SG122937A1 - Lithographic apparatus and device manufacturing m ethod - Google Patents

Lithographic apparatus and device manufacturing m ethod

Info

Publication number
SG122937A1
SG122937A1 SG200507707A SG200507707A SG122937A1 SG 122937 A1 SG122937 A1 SG 122937A1 SG 200507707 A SG200507707 A SG 200507707A SG 200507707 A SG200507707 A SG 200507707A SG 122937 A1 SG122937 A1 SG 122937A1
Authority
SG
Singapore
Prior art keywords
ethod
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200507707A
Other languages
English (en)
Inventor
Johannes Jacobus Mat Baselmans
Sjoerd Nicolaas Lamber Donders
Christiaan Alexander Hoogendam
Jeroen Johannes Sophia Mertens
Johannes Catharinus Hu Mulkens
Bob Streefkerk
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG122937A1 publication Critical patent/SG122937A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200507707A 2004-12-02 2005-11-30 Lithographic apparatus and device manufacturing m ethod SG122937A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/001,082 US7161654B2 (en) 2004-12-02 2004-12-02 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG122937A1 true SG122937A1 (en) 2006-06-29

Family

ID=35698857

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200804223-6A SG143284A1 (en) 2004-12-02 2005-11-30 Lithographic apparatus and device manufacturing method
SG200507707A SG122937A1 (en) 2004-12-02 2005-11-30 Lithographic apparatus and device manufacturing m ethod

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200804223-6A SG143284A1 (en) 2004-12-02 2005-11-30 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (3) US7161654B2 (zh)
EP (1) EP1666973B1 (zh)
JP (2) JP2006165550A (zh)
KR (1) KR100729243B1 (zh)
CN (2) CN101241316B (zh)
DE (1) DE602005020891D1 (zh)
SG (2) SG143284A1 (zh)
TW (1) TWI311693B (zh)

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Also Published As

Publication number Publication date
EP1666973A1 (en) 2006-06-07
US7161654B2 (en) 2007-01-09
KR100729243B1 (ko) 2007-06-15
CN101241316B (zh) 2012-07-04
JP2006165550A (ja) 2006-06-22
CN101241316A (zh) 2008-08-13
JP2009188421A (ja) 2009-08-20
DE602005020891D1 (de) 2010-06-10
CN1782886A (zh) 2006-06-07
CN1782886B (zh) 2010-08-25
SG143284A1 (en) 2008-06-27
US20060119807A1 (en) 2006-06-08
TW200622514A (en) 2006-07-01
KR20060061899A (ko) 2006-06-08
US20070013886A1 (en) 2007-01-18
US20110001944A1 (en) 2011-01-06
EP1666973B1 (en) 2010-04-28
US7812924B2 (en) 2010-10-12
TWI311693B (en) 2009-07-01

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