SG11201600242PA - Low density polishing pad - Google Patents

Low density polishing pad

Info

Publication number
SG11201600242PA
SG11201600242PA SG11201600242PA SG11201600242PA SG11201600242PA SG 11201600242P A SG11201600242P A SG 11201600242PA SG 11201600242P A SG11201600242P A SG 11201600242PA SG 11201600242P A SG11201600242P A SG 11201600242PA SG 11201600242P A SG11201600242P A SG 11201600242PA
Authority
SG
Singapore
Prior art keywords
low density
polishing pad
density polishing
pad
low
Prior art date
Application number
SG11201600242PA
Other languages
English (en)
Inventor
Ping Huang
William C Allison
Richard Frentzel
Paul Andre Lefevre
Robert Kerprich
Diane Scott
Original Assignee
Nexplanar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nexplanar Corp filed Critical Nexplanar Corp
Publication of SG11201600242PA publication Critical patent/SG11201600242PA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/04Zonally-graded surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/205Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001Manufacture of flexible abrasive materials
    • B24D11/005Making abrasive webs
    • B24D11/006Making abrasive webs without embedded abrasive particles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
SG11201600242PA 2013-07-31 2014-07-17 Low density polishing pad SG11201600242PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/955,398 US20150038066A1 (en) 2013-07-31 2013-07-31 Low density polishing pad
PCT/US2014/047065 WO2015017138A1 (en) 2013-07-31 2014-07-17 Low density polishing pad

Publications (1)

Publication Number Publication Date
SG11201600242PA true SG11201600242PA (en) 2016-02-26

Family

ID=51263570

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201600242PA SG11201600242PA (en) 2013-07-31 2014-07-17 Low density polishing pad

Country Status (8)

Country Link
US (1) US20150038066A1 (enExample)
EP (1) EP3027363B1 (enExample)
JP (3) JP6517802B2 (enExample)
KR (1) KR101801693B1 (enExample)
CN (1) CN105408063B (enExample)
SG (1) SG11201600242PA (enExample)
TW (1) TWI579106B (enExample)
WO (1) WO2015017138A1 (enExample)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US9776361B2 (en) 2014-10-17 2017-10-03 Applied Materials, Inc. Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
US10399201B2 (en) 2014-10-17 2019-09-03 Applied Materials, Inc. Advanced polishing pads having compositional gradients by use of an additive manufacturing process
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
CN113579992A (zh) 2014-10-17 2021-11-02 应用材料公司 使用加成制造工艺的具复合材料特性的cmp衬垫建构
US9586304B2 (en) * 2014-12-19 2017-03-07 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Controlled-expansion CMP PAD casting method
US10005172B2 (en) * 2015-06-26 2018-06-26 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Controlled-porosity method for forming polishing pad
JP6940495B2 (ja) 2015-10-30 2021-09-29 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated 所望のゼータ電位を有する研磨用物品を形成するための装置及び方法
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
KR20240015161A (ko) 2016-01-19 2024-02-02 어플라이드 머티어리얼스, 인코포레이티드 다공성 화학적 기계적 연마 패드들
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
JP7148226B2 (ja) 2016-09-21 2022-10-05 東友ファインケム株式会社 赤色硬化性樹脂組成物
US20180304539A1 (en) 2017-04-21 2018-10-25 Applied Materials, Inc. Energy delivery system with array of energy sources for an additive manufacturing apparatus
US20180345449A1 (en) * 2017-06-06 2018-12-06 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pads for improved removal rate and planarization
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
US11072050B2 (en) 2017-08-04 2021-07-27 Applied Materials, Inc. Polishing pad with window and manufacturing methods thereof
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME
KR101949905B1 (ko) 2017-08-23 2019-02-19 에스케이씨 주식회사 다공성 폴리우레탄 연마패드 및 이의 제조방법
CN111032285B (zh) * 2017-08-25 2022-07-19 3M创新有限公司 表面突起抛光垫
KR101949911B1 (ko) 2017-09-11 2019-02-19 에스케이씨 주식회사 다공성 폴리우레탄 연마패드 및 이의 제조방법
US11642752B2 (en) * 2017-09-11 2023-05-09 Sk Enpulse Co., Ltd. Porous polyurethane polishing pad and process for preparing the same
KR102088919B1 (ko) 2017-09-11 2020-03-13 에스케이씨 주식회사 다공성 폴리우레탄 연마패드 및 이의 제조방법
KR102054309B1 (ko) 2018-04-17 2019-12-10 에스케이씨 주식회사 다공성 연마 패드 및 이의 제조방법
KR102058877B1 (ko) 2018-04-20 2019-12-24 에스케이씨 주식회사 다공성 폴리우레탄 연마패드 및 이의 제조방법
KR20210042171A (ko) 2018-09-04 2021-04-16 어플라이드 머티어리얼스, 인코포레이티드 진보한 폴리싱 패드들을 위한 제형들
KR20200079865A (ko) 2018-12-26 2020-07-06 에스케이씨 주식회사 연마패드용 조성물, 연마패드 및 이의 제조방법
TWI735101B (zh) 2018-12-26 2021-08-01 南韓商Skc索密思股份有限公司 用於研磨墊之組成物、研磨墊及用於製備其之方法
KR20200079847A (ko) 2018-12-26 2020-07-06 에스케이씨 주식회사 연마패드용 조성물, 연마패드 및 이의 제조방법
KR102202076B1 (ko) 2018-12-26 2021-01-12 에스케이씨 주식회사 연마패드용 조성물, 연마패드 및 이의 제조방법
KR102283399B1 (ko) 2018-12-26 2021-07-30 에스케이씨솔믹스 주식회사 연마패드용 조성물, 연마패드 및 이의 제조방법
KR102185265B1 (ko) 2018-12-26 2020-12-01 에스케이씨 주식회사 연마패드용 조성물, 연마패드 및 이의 제조방법
KR102174958B1 (ko) 2019-03-27 2020-11-05 에스케이씨 주식회사 결함 발생을 최소화시키는 연마패드 및 이의 제조방법
KR102277418B1 (ko) 2019-05-21 2021-07-14 에스케이씨솔믹스 주식회사 가교 밀도가 향상된 연마패드 및 이의 제조방법
KR102237367B1 (ko) 2019-06-17 2021-04-07 에스케이씨솔믹스 주식회사 연마패드용 조성물, 연마패드 및 반도체 소자의 제조방법
KR102237351B1 (ko) 2019-06-17 2021-04-07 에스케이씨솔믹스 주식회사 연마패드용 조성물, 연마패드 및 반도체 소자의 제조방법
KR102237357B1 (ko) 2019-06-17 2021-04-07 에스케이씨솔믹스 주식회사 연마패드용 조성물, 연마패드 및 반도체 소자의 제조방법
KR102237362B1 (ko) 2019-06-17 2021-04-07 에스케이씨솔믹스 주식회사 연마패드용 조성물, 연마패드 및 반도체 소자의 제조방법
TWI743831B (zh) 2019-06-17 2021-10-21 南韓商Skc索密思股份有限公司 用於研磨墊之組成物、研磨墊及半導體裝置之製備方法
KR102197481B1 (ko) 2019-06-27 2020-12-31 에스케이씨 주식회사 연마패드 및 이의 제조방법
KR102273097B1 (ko) 2019-10-23 2021-07-05 에스케이씨솔믹스 주식회사 연마패드용 조성물, 연마패드 및 이의 제조방법
TWI741753B (zh) 2019-10-29 2021-10-01 南韓商Skc索密思股份有限公司 研磨墊、製造該研磨墊之方法及使用該研磨墊以製造半導體裝置之方法
KR102188525B1 (ko) 2019-10-29 2020-12-08 에스케이씨 주식회사 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법
KR102304965B1 (ko) 2019-10-30 2021-09-24 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법
KR102287235B1 (ko) 2019-10-30 2021-08-06 에스케이씨솔믹스 주식회사 가교도가 조절된 연마패드 및 이의 제조방법
KR102287923B1 (ko) 2019-10-30 2021-08-09 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법
KR102298114B1 (ko) 2019-11-05 2021-09-03 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
KR102298111B1 (ko) 2019-11-15 2021-09-03 에스케이씨솔믹스 주식회사 재생 폴리올을 포함하는 폴리우레탄 연마패드 및 이의 제조방법
KR102300038B1 (ko) 2019-11-15 2021-09-08 에스케이씨솔믹스 주식회사 연마패드로부터 재생된 폴리올 조성물 및 이의 제조방법
KR102300050B1 (ko) 2019-11-15 2021-09-08 에스케이씨솔믹스 주식회사 연마패드로부터 재생된 폴리올 및 이의 제조방법
KR102293765B1 (ko) 2019-11-21 2021-08-26 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법
KR102177748B1 (ko) 2019-11-28 2020-11-11 에스케이씨 주식회사 다공성 연마 패드 및 이의 제조방법
US11813712B2 (en) 2019-12-20 2023-11-14 Applied Materials, Inc. Polishing pads having selectively arranged porosity
JP7576396B2 (ja) * 2020-01-20 2024-10-31 ニッタ・デュポン株式会社 研磨パッド
US11667061B2 (en) * 2020-04-18 2023-06-06 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of forming leveraged poromeric polishing pad
US11806829B2 (en) * 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
KR20200105465A (ko) 2020-08-28 2020-09-07 에스케이씨 주식회사 연마패드용 조성물, 연마패드 및 이의 제조방법
KR20200105790A (ko) 2020-09-01 2020-09-09 에스케이씨 주식회사 연마패드용 조성물, 연마패드 및 이의 제조방법
CN112091817B (zh) * 2020-09-08 2022-06-17 中国航发贵州黎阳航空动力有限公司 一种薄壁环形零件端面研磨工具
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ
CN120051356A (zh) * 2022-09-22 2025-05-27 Cmc材料有限责任公司 具有二硫键的化学机械抛光垫
KR102731712B1 (ko) 2023-04-14 2024-11-19 에스케이엔펄스 주식회사 염소 함량이 조절된 연마패드 및 이를 이용한 반도체 소자의 제조방법
KR102884111B1 (ko) 2023-04-25 2025-11-17 주식회사 브러쉬텍 씨엠피용 패드 컨디셔닝 디스크 및 그 제조방법
US20250033160A1 (en) 2023-07-26 2025-01-30 Sk Enpulse Co., Ltd. Polishing pad with reduced defect and method of preparing a semiconductor device using the same
KR102889774B1 (ko) 2023-11-06 2025-11-24 엔펄스 주식회사 결함 발생이 감소된 연마패드 및 이를 이용한 반도체 소자의 제조방법
KR102741574B1 (ko) 2023-07-26 2024-12-12 에스케이엔펄스 주식회사 결함 발생이 저감된 연마패드 및 이를 이용한 반도체 소자의 제조방법
KR20250066450A (ko) 2023-11-06 2025-05-13 엔펄스 주식회사 연마패드 및 이를 이용한 반도체 소자의 제조 방법
KR20250066238A (ko) 2023-11-06 2025-05-13 엔펄스 주식회사 연마패드 및 이를 이용한 반도체 소자의 제조 방법

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5885312A (en) * 1997-06-17 1999-03-23 Speedfam Corporation Grinding composition using abrasive particles on bubbles
US6231942B1 (en) * 1998-01-21 2001-05-15 Trexel, Inc. Method and apparatus for microcellular polypropylene extrusion, and polypropylene articles produced thereby
TWI228522B (en) * 1999-06-04 2005-03-01 Fuji Spinning Co Ltd Urethane molded products for polishing pad and method for making same
US6368200B1 (en) * 2000-03-02 2002-04-09 Agere Systems Guardian Corporation Polishing pads from closed-cell elastomer foam
US20020016139A1 (en) * 2000-07-25 2002-02-07 Kazuto Hirokawa Polishing tool and manufacturing method therefor
US8062098B2 (en) * 2000-11-17 2011-11-22 Duescher Wayne O High speed flat lapping platen
JP2005517290A (ja) * 2002-02-06 2005-06-09 アプライド マテリアルズ インコーポレイテッド 渦電流モニタリングシステムを備えた化学機械的研磨の為の方法及び装置
US6841221B2 (en) * 2002-02-20 2005-01-11 Congoleum Corporation Heat activated coating texture
US7163444B2 (en) * 2003-01-10 2007-01-16 3M Innovative Properties Company Pad constructions for chemical mechanical planarization applications
US6960120B2 (en) * 2003-02-10 2005-11-01 Cabot Microelectronics Corporation CMP pad with composite transparent window
JP2004345014A (ja) * 2003-05-21 2004-12-09 Hitachi Chem Co Ltd 研磨用パッドとそれを用いた研磨方法
US20050017122A1 (en) * 2003-07-23 2005-01-27 Conitex-Sonoco Llc Apparatus and method for forming enlarged base on yarn carrier, and yarn carrier with enlarged base
US7074115B2 (en) * 2003-10-09 2006-07-11 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad
JP2006128563A (ja) * 2004-11-01 2006-05-18 Toyo Tire & Rubber Co Ltd 半導体ウエハ研磨用研磨パッドおよび半導体デバイスの製造方法
EP1704965A1 (de) * 2005-03-24 2006-09-27 Solvay Fluor GmbH Schleifmittelzusatz
JP4986129B2 (ja) * 2007-01-15 2012-07-25 東洋ゴム工業株式会社 研磨パッド
JP5117147B2 (ja) * 2007-09-11 2013-01-09 富士紡ホールディングス株式会社 研磨パッドおよび研磨パッドの製造方法
US8377351B2 (en) * 2008-04-01 2013-02-19 Innopad, Inc. Polishing pad with controlled void formation
EP2182024A3 (en) * 2008-10-30 2011-04-20 Rohm and Haas Company Flexible acrylic foam composition
JP5393434B2 (ja) * 2008-12-26 2014-01-22 東洋ゴム工業株式会社 研磨パッド及びその製造方法
JP5521243B2 (ja) * 2009-07-03 2014-06-11 日本発條株式会社 研磨保持用パッド
US20120009458A1 (en) * 2010-07-12 2012-01-12 Wu Donald P H Connecting structure for exteriorly connecting a battery cell and a load
US8702479B2 (en) * 2010-10-15 2014-04-22 Nexplanar Corporation Polishing pad with multi-modal distribution of pore diameters
US20120302148A1 (en) * 2011-05-23 2012-11-29 Rajeev Bajaj Polishing pad with homogeneous body having discrete protrusions thereon
JP5738731B2 (ja) * 2011-09-22 2015-06-24 東洋ゴム工業株式会社 研磨パッド
JP5945874B2 (ja) * 2011-10-18 2016-07-05 富士紡ホールディングス株式会社 研磨パッド及びその製造方法

Also Published As

Publication number Publication date
US20150038066A1 (en) 2015-02-05
EP3027363B1 (en) 2020-01-15
JP2017042910A (ja) 2017-03-02
JP6415521B2 (ja) 2018-10-31
TWI579106B (zh) 2017-04-21
KR101801693B1 (ko) 2017-11-27
KR20160027075A (ko) 2016-03-09
JP2016525459A (ja) 2016-08-25
WO2015017138A1 (en) 2015-02-05
TW201509595A (zh) 2015-03-16
EP3027363A1 (en) 2016-06-08
JP6517802B2 (ja) 2019-05-22
JP2019077036A (ja) 2019-05-23
CN105408063A (zh) 2016-03-16
CN105408063B (zh) 2018-01-30

Similar Documents

Publication Publication Date Title
SG11201600242PA (en) Low density polishing pad
SG11201705917PA (en) Low density polishing pad
SG11201602207QA (en) Multi-layered polishing pads
PT2764808E (pt) Moinho de trituração
EP2945521A4 (en) Cleaning pad
SG11201508452VA (en) Low surface roughness polishing pad
LT2983866T (lt) Abrazyvinis įrankis
SG11201505900XA (en) Polishing pad
SG11201601941SA (en) Polishing composition
SG11201601847WA (en) Polishing composition
SG10201407798XA (en) Polishing apparatus
AU351637S (en) Pad arrangement
SG11201505490RA (en) Surface selective polishing compositions
SG11201505923QA (en) Polishing pad
AU351636S (en) Pad arrangement
AU354694S (en) Surface treatment pad
SG10201403993VA (en) Polishing apparatus
HUE036683T2 (hu) Mûgyantakötéses csiszolókorong
AU351634S (en) Pad arrangement
PT2829208T (pt) Moinho de especiarias
AU351664S (en) Pad arrangement
GB2516844B (en) Kneeling pad
GB201319214D0 (en) +Pad
AU351635S (en) Pad arrangement
TWM475876U (en) Air-permeable pad