SG11201401635PA - Injection system for an apparatus for depositing thin layers by vacuum evaporation - Google Patents

Injection system for an apparatus for depositing thin layers by vacuum evaporation

Info

Publication number
SG11201401635PA
SG11201401635PA SG11201401635PA SG11201401635PA SG11201401635PA SG 11201401635P A SG11201401635P A SG 11201401635PA SG 11201401635P A SG11201401635P A SG 11201401635PA SG 11201401635P A SG11201401635P A SG 11201401635PA SG 11201401635P A SG11201401635P A SG 11201401635PA
Authority
SG
Singapore
Prior art keywords
injection system
vacuum evaporation
thin layers
depositing thin
depositing
Prior art date
Application number
SG11201401635PA
Other languages
English (en)
Inventor
Jean-Louis Guyaux
Jérôme Villette
Nicolas Briant
David Esteve
Original Assignee
Riber
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Riber filed Critical Riber
Publication of SG11201401635PA publication Critical patent/SG11201401635PA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
SG11201401635PA 2011-10-21 2012-10-18 Injection system for an apparatus for depositing thin layers by vacuum evaporation SG11201401635PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1159560A FR2981667B1 (fr) 2011-10-21 2011-10-21 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide
PCT/FR2012/052388 WO2013057443A1 (fr) 2011-10-21 2012-10-18 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide

Publications (1)

Publication Number Publication Date
SG11201401635PA true SG11201401635PA (en) 2014-09-26

Family

ID=47221468

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401635PA SG11201401635PA (en) 2011-10-21 2012-10-18 Injection system for an apparatus for depositing thin layers by vacuum evaporation

Country Status (9)

Country Link
US (1) US20140245955A1 (enExample)
EP (1) EP2769001B1 (enExample)
JP (1) JP6170927B2 (enExample)
KR (1) KR102108173B1 (enExample)
CN (1) CN103906856B (enExample)
FR (1) FR2981667B1 (enExample)
IN (1) IN2014DN03425A (enExample)
SG (1) SG11201401635PA (enExample)
WO (1) WO2013057443A1 (enExample)

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CN107078215B (zh) * 2014-11-07 2020-09-22 应用材料公司 用于真空沉积的材料源配置与材料分布配置
EP3245313B1 (en) * 2015-07-13 2018-12-05 Applied Materials, Inc. Evaporation source.
CN105088145B (zh) * 2015-08-19 2017-03-29 京东方科技集团股份有限公司 用于oled蒸发源的坩埚及其制造方法
CN205443432U (zh) * 2016-04-07 2016-08-10 鄂尔多斯市源盛光电有限责任公司 一种线性蒸发源、蒸发源系统及蒸镀装置
JP6823954B2 (ja) * 2016-07-08 2021-02-03 株式会社ジャパンディスプレイ 成膜装置および成膜方法
CN106868456B (zh) * 2017-03-21 2019-03-12 京东方科技集团股份有限公司 蒸发源和蒸镀设备
JP6543664B2 (ja) * 2017-09-11 2019-07-10 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 真空堆積チャンバ
CN109943806A (zh) * 2017-12-20 2019-06-28 合肥欣奕华智能机器有限公司 一种线性蒸发源装置及蒸镀装置
CN109817842B (zh) * 2019-01-16 2021-10-01 京东方科技集团股份有限公司 一种真空干燥装置、显示用基板的制备方法
JP2022107982A (ja) * 2021-01-12 2022-07-25 キヤノントッキ株式会社 蒸発源装置、成膜装置、成膜方法及び電子デバイスの製造方法

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Also Published As

Publication number Publication date
CN103906856A (zh) 2014-07-02
KR20140092816A (ko) 2014-07-24
CN103906856B (zh) 2016-11-09
EP2769001A1 (fr) 2014-08-27
FR2981667B1 (fr) 2014-07-04
KR102108173B1 (ko) 2020-05-08
WO2013057443A1 (fr) 2013-04-25
IN2014DN03425A (enExample) 2015-06-05
US20140245955A1 (en) 2014-09-04
JP2015501379A (ja) 2015-01-15
JP6170927B2 (ja) 2017-07-26
EP2769001B1 (fr) 2017-12-20
FR2981667A1 (fr) 2013-04-26

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