KR102108173B1 - 진공 증발에 의한 박막 증착용 장치를 위한 분사 시스템 - Google Patents

진공 증발에 의한 박막 증착용 장치를 위한 분사 시스템 Download PDF

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KR102108173B1
KR102108173B1 KR1020147010540A KR20147010540A KR102108173B1 KR 102108173 B1 KR102108173 B1 KR 102108173B1 KR 1020147010540 A KR1020147010540 A KR 1020147010540A KR 20147010540 A KR20147010540 A KR 20147010540A KR 102108173 B1 KR102108173 B1 KR 102108173B1
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injection
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lamp
container
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KR20140092816A (ko
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장-루이스 귀요
제롬 빌렛트
니콜라스 브라이언트
데이비드 에스티브
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리베르
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020147010540A 2011-10-21 2012-10-18 진공 증발에 의한 박막 증착용 장치를 위한 분사 시스템 Active KR102108173B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1159560 2011-10-21
FR1159560A FR2981667B1 (fr) 2011-10-21 2011-10-21 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide
PCT/FR2012/052388 WO2013057443A1 (fr) 2011-10-21 2012-10-18 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide

Publications (2)

Publication Number Publication Date
KR20140092816A KR20140092816A (ko) 2014-07-24
KR102108173B1 true KR102108173B1 (ko) 2020-05-08

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KR1020147010540A Active KR102108173B1 (ko) 2011-10-21 2012-10-18 진공 증발에 의한 박막 증착용 장치를 위한 분사 시스템

Country Status (9)

Country Link
US (1) US20140245955A1 (enExample)
EP (1) EP2769001B1 (enExample)
JP (1) JP6170927B2 (enExample)
KR (1) KR102108173B1 (enExample)
CN (1) CN103906856B (enExample)
FR (1) FR2981667B1 (enExample)
IN (1) IN2014DN03425A (enExample)
SG (1) SG11201401635PA (enExample)
WO (1) WO2013057443A1 (enExample)

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WO2016070941A1 (en) * 2014-11-07 2016-05-12 Applied Materials, Inc. Material source arrangment and nozzle for vacuum deposition
KR102082192B1 (ko) * 2014-11-07 2020-02-27 어플라이드 머티어리얼스, 인코포레이티드 증발된 재료를 증착하기 위한 장치, 분배 파이프, 진공 증착 챔버, 및 증발된 재료를 증착하기 위한 방법
CN107078215B (zh) * 2014-11-07 2020-09-22 应用材料公司 用于真空沉积的材料源配置与材料分布配置
EP3245313B1 (en) * 2015-07-13 2018-12-05 Applied Materials, Inc. Evaporation source.
CN105088145B (zh) * 2015-08-19 2017-03-29 京东方科技集团股份有限公司 用于oled蒸发源的坩埚及其制造方法
CN205443432U (zh) * 2016-04-07 2016-08-10 鄂尔多斯市源盛光电有限责任公司 一种线性蒸发源、蒸发源系统及蒸镀装置
JP6823954B2 (ja) * 2016-07-08 2021-02-03 株式会社ジャパンディスプレイ 成膜装置および成膜方法
CN106868456B (zh) * 2017-03-21 2019-03-12 京东方科技集团股份有限公司 蒸发源和蒸镀设备
JP6543664B2 (ja) * 2017-09-11 2019-07-10 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 真空堆積チャンバ
CN109943806A (zh) * 2017-12-20 2019-06-28 合肥欣奕华智能机器有限公司 一种线性蒸发源装置及蒸镀装置
CN109817842B (zh) * 2019-01-16 2021-10-01 京东方科技集团股份有限公司 一种真空干燥装置、显示用基板的制备方法
JP2022107982A (ja) * 2021-01-12 2022-07-25 キヤノントッキ株式会社 蒸発源装置、成膜装置、成膜方法及び電子デバイスの製造方法

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WO2010019200A1 (en) * 2008-08-12 2010-02-18 Momentive Performance Materials Inc. Evaporator

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WO2010019200A1 (en) * 2008-08-12 2010-02-18 Momentive Performance Materials Inc. Evaporator

Also Published As

Publication number Publication date
CN103906856A (zh) 2014-07-02
KR20140092816A (ko) 2014-07-24
CN103906856B (zh) 2016-11-09
EP2769001A1 (fr) 2014-08-27
FR2981667B1 (fr) 2014-07-04
SG11201401635PA (en) 2014-09-26
WO2013057443A1 (fr) 2013-04-25
IN2014DN03425A (enExample) 2015-06-05
US20140245955A1 (en) 2014-09-04
JP2015501379A (ja) 2015-01-15
JP6170927B2 (ja) 2017-07-26
EP2769001B1 (fr) 2017-12-20
FR2981667A1 (fr) 2013-04-26

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