FR2981667B1 - Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide - Google Patents

Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide

Info

Publication number
FR2981667B1
FR2981667B1 FR1159560A FR1159560A FR2981667B1 FR 2981667 B1 FR2981667 B1 FR 2981667B1 FR 1159560 A FR1159560 A FR 1159560A FR 1159560 A FR1159560 A FR 1159560A FR 2981667 B1 FR2981667 B1 FR 2981667B1
Authority
FR
France
Prior art keywords
injection system
vacuum evaporation
thin layers
depositing thin
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1159560A
Other languages
English (en)
French (fr)
Other versions
FR2981667A1 (fr
Inventor
Jean-Louis Guyaux
Jerome Villette
Nicolas Briant
David Esteve
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Riber SA
Original Assignee
Riber SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1159560A priority Critical patent/FR2981667B1/fr
Application filed by Riber SA filed Critical Riber SA
Priority to SG11201401635PA priority patent/SG11201401635PA/en
Priority to US14/350,104 priority patent/US20140245955A1/en
Priority to JP2014536318A priority patent/JP6170927B2/ja
Priority to PCT/FR2012/052388 priority patent/WO2013057443A1/fr
Priority to EP12790607.1A priority patent/EP2769001B1/fr
Priority to KR1020147010540A priority patent/KR102108173B1/ko
Priority to CN201280051570.2A priority patent/CN103906856B/zh
Priority to IN3425DEN2014 priority patent/IN2014DN03425A/en
Publication of FR2981667A1 publication Critical patent/FR2981667A1/fr
Application granted granted Critical
Publication of FR2981667B1 publication Critical patent/FR2981667B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
FR1159560A 2011-10-21 2011-10-21 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide Active FR2981667B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR1159560A FR2981667B1 (fr) 2011-10-21 2011-10-21 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide
US14/350,104 US20140245955A1 (en) 2011-10-21 2012-10-18 Injection system for an apparatus for depositing thin layers by vacuum evaporation
JP2014536318A JP6170927B2 (ja) 2011-10-21 2012-10-18 真空蒸着によって薄膜を堆積させる装置のための噴射システム
PCT/FR2012/052388 WO2013057443A1 (fr) 2011-10-21 2012-10-18 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide
SG11201401635PA SG11201401635PA (en) 2011-10-21 2012-10-18 Injection system for an apparatus for depositing thin layers by vacuum evaporation
EP12790607.1A EP2769001B1 (fr) 2011-10-21 2012-10-18 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide
KR1020147010540A KR102108173B1 (ko) 2011-10-21 2012-10-18 진공 증발에 의한 박막 증착용 장치를 위한 분사 시스템
CN201280051570.2A CN103906856B (zh) 2011-10-21 2012-10-18 用于通过真空蒸发沉积薄膜的装置的喷射系统
IN3425DEN2014 IN2014DN03425A (enExample) 2011-10-21 2012-10-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1159560A FR2981667B1 (fr) 2011-10-21 2011-10-21 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide

Publications (2)

Publication Number Publication Date
FR2981667A1 FR2981667A1 (fr) 2013-04-26
FR2981667B1 true FR2981667B1 (fr) 2014-07-04

Family

ID=47221468

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1159560A Active FR2981667B1 (fr) 2011-10-21 2011-10-21 Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide

Country Status (9)

Country Link
US (1) US20140245955A1 (enExample)
EP (1) EP2769001B1 (enExample)
JP (1) JP6170927B2 (enExample)
KR (1) KR102108173B1 (enExample)
CN (1) CN103906856B (enExample)
FR (1) FR2981667B1 (enExample)
IN (1) IN2014DN03425A (enExample)
SG (1) SG11201401635PA (enExample)
WO (1) WO2013057443A1 (enExample)

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WO2016070941A1 (en) * 2014-11-07 2016-05-12 Applied Materials, Inc. Material source arrangment and nozzle for vacuum deposition
KR102082192B1 (ko) * 2014-11-07 2020-02-27 어플라이드 머티어리얼스, 인코포레이티드 증발된 재료를 증착하기 위한 장치, 분배 파이프, 진공 증착 챔버, 및 증발된 재료를 증착하기 위한 방법
CN107078215B (zh) * 2014-11-07 2020-09-22 应用材料公司 用于真空沉积的材料源配置与材料分布配置
EP3245313B1 (en) * 2015-07-13 2018-12-05 Applied Materials, Inc. Evaporation source.
CN105088145B (zh) * 2015-08-19 2017-03-29 京东方科技集团股份有限公司 用于oled蒸发源的坩埚及其制造方法
CN205443432U (zh) * 2016-04-07 2016-08-10 鄂尔多斯市源盛光电有限责任公司 一种线性蒸发源、蒸发源系统及蒸镀装置
JP6823954B2 (ja) * 2016-07-08 2021-02-03 株式会社ジャパンディスプレイ 成膜装置および成膜方法
CN106868456B (zh) * 2017-03-21 2019-03-12 京东方科技集团股份有限公司 蒸发源和蒸镀设备
JP6543664B2 (ja) * 2017-09-11 2019-07-10 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 真空堆積チャンバ
CN109943806A (zh) * 2017-12-20 2019-06-28 合肥欣奕华智能机器有限公司 一种线性蒸发源装置及蒸镀装置
CN109817842B (zh) * 2019-01-16 2021-10-01 京东方科技集团股份有限公司 一种真空干燥装置、显示用基板的制备方法
JP2022107982A (ja) * 2021-01-12 2022-07-25 キヤノントッキ株式会社 蒸発源装置、成膜装置、成膜方法及び電子デバイスの製造方法

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US20060127599A1 (en) * 2002-02-12 2006-06-15 Wojak Gregory J Process and apparatus for preparing a diamond substance
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung
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Also Published As

Publication number Publication date
CN103906856A (zh) 2014-07-02
KR20140092816A (ko) 2014-07-24
CN103906856B (zh) 2016-11-09
EP2769001A1 (fr) 2014-08-27
KR102108173B1 (ko) 2020-05-08
SG11201401635PA (en) 2014-09-26
WO2013057443A1 (fr) 2013-04-25
IN2014DN03425A (enExample) 2015-06-05
US20140245955A1 (en) 2014-09-04
JP2015501379A (ja) 2015-01-15
JP6170927B2 (ja) 2017-07-26
EP2769001B1 (fr) 2017-12-20
FR2981667A1 (fr) 2013-04-26

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