IN2014DN03425A - - Google Patents

Download PDF

Info

Publication number
IN2014DN03425A
IN2014DN03425A IN3425DEN2014A IN2014DN03425A IN 2014DN03425 A IN2014DN03425 A IN 2014DN03425A IN 3425DEN2014 A IN3425DEN2014 A IN 3425DEN2014A IN 2014DN03425 A IN2014DN03425 A IN 2014DN03425A
Authority
IN
India
Prior art keywords
injection
ramp
reservoir
longitudinal direction
way
Prior art date
Application number
Inventor
Jean Louis Guyaux
Jérôme Villette
Nicolas Briant
David Esteve
Original Assignee
Riber
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Riber filed Critical Riber
Publication of IN2014DN03425A publication Critical patent/IN2014DN03425A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The present invention concerns an injection system for an apparatus for depositing thin layers by vacuum evaporation said injection system comprising a reservoir intended to receive a source of material to be evaporated means of heating the reservoir capable of evaporating said material at least one injection ramp comprising an inner conduit connected to the reservoir in such a way as to receive said evaporated material coming from the reservoir and a plurality of nozzles each nozzle comprising at least a communication channel between said inner conduit and the external portion of the ramp in such a way as to discharge the evaporated material into said vacuum evaporation chamber. According to the invention the injection ramp comprises a plurality of injection modules mechanically connected to each other in series along a longitudinal direction each injection module comprising a plurality of injection nozzles and said injection ramp comprises means of adjusting the orientation of said injection modules about said longitudinal direction in such a way as to align said injection nozzles along a line parallel to the longitudinal direction of the injection ramp.
IN3425DEN2014 2011-10-21 2012-10-18 IN2014DN03425A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1159560A FR2981667B1 (en) 2011-10-21 2011-10-21 INJECTION SYSTEM FOR DEVICE FOR DEPOSITING THIN LAYERS BY VACUUM EVAPORATION
PCT/FR2012/052388 WO2013057443A1 (en) 2011-10-21 2012-10-18 Injection system for an apparatus for depositing thin layers by vacuum evaporation

Publications (1)

Publication Number Publication Date
IN2014DN03425A true IN2014DN03425A (en) 2015-06-05

Family

ID=47221468

Family Applications (1)

Application Number Title Priority Date Filing Date
IN3425DEN2014 IN2014DN03425A (en) 2011-10-21 2012-10-18

Country Status (9)

Country Link
US (1) US20140245955A1 (en)
EP (1) EP2769001B1 (en)
JP (1) JP6170927B2 (en)
KR (1) KR102108173B1 (en)
CN (1) CN103906856B (en)
FR (1) FR2981667B1 (en)
IN (1) IN2014DN03425A (en)
SG (1) SG11201401635PA (en)
WO (1) WO2013057443A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102018865B1 (en) * 2014-11-07 2019-09-05 어플라이드 머티어리얼스, 인코포레이티드 Material source arrangement and nozzle for vacuum deposition
WO2016070943A1 (en) * 2014-11-07 2016-05-12 Applied Materials, Inc. Material source arrangment and material distribution arrangement for vacuum deposition
CN107502858B (en) * 2014-11-07 2020-06-19 应用材料公司 Vacuum deposition chamber
WO2017008838A1 (en) * 2015-07-13 2017-01-19 Applied Materials, Inc. Evaporation source.
CN105088145B (en) * 2015-08-19 2017-03-29 京东方科技集团股份有限公司 For the crucible and its manufacture method of OLED evaporation sources
CN205443432U (en) * 2016-04-07 2016-08-10 鄂尔多斯市源盛光电有限责任公司 Linear evaporation source, evaporation source system and coating by vaporization device
JP6823954B2 (en) * 2016-07-08 2021-02-03 株式会社ジャパンディスプレイ Film formation equipment and film formation method
CN106868456B (en) * 2017-03-21 2019-03-12 京东方科技集团股份有限公司 Evaporation source and evaporated device
JP6543664B2 (en) * 2017-09-11 2019-07-10 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Vacuum deposition chamber
CN109943806A (en) * 2017-12-20 2019-06-28 合肥欣奕华智能机器有限公司 A kind of linear evaporation source device and evaporation coating device
CN109817842B (en) * 2019-01-16 2021-10-01 京东方科技集团股份有限公司 Vacuum drying device and preparation method of display substrate

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2688500A (en) * 1952-01-02 1954-09-07 Laval Separator Co De Coupling for pipes
US3661117A (en) * 1969-12-03 1972-05-09 Stanford Research Inst Apparatus for depositing thin lines
US4016310A (en) * 1975-04-23 1977-04-05 Xerox Corporation Coater hardware and method for obtaining uniform photoconductive layers on a xerographic photoreceptor
US4756465A (en) * 1985-04-15 1988-07-12 Latviisky Gosudarstvenny Institut Method of cold welding
DE3636891A1 (en) * 1986-10-30 1988-05-11 Armin Dommer METHOD AND DEVICE FOR BUTT WELDING PLASTIC PIPE SECTIONS OR PLASTIC MOLDED PIECES
US5186120A (en) * 1989-03-22 1993-02-16 Mitsubishi Denki Kabushiki Kaisha Mixture thin film forming apparatus
JP3139179B2 (en) * 1992-10-12 2001-02-26 オイレス工業株式会社 Spherical band seal
US5458725A (en) * 1993-08-17 1995-10-17 Motorola, Inc. Gas distribution system
FR2800754B1 (en) * 1999-11-08 2003-05-09 Joint Industrial Processors For Electronics DEVICE FOR EVAPORATING A CHEMICAL VAPOR DEPOSIT SYSTEM
US20060127599A1 (en) * 2002-02-12 2006-06-15 Wojak Gregory J Process and apparatus for preparing a diamond substance
DE10256038A1 (en) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg A steamer
JP4015064B2 (en) * 2003-05-28 2007-11-28 トッキ株式会社 Vapor deposition equipment
KR100659762B1 (en) * 2005-01-17 2006-12-19 삼성에스디아이 주식회사 Vapor deposition source and evaporating apparatus and method for deposition using the same
KR101153161B1 (en) * 2005-04-01 2012-06-18 주성엔지니어링(주) Gas injector and Apparatus including the same for fabricating Liquid Crystal Display Device
EP1752555A1 (en) * 2005-07-28 2007-02-14 Applied Materials GmbH & Co. KG Vaporizing device
JP5213341B2 (en) * 2007-03-20 2013-06-19 東京エレクトロン株式会社 Vaporizer, vaporization module, film deposition system
JP2008274322A (en) * 2007-04-26 2008-11-13 Sony Corp Vapor deposition apparatus
JP5043776B2 (en) * 2008-08-08 2012-10-10 株式会社日立国際電気 Substrate processing apparatus and semiconductor device manufacturing method
US8512806B2 (en) * 2008-08-12 2013-08-20 Momentive Performance Materials Inc. Large volume evaporation source
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
JP4831841B2 (en) * 2009-07-10 2011-12-07 三菱重工業株式会社 Vacuum deposition apparatus and method
KR100977374B1 (en) * 2009-08-03 2010-08-20 텔리오솔라 테크놀로지스 인크 Fast devaporation system for large-sized thin film-type cigs solar cell manufacturing and method thereof
JP5642952B2 (en) * 2009-09-07 2014-12-17 花王株式会社 Packaging box
DE102010046389A1 (en) * 2009-09-25 2011-05-19 Creaphys Gmbh Linear evaporator for the deposition of vapor deposition material made of substrates, comprise a heatable primary evaporator and/or a long stretched, heatable steam distributor connected to the primary evaporator
WO2011082179A1 (en) * 2009-12-28 2011-07-07 Global Solar Energy, Inc. Apparatus and methods of mixing and depositing thin film photovoltaic compositions
FR2956412B1 (en) * 2010-02-16 2012-04-06 Astron Fiamm Safety CONSTANT VOLUME SHUT-OFF VALVE OF A VAPOR PHASE DEPOSITION SOURCE
US9748526B2 (en) * 2011-03-15 2017-08-29 Sharp Kabushiki Kaisha Vapor deposition device, vapor deposition method, and method for producing organic el display device

Also Published As

Publication number Publication date
JP6170927B2 (en) 2017-07-26
CN103906856A (en) 2014-07-02
US20140245955A1 (en) 2014-09-04
WO2013057443A1 (en) 2013-04-25
KR20140092816A (en) 2014-07-24
FR2981667B1 (en) 2014-07-04
FR2981667A1 (en) 2013-04-26
EP2769001A1 (en) 2014-08-27
JP2015501379A (en) 2015-01-15
KR102108173B1 (en) 2020-05-08
CN103906856B (en) 2016-11-09
SG11201401635PA (en) 2014-09-26
EP2769001B1 (en) 2017-12-20

Similar Documents

Publication Publication Date Title
IN2014DN03425A (en)
EP2688121A3 (en) Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus by using the same, and organic light-emitting display apparatus manufactured by the method
MX2021000174A (en) Hybridosomes, compositions comprising the same, processes for their production and uses thereof.
MX2013007667A (en) Processes and systems for enzymatically isolating lignin and other bioproducts from herbaceous plants.
MX2016011893A (en) Ink jet delivery system comprising an improved fluid mixture.
WO2013182879A3 (en) Gas injection components for deposition systems and related methods
MX358384B (en) An aerosol generating device with air flow nozzles.
WO2012163459A3 (en) Energy storage module comprising a plurality of in particular prismatic storage cells and method for producing an energy storage module
WO2013022669A3 (en) Systems and methods for processing vapor
MX2012003271A (en) Bottle decontamination system.
TW201130129A (en) Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
WO2013075081A3 (en) System and method for providing a micron-scale continuous liquid jet
WO2008003942A3 (en) Powder delivery apparatus
AR076906A1 (en) SPRAY SYSTEM, ENGINE POWER INCREASE SYSTEM CONTAINING THE SPRAY SYSTEM AND METHOD FOR AIR HUMIDIFYING
MY185561A (en) Vapor transport deposition method and system for material co-deposition
TW201613742A (en) Method for attaching optical film to optical display unit
WO2012036908A3 (en) Spray deposition module for an in-line processing system
DK2524974T3 (en) Injector for a vacuum evaporation system
EP3199796A4 (en) Nozzle plate for fuel injection devices
EP3273049A4 (en) Nozzle plate for fuel injection device
ZA201305203B (en) Increased tolerance of dht-enabled plants to auxinic herbicides resulting from moiety differences in auxinic herbicide molecular structures
AR089044A1 (en) REACTIVE SPRAYING PROCESS
WO2013130954A3 (en) System and methods for delivery of materials
WO2017044770A8 (en) High speed intermittent barrier nozzle
WO2015107154A3 (en) Module for feeding drying gas and for leading away gas laden with vapor and device for drying a substrate