IN2014DN03425A - - Google Patents

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Publication number
IN2014DN03425A
IN2014DN03425A IN3425DEN2014A IN2014DN03425A IN 2014DN03425 A IN2014DN03425 A IN 2014DN03425A IN 3425DEN2014 A IN3425DEN2014 A IN 3425DEN2014A IN 2014DN03425 A IN2014DN03425 A IN 2014DN03425A
Authority
IN
India
Prior art keywords
injection
ramp
reservoir
longitudinal direction
way
Prior art date
Application number
Inventor
Jean Louis Guyaux
Jérôme Villette
Nicolas Briant
David Esteve
Original Assignee
Riber
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Riber filed Critical Riber
Publication of IN2014DN03425A publication Critical patent/IN2014DN03425A/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The present invention concerns an injection system for an apparatus for depositing thin layers by vacuum evaporation said injection system comprising a reservoir intended to receive a source of material to be evaporated means of heating the reservoir capable of evaporating said material at least one injection ramp comprising an inner conduit connected to the reservoir in such a way as to receive said evaporated material coming from the reservoir and a plurality of nozzles each nozzle comprising at least a communication channel between said inner conduit and the external portion of the ramp in such a way as to discharge the evaporated material into said vacuum evaporation chamber. According to the invention the injection ramp comprises a plurality of injection modules mechanically connected to each other in series along a longitudinal direction each injection module comprising a plurality of injection nozzles and said injection ramp comprises means of adjusting the orientation of said injection modules about said longitudinal direction in such a way as to align said injection nozzles along a line parallel to the longitudinal direction of the injection ramp.
IN3425DEN2014 2011-10-21 2012-10-18 IN2014DN03425A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1159560A FR2981667B1 (en) 2011-10-21 2011-10-21 INJECTION SYSTEM FOR DEVICE FOR DEPOSITING THIN LAYERS BY VACUUM EVAPORATION
PCT/FR2012/052388 WO2013057443A1 (en) 2011-10-21 2012-10-18 Injection system for an apparatus for depositing thin layers by vacuum evaporation

Publications (1)

Publication Number Publication Date
IN2014DN03425A true IN2014DN03425A (en) 2015-06-05

Family

ID=47221468

Family Applications (1)

Application Number Title Priority Date Filing Date
IN3425DEN2014 IN2014DN03425A (en) 2011-10-21 2012-10-18

Country Status (9)

Country Link
US (1) US20140245955A1 (en)
EP (1) EP2769001B1 (en)
JP (1) JP6170927B2 (en)
KR (1) KR102108173B1 (en)
CN (1) CN103906856B (en)
FR (1) FR2981667B1 (en)
IN (1) IN2014DN03425A (en)
SG (1) SG11201401635PA (en)
WO (1) WO2013057443A1 (en)

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JP6656261B2 (en) * 2014-11-07 2020-03-04 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Apparatus for depositing vaporized material, distribution pipe, vacuum deposition chamber, and method for depositing vaporized material
KR101959417B1 (en) * 2014-11-07 2019-03-18 어플라이드 머티어리얼스, 인코포레이티드 Material source arrangement and material distribution arrangement for vacuum deposition
KR102018865B1 (en) * 2014-11-07 2019-09-05 어플라이드 머티어리얼스, 인코포레이티드 Material source arrangement and nozzle for vacuum deposition
JP6488400B2 (en) * 2015-07-13 2019-03-20 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Evaporation source
CN105088145B (en) * 2015-08-19 2017-03-29 京东方科技集团股份有限公司 For the crucible and its manufacture method of OLED evaporation sources
CN205443432U (en) * 2016-04-07 2016-08-10 鄂尔多斯市源盛光电有限责任公司 Linear evaporation source, evaporation source system and coating by vaporization device
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CN106868456B (en) * 2017-03-21 2019-03-12 京东方科技集团股份有限公司 Evaporation source and evaporated device
JP6543664B2 (en) * 2017-09-11 2019-07-10 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Vacuum deposition chamber
CN109943806A (en) * 2017-12-20 2019-06-28 合肥欣奕华智能机器有限公司 A kind of linear evaporation source device and evaporation coating device
CN109817842B (en) * 2019-01-16 2021-10-01 京东方科技集团股份有限公司 Vacuum drying device and preparation method of display substrate

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Also Published As

Publication number Publication date
FR2981667B1 (en) 2014-07-04
KR20140092816A (en) 2014-07-24
CN103906856B (en) 2016-11-09
WO2013057443A1 (en) 2013-04-25
FR2981667A1 (en) 2013-04-26
EP2769001A1 (en) 2014-08-27
EP2769001B1 (en) 2017-12-20
JP2015501379A (en) 2015-01-15
CN103906856A (en) 2014-07-02
KR102108173B1 (en) 2020-05-08
US20140245955A1 (en) 2014-09-04
JP6170927B2 (en) 2017-07-26
SG11201401635PA (en) 2014-09-26

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