PL2468917T3 - Wtryskiwacz do źródła odparowywania próżniowego - Google Patents
Wtryskiwacz do źródła odparowywania próżniowegoInfo
- Publication number
- PL2468917T3 PL2468917T3 PL10306524T PL10306524T PL2468917T3 PL 2468917 T3 PL2468917 T3 PL 2468917T3 PL 10306524 T PL10306524 T PL 10306524T PL 10306524 T PL10306524 T PL 10306524T PL 2468917 T3 PL2468917 T3 PL 2468917T3
- Authority
- PL
- Poland
- Prior art keywords
- injector
- evaporation source
- vacuum evaporation
- vacuum
- source
- Prior art date
Links
- 238000007738 vacuum evaporation Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10306524.9A EP2468917B1 (en) | 2010-12-27 | 2010-12-27 | Injector for a vacuum evaporation source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL2468917T3 true PL2468917T3 (pl) | 2013-11-29 |
Family
ID=43875295
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL10306524T PL2468917T3 (pl) | 2010-12-27 | 2010-12-27 | Wtryskiwacz do źródła odparowywania próżniowego |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8858714B2 (pl) |
| EP (1) | EP2468917B1 (pl) |
| JP (1) | JP5781429B2 (pl) |
| KR (1) | KR101755534B1 (pl) |
| CN (1) | CN102534507B (pl) |
| DK (1) | DK2468917T3 (pl) |
| ES (1) | ES2429343T3 (pl) |
| PL (1) | PL2468917T3 (pl) |
| SG (1) | SG182124A1 (pl) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102018865B1 (ko) * | 2014-11-07 | 2019-09-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 진공 증착을 위한 재료 소스 배열체 및 노즐 |
| TWI737718B (zh) | 2016-04-25 | 2021-09-01 | 美商創新先進材料股份有限公司 | 含有瀉流源的沉積系統及相關方法 |
| EP4127260A1 (en) * | 2020-03-26 | 2023-02-08 | Applied Materials, Inc. | Evaporation source, deposition apparatus having an evaporation source, and methods therefor |
| CN112342529B (zh) * | 2020-09-24 | 2022-12-06 | 杭州盾源聚芯半导体科技有限公司 | 一种具有连接头的喷射管 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1471916A (en) * | 1974-03-14 | 1977-04-27 | Plessey Co Ltd | Fuel injection arrangements having vibrating fuel injection nozzles |
| JPH0745530A (ja) * | 1993-07-27 | 1995-02-14 | Shin Etsu Handotai Co Ltd | 縦型気相成長装置 |
| US5421522A (en) * | 1993-09-24 | 1995-06-06 | Bex Engineering Ltd. | Nozzle assembly |
| JP4063565B2 (ja) * | 2002-03-26 | 2008-03-19 | トヨタ自動車株式会社 | 薄膜の成膜方法 |
| KR100490537B1 (ko) * | 2002-07-23 | 2005-05-17 | 삼성에스디아이 주식회사 | 가열용기와 이를 이용한 증착장치 |
| DE10256038A1 (de) * | 2002-11-30 | 2004-06-17 | Applied Films Gmbh & Co. Kg | Bedampfungsvorrichtung |
| JP4557170B2 (ja) | 2004-11-26 | 2010-10-06 | 三星モバイルディスプレイ株式會社 | 蒸発源 |
| WO2008004792A1 (en) * | 2006-07-03 | 2008-01-10 | Yas Co., Ltd. | Multiple nozzle evaporator for vacuum thermal evaporation |
| EP2109899A4 (en) | 2006-12-19 | 2012-12-12 | Veeco Instr Inc | SOURCES OF VAPOR DEPOSITION AND METHODS |
| EP1967604A1 (en) * | 2007-03-08 | 2008-09-10 | Applied Materials, Inc. | Evaporation crucible and evaporation apparatus with directional evaporation |
| US7827646B2 (en) * | 2008-02-08 | 2010-11-09 | Tdw Delaware, Inc. | Vortex inhibitor dispersal pig |
| US8328561B2 (en) | 2008-08-11 | 2012-12-11 | Veeco Instruments Inc. | Electrical contacts for use with vacuum deposition sources |
| KR101015336B1 (ko) * | 2008-08-22 | 2011-02-16 | 삼성모바일디스플레이주식회사 | 내부 플레이트 및 이를 구비한 증착용 도가니 장치 |
| US20100159132A1 (en) * | 2008-12-18 | 2010-06-24 | Veeco Instruments, Inc. | Linear Deposition Source |
| US9062369B2 (en) * | 2009-03-25 | 2015-06-23 | Veeco Instruments, Inc. | Deposition of high vapor pressure materials |
| KR100977374B1 (ko) * | 2009-08-03 | 2010-08-20 | 텔리오솔라 테크놀로지스 인크 | 대면적 박막형 ｃｉｇｓ 태양전지 고속증착 및 양산장비, 그 공정방법 |
-
2010
- 2010-12-27 ES ES10306524T patent/ES2429343T3/es active Active
- 2010-12-27 EP EP10306524.9A patent/EP2468917B1/en active Active
- 2010-12-27 PL PL10306524T patent/PL2468917T3/pl unknown
- 2010-12-27 DK DK10306524.9T patent/DK2468917T3/da active
-
2011
- 2011-01-06 US US12/985,524 patent/US8858714B2/en active Active
- 2011-01-17 KR KR1020110004651A patent/KR101755534B1/ko active Active
- 2011-12-22 SG SG2011095981A patent/SG182124A1/en unknown
- 2011-12-22 JP JP2011281040A patent/JP5781429B2/ja active Active
- 2011-12-27 CN CN201110444997.6A patent/CN102534507B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| ES2429343T3 (es) | 2013-11-14 |
| US8858714B2 (en) | 2014-10-14 |
| US20120160171A1 (en) | 2012-06-28 |
| CN102534507A (zh) | 2012-07-04 |
| SG182124A1 (en) | 2012-07-30 |
| EP2468917A1 (en) | 2012-06-27 |
| KR20120074172A (ko) | 2012-07-05 |
| JP5781429B2 (ja) | 2015-09-24 |
| CN102534507B (zh) | 2016-10-26 |
| DK2468917T3 (da) | 2013-10-14 |
| KR101755534B1 (ko) | 2017-07-07 |
| JP2012136777A (ja) | 2012-07-19 |
| EP2468917B1 (en) | 2013-07-10 |
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