SE9904080D0 - Fotoinitiatorberedning - Google Patents

Fotoinitiatorberedning

Info

Publication number
SE9904080D0
SE9904080D0 SE9904080A SE9904080A SE9904080D0 SE 9904080 D0 SE9904080 D0 SE 9904080D0 SE 9904080 A SE9904080 A SE 9904080A SE 9904080 A SE9904080 A SE 9904080A SE 9904080 D0 SE9904080 D0 SE 9904080D0
Authority
SE
Sweden
Prior art keywords
c4alkyl
c20alkyl
biphenylyl
cyclopentyl
naphthyl
Prior art date
Application number
SE9904080A
Other languages
English (en)
Swedish (sv)
Inventor
Andre Litzler
Manfred Koehler
Nils Hoeck
Guido Tolotti
Jean-Pierre Wolf
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of SE9904080D0 publication Critical patent/SE9904080D0/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/30Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
    • C07F9/32Esters thereof
    • C07F9/3258Esters thereof the ester moiety containing a substituent or a structure which is considered as characteristic
    • C07F9/3264Esters with hydroxyalkyl compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/1006Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106Esters of polycondensation macromers
    • C08F222/1065Esters of polycondensation macromers of alcohol terminated (poly)urethanes, e.g. urethane(meth)acrylates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Reinforced Plastic Materials (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Dental Preparations (AREA)
SE9904080A 1998-12-03 1999-11-11 Fotoinitiatorberedning SE9904080D0 (sv)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH239998 1998-12-03
CH45399 1999-03-11

Publications (1)

Publication Number Publication Date
SE9904080D0 true SE9904080D0 (sv) 1999-11-11

Family

ID=25684626

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9904080A SE9904080D0 (sv) 1998-12-03 1999-11-11 Fotoinitiatorberedning

Country Status (4)

Country Link
US (2) US6251963B1 (enExample)
JP (1) JP4869463B2 (enExample)
GB (1) GB9927430D0 (enExample)
SE (1) SE9904080D0 (enExample)

Families Citing this family (158)

* Cited by examiner, † Cited by third party
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DK1106627T3 (da) * 1999-12-08 2004-02-23 Ciba Sc Holding Ag Hidtil ukendte fotoinitiatorsystem af phosphinoxider og hærdbare sammensætninger med lav farve
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
JP4597323B2 (ja) * 2000-07-07 2010-12-15 リンテック株式会社 紫外線硬化型粘着剤組成物および紫外線硬化性粘着シート
US20030164580A1 (en) * 2000-09-14 2003-09-04 Karsten Rinker Acylphosphine oxide photoinitiators in methacrylate casting resins
US20030185990A1 (en) * 2000-09-25 2003-10-02 Klaus Bittner Method for pretreating and coating metal surfaces prior to forming, with a paint-like coating and use of substrates so coated
KR100673265B1 (ko) * 2000-10-04 2007-01-22 엘지.필립스 엘시디 주식회사 액정표시장치
US20020132871A1 (en) * 2000-11-13 2002-09-19 Martin Colton Transparent UV curable coating system
US6737216B2 (en) * 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
US6951623B2 (en) * 2001-11-02 2005-10-04 The Boeing Company Radiation curable maskant and line sealer for protecting metal substrates
DE10206096A1 (de) * 2002-02-13 2003-08-14 Basf Ag Mono- und Bisacylphosphinderivate
DE10206097A1 (de) * 2002-02-13 2003-08-14 Basf Ag Alkoxylierte Acyl- und Bisacylphosphinderivate
US7264880B2 (en) * 2002-04-30 2007-09-04 Avery Dennison Corporation Fluorescent articles having multiple film layers
US7618709B2 (en) * 2002-04-30 2009-11-17 Avery Dennison Corporation Fluorescent articles having multiple film layers
JP4485117B2 (ja) * 2002-06-27 2010-06-16 日東電工株式会社 保護剥離用フィルム
US7134875B2 (en) * 2002-06-28 2006-11-14 3M Innovative Properties Company Processes for forming dental materials and device
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US6822063B2 (en) * 2002-08-27 2004-11-23 Ecolab Inc. Highly durable waterborne radiation cured coating
DE60326744D1 (de) * 2002-10-08 2009-04-30 Kuraray Medical Inc Zahnbeschichtungsset
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CA2509222A1 (en) * 2002-12-10 2004-06-24 Wyeth Substituted indole oxo-acetyl amino acetic acid derivatives as inhibitors of plasminogen activator inhibitor-1 (pai-1)
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KR101015033B1 (ko) * 2002-12-20 2011-02-16 시바 홀딩 인크 관능성 층의 형성방법
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US20040122126A1 (en) * 2002-12-20 2004-06-24 Dong Wu Free-radical initiator systems containing enzymes, compositions, and methods
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JP5008978B2 (ja) * 2003-05-23 2012-08-22 チバ ホールディング インコーポレーテッド 強力接着性表面被覆
CN1829818A (zh) * 2003-08-04 2006-09-06 西巴特殊化学品控股有限公司 强力粘附涂层的生产方法
CN1829819A (zh) * 2003-08-04 2006-09-06 西巴特殊化学品控股有限公司 强粘性涂料的生产方法
DE10335596A1 (de) * 2003-08-04 2005-02-24 Basf Coatings Ag Verfahren zur Charakterisierung von Oberflächenstrukturen und seine Verwendung bei der Modifizierung, Neuentwicklung und Herstellung von Werkstoffen
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US8962709B2 (en) * 2003-10-22 2015-02-24 The Regents Of The University Of Colorado, A Body Corporate Resin systems for dental restorative materials and methods using same
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JP4533205B2 (ja) * 2004-03-26 2010-09-01 キヤノン株式会社 活性エネルギー線硬化型水性インク、それを用いたインクジェット記録方法、インクカートリッジ、記録ユニット及びインクジェット記録装置
CN100564461C (zh) 2004-03-26 2009-12-02 佳能株式会社 活性能量射线固化型水性油墨组合物、使用该组合物的喷墨记录方法、墨盒、记录单元和喷墨记录装置
JP4500717B2 (ja) * 2004-03-26 2010-07-14 キヤノン株式会社 活性エネルギー線硬化型水性インク組成物、それを用いたインクジェット記録方法、インクカートリッジ、記録ユニット及びインクジェット記録装置
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US20090012209A1 (en) * 2005-08-05 2009-01-08 Gunther Eckhardt Dental compositions containing a surface-modified filler
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