SE503956C2 - Komposition för stereolitografi bestående av vinyleterepoxidpolymerer och sätt att framställa ett tredimensionellt föremål med denna komposition - Google Patents

Komposition för stereolitografi bestående av vinyleterepoxidpolymerer och sätt att framställa ett tredimensionellt föremål med denna komposition

Info

Publication number
SE503956C2
SE503956C2 SE9303557A SE9303557A SE503956C2 SE 503956 C2 SE503956 C2 SE 503956C2 SE 9303557 A SE9303557 A SE 9303557A SE 9303557 A SE9303557 A SE 9303557A SE 503956 C2 SE503956 C2 SE 503956C2
Authority
SE
Sweden
Prior art keywords
vinyl ether
composition
derived
polymer precursor
compounds
Prior art date
Application number
SE9303557A
Other languages
English (en)
Swedish (sv)
Other versions
SE9303557L (sv
SE9303557D0 (sv
Inventor
Stephen Craig Lapin
James Ronald Snyder
Eugene Valentine Sitzmann
Darryl Keith Barnes
George David Green
Original Assignee
Allied Signal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Signal Inc filed Critical Allied Signal Inc
Publication of SE9303557D0 publication Critical patent/SE9303557D0/xx
Publication of SE9303557L publication Critical patent/SE9303557L/
Publication of SE503956C2 publication Critical patent/SE503956C2/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
SE9303557A 1991-05-01 1993-10-29 Komposition för stereolitografi bestående av vinyleterepoxidpolymerer och sätt att framställa ett tredimensionellt föremål med denna komposition SE503956C2 (sv)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US69389091A 1991-05-01 1991-05-01
US85539292A 1992-03-26 1992-03-26
PCT/US1992/003168 WO1992020014A1 (en) 1991-05-01 1992-04-15 Stereolithography using vinyl ether-epoxide polymers

Publications (3)

Publication Number Publication Date
SE9303557D0 SE9303557D0 (sv) 1993-10-29
SE9303557L SE9303557L (sv) 1993-11-22
SE503956C2 true SE503956C2 (sv) 1996-10-07

Family

ID=27105258

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9303557A SE503956C2 (sv) 1991-05-01 1993-10-29 Komposition för stereolitografi bestående av vinyleterepoxidpolymerer och sätt att framställa ett tredimensionellt föremål med denna komposition

Country Status (11)

Country Link
US (1) US5437964A (nl)
JP (1) JP2667934B2 (nl)
BE (1) BE1005001A4 (nl)
CA (1) CA2102107C (nl)
DE (1) DE4291255T1 (nl)
FR (1) FR2676061B1 (nl)
GB (1) GB2273297B (nl)
IT (1) IT1263117B (nl)
NL (1) NL193122C (nl)
SE (1) SE503956C2 (nl)
WO (1) WO1992020014A1 (nl)

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992015620A1 (en) * 1991-02-27 1992-09-17 Allied-Signal Inc. Stereolithography using vinyl ether based polymers
EP0646580B1 (de) * 1993-09-16 2000-05-31 Ciba SC Holding AG Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
US5494618A (en) * 1994-06-27 1996-02-27 Alliedsignal Inc. Increasing the useful range of cationic photoinitiators in stereolithography
US5639413A (en) * 1995-03-30 1997-06-17 Crivello; James Vincent Methods and compositions related to stereolithography
EP0831127B1 (en) * 1995-05-12 2003-09-03 Asahi Denka Kogyo Kabushiki Kaisha Stereolithographic resin composition and stereolithographic method
US5707780A (en) 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
US5648194A (en) * 1995-08-03 1997-07-15 Shipley Company, L.L.C. Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether
US5932309A (en) 1995-09-28 1999-08-03 Alliedsignal Inc. Colored articles and compositions and methods for their fabrication
US5783136A (en) * 1996-09-09 1998-07-21 Ford Global Technologies, Inc. Method of preparing a stereolithographically produced prototype for experimental stress analysis
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
FR2757530A1 (fr) * 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
US5889084A (en) * 1997-01-30 1999-03-30 Ncr Corporation UV or visible light initiated cationic cured ink for ink jet printing
GB9702658D0 (en) * 1997-02-10 1997-04-02 Imperial College Fabrication method and apparatus
US6054250A (en) * 1997-02-18 2000-04-25 Alliedsignal Inc. High temperature performance polymers for stereolithography
JP2001527590A (ja) * 1997-02-18 2001-12-25 アライド シグナル インコーポレイテッド ステレオリソグラフィのための耐熱性ポリマー
US5858605A (en) * 1997-03-08 1999-01-12 Shipley Company, L.L.C. Acid labile photoactive composition
US6025017A (en) * 1997-05-21 2000-02-15 Ncr Corporation Photopolymerizable coating formulation for thermal transfer media
US5977018A (en) * 1997-06-30 1999-11-02 Ncr Corporation Reactive paper and ink for indelible print
US5992314A (en) * 1997-06-30 1999-11-30 Ncr Corporation UV curable adhesive for stencil media
EP0889360B1 (de) * 1997-06-30 2002-01-30 Siemens Aktiengesellschaft Reaktionsharzmischungen und deren Verwendung
US6028212A (en) * 1997-12-16 2000-02-22 Morton International, Inc. Solid vinyl ether terminated urethane curing agent
US6040040A (en) * 1998-01-28 2000-03-21 Ncr Corporation Multi-layer thermal transfer media from selectively curable formulations
US6262825B1 (en) 1999-08-24 2001-07-17 Napp Systems, Inc. Apparatus and method for the enhanced imagewise exposure of a photosensitive material
WO2001034371A2 (en) 1999-11-05 2001-05-17 Z Corporation Material systems and methods of three-dimensional printing
US6376148B1 (en) 2001-01-17 2002-04-23 Nanotek Instruments, Inc. Layer manufacturing using electrostatic imaging and lamination
US6893489B2 (en) 2001-12-20 2005-05-17 Honeywell International Inc. Physical colored inks and coatings
US7005232B2 (en) 2003-06-16 2006-02-28 Napp Systems, Inc. Highly reflective substrates for the digital processing of photopolymer printing plates
US7569260B2 (en) 2003-08-21 2009-08-04 Asahi Kasei Chemicals Corporation Photosensitive composition and cured products thereof
ATE527099T1 (de) * 2004-03-22 2011-10-15 Huntsman Adv Mat Switzerland Photohärtbare zusammensetzungen
JP2008501826A (ja) * 2004-06-04 2008-01-24 デジグナー モレキュールズ インコーポレイテッド フリーラジカル硬化可能なポリエステル類およびその使用方法
US7875688B2 (en) * 2004-06-04 2011-01-25 Designer Molecules, Inc. Free-radical curable polyesters and methods for use thereof
CN101568422B (zh) 2006-12-08 2013-02-13 3D系统公司 使用过氧化物固化的三维印刷材料体系和方法
US8167999B2 (en) 2007-01-10 2012-05-01 3D Systems, Inc. Three-dimensional printing material system with improved color, article performance, and ease of use
WO2008103450A2 (en) 2007-02-22 2008-08-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
WO2008111283A1 (ja) * 2007-03-09 2008-09-18 Daicel Chemical Industries, Ltd. 光硬化性樹脂組成物
US7868113B2 (en) 2007-04-11 2011-01-11 Designer Molecules, Inc. Low shrinkage polyester thermosetting resins
US8158748B2 (en) 2008-08-13 2012-04-17 Designer Molecules, Inc. Hetero-functional compounds and methods for use thereof
BE1019331A5 (nl) 2010-05-10 2012-06-05 Flooring Ind Ltd Sarl Vloerpaneel en werkwijzen voor het vervaardigen van vloerpanelen.
US8816021B2 (en) 2010-09-10 2014-08-26 Designer Molecules, Inc. Curable composition with rubber-like properties
ITVI20110333A1 (it) * 2011-12-23 2013-06-24 Ettore Maurizio Costabeber Macchina stereolitografica con gruppo ottico perfezionato
CN105164210B (zh) * 2013-06-19 2019-09-27 惠普发展公司，有限责任合伙企业 用于三维(3d)打印的组合物
CN112074395A (zh) * 2018-03-02 2020-12-11 福姆实验室公司 潜伏性固化树脂及相关方法
US11612978B2 (en) 2020-06-09 2023-03-28 Applied Materials, Inc. Additive manufacturing of polishing pads
US11638979B2 (en) * 2020-06-09 2023-05-02 Applied Materials, Inc. Additive manufacturing of polishing pads

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE631536A (nl) * 1962-04-25
DE2628408A1 (de) * 1976-06-24 1978-01-12 Basf Ag Vinylaether des 3-methylpentandiol- 1,5
US4645781A (en) * 1983-03-29 1987-02-24 Union Carbide Corporation Blends of cyclic vinyl ether containing compounds and expoxides
CA1246785A (en) * 1983-03-29 1988-12-13 Union Carbide Corporation Blends of cyclic vinyl ether containing compounds and a poly(active hydrogen) organic compound
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
JPH01126638A (ja) * 1987-11-11 1989-05-18 Nippon Soda Co Ltd 画像形成用樹脂組成物
JPH0826121B2 (ja) * 1988-02-19 1996-03-13 旭電化工業株式会社 光学的造形用樹脂組成物
WO1989007620A1 (en) * 1988-02-19 1989-08-24 Asahi Denka Kogyo K.K. Resin composition for optical modeling
US4885319A (en) * 1988-02-29 1989-12-05 Gaf Corporation Solvent resistant irradiation curable coatings
US4942001A (en) * 1988-03-02 1990-07-17 Inc. DeSoto Method of forming a three-dimensional object by stereolithography and composition therefore
WO1989008021A1 (en) * 1988-03-02 1989-09-08 Desoto, Inc. Stereolithography using composition providing reduced distortion
US4844144A (en) * 1988-08-08 1989-07-04 Desoto, Inc. Investment casting utilizing patterns produced by stereolithography
WO1990001512A1 (en) * 1988-08-12 1990-02-22 Desoto, Inc. Photo-curable vinyl ether compositions
US4956198A (en) * 1988-09-13 1990-09-11 Desoto, Inc. Ultraviolet-curable cationic vinyl ether polyurethane coating compositions
WO1990003989A1 (en) * 1988-10-03 1990-04-19 Desoto, Inc. Cationically curable polyurethane compositions having vinyl ether functionality
US5106885A (en) * 1989-11-03 1992-04-21 Isp Investments Inc. Radiation curable compositions containing multifunctional vinyl ether monomers and protective coatings formed therefrom
CA2028259A1 (en) * 1989-11-20 1991-05-21 Stefan Weigl Tacky photopolymerizable adhesive compositions
US5045572A (en) * 1990-01-26 1991-09-03 Gaf Chemicals Corporation Radiation curable cross linkable compositions containing an aliphatic polyfunctional alkenyl ether
US5036112A (en) * 1990-01-26 1991-07-30 Gaf Chemicals Corporation Cross-linkable vinyl ether polyacetal oligomers
US5055357A (en) * 1990-01-26 1991-10-08 Isp Investments Inc. Radiation curable cross linkable compositions
US5039716A (en) * 1990-01-26 1991-08-13 Gaf Chemicals Corporation Alk-1-enyl ether silicates and radiation curable composition containing alk-1-enyl ether silicates
US5139872A (en) * 1990-08-29 1992-08-18 Allied-Signal Inc. Vinyl ether based optical fiber coatings

Also Published As

Publication number Publication date
FR2676061A1 (fr) 1992-11-06
DE4291255T1 (de) 1994-05-05
JPH06507738A (ja) 1994-09-01
GB9321979D0 (en) 1994-02-16
ITTO920368A0 (it) 1992-04-29
BE1005001A4 (fr) 1993-03-16
US5437964A (en) 1995-08-01
SE9303557L (sv) 1993-11-22
CA2102107A1 (en) 1992-11-02
IT1263117B (it) 1996-07-30
NL193122C (nl) 1998-11-03
FR2676061B1 (fr) 2000-03-31
SE9303557D0 (sv) 1993-10-29
GB2273297A (en) 1994-06-15
WO1992020014A1 (en) 1992-11-12
GB2273297B (en) 1995-11-22
ITTO920368A1 (it) 1993-10-29
JP2667934B2 (ja) 1997-10-27
NL193122B (nl) 1998-07-01
CA2102107C (en) 2002-07-16
NL9220016A (nl) 1994-02-01

Similar Documents

Publication Publication Date Title
SE503956C2 (sv) Komposition för stereolitografi bestående av vinyleterepoxidpolymerer och sätt att framställa ett tredimensionellt föremål med denna komposition
JP3475275B2 (ja) ステレオリソグラフィーにおけるカチオン系開始剤の有用範囲の拡大
US5494618A (en) Increasing the useful range of cationic photoinitiators in stereolithography
US5506087A (en) Stereolithography using vinyl ether based polymers
US20080103226A1 (en) Photo-curable resin composition
JP4516019B2 (ja) 三次元構造体およびその製造方法
US5510226A (en) Stereolithography using vinyl ether-epoxide polymers
US8293448B2 (en) Resin composition for stereolithography
GB2110702A (en) Radiation sensitive oligomer compositions
BRPI0903949A2 (pt) formulações de poliuretano à base de poliéter para preparação de meios holográficos
KR20050007372A (ko) 방사선 경화성 수지 조성물 및 이를 이용한 쾌속 성형법
JPH0138803B2 (nl)
JPH0618850B2 (ja) 環状エ−テルと脂環式エポキシドとの光硬化性ブレンド
RU2074865C1 (ru) Олигомер винилэфируретана и полимерпродукт его отверждения
US6054250A (en) High temperature performance polymers for stereolithography
WO1998036323A9 (en) High temperature performance polymers for stereolithography
EP0960354A1 (en) High temperature performance polymers for stereolithography
JP2009249605A (ja) 光重合性組成物
JPS60217226A (ja) 環状ビニルエーテル含有化合物とウレタンアクリレートとの混合物
JP3974336B2 (ja) 光学的立体造形用の活性エネルギー線硬化性樹脂組成物
JP2002060463A (ja) 光硬化性樹脂組成物および立体形状物
JP4795630B2 (ja) 靱性に優れた光学的立体造形用樹脂組成物
US5902837A (en) Photo-curing resin composition comprising a propenyl ether group-containing compound
CN108778688B (zh) 具有改善韧性耐高温性的加成法制造用可辐射固化组合物
JP2881134B2 (ja) 光硬化性樹脂組成物

Legal Events

Date Code Title Description
NUG Patent has lapsed