SE9303557D0 - Stereolitografi med användning av eter-epoxidpolymerer - Google Patents

Stereolitografi med användning av eter-epoxidpolymerer

Info

Publication number
SE9303557D0
SE9303557D0 SE9303557A SE9303557A SE9303557D0 SE 9303557 D0 SE9303557 D0 SE 9303557D0 SE 9303557 A SE9303557 A SE 9303557A SE 9303557 A SE9303557 A SE 9303557A SE 9303557 D0 SE9303557 D0 SE 9303557D0
Authority
SE
Sweden
Prior art keywords
stereolithography
ether epoxide
epoxide polymers
functionalized compounds
polymers
Prior art date
Application number
SE9303557A
Other languages
English (en)
Other versions
SE503956C2 (sv
SE9303557L (sv
Inventor
Stephen Craig Lapin
James Ronald Snyder
Eugene Valentine Sitzmann
Darryl Keith Barnes
George David Green
Original Assignee
Allied Signal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Signal Inc filed Critical Allied Signal Inc
Publication of SE9303557D0 publication Critical patent/SE9303557D0/sv
Publication of SE9303557L publication Critical patent/SE9303557L/sv
Publication of SE503956C2 publication Critical patent/SE503956C2/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
SE9303557A 1991-05-01 1993-10-29 Komposition för stereolitografi bestående av vinyleterepoxidpolymerer och sätt att framställa ett tredimensionellt föremål med denna komposition SE503956C2 (sv)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US69389091A 1991-05-01 1991-05-01
US85539292A 1992-03-26 1992-03-26
PCT/US1992/003168 WO1992020014A1 (en) 1991-05-01 1992-04-15 Stereolithography using vinyl ether-epoxide polymers

Publications (3)

Publication Number Publication Date
SE9303557D0 true SE9303557D0 (sv) 1993-10-29
SE9303557L SE9303557L (sv) 1993-11-22
SE503956C2 SE503956C2 (sv) 1996-10-07

Family

ID=27105258

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9303557A SE503956C2 (sv) 1991-05-01 1993-10-29 Komposition för stereolitografi bestående av vinyleterepoxidpolymerer och sätt att framställa ett tredimensionellt föremål med denna komposition

Country Status (11)

Country Link
US (1) US5437964A (sv)
JP (1) JP2667934B2 (sv)
BE (1) BE1005001A4 (sv)
CA (1) CA2102107C (sv)
DE (1) DE4291255T1 (sv)
FR (1) FR2676061B1 (sv)
GB (1) GB2273297B (sv)
IT (1) IT1263117B (sv)
NL (1) NL193122C (sv)
SE (1) SE503956C2 (sv)
WO (1) WO1992020014A1 (sv)

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EP0646580B1 (de) 1993-09-16 2000-05-31 Ciba SC Holding AG Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
US5494618A (en) * 1994-06-27 1996-02-27 Alliedsignal Inc. Increasing the useful range of cationic photoinitiators in stereolithography
US5639413A (en) * 1995-03-30 1997-06-17 Crivello; James Vincent Methods and compositions related to stereolithography
WO1996035756A1 (fr) * 1995-05-12 1996-11-14 Asahi Denka Kogyo Kabushiki Kaisha Composition a base de resines stereolithographiques et procede de stereolithographie
US5707780A (en) 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
US5648194A (en) * 1995-08-03 1997-07-15 Shipley Company, L.L.C. Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether
US5932309A (en) * 1995-09-28 1999-08-03 Alliedsignal Inc. Colored articles and compositions and methods for their fabrication
US5783136A (en) * 1996-09-09 1998-07-21 Ford Global Technologies, Inc. Method of preparing a stereolithographically produced prototype for experimental stress analysis
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
FR2757530A1 (fr) * 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
US5889084A (en) * 1997-01-30 1999-03-30 Ncr Corporation UV or visible light initiated cationic cured ink for ink jet printing
GB9702658D0 (en) 1997-02-10 1997-04-02 Imperial College Fabrication method and apparatus
US6054250A (en) * 1997-02-18 2000-04-25 Alliedsignal Inc. High temperature performance polymers for stereolithography
JP2001527590A (ja) * 1997-02-18 2001-12-25 アライド シグナル インコーポレイテッド ステレオリソグラフィのための耐熱性ポリマー
US5858605A (en) * 1997-03-08 1999-01-12 Shipley Company, L.L.C. Acid labile photoactive composition
US6025017A (en) * 1997-05-21 2000-02-15 Ncr Corporation Photopolymerizable coating formulation for thermal transfer media
US5992314A (en) * 1997-06-30 1999-11-30 Ncr Corporation UV curable adhesive for stencil media
US5977018A (en) * 1997-06-30 1999-11-02 Ncr Corporation Reactive paper and ink for indelible print
DE59802943D1 (de) * 1997-06-30 2002-03-14 Siemens Ag Reaktionsharzmischungen und deren Verwendung
US6028212A (en) * 1997-12-16 2000-02-22 Morton International, Inc. Solid vinyl ether terminated urethane curing agent
US6040040A (en) * 1998-01-28 2000-03-21 Ncr Corporation Multi-layer thermal transfer media from selectively curable formulations
US6262825B1 (en) 1999-08-24 2001-07-17 Napp Systems, Inc. Apparatus and method for the enhanced imagewise exposure of a photosensitive material
EP1226019B1 (en) 1999-11-05 2004-03-03 Z Corporation Methods of three-dimensional printing
US6376148B1 (en) 2001-01-17 2002-04-23 Nanotek Instruments, Inc. Layer manufacturing using electrostatic imaging and lamination
US6893489B2 (en) 2001-12-20 2005-05-17 Honeywell International Inc. Physical colored inks and coatings
US7005232B2 (en) 2003-06-16 2006-02-28 Napp Systems, Inc. Highly reflective substrates for the digital processing of photopolymer printing plates
WO2005019299A1 (ja) 2003-08-21 2005-03-03 Asahi Kasei Chemicals Corporation 感光性組成物およびその硬化物
CN100581792C (zh) * 2004-03-22 2010-01-20 亨斯迈先进材料（瑞士）有限公司 可光致固化组合物
US7875688B2 (en) * 2004-06-04 2011-01-25 Designer Molecules, Inc. Free-radical curable polyesters and methods for use thereof
US7285613B2 (en) * 2004-06-04 2007-10-23 Designer Molecules, Inc. Free-radical curable polyesters and methods for use thereof
EP2089215B1 (en) 2006-12-08 2015-02-18 3D Systems Incorporated Three dimensional printing material system
US8167999B2 (en) 2007-01-10 2012-05-01 3D Systems, Inc. Three-dimensional printing material system with improved color, article performance, and ease of use
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
WO2008111283A1 (ja) * 2007-03-09 2008-09-18 Daicel Chemical Industries, Ltd. 光硬化性樹脂組成物
US7868113B2 (en) 2007-04-11 2011-01-11 Designer Molecules, Inc. Low shrinkage polyester thermosetting resins
US8158748B2 (en) 2008-08-13 2012-04-17 Designer Molecules, Inc. Hetero-functional compounds and methods for use thereof
BE1019331A5 (nl) 2010-05-10 2012-06-05 Flooring Ind Ltd Sarl Vloerpaneel en werkwijzen voor het vervaardigen van vloerpanelen.
US8816021B2 (en) 2010-09-10 2014-08-26 Designer Molecules, Inc. Curable composition with rubber-like properties
ITVI20110333A1 (it) * 2011-12-23 2013-06-24 Ettore Maurizio Costabeber Macchina stereolitografica con gruppo ottico perfezionato
EP3010978B1 (en) * 2013-06-19 2019-02-06 Hewlett-Packard Development Company, L.P. Compositions for three-dimensional (3d) printing
WO2019169211A1 (en) * 2018-03-02 2019-09-06 Formlabs, Inc. Latent cure resins and related methods
US11638979B2 (en) * 2020-06-09 2023-05-02 Applied Materials, Inc. Additive manufacturing of polishing pads
US11612978B2 (en) 2020-06-09 2023-03-28 Applied Materials, Inc. Additive manufacturing of polishing pads

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Also Published As

Publication number Publication date
GB2273297A (en) 1994-06-15
JP2667934B2 (ja) 1997-10-27
ITTO920368A1 (it) 1993-10-29
NL193122B (nl) 1998-07-01
WO1992020014A1 (en) 1992-11-12
CA2102107C (en) 2002-07-16
GB2273297B (en) 1995-11-22
DE4291255T1 (de) 1994-05-05
JPH06507738A (ja) 1994-09-01
FR2676061B1 (fr) 2000-03-31
GB9321979D0 (en) 1994-02-16
ITTO920368A0 (it) 1992-04-29
FR2676061A1 (fr) 1992-11-06
NL9220016A (nl) 1994-02-01
US5437964A (en) 1995-08-01
SE503956C2 (sv) 1996-10-07
BE1005001A4 (fr) 1993-03-16
NL193122C (nl) 1998-11-03
SE9303557L (sv) 1993-11-22
CA2102107A1 (en) 1992-11-02
IT1263117B (it) 1996-07-30

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