NL193122B - Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren. - Google Patents
Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren.Info
- Publication number
- NL193122B NL193122B NL9220016A NL9220016A NL193122B NL 193122 B NL193122 B NL 193122B NL 9220016 A NL9220016 A NL 9220016A NL 9220016 A NL9220016 A NL 9220016A NL 193122 B NL193122 B NL 193122B
- Authority
- NL
- Netherlands
- Prior art keywords
- stereolithography
- vinyl ether
- ether epoxide
- epoxide polymers
- polymers
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US69389091A | 1991-05-01 | 1991-05-01 | |
US69389091 | 1991-05-01 | ||
US85539292A | 1992-03-26 | 1992-03-26 | |
US85539292 | 1992-03-26 | ||
PCT/US1992/003168 WO1992020014A1 (en) | 1991-05-01 | 1992-04-15 | Stereolithography using vinyl ether-epoxide polymers |
US9203168 | 1992-04-15 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL9220016A NL9220016A (nl) | 1994-02-01 |
NL193122B true NL193122B (nl) | 1998-07-01 |
NL193122C NL193122C (nl) | 1998-11-03 |
Family
ID=27105258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL9220016A NL193122C (nl) | 1991-05-01 | 1992-04-15 | Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren. |
Country Status (11)
Country | Link |
---|---|
US (1) | US5437964A (nl) |
JP (1) | JP2667934B2 (nl) |
BE (1) | BE1005001A4 (nl) |
CA (1) | CA2102107C (nl) |
DE (1) | DE4291255T1 (nl) |
FR (1) | FR2676061B1 (nl) |
GB (1) | GB2273297B (nl) |
IT (1) | IT1263117B (nl) |
NL (1) | NL193122C (nl) |
SE (1) | SE503956C2 (nl) |
WO (1) | WO1992020014A1 (nl) |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992015620A1 (en) * | 1991-02-27 | 1992-09-17 | Allied-Signal Inc. | Stereolithography using vinyl ether based polymers |
ATE193532T1 (de) * | 1993-09-16 | 2000-06-15 | Ciba Sc Holding Ag | Vinyletherverbindungen mit zusätzlichen von vinylethergruppen verschiedenen funktionellen gruppen und deren verwendung zur formulierung härtbarer zusammensetzungen |
US5496682A (en) * | 1993-10-15 | 1996-03-05 | W. R. Grace & Co.-Conn. | Three dimensional sintered inorganic structures using photopolymerization |
US5418112A (en) * | 1993-11-10 | 1995-05-23 | W. R. Grace & Co.-Conn. | Photosensitive compositions useful in three-dimensional part-building and having improved photospeed |
US5494618A (en) * | 1994-06-27 | 1996-02-27 | Alliedsignal Inc. | Increasing the useful range of cationic photoinitiators in stereolithography |
US5705116A (en) * | 1994-06-27 | 1998-01-06 | Sitzmann; Eugene Valentine | Increasing the useful range of cationic photoinitiators in stereolithography |
US5639413A (en) * | 1995-03-30 | 1997-06-17 | Crivello; James Vincent | Methods and compositions related to stereolithography |
EP0831127B1 (en) * | 1995-05-12 | 2003-09-03 | Asahi Denka Kogyo Kabushiki Kaisha | Stereolithographic resin composition and stereolithographic method |
US5707780A (en) | 1995-06-07 | 1998-01-13 | E. I. Du Pont De Nemours And Company | Photohardenable epoxy composition |
US5648194A (en) * | 1995-08-03 | 1997-07-15 | Shipley Company, L.L.C. | Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether |
US5932309A (en) | 1995-09-28 | 1999-08-03 | Alliedsignal Inc. | Colored articles and compositions and methods for their fabrication |
US5783136A (en) * | 1996-09-09 | 1998-07-21 | Ford Global Technologies, Inc. | Method of preparing a stereolithographically produced prototype for experimental stress analysis |
JP3765896B2 (ja) | 1996-12-13 | 2006-04-12 | Jsr株式会社 | 光学的立体造形用光硬化性樹脂組成物 |
FR2757530A1 (fr) * | 1996-12-24 | 1998-06-26 | Rhodia Chimie Sa | Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques |
US5889084A (en) * | 1997-01-30 | 1999-03-30 | Ncr Corporation | UV or visible light initiated cationic cured ink for ink jet printing |
GB9702658D0 (en) | 1997-02-10 | 1997-04-02 | Imperial College | Fabrication method and apparatus |
US6054250A (en) * | 1997-02-18 | 2000-04-25 | Alliedsignal Inc. | High temperature performance polymers for stereolithography |
WO1998036323A1 (en) * | 1997-02-14 | 1998-08-20 | Alliedsignal Inc. | High temperature performance polymers for stereolithography |
US5858605A (en) * | 1997-03-08 | 1999-01-12 | Shipley Company, L.L.C. | Acid labile photoactive composition |
US6025017A (en) * | 1997-05-21 | 2000-02-15 | Ncr Corporation | Photopolymerizable coating formulation for thermal transfer media |
US5992314A (en) * | 1997-06-30 | 1999-11-30 | Ncr Corporation | UV curable adhesive for stencil media |
US5977018A (en) * | 1997-06-30 | 1999-11-02 | Ncr Corporation | Reactive paper and ink for indelible print |
ATE212734T1 (de) * | 1997-06-30 | 2002-02-15 | Siemens Ag | Reaktionsharzmischungen und deren verwendung |
US6028212A (en) * | 1997-12-16 | 2000-02-22 | Morton International, Inc. | Solid vinyl ether terminated urethane curing agent |
US6040040A (en) * | 1998-01-28 | 2000-03-21 | Ncr Corporation | Multi-layer thermal transfer media from selectively curable formulations |
US6262825B1 (en) | 1999-08-24 | 2001-07-17 | Napp Systems, Inc. | Apparatus and method for the enhanced imagewise exposure of a photosensitive material |
DE60008778T2 (de) | 1999-11-05 | 2005-02-10 | Z Corp., Burlington | Verfahren für dreidimensionales drucken |
US6376148B1 (en) | 2001-01-17 | 2002-04-23 | Nanotek Instruments, Inc. | Layer manufacturing using electrostatic imaging and lamination |
US6893489B2 (en) | 2001-12-20 | 2005-05-17 | Honeywell International Inc. | Physical colored inks and coatings |
US7005232B2 (en) | 2003-06-16 | 2006-02-28 | Napp Systems, Inc. | Highly reflective substrates for the digital processing of photopolymer printing plates |
US7569260B2 (en) | 2003-08-21 | 2009-08-04 | Asahi Kasei Chemicals Corporation | Photosensitive composition and cured products thereof |
EP1727663B1 (en) * | 2004-03-22 | 2011-10-05 | Huntsman Advanced Materials (Switzerland) GmbH | Photocurable compositions |
WO2005121190A2 (en) * | 2004-06-04 | 2005-12-22 | Designer Molecules Inc. | Free-radical curable polyesters and methods for use thereof |
US7875688B2 (en) * | 2004-06-04 | 2011-01-25 | Designer Molecules, Inc. | Free-radical curable polyesters and methods for use thereof |
WO2008073297A2 (en) | 2006-12-08 | 2008-06-19 | Z Corporation | Three dimensional printing material system and method using peroxide cure |
WO2008086033A1 (en) | 2007-01-10 | 2008-07-17 | Z Corporation | Three-dimensional printing material system with improved color, article performance, and ease of use |
US7968626B2 (en) | 2007-02-22 | 2011-06-28 | Z Corporation | Three dimensional printing material system and method using plasticizer-assisted sintering |
WO2008111283A1 (ja) * | 2007-03-09 | 2008-09-18 | Daicel Chemical Industries, Ltd. | 光硬化性樹脂組成物 |
US7868113B2 (en) | 2007-04-11 | 2011-01-11 | Designer Molecules, Inc. | Low shrinkage polyester thermosetting resins |
US8158748B2 (en) | 2008-08-13 | 2012-04-17 | Designer Molecules, Inc. | Hetero-functional compounds and methods for use thereof |
BE1019331A5 (nl) | 2010-05-10 | 2012-06-05 | Flooring Ind Ltd Sarl | Vloerpaneel en werkwijzen voor het vervaardigen van vloerpanelen. |
US8816021B2 (en) | 2010-09-10 | 2014-08-26 | Designer Molecules, Inc. | Curable composition with rubber-like properties |
ITVI20110333A1 (it) * | 2011-12-23 | 2013-06-24 | Ettore Maurizio Costabeber | Macchina stereolitografica con gruppo ottico perfezionato |
CN105164210B (zh) * | 2013-06-19 | 2019-09-27 | 惠普发展公司,有限责任合伙企业 | 用于三维(3d)打印的组合物 |
WO2019169211A1 (en) * | 2018-03-02 | 2019-09-06 | Formlabs, Inc. | Latent cure resins and related methods |
US11638979B2 (en) * | 2020-06-09 | 2023-05-02 | Applied Materials, Inc. | Additive manufacturing of polishing pads |
US11612978B2 (en) | 2020-06-09 | 2023-03-28 | Applied Materials, Inc. | Additive manufacturing of polishing pads |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE631536A (nl) * | 1962-04-25 | |||
DE2628408A1 (de) * | 1976-06-24 | 1978-01-12 | Basf Ag | Vinylaether des 3-methylpentandiol- 1,5 |
US4645781A (en) * | 1983-03-29 | 1987-02-24 | Union Carbide Corporation | Blends of cyclic vinyl ether containing compounds and expoxides |
CA1246785A (en) * | 1983-03-29 | 1988-12-13 | Union Carbide Corporation | Blends of cyclic vinyl ether containing compounds and a poly(active hydrogen) organic compound |
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
JPH01126638A (ja) * | 1987-11-11 | 1989-05-18 | Nippon Soda Co Ltd | 画像形成用樹脂組成物 |
WO1989007620A1 (en) * | 1988-02-19 | 1989-08-24 | Asahi Denka Kogyo K.K. | Resin composition for optical modeling |
JPH0826121B2 (ja) * | 1988-02-19 | 1996-03-13 | 旭電化工業株式会社 | 光学的造形用樹脂組成物 |
US4885319A (en) * | 1988-02-29 | 1989-12-05 | Gaf Corporation | Solvent resistant irradiation curable coatings |
WO1989008021A1 (en) * | 1988-03-02 | 1989-09-08 | Desoto, Inc. | Stereolithography using composition providing reduced distortion |
US4942001A (en) * | 1988-03-02 | 1990-07-17 | Inc. DeSoto | Method of forming a three-dimensional object by stereolithography and composition therefore |
US4844144A (en) * | 1988-08-08 | 1989-07-04 | Desoto, Inc. | Investment casting utilizing patterns produced by stereolithography |
AU4191089A (en) * | 1988-08-12 | 1990-03-05 | Desoto Inc. | Photo-curable vinyl ether compositions |
US4956198A (en) * | 1988-09-13 | 1990-09-11 | Desoto, Inc. | Ultraviolet-curable cationic vinyl ether polyurethane coating compositions |
WO1990003989A1 (en) * | 1988-10-03 | 1990-04-19 | Desoto, Inc. | Cationically curable polyurethane compositions having vinyl ether functionality |
US5106885A (en) * | 1989-11-03 | 1992-04-21 | Isp Investments Inc. | Radiation curable compositions containing multifunctional vinyl ether monomers and protective coatings formed therefrom |
CA2028259A1 (en) * | 1989-11-20 | 1991-05-21 | Stefan Weigl | Tacky photopolymerizable adhesive compositions |
US5039716A (en) * | 1990-01-26 | 1991-08-13 | Gaf Chemicals Corporation | Alk-1-enyl ether silicates and radiation curable composition containing alk-1-enyl ether silicates |
US5045572A (en) * | 1990-01-26 | 1991-09-03 | Gaf Chemicals Corporation | Radiation curable cross linkable compositions containing an aliphatic polyfunctional alkenyl ether |
US5055357A (en) * | 1990-01-26 | 1991-10-08 | Isp Investments Inc. | Radiation curable cross linkable compositions |
US5036112A (en) * | 1990-01-26 | 1991-07-30 | Gaf Chemicals Corporation | Cross-linkable vinyl ether polyacetal oligomers |
US5139872A (en) * | 1990-08-29 | 1992-08-18 | Allied-Signal Inc. | Vinyl ether based optical fiber coatings |
-
1992
- 1992-04-15 DE DE4291255T patent/DE4291255T1/de not_active Ceased
- 1992-04-15 JP JP4511859A patent/JP2667934B2/ja not_active Expired - Lifetime
- 1992-04-15 CA CA002102107A patent/CA2102107C/en not_active Expired - Lifetime
- 1992-04-15 WO PCT/US1992/003168 patent/WO1992020014A1/en not_active Application Discontinuation
- 1992-04-15 NL NL9220016A patent/NL193122C/nl not_active IP Right Cessation
- 1992-04-15 GB GB9321979A patent/GB2273297B/en not_active Expired - Lifetime
- 1992-04-29 FR FR9205313A patent/FR2676061B1/fr not_active Expired - Lifetime
- 1992-04-29 IT ITTO920368A patent/IT1263117B/it active IP Right Grant
- 1992-04-30 BE BE9200408A patent/BE1005001A4/fr not_active IP Right Cessation
-
1993
- 1993-10-29 SE SE9303557A patent/SE503956C2/sv not_active IP Right Cessation
-
1994
- 1994-02-24 US US08/201,146 patent/US5437964A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
BE1005001A4 (fr) | 1993-03-16 |
JPH06507738A (ja) | 1994-09-01 |
NL9220016A (nl) | 1994-02-01 |
NL193122C (nl) | 1998-11-03 |
CA2102107A1 (en) | 1992-11-02 |
JP2667934B2 (ja) | 1997-10-27 |
IT1263117B (it) | 1996-07-30 |
ITTO920368A1 (it) | 1993-10-29 |
GB2273297B (en) | 1995-11-22 |
WO1992020014A1 (en) | 1992-11-12 |
SE503956C2 (sv) | 1996-10-07 |
GB2273297A (en) | 1994-06-15 |
US5437964A (en) | 1995-08-01 |
FR2676061A1 (fr) | 1992-11-06 |
FR2676061B1 (fr) | 2000-03-31 |
GB9321979D0 (en) | 1994-02-16 |
ITTO920368A0 (it) | 1992-04-29 |
SE9303557D0 (sv) | 1993-10-29 |
CA2102107C (en) | 2002-07-16 |
DE4291255T1 (de) | 1994-05-05 |
SE9303557L (sv) | 1993-11-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
SNR | Assignments of patents or rights arising from examined patent applications |
Owner name: VANTICO AG;CIBA SPECIALTY CHEMICALS HOLDING INC. |
|
V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20041101 |