NL193122B - Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren. - Google Patents

Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren.

Info

Publication number
NL193122B
NL193122B NL9220016A NL9220016A NL193122B NL 193122 B NL193122 B NL 193122B NL 9220016 A NL9220016 A NL 9220016A NL 9220016 A NL9220016 A NL 9220016A NL 193122 B NL193122 B NL 193122B
Authority
NL
Netherlands
Prior art keywords
stereolithography
vinyl ether
ether epoxide
epoxide polymers
polymers
Prior art date
Application number
NL9220016A
Other languages
English (en)
Other versions
NL9220016A (nl
NL193122C (nl
Inventor
Stephen Craig Lapin
James Ronald Snyder
Eugene Valentine Sitzmann
Darryl Keith Barnes
George David Green
Original Assignee
Allied Signal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Signal Inc filed Critical Allied Signal Inc
Publication of NL9220016A publication Critical patent/NL9220016A/nl
Publication of NL193122B publication Critical patent/NL193122B/nl
Application granted granted Critical
Publication of NL193122C publication Critical patent/NL193122C/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
NL9220016A 1991-05-01 1992-04-15 Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren. NL193122C (nl)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US69389091A 1991-05-01 1991-05-01
US69389091 1991-05-01
US85539292A 1992-03-26 1992-03-26
US85539292 1992-03-26
PCT/US1992/003168 WO1992020014A1 (en) 1991-05-01 1992-04-15 Stereolithography using vinyl ether-epoxide polymers
US9203168 1992-04-15

Publications (3)

Publication Number Publication Date
NL9220016A NL9220016A (nl) 1994-02-01
NL193122B true NL193122B (nl) 1998-07-01
NL193122C NL193122C (nl) 1998-11-03

Family

ID=27105258

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9220016A NL193122C (nl) 1991-05-01 1992-04-15 Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren.

Country Status (11)

Country Link
US (1) US5437964A (nl)
JP (1) JP2667934B2 (nl)
BE (1) BE1005001A4 (nl)
CA (1) CA2102107C (nl)
DE (1) DE4291255T1 (nl)
FR (1) FR2676061B1 (nl)
GB (1) GB2273297B (nl)
IT (1) IT1263117B (nl)
NL (1) NL193122C (nl)
SE (1) SE503956C2 (nl)
WO (1) WO1992020014A1 (nl)

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WO1992015620A1 (en) * 1991-02-27 1992-09-17 Allied-Signal Inc. Stereolithography using vinyl ether based polymers
ATE193532T1 (de) * 1993-09-16 2000-06-15 Ciba Sc Holding Ag Vinyletherverbindungen mit zusätzlichen von vinylethergruppen verschiedenen funktionellen gruppen und deren verwendung zur formulierung härtbarer zusammensetzungen
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US5494618A (en) * 1994-06-27 1996-02-27 Alliedsignal Inc. Increasing the useful range of cationic photoinitiators in stereolithography
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
US5639413A (en) * 1995-03-30 1997-06-17 Crivello; James Vincent Methods and compositions related to stereolithography
EP0831127B1 (en) * 1995-05-12 2003-09-03 Asahi Denka Kogyo Kabushiki Kaisha Stereolithographic resin composition and stereolithographic method
US5707780A (en) 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
US5648194A (en) * 1995-08-03 1997-07-15 Shipley Company, L.L.C. Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether
US5932309A (en) 1995-09-28 1999-08-03 Alliedsignal Inc. Colored articles and compositions and methods for their fabrication
US5783136A (en) * 1996-09-09 1998-07-21 Ford Global Technologies, Inc. Method of preparing a stereolithographically produced prototype for experimental stress analysis
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
FR2757530A1 (fr) * 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
US5889084A (en) * 1997-01-30 1999-03-30 Ncr Corporation UV or visible light initiated cationic cured ink for ink jet printing
GB9702658D0 (en) 1997-02-10 1997-04-02 Imperial College Fabrication method and apparatus
US6054250A (en) * 1997-02-18 2000-04-25 Alliedsignal Inc. High temperature performance polymers for stereolithography
WO1998036323A1 (en) * 1997-02-14 1998-08-20 Alliedsignal Inc. High temperature performance polymers for stereolithography
US5858605A (en) * 1997-03-08 1999-01-12 Shipley Company, L.L.C. Acid labile photoactive composition
US6025017A (en) * 1997-05-21 2000-02-15 Ncr Corporation Photopolymerizable coating formulation for thermal transfer media
US5992314A (en) * 1997-06-30 1999-11-30 Ncr Corporation UV curable adhesive for stencil media
US5977018A (en) * 1997-06-30 1999-11-02 Ncr Corporation Reactive paper and ink for indelible print
ATE212734T1 (de) * 1997-06-30 2002-02-15 Siemens Ag Reaktionsharzmischungen und deren verwendung
US6028212A (en) * 1997-12-16 2000-02-22 Morton International, Inc. Solid vinyl ether terminated urethane curing agent
US6040040A (en) * 1998-01-28 2000-03-21 Ncr Corporation Multi-layer thermal transfer media from selectively curable formulations
US6262825B1 (en) 1999-08-24 2001-07-17 Napp Systems, Inc. Apparatus and method for the enhanced imagewise exposure of a photosensitive material
DE60008778T2 (de) 1999-11-05 2005-02-10 Z Corp., Burlington Verfahren für dreidimensionales drucken
US6376148B1 (en) 2001-01-17 2002-04-23 Nanotek Instruments, Inc. Layer manufacturing using electrostatic imaging and lamination
US6893489B2 (en) 2001-12-20 2005-05-17 Honeywell International Inc. Physical colored inks and coatings
US7005232B2 (en) 2003-06-16 2006-02-28 Napp Systems, Inc. Highly reflective substrates for the digital processing of photopolymer printing plates
US7569260B2 (en) 2003-08-21 2009-08-04 Asahi Kasei Chemicals Corporation Photosensitive composition and cured products thereof
EP1727663B1 (en) * 2004-03-22 2011-10-05 Huntsman Advanced Materials (Switzerland) GmbH Photocurable compositions
WO2005121190A2 (en) * 2004-06-04 2005-12-22 Designer Molecules Inc. Free-radical curable polyesters and methods for use thereof
US7875688B2 (en) * 2004-06-04 2011-01-25 Designer Molecules, Inc. Free-radical curable polyesters and methods for use thereof
WO2008073297A2 (en) 2006-12-08 2008-06-19 Z Corporation Three dimensional printing material system and method using peroxide cure
WO2008086033A1 (en) 2007-01-10 2008-07-17 Z Corporation Three-dimensional printing material system with improved color, article performance, and ease of use
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
WO2008111283A1 (ja) * 2007-03-09 2008-09-18 Daicel Chemical Industries, Ltd. 光硬化性樹脂組成物
US7868113B2 (en) 2007-04-11 2011-01-11 Designer Molecules, Inc. Low shrinkage polyester thermosetting resins
US8158748B2 (en) 2008-08-13 2012-04-17 Designer Molecules, Inc. Hetero-functional compounds and methods for use thereof
BE1019331A5 (nl) 2010-05-10 2012-06-05 Flooring Ind Ltd Sarl Vloerpaneel en werkwijzen voor het vervaardigen van vloerpanelen.
US8816021B2 (en) 2010-09-10 2014-08-26 Designer Molecules, Inc. Curable composition with rubber-like properties
ITVI20110333A1 (it) * 2011-12-23 2013-06-24 Ettore Maurizio Costabeber Macchina stereolitografica con gruppo ottico perfezionato
CN105164210B (zh) * 2013-06-19 2019-09-27 惠普发展公司，有限责任合伙企业 用于三维(3d)打印的组合物
WO2019169211A1 (en) * 2018-03-02 2019-09-06 Formlabs, Inc. Latent cure resins and related methods
US11638979B2 (en) * 2020-06-09 2023-05-02 Applied Materials, Inc. Additive manufacturing of polishing pads
US11612978B2 (en) 2020-06-09 2023-03-28 Applied Materials, Inc. Additive manufacturing of polishing pads

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BE631536A (nl) * 1962-04-25
DE2628408A1 (de) * 1976-06-24 1978-01-12 Basf Ag Vinylaether des 3-methylpentandiol- 1,5
US4645781A (en) * 1983-03-29 1987-02-24 Union Carbide Corporation Blends of cyclic vinyl ether containing compounds and expoxides
CA1246785A (en) * 1983-03-29 1988-12-13 Union Carbide Corporation Blends of cyclic vinyl ether containing compounds and a poly(active hydrogen) organic compound
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
JPH01126638A (ja) * 1987-11-11 1989-05-18 Nippon Soda Co Ltd 画像形成用樹脂組成物
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JPH0826121B2 (ja) * 1988-02-19 1996-03-13 旭電化工業株式会社 光学的造形用樹脂組成物
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US4942001A (en) * 1988-03-02 1990-07-17 Inc. DeSoto Method of forming a three-dimensional object by stereolithography and composition therefore
US4844144A (en) * 1988-08-08 1989-07-04 Desoto, Inc. Investment casting utilizing patterns produced by stereolithography
AU4191089A (en) * 1988-08-12 1990-03-05 Desoto Inc. Photo-curable vinyl ether compositions
US4956198A (en) * 1988-09-13 1990-09-11 Desoto, Inc. Ultraviolet-curable cationic vinyl ether polyurethane coating compositions
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Also Published As

Publication number Publication date
BE1005001A4 (fr) 1993-03-16
JPH06507738A (ja) 1994-09-01
NL9220016A (nl) 1994-02-01
NL193122C (nl) 1998-11-03
CA2102107A1 (en) 1992-11-02
JP2667934B2 (ja) 1997-10-27
IT1263117B (it) 1996-07-30
ITTO920368A1 (it) 1993-10-29
GB2273297B (en) 1995-11-22
WO1992020014A1 (en) 1992-11-12
SE503956C2 (sv) 1996-10-07
GB2273297A (en) 1994-06-15
US5437964A (en) 1995-08-01
FR2676061A1 (fr) 1992-11-06
FR2676061B1 (fr) 2000-03-31
GB9321979D0 (en) 1994-02-16
ITTO920368A0 (it) 1992-04-29
SE9303557D0 (sv) 1993-10-29
CA2102107C (en) 2002-07-16
DE4291255T1 (de) 1994-05-05
SE9303557L (sv) 1993-11-22

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Legal Events

Date Code Title Description
BB A search report has been drawn up
BC A request for examination has been filed
SNR Assignments of patents or rights arising from examined patent applications

Owner name: VANTICO AG;CIBA SPECIALTY CHEMICALS HOLDING INC.

V1 Lapsed because of non-payment of the annual fee

Effective date: 20041101