SE454225B - Fotovoltiskt don samt anvendning av donet - Google Patents
Fotovoltiskt don samt anvendning av donetInfo
- Publication number
- SE454225B SE454225B SE8301051A SE8301051A SE454225B SE 454225 B SE454225 B SE 454225B SE 8301051 A SE8301051 A SE 8301051A SE 8301051 A SE8301051 A SE 8301051A SE 454225 B SE454225 B SE 454225B
- Authority
- SE
- Sweden
- Prior art keywords
- layer
- amorphous silicon
- doped
- random
- deposited
- Prior art date
Links
- 239000000463 material Substances 0.000 claims description 72
- 239000000956 alloy Substances 0.000 claims description 65
- 229910045601 alloy Inorganic materials 0.000 claims description 64
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 57
- 230000005855 radiation Effects 0.000 claims description 44
- 239000004065 semiconductor Substances 0.000 claims description 26
- 230000000737 periodic effect Effects 0.000 claims description 23
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- 239000002800 charge carrier Substances 0.000 claims description 10
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 10
- 229910001887 tin oxide Inorganic materials 0.000 claims description 8
- 229910010293 ceramic material Inorganic materials 0.000 claims description 5
- 210000003298 dental enamel Anatomy 0.000 claims description 5
- 239000004408 titanium dioxide Substances 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 4
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 239000011669 selenium Substances 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- 239000005083 Zinc sulfide Substances 0.000 claims description 2
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 2
- 210000005056 cell body Anatomy 0.000 claims 1
- 239000010410 layer Substances 0.000 description 177
- 239000000758 substrate Substances 0.000 description 30
- 239000001257 hydrogen Substances 0.000 description 23
- 229910052739 hydrogen Inorganic materials 0.000 description 23
- 229910052751 metal Inorganic materials 0.000 description 21
- 239000002184 metal Substances 0.000 description 21
- 239000011521 glass Substances 0.000 description 20
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 19
- 238000000151 deposition Methods 0.000 description 19
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 16
- 229910052731 fluorine Inorganic materials 0.000 description 16
- 239000011737 fluorine Substances 0.000 description 16
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 15
- 230000008021 deposition Effects 0.000 description 15
- 239000007789 gas Substances 0.000 description 15
- 229910000077 silane Inorganic materials 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- 239000013078 crystal Substances 0.000 description 10
- 239000004020 conductor Substances 0.000 description 9
- 239000002019 doping agent Substances 0.000 description 9
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 9
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 9
- 150000002739 metals Chemical class 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 239000003638 chemical reducing agent Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 229910052732 germanium Inorganic materials 0.000 description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000002178 crystalline material Substances 0.000 description 6
- 229910021419 crystalline silicon Inorganic materials 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910052793 cadmium Inorganic materials 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 229940071182 stannate Drugs 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000003667 anti-reflective effect Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 3
- 229910000676 Si alloy Inorganic materials 0.000 description 3
- 238000005275 alloying Methods 0.000 description 3
- 238000000149 argon plasma sintering Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- 230000014509 gene expression Effects 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 238000005488 sandblasting Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910001188 F alloy Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 2
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 2
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- NCGICGYLBXGBGN-UHFFFAOYSA-N 3-morpholin-4-yl-1-oxa-3-azonia-2-azanidacyclopent-3-en-5-imine;hydrochloride Chemical compound Cl.[N-]1OC(=N)C=[N+]1N1CCOCC1 NCGICGYLBXGBGN-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 241000347389 Serranus cabrilla Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- VDRSDNINOSAWIV-UHFFFAOYSA-N [F].[Si] Chemical compound [F].[Si] VDRSDNINOSAWIV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229940124558 contraceptive agent Drugs 0.000 description 1
- 239000003433 contraceptive agent Substances 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- 238000012258 culturing Methods 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910000078 germane Inorganic materials 0.000 description 1
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 1
- 229910052986 germanium hydride Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000003278 mimic effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- HSYFJDYGOJKZCL-UHFFFAOYSA-L zinc;sulfite Chemical compound [Zn+2].[O-]S([O-])=O HSYFJDYGOJKZCL-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/056—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means the light-reflecting means being of the back surface reflector [BSR] type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/354,285 US4419533A (en) | 1982-03-03 | 1982-03-03 | Photovoltaic device having incident radiation directing means for total internal reflection |
Publications (3)
Publication Number | Publication Date |
---|---|
SE8301051D0 SE8301051D0 (sv) | 1983-02-25 |
SE8301051L SE8301051L (sv) | 1983-09-04 |
SE454225B true SE454225B (sv) | 1988-04-11 |
Family
ID=23392626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE8301051A SE454225B (sv) | 1982-03-03 | 1983-02-25 | Fotovoltiskt don samt anvendning av donet |
Country Status (20)
Country | Link |
---|---|
US (1) | US4419533A (it) |
JP (1) | JPS58159383A (it) |
KR (1) | KR840004309A (it) |
AU (1) | AU543213B2 (it) |
BR (1) | BR8300902A (it) |
CA (1) | CA1187970A (it) |
DE (1) | DE3306148A1 (it) |
EG (1) | EG15060A (it) |
ES (1) | ES8403667A1 (it) |
FR (1) | FR2522880A1 (it) |
GB (1) | GB2116364B (it) |
GR (1) | GR78799B (it) |
IE (1) | IE54408B1 (it) |
IL (1) | IL67794A (it) |
IN (1) | IN157618B (it) |
IT (1) | IT1167617B (it) |
NL (1) | NL8300603A (it) |
PH (1) | PH19299A (it) |
SE (1) | SE454225B (it) |
ZA (1) | ZA83748B (it) |
Families Citing this family (117)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4514582A (en) * | 1982-09-17 | 1985-04-30 | Exxon Research And Engineering Co. | Optical absorption enhancement in amorphous silicon deposited on rough substrate |
US4497974A (en) * | 1982-11-22 | 1985-02-05 | Exxon Research & Engineering Co. | Realization of a thin film solar cell with a detached reflector |
JPS59127879A (ja) * | 1983-01-12 | 1984-07-23 | Semiconductor Energy Lab Co Ltd | 光電変換装置およびその作製方法 |
GB2139421B (en) * | 1983-03-07 | 1987-09-23 | Semiconductor Energy Lab | Semiconductor photoelectric conversion device and method of manufacture |
US4536608A (en) * | 1983-04-25 | 1985-08-20 | Exxon Research And Engineering Co. | Solar cell with two-dimensional hexagonal reflecting diffraction grating |
DE3705173A1 (de) * | 1986-02-28 | 1987-09-03 | Canon Kk | Halbleitervorrichtung |
DE3789846T2 (de) * | 1986-10-07 | 1994-09-22 | Canon Kk | Bildablesesystem. |
FR2615327A1 (fr) * | 1987-03-27 | 1988-11-18 | Sanyo Electric Co | Dispositif photovoltaique |
JP2805353B2 (ja) * | 1989-09-12 | 1998-09-30 | キヤノン株式会社 | 太陽電池 |
US5138214A (en) * | 1989-12-27 | 1992-08-11 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric transducer and method of adjusting oscillation frequency thereof |
DE4004398A1 (de) * | 1990-02-13 | 1991-08-14 | Siemens Ag | Wellenlaengenselektiver photodetektor |
JP2784841B2 (ja) * | 1990-08-09 | 1998-08-06 | キヤノン株式会社 | 太陽電池用基板 |
US5270858A (en) * | 1990-10-11 | 1993-12-14 | Viratec Thin Films Inc | D.C. reactively sputtered antireflection coatings |
WO1992007386A1 (en) * | 1990-10-15 | 1992-04-30 | United Solar Systems Corporation | Monolithic solar cell array and method for its manufacture |
US5284525A (en) * | 1990-12-13 | 1994-02-08 | Canon Kabushiki Kaisha | Solar cell |
JP2908067B2 (ja) * | 1991-05-09 | 1999-06-21 | キヤノン株式会社 | 太陽電池用基板および太陽電池 |
DE69218102T2 (de) * | 1991-10-22 | 1997-10-09 | Canon Kk | Photovoltaisches Bauelement |
US5221854A (en) * | 1991-11-18 | 1993-06-22 | United Solar Systems Corporation | Protective layer for the back reflector of a photovoltaic device |
US5291055A (en) * | 1992-01-28 | 1994-03-01 | The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | Resonant infrared detector with substantially unit quantum efficiency |
JP2974485B2 (ja) * | 1992-02-05 | 1999-11-10 | キヤノン株式会社 | 光起電力素子の製造法 |
US5230746A (en) * | 1992-03-03 | 1993-07-27 | Amoco Corporation | Photovoltaic device having enhanced rear reflecting contact |
US5261970A (en) * | 1992-04-08 | 1993-11-16 | Sverdrup Technology, Inc. | Optoelectronic and photovoltaic devices with low-reflectance surfaces |
US5296045A (en) * | 1992-09-04 | 1994-03-22 | United Solar Systems Corporation | Composite back reflector for photovoltaic device |
JP2771414B2 (ja) * | 1992-12-28 | 1998-07-02 | キヤノン株式会社 | 太陽電池の製造方法 |
US5593549A (en) * | 1993-06-02 | 1997-01-14 | Stirbl; Robert C. | Method for changing solar energy distribution |
US5650362A (en) * | 1993-11-04 | 1997-07-22 | Fuji Xerox Co. | Oriented conductive film and process for preparing the same |
US5668050A (en) * | 1994-04-28 | 1997-09-16 | Canon Kabushiki Kaisha | Solar cell manufacturing method |
JPH07326783A (ja) * | 1994-05-30 | 1995-12-12 | Canon Inc | 光起電力素子の形成方法及びそれに用いる薄膜製造装置 |
JPH0864848A (ja) * | 1994-08-23 | 1996-03-08 | Canon Inc | 光電気変換装置、反射防止膜及び電極基板 |
US6020553A (en) * | 1994-10-09 | 2000-02-01 | Yeda Research And Development Co., Ltd. | Photovoltaic cell system and an optical structure therefor |
JP3017422B2 (ja) * | 1995-09-11 | 2000-03-06 | キヤノン株式会社 | 光起電力素子アレー及びその製造方法 |
US5986204A (en) * | 1996-03-21 | 1999-11-16 | Canon Kabushiki Kaisha | Photovoltaic cell |
US6172296B1 (en) * | 1996-05-17 | 2001-01-09 | Canon Kabushiki Kaisha | Photovoltaic cell |
JPH10178193A (ja) * | 1996-12-18 | 1998-06-30 | Canon Inc | 光起電力素子の製造方法 |
US5998730A (en) * | 1997-05-13 | 1999-12-07 | Canon Kabushiki Kaisha | Production method for deposited film, production method for photoelectric conversion element, production apparatus for deposited film, production apparatus for photoelectric conversion element |
JPH10335684A (ja) * | 1997-05-30 | 1998-12-18 | Canon Inc | 光電気変換体の製造方法 |
US6222117B1 (en) | 1998-01-05 | 2001-04-24 | Canon Kabushiki Kaisha | Photovoltaic device, manufacturing method of photovoltaic device, photovoltaic device integrated with building material and power-generating apparatus |
JPH11302843A (ja) * | 1998-02-17 | 1999-11-02 | Canon Inc | 酸化亜鉛膜の堆積方法および堆積装置、光起電力素子 |
KR100414132B1 (ko) | 1998-07-02 | 2004-01-07 | 아스트로파워 | 다결정성 실리콘 박막, 다결정성 실리콘 박막 전자 디바이스, 집적 태양 전지, 태양전지 모듈 및 그 제조방법 |
US6468828B1 (en) | 1998-07-14 | 2002-10-22 | Sky Solar L.L.C. | Method of manufacturing lightweight, high efficiency photovoltaic module |
JP2000294818A (ja) * | 1999-04-05 | 2000-10-20 | Sony Corp | 薄膜半導体素子およびその製造方法 |
TW437104B (en) * | 1999-05-25 | 2001-05-28 | Wang Tien Yang | Semiconductor light-emitting device and method for manufacturing the same |
JP2001345460A (ja) * | 2000-03-29 | 2001-12-14 | Sanyo Electric Co Ltd | 太陽電池装置 |
US6858462B2 (en) * | 2000-04-11 | 2005-02-22 | Gratings, Inc. | Enhanced light absorption of solar cells and photodetectors by diffraction |
US6587097B1 (en) | 2000-11-28 | 2003-07-01 | 3M Innovative Properties Co. | Display system |
US7057256B2 (en) | 2001-05-25 | 2006-06-06 | President & Fellows Of Harvard College | Silicon-based visible and near-infrared optoelectric devices |
US7442629B2 (en) | 2004-09-24 | 2008-10-28 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
JP2003013218A (ja) * | 2001-06-29 | 2003-01-15 | Canon Inc | 長時間スパッタリング方法 |
FR2832706B1 (fr) * | 2001-11-28 | 2004-07-23 | Saint Gobain | Substrat transparent muni d'une electrode |
US20050067667A1 (en) * | 2003-09-26 | 2005-03-31 | Goushcha Alexander O. | Fast silicon photodiodes with high back surface reflectance in a wavelength range close to the bandgap |
DE102005013537A1 (de) * | 2004-03-24 | 2005-10-20 | Sharp Kk | Fotoelektrischer Wandler und Herstellverfahren für einen solchen |
JP5367575B2 (ja) * | 2006-09-28 | 2013-12-11 | ビー−ポッズ・ホールディングス・プロプライエタリー・リミテッド | 太陽エネルギー収集装置 |
US20080223438A1 (en) * | 2006-10-19 | 2008-09-18 | Intematix Corporation | Systems and methods for improving luminescent concentrator performance |
EP1993142A1 (de) * | 2007-05-14 | 2008-11-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Reflektiv beschichtetes Halbleiterbauelement, Verfahren zu dessen Herstellung sowie dessen Verwendung |
PT2031082E (pt) * | 2007-08-31 | 2014-11-04 | Ecole Polytech | Substrato metálico texturizado cristalograficamente, dispositivvo texturizado cristalograficamente, célula e módulo fotovoltaico que compreendem um tal dispositivo e processo de deposição de camadas finas |
KR101244027B1 (ko) * | 2008-07-08 | 2013-03-14 | 시너스 테크놀리지, 인코포레이티드 | 플렉서블 태양전지 제조방법 |
TW201005963A (en) * | 2008-07-17 | 2010-02-01 | Big Sun Energy Technology Inc | Solar cell with high photon utilization and method of manufacturing the same |
US8679959B2 (en) * | 2008-09-03 | 2014-03-25 | Sionyx, Inc. | High sensitivity photodetectors, imaging arrays, and high efficiency photovoltaic devices produced using ion implantation and femtosecond laser irradiation |
KR100993513B1 (ko) * | 2008-10-06 | 2010-11-10 | 엘지전자 주식회사 | 태양전지 |
US8686284B2 (en) * | 2008-10-23 | 2014-04-01 | Alta Devices, Inc. | Photovoltaic device with increased light trapping |
TW201030998A (en) * | 2008-10-23 | 2010-08-16 | Alta Devices Inc | Photovoltaic device |
US20120104460A1 (en) | 2010-11-03 | 2012-05-03 | Alta Devices, Inc. | Optoelectronic devices including heterojunction |
WO2010048543A2 (en) * | 2008-10-23 | 2010-04-29 | Alta Devices, Inc. | Thin absorber layer of a photovoltaic device |
TW201021229A (en) * | 2008-11-21 | 2010-06-01 | Ind Tech Res Inst | Solar cell having reflective structure |
EP2190033A1 (de) | 2008-11-24 | 2010-05-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Tandemsolarzelle aus kristallinem Silizium und kristallinem Siliziumcarbid sowie Verfahren zu dessen Herstellung |
FR2939240B1 (fr) * | 2008-12-03 | 2011-02-18 | Saint Gobain | Element en couches et dispositif photovoltaique comprenant un tel element |
JP5470633B2 (ja) * | 2008-12-11 | 2014-04-16 | 国立大学法人東北大学 | 光電変換素子及び太陽電池 |
US20100186816A1 (en) * | 2009-01-23 | 2010-07-29 | Samsung Electronics Co., Ltd. | Solar cell |
WO2010087785A1 (en) * | 2009-02-02 | 2010-08-05 | Agency For Science, Technology And Research | Thin film solar cell structure |
US8207051B2 (en) | 2009-04-28 | 2012-06-26 | Sionyx, Inc. | Semiconductor surface modification |
FR2945159B1 (fr) * | 2009-04-29 | 2016-04-01 | Horiba Jobin Yvon Sas | Reseau de diffraction metallique en reflexion a haute tenue au flux en regime femtoseconde, systeme comprenant un tel reseau et procede d'amelioration du seuil d'endommagement d'un reseau de diffraction metallique |
US20110121424A1 (en) * | 2009-04-30 | 2011-05-26 | James Carey | Low oxygen content semiconductor material for surface enhanced photonic devices and associated methods |
US20100288352A1 (en) * | 2009-05-12 | 2010-11-18 | Lightwave Power, Inc. | Integrated solar cell nanoarray layers and light concentrating device |
TWI394285B (zh) * | 2009-06-08 | 2013-04-21 | Univ Tatung | 光電轉換裝置及其製法 |
DE102009029944A1 (de) * | 2009-06-19 | 2010-12-23 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Solarzelle und Verfahren zu deren Herstellung |
US8062920B2 (en) * | 2009-07-24 | 2011-11-22 | Ovshinsky Innovation, Llc | Method of manufacturing a photovoltaic device |
US20110203648A1 (en) * | 2009-08-20 | 2011-08-25 | James Carey | Laser processed heterojunction photovoltaic devices and associated methods |
US8476598B1 (en) | 2009-08-31 | 2013-07-02 | Sionyx, Inc. | Electromagnetic radiation imaging devices and associated methods |
US8309389B1 (en) | 2009-09-10 | 2012-11-13 | Sionyx, Inc. | Photovoltaic semiconductor devices and associated methods |
US9673243B2 (en) | 2009-09-17 | 2017-06-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
KR101893331B1 (ko) | 2009-09-17 | 2018-08-30 | 사이오닉스, 엘엘씨 | 감광성 이미징 장치 및 이와 관련된 방법 |
US9911781B2 (en) | 2009-09-17 | 2018-03-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
US8476681B2 (en) | 2009-09-17 | 2013-07-02 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
US9691921B2 (en) | 2009-10-14 | 2017-06-27 | Alta Devices, Inc. | Textured metallic back reflector |
WO2011050336A2 (en) * | 2009-10-22 | 2011-04-28 | Sionyx, Inc. | Semiconductor devices having an enhanced absorption region and associated methods |
US20150380576A1 (en) | 2010-10-13 | 2015-12-31 | Alta Devices, Inc. | Optoelectronic device with dielectric layer and method of manufacture |
US20170141256A1 (en) | 2009-10-23 | 2017-05-18 | Alta Devices, Inc. | Multi-junction optoelectronic device with group iv semiconductor as a bottom junction |
US9502594B2 (en) | 2012-01-19 | 2016-11-22 | Alta Devices, Inc. | Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from template layer and etching |
US11271128B2 (en) | 2009-10-23 | 2022-03-08 | Utica Leaseco, Llc | Multi-junction optoelectronic device |
US9768329B1 (en) | 2009-10-23 | 2017-09-19 | Alta Devices, Inc. | Multi-junction optoelectronic device |
US8212250B2 (en) | 2009-12-10 | 2012-07-03 | Leonard Forbes | Backside texturing by cusps to improve IR response of silicon solar cells and photodetectors |
US8120027B2 (en) * | 2009-12-10 | 2012-02-21 | Leonard Forbes | Backside nanoscale texturing to improve IR response of silicon solar cells and photodetectors |
US8692198B2 (en) | 2010-04-21 | 2014-04-08 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
FR2959872B1 (fr) * | 2010-05-05 | 2013-03-15 | Commissariat Energie Atomique | Cellule photovoltaique a face arriere structuree et procede de fabrication associe. |
EP2583312A2 (en) | 2010-06-18 | 2013-04-24 | Sionyx, Inc. | High speed photosensitive devices and associated methods |
TWI453932B (zh) * | 2010-07-06 | 2014-09-21 | Solarbase Group Inc | 光伏模組和製造ㄧ具有電極擴散層之光伏模組的方法 |
US20120024365A1 (en) * | 2010-07-27 | 2012-02-02 | Alliance For Sustainable Energy, Llc | Solar energy systems |
US9893223B2 (en) | 2010-11-16 | 2018-02-13 | Suncore Photovoltaics, Inc. | Solar electricity generation system |
JP2014500633A (ja) | 2010-12-21 | 2014-01-09 | サイオニクス、インク. | 基板損傷の少ない半導体素子および関連方法 |
US20120211065A1 (en) * | 2011-02-21 | 2012-08-23 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
JP2014514733A (ja) | 2011-03-10 | 2014-06-19 | サイオニクス、インク. | 3次元センサ、システム、および関連する方法 |
US9496308B2 (en) | 2011-06-09 | 2016-11-15 | Sionyx, Llc | Process module for increasing the response of backside illuminated photosensitive imagers and associated methods |
US20130016203A1 (en) | 2011-07-13 | 2013-01-17 | Saylor Stephen D | Biometric imaging devices and associated methods |
US8865507B2 (en) | 2011-09-16 | 2014-10-21 | Sionyx, Inc. | Integrated visible and infrared imager devices and associated methods |
US20130167903A1 (en) * | 2011-11-14 | 2013-07-04 | Prism Solar Technologies Incorporated | Encapsulated solar energy concentrator |
US20130167933A1 (en) * | 2011-12-30 | 2013-07-04 | Syracuse University | Intrinsic oxide buffer layers for solar cells |
US11038080B2 (en) | 2012-01-19 | 2021-06-15 | Utica Leaseco, Llc | Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from etching |
US9064764B2 (en) | 2012-03-22 | 2015-06-23 | Sionyx, Inc. | Pixel isolation elements, devices, and associated methods |
CN103066134B (zh) * | 2012-12-20 | 2016-02-10 | 河南大学 | 一种薄膜太阳能电池背反电极及其制备方法 |
US10514509B2 (en) * | 2013-01-10 | 2019-12-24 | The Regents Of The University Of Colorado, A Body Corporate | Method and apparatus for optical waveguide-to-semiconductor coupling and optical vias for monolithically integrated electronic and photonic circuits |
JP6466346B2 (ja) | 2013-02-15 | 2019-02-06 | サイオニクス、エルエルシー | アンチブルーミング特性を有するハイダイナミックレンジcmos画像センサおよび関連づけられた方法 |
US9939251B2 (en) | 2013-03-15 | 2018-04-10 | Sionyx, Llc | Three dimensional imaging utilizing stacked imager devices and associated methods |
WO2014209421A1 (en) | 2013-06-29 | 2014-12-31 | Sionyx, Inc. | Shallow trench textured regions and associated methods |
US9337229B2 (en) | 2013-12-26 | 2016-05-10 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor device and manufacturing method thereof |
JP2016178234A (ja) * | 2015-03-20 | 2016-10-06 | 株式会社東芝 | 半導体受光デバイス |
US10983275B2 (en) | 2016-03-21 | 2021-04-20 | The Regents Of The University Of Colorado, A Body Corporate | Method and apparatus for optical waveguide-to-semiconductor coupling for integrated photonic circuits |
EP4224537A1 (en) * | 2022-02-02 | 2023-08-09 | Airbus Defence and Space GmbH | A dual junction solar cell with light management features for space use, a photovoltaic assembly for space use including a dual junction solar cell, a satellite including the photovoltaic assembly and a method for manufacturing a dual junction solar cell for space use |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3569997A (en) * | 1967-07-13 | 1971-03-09 | Inventors And Investors Inc | Photoelectric microcircuit components monolythically integrated with zone plate optics |
US3487223A (en) * | 1968-07-10 | 1969-12-30 | Us Air Force | Multiple internal reflection structure in a silicon detector which is obtained by sandblasting |
US3873829A (en) * | 1970-05-29 | 1975-03-25 | Philips Corp | Photo cathode with means provided which produce a repeated total reflection of the incident light without interference phenomena |
FR2226754B1 (it) * | 1973-04-20 | 1975-08-22 | Thomson Csf | |
US3973994A (en) * | 1974-03-11 | 1976-08-10 | Rca Corporation | Solar cell with grooved surface |
US3971672A (en) * | 1975-02-03 | 1976-07-27 | D. H. Baldwin Company | Light diffuser for photovoltaic cell |
US4053327A (en) * | 1975-09-24 | 1977-10-11 | Communications Satellite Corporation | Light concentrating solar cell cover |
US4252865A (en) * | 1978-05-24 | 1981-02-24 | National Patent Development Corporation | Highly solar-energy absorbing device and method of making the same |
US4153813A (en) * | 1978-06-19 | 1979-05-08 | Atlantic Richfield Company | Luminescent solar collector |
US4166919A (en) * | 1978-09-25 | 1979-09-04 | Rca Corporation | Amorphous silicon solar cell allowing infrared transmission |
US4204881A (en) * | 1978-10-02 | 1980-05-27 | Mcgrew Stephen P | Solar power system |
JP60041878B2 (en) * | 1979-02-14 | 1985-09-19 | Sharp Kk | Thin film solar cell |
JPS55125680A (en) * | 1979-03-20 | 1980-09-27 | Yoshihiro Hamakawa | Photovoltaic element |
US4328390A (en) * | 1979-09-17 | 1982-05-04 | The University Of Delaware | Thin film photovoltaic cell |
US4246042A (en) * | 1980-02-13 | 1981-01-20 | Science Applications, Inc. | Fixed solar energy concentrator |
DK79780A (da) * | 1980-02-25 | 1981-08-26 | Elektronikcentralen | Solcelle med et halvlederkrystal og med en belyst overflade batteri af solceller og fremgangsmaade til fremstilling af samme |
DE3016498A1 (de) * | 1980-04-29 | 1981-11-05 | Siemens AG, 1000 Berlin und 8000 München | Lichtempfindliche halbleiterbauelemente |
DE3023165A1 (de) * | 1980-06-20 | 1982-01-07 | Siemens AG, 1000 Berlin und 8000 München | Solarzelle aus amorphem silizium |
US4289920A (en) * | 1980-06-23 | 1981-09-15 | International Business Machines Corporation | Multiple bandgap solar cell on transparent substrate |
DE3140974C2 (de) * | 1981-10-15 | 1986-11-20 | Viktor Voskanovič Afian | Fotoelektrischer Sonnenmodul |
-
1982
- 1982-03-03 US US06/354,285 patent/US4419533A/en not_active Expired - Lifetime
-
1983
- 1983-01-31 IL IL67794A patent/IL67794A/xx unknown
- 1983-02-04 ZA ZA83748A patent/ZA83748B/xx unknown
- 1983-02-14 GB GB08304033A patent/GB2116364B/en not_active Expired
- 1983-02-14 IE IE294/83A patent/IE54408B1/en not_active IP Right Cessation
- 1983-02-15 CA CA000421646A patent/CA1187970A/en not_active Expired
- 1983-02-16 AU AU11494/83A patent/AU543213B2/en not_active Ceased
- 1983-02-16 FR FR8302480A patent/FR2522880A1/fr not_active Withdrawn
- 1983-02-17 NL NL8300603A patent/NL8300603A/nl not_active Application Discontinuation
- 1983-02-18 IT IT47739/83A patent/IT1167617B/it active
- 1983-02-21 PH PH28546A patent/PH19299A/en unknown
- 1983-02-22 DE DE19833306148 patent/DE3306148A1/de not_active Withdrawn
- 1983-02-24 BR BR8300902A patent/BR8300902A/pt unknown
- 1983-02-25 JP JP58030683A patent/JPS58159383A/ja active Pending
- 1983-02-25 SE SE8301051A patent/SE454225B/sv not_active IP Right Cessation
- 1983-02-25 IN IN236/CAL/83A patent/IN157618B/en unknown
- 1983-03-01 EG EG137/83A patent/EG15060A/xx active
- 1983-03-02 ES ES520247A patent/ES8403667A1/es not_active Expired
- 1983-03-02 GR GR70656A patent/GR78799B/el unknown
- 1983-03-03 KR KR1019830000861A patent/KR840004309A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
FR2522880A1 (fr) | 1983-09-09 |
IN157618B (it) | 1986-05-03 |
IE54408B1 (en) | 1989-09-27 |
GB2116364B (en) | 1985-10-23 |
IT8347739A0 (it) | 1983-02-18 |
JPS58159383A (ja) | 1983-09-21 |
ZA83748B (en) | 1983-11-30 |
SE8301051L (sv) | 1983-09-04 |
US4419533A (en) | 1983-12-06 |
EG15060A (en) | 1985-12-31 |
ES520247A0 (es) | 1984-03-16 |
IL67794A (en) | 1986-01-31 |
IL67794A0 (en) | 1983-05-15 |
GB2116364A (en) | 1983-09-21 |
CA1187970A (en) | 1985-05-28 |
NL8300603A (nl) | 1983-10-03 |
KR840004309A (ko) | 1984-10-10 |
ES8403667A1 (es) | 1984-03-16 |
DE3306148A1 (de) | 1983-09-15 |
IE830294L (en) | 1983-09-03 |
SE8301051D0 (sv) | 1983-02-25 |
AU543213B2 (en) | 1985-04-04 |
GB8304033D0 (en) | 1983-03-16 |
IT1167617B (it) | 1987-05-13 |
PH19299A (en) | 1986-03-05 |
AU1149483A (en) | 1983-09-08 |
BR8300902A (pt) | 1983-11-16 |
GR78799B (it) | 1984-10-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SE454225B (sv) | Fotovoltiskt don samt anvendning av donet | |
KR860002031B1 (ko) | 광응답 비정질 합금을 최적화하는 방법 및 디바이스 | |
JP2951146B2 (ja) | 光起電力デバイス | |
US4471155A (en) | Narrow band gap photovoltaic devices with enhanced open circuit voltage | |
SE457125B (sv) | Fotocellsdon och saett att framstaella detsamma | |
EP0559141A2 (en) | Photovoltaic device | |
JP2003017724A (ja) | 光起電力素子 | |
JP2006080557A (ja) | 高水素希釈低温プラズマ蒸着によって製造されるアモルファスシリコン系素子の向上せしめられた安定化特性 | |
WO2005011002A1 (ja) | シリコン系薄膜太陽電池 | |
JPH04267568A (ja) | 光起電力素子 | |
US4398054A (en) | Compensated amorphous silicon solar cell incorporating an insulating layer | |
KR890004497B1 (ko) | 다중 셀의 감광성 비정질 합금 및 소자 | |
CA1245330A (en) | Back reflector system and devices utilizing same | |
JP2918345B2 (ja) | 光起電力素子 | |
JP3078937B2 (ja) | 太陽電池とその製造方法 | |
JP2757896B2 (ja) | 光起電力装置 | |
JPH04266067A (ja) | 光起電力素子 | |
JPH0513790A (ja) | 光起電力素子 | |
JP2784821B2 (ja) | 光起電力素子 | |
JPH06128748A (ja) | マイクロ波プラズマcvd法による堆積膜形成方法及び堆積膜作製装置 | |
JP3046644B2 (ja) | 光起電力素子の製造方法 | |
Mahabaduge | Influence of a front buffer layer on the performance of flexible Cadmium sulfide/Cadmium telluride solar cells | |
JP2011181852A (ja) | 薄膜光電変換装置と薄膜光電変換装置の製造方法 | |
JPS62115785A (ja) | 半導体装置 | |
Guha | SERI (Solar Energy Research Institute) photovoltaic subcontract reports: 1989 abstracts and document control information, March 1, 1987--February 29, 1988 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |
Ref document number: 8301051-2 Effective date: 19930912 Format of ref document f/p: F |