SE447275B - Surt galvaniskt kopparbad samt anvendning av detsamma for utfellning av glensande kopparskikt - Google Patents
Surt galvaniskt kopparbad samt anvendning av detsamma for utfellning av glensande kopparskiktInfo
- Publication number
- SE447275B SE447275B SE7810754A SE7810754A SE447275B SE 447275 B SE447275 B SE 447275B SE 7810754 A SE7810754 A SE 7810754A SE 7810754 A SE7810754 A SE 7810754A SE 447275 B SE447275 B SE 447275B
- Authority
- SE
- Sweden
- Prior art keywords
- acid
- alkali
- copper
- ester
- component
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Lubricants (AREA)
- Detergent Compositions (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2746938A DE2746938C2 (de) | 1977-10-17 | 1977-10-17 | Wäßriges saures Bad zur galvanischen Abscheidung von glänzenden und rißfreien Kupferüberzügen und Verwendung dieses Bades |
Publications (2)
Publication Number | Publication Date |
---|---|
SE7810754L SE7810754L (sv) | 1979-04-18 |
SE447275B true SE447275B (sv) | 1986-11-03 |
Family
ID=6021780
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE7810754A SE447275B (sv) | 1977-10-17 | 1978-10-16 | Surt galvaniskt kopparbad samt anvendning av detsamma for utfellning av glensande kopparskikt |
Country Status (8)
Country | Link |
---|---|
US (1) | US4181582A (zh) |
JP (1) | JPS59596B2 (zh) |
CH (1) | CH642686A5 (zh) |
DE (1) | DE2746938C2 (zh) |
FR (1) | FR2406009A1 (zh) |
GB (1) | GB2009238B (zh) |
IT (1) | IT1099997B (zh) |
SE (1) | SE447275B (zh) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3012168A1 (de) * | 1980-03-27 | 1981-10-01 | Schering Ag Berlin Und Bergkamen, 1000 Berlin | Verfahren zur galvanischen abscheidung von kupferniederschlaegen |
US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
US4490220A (en) * | 1982-09-30 | 1984-12-25 | Learonal, Inc. | Electrolytic copper plating solutions |
JPS59501829A (ja) * | 1982-09-30 | 1984-11-01 | リ−ロ−ナル インコ−ポレ−テツド | 電気銅メッキ液 |
DE3240643A1 (de) * | 1982-11-04 | 1984-05-30 | LPW-Chemie GmbH, 4040 Neuss | Erzeugung von leiterbahnbeschichtungen und leitenden lochwandbeschichtungen auf bzw. in leiterplatten |
AU559896B2 (en) * | 1983-06-10 | 1987-03-26 | Omi International Corp. | Electrolytic copper depositing processes |
AU554236B2 (en) * | 1983-06-10 | 1986-08-14 | Omi International Corp. | Electrolyte composition and process for electrodepositing copper |
DE3404267A1 (de) * | 1984-02-03 | 1985-08-08 | Schering AG, 1000 Berlin und 4709 Bergkamen | Verfahren zur vollautomatischen steuerung der galvanischen abscheidung von kupferueberzuegen aus sauren kupferbaedern |
US4555315A (en) * | 1984-05-29 | 1985-11-26 | Omi International Corporation | High speed copper electroplating process and bath therefor |
US4673469A (en) * | 1984-06-08 | 1987-06-16 | Mcgean-Rohco, Inc. | Method of plating plastics |
US4786746A (en) * | 1987-09-18 | 1988-11-22 | Pennsylvania Research Corporation | Copper electroplating solutions and methods of making and using them |
US4948474A (en) * | 1987-09-18 | 1990-08-14 | Pennsylvania Research Corporation | Copper electroplating solutions and methods |
DE3836521C2 (de) * | 1988-10-24 | 1995-04-13 | Atotech Deutschland Gmbh | Wäßriges saures Bad zur galvanischen Abscheidung von glänzenden und rißfreien Kupferüberzügen und Verwendung des Bades |
US4969979A (en) * | 1989-05-08 | 1990-11-13 | International Business Machines Corporation | Direct electroplating of through holes |
EP0785297B1 (de) | 1990-03-19 | 2000-01-05 | ATOTECH Deutschland GmbH | Wässriges, saures Bad zur galvanischen Abscheidung von glänzenden und rissfreien Kupferüberzügen und Verwendung dieses Bades |
DE4032864A1 (de) * | 1990-10-13 | 1992-04-16 | Schering Ag | Saures bad zur galvanischen abscheidung von kupferueberzuegen und verfahren unter verwendung dieser kombination |
DE4126502C1 (zh) * | 1991-08-07 | 1993-02-11 | Schering Ag Berlin Und Bergkamen, 1000 Berlin, De | |
US5733429A (en) * | 1996-09-10 | 1998-03-31 | Enthone-Omi, Inc. | Polyacrylic acid additives for copper electrorefining and electrowinning |
US6024857A (en) * | 1997-10-08 | 2000-02-15 | Novellus Systems, Inc. | Electroplating additive for filling sub-micron features |
DE19758121C2 (de) * | 1997-12-17 | 2000-04-06 | Atotech Deutschland Gmbh | Wäßriges Bad und Verfahren zum elektrolytischen Abscheiden von Kupferschichten |
JP4793530B2 (ja) * | 2001-07-02 | 2011-10-12 | 上村工業株式会社 | 硫酸銅めっき浴 |
KR100389061B1 (ko) * | 2002-11-14 | 2003-06-25 | 일진소재산업주식회사 | 전해 동박 제조용 전해액 및 이를 이용한 전해 동박 제조방법 |
DE10337669B4 (de) * | 2003-08-08 | 2006-04-27 | Atotech Deutschland Gmbh | Wässrige, saure Lösung und Verfahren zum galvanischen Abscheiden von Kupferüberzügen sowie Verwendung der Lösung |
DE102005011708B3 (de) | 2005-03-11 | 2007-03-01 | Atotech Deutschland Gmbh | Polyvinylammoniumverbindung und Verfahren zu deren Herstellung sowie diese Verbindung enthaltende saure Lösung und Verfahren zum elektrolytischen Abscheiden eines Kupferniederschlages |
EP2568063A1 (en) * | 2011-09-09 | 2013-03-13 | Rohm and Haas Electronic Materials LLC | Low internal stress copper electroplating method |
EP3288990B1 (en) | 2015-04-28 | 2022-09-28 | Rohm and Haas Electronic Materials LLC | Reaction products of bisanhydrids and diamines as additives for electroplating baths |
CN107447237B (zh) * | 2016-05-30 | 2021-04-20 | 史莱福灵有限公司 | 具有降低的接触噪声的滑环 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2798040A (en) * | 1955-09-15 | 1957-07-02 | Dow Chemical Co | Electrowinning of metals |
US2888390A (en) * | 1956-11-08 | 1959-05-26 | Anaconda Co | Electrolytic refining of copper |
US2954331A (en) * | 1958-08-14 | 1960-09-27 | Dayton Bright Copper Company | Bright copper plating bath |
US3287236A (en) * | 1964-02-14 | 1966-11-22 | Langbein Pfanhausen Werke A G | Electrodeposition of copper and solutions therefor |
SE322956B (zh) * | 1966-08-20 | 1970-04-20 | Schering Ag | |
US3804729A (en) * | 1972-06-19 | 1974-04-16 | M & T Chemicals Inc | Electrolyte and process for electro-depositing copper |
JPS5330279B2 (zh) * | 1972-07-19 | 1978-08-25 | ||
JPS4931406A (zh) * | 1972-07-20 | 1974-03-20 |
-
1977
- 1977-10-17 DE DE2746938A patent/DE2746938C2/de not_active Expired
-
1978
- 1978-10-02 US US05/947,746 patent/US4181582A/en not_active Expired - Lifetime
- 1978-10-13 CH CH1066578A patent/CH642686A5/de not_active IP Right Cessation
- 1978-10-16 FR FR7829381A patent/FR2406009A1/fr active Granted
- 1978-10-16 SE SE7810754A patent/SE447275B/sv not_active IP Right Cessation
- 1978-10-16 JP JP53126287A patent/JPS59596B2/ja not_active Expired
- 1978-10-16 GB GB7840680A patent/GB2009238B/en not_active Expired
- 1978-10-17 IT IT28812/78A patent/IT1099997B/it active
Also Published As
Publication number | Publication date |
---|---|
GB2009238A (en) | 1979-06-13 |
FR2406009A1 (fr) | 1979-05-11 |
DE2746938C2 (de) | 1987-04-09 |
JPS5464025A (en) | 1979-05-23 |
JPS59596B2 (ja) | 1984-01-07 |
FR2406009B1 (zh) | 1982-06-11 |
IT1099997B (it) | 1985-09-28 |
US4181582A (en) | 1980-01-01 |
CH642686A5 (de) | 1984-04-30 |
DE2746938A1 (de) | 1979-04-19 |
IT7828812A0 (it) | 1978-10-17 |
GB2009238B (en) | 1982-05-26 |
SE7810754L (sv) | 1979-04-18 |
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