PL2504469T3 - Sposoby polerowania elektrolitycznego - Google Patents

Sposoby polerowania elektrolitycznego

Info

Publication number
PL2504469T3
PL2504469T3 PL10832335T PL10832335T PL2504469T3 PL 2504469 T3 PL2504469 T3 PL 2504469T3 PL 10832335 T PL10832335 T PL 10832335T PL 10832335 T PL10832335 T PL 10832335T PL 2504469 T3 PL2504469 T3 PL 2504469T3
Authority
PL
Poland
Prior art keywords
electropolishing methods
electropolishing
methods
Prior art date
Application number
PL10832335T
Other languages
English (en)
Inventor
James L. Clasquin
Thomas J. Christensen
Original Assignee
Metcon, Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metcon, Llc filed Critical Metcon, Llc
Publication of PL2504469T3 publication Critical patent/PL2504469T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/04—Etching of light metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/26—Acidic compositions for etching refractory metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
    • C25F1/02—Pickling; Descaling
    • C25F1/04—Pickling; Descaling in solution
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/08—Etching of refractory metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/22—Polishing of heavy metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/22—Polishing of heavy metals
    • C25F3/26—Polishing of heavy metals of refractory metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • ing And Chemical Polishing (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
PL10832335T 2009-11-23 2010-11-22 Sposoby polerowania elektrolitycznego PL2504469T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US26360609P 2009-11-23 2009-11-23
EP10832335.3A EP2504469B1 (en) 2009-11-23 2010-11-22 Electropolishing methods
PCT/US2010/057672 WO2011063353A2 (en) 2009-11-23 2010-11-22 Electrolyte solution and electropolishing methods

Publications (1)

Publication Number Publication Date
PL2504469T3 true PL2504469T3 (pl) 2018-12-31

Family

ID=44060399

Family Applications (1)

Application Number Title Priority Date Filing Date
PL10832335T PL2504469T3 (pl) 2009-11-23 2010-11-22 Sposoby polerowania elektrolitycznego

Country Status (17)

Country Link
US (2) US8357287B2 (pl)
EP (1) EP2504469B1 (pl)
JP (2) JP5973351B2 (pl)
KR (1) KR101719606B1 (pl)
CN (2) CN105420805B (pl)
AU (1) AU2010321725B2 (pl)
BR (1) BR112012012250B8 (pl)
CA (1) CA2781613C (pl)
DK (1) DK2504469T3 (pl)
EA (2) EA021898B1 (pl)
ES (1) ES2690200T3 (pl)
MX (1) MX2012005909A (pl)
PL (1) PL2504469T3 (pl)
SI (1) SI2504469T1 (pl)
TR (1) TR201815028T4 (pl)
UA (1) UA109537C2 (pl)
WO (1) WO2011063353A2 (pl)

Families Citing this family (19)

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US8580103B2 (en) 2010-11-22 2013-11-12 Metcon, Llc Electrolyte solution and electrochemical surface modification methods
US9322109B2 (en) 2013-08-01 2016-04-26 Seagate Technology Llc Electro-chemically machining with a motor part including an electrode
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CN104028862B (zh) * 2014-05-06 2017-02-22 张家港华宝机械制造有限公司 一种钛合金细长轴的电解加工方法及加工设备
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US11447887B2 (en) 2020-12-10 2022-09-20 Saudi Arabian Oil Company Surface smoothing of copper by electropolishing
US11787759B2 (en) 2021-08-12 2023-10-17 Saudi Arabian Oil Company Dimethyl ether production via dry reforming and dimethyl ether synthesis in a vessel
US11578016B1 (en) 2021-08-12 2023-02-14 Saudi Arabian Oil Company Olefin production via dry reforming and olefin synthesis in a vessel
US11718575B2 (en) 2021-08-12 2023-08-08 Saudi Arabian Oil Company Methanol production via dry reforming and methanol synthesis in a vessel
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Also Published As

Publication number Publication date
DK2504469T3 (en) 2018-10-08
JP2016074986A (ja) 2016-05-12
CN105420805A (zh) 2016-03-23
EP2504469A2 (en) 2012-10-03
MX2012005909A (es) 2012-11-12
US20120267254A1 (en) 2012-10-25
BR112012012250B8 (pt) 2022-10-18
AU2010321725A1 (en) 2012-06-14
JP2013511624A (ja) 2013-04-04
EP2504469B1 (en) 2018-07-11
EP2504469A4 (en) 2016-06-29
BR112012012250A2 (pt) 2020-06-23
CN102686786A (zh) 2012-09-19
CA2781613C (en) 2017-11-14
US8357287B2 (en) 2013-01-22
TR201815028T4 (tr) 2018-11-21
CN102686786B (zh) 2016-01-06
CN105420805B (zh) 2018-10-23
KR20120124395A (ko) 2012-11-13
KR101719606B1 (ko) 2017-03-24
EA021898B1 (ru) 2015-09-30
BR112012012250B1 (pt) 2021-01-26
ES2690200T3 (es) 2018-11-19
CA2781613A1 (en) 2011-05-26
SI2504469T1 (sl) 2018-11-30
EA201290385A1 (ru) 2013-02-28
WO2011063353A2 (en) 2011-05-26
US20110120883A1 (en) 2011-05-26
JP5973351B2 (ja) 2016-08-23
UA109537C2 (uk) 2015-09-10
AU2010321725B2 (en) 2015-11-05
WO2011063353A3 (en) 2011-11-24
EA201500017A1 (ru) 2015-07-30

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