NO20020117L - Polykrystallinsk silikon, fremgangsmåte og anordning for fremstilling derav - Google Patents

Polykrystallinsk silikon, fremgangsmåte og anordning for fremstilling derav

Info

Publication number
NO20020117L
NO20020117L NO20020117A NO20020117A NO20020117L NO 20020117 L NO20020117 L NO 20020117L NO 20020117 A NO20020117 A NO 20020117A NO 20020117 A NO20020117 A NO 20020117A NO 20020117 L NO20020117 L NO 20020117L
Authority
NO
Norway
Prior art keywords
making
polycrystalline silicone
polycrystalline
silicone
Prior art date
Application number
NO20020117A
Other languages
English (en)
Other versions
NO333347B1 (no
NO20020117D0 (no
Inventor
Satoru Wakamatsu
Hiroyuki Oda
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of NO20020117D0 publication Critical patent/NO20020117D0/no
Publication of NO20020117L publication Critical patent/NO20020117L/no
Publication of NO333347B1 publication Critical patent/NO333347B1/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J10/00—Chemical processes in general for reacting liquid with gaseous media other than in the presence of solid particles, or apparatus specially adapted therefor
    • B01J10/005—Chemical processes in general for reacting liquid with gaseous media other than in the presence of solid particles, or apparatus specially adapted therefor carried out at high temperatures in the presence of a molten material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
    • B01J2219/0009—Coils
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
    • B01J2219/00094—Jackets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00159—Controlling the temperature controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/901—Levitation, reduced gravity, microgravity, space
    • Y10S117/902—Specified orientation, shape, crystallography, or size of seed or substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1016—Apparatus with means for treating single-crystal [e.g., heat treating]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/102—Apparatus for forming a platelet shape or a small diameter, elongate, generally cylindrical shape [e.g., whisker, fiber, needle, filament]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
NO20020117A 2000-05-11 2002-01-10 Oppskummet polykrystallinsk silisium, knust produkt derav og fremgangsmate for fremstilling derav NO333347B1 (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000139023 2000-05-11
PCT/JP2001/003865 WO2001085613A1 (fr) 2000-05-11 2001-05-09 Silicium polycristallin et procede et appareil de production correspondants

Publications (3)

Publication Number Publication Date
NO20020117D0 NO20020117D0 (no) 2002-01-10
NO20020117L true NO20020117L (no) 2002-03-06
NO333347B1 NO333347B1 (no) 2013-05-13

Family

ID=18646543

Family Applications (2)

Application Number Title Priority Date Filing Date
NO20020117A NO333347B1 (no) 2000-05-11 2002-01-10 Oppskummet polykrystallinsk silisium, knust produkt derav og fremgangsmate for fremstilling derav
NO20120619A NO20120619L (no) 2000-05-11 2012-05-25 Polykrastallinsk silisium, anordning for fremstilling derav

Family Applications After (1)

Application Number Title Priority Date Filing Date
NO20120619A NO20120619L (no) 2000-05-11 2012-05-25 Polykrastallinsk silisium, anordning for fremstilling derav

Country Status (10)

Country Link
US (1) US6861144B2 (no)
EP (2) EP1285880B1 (no)
KR (1) KR100692444B1 (no)
CN (2) CN1224574C (no)
AU (1) AU770276C (no)
CA (1) CA2377892C (no)
DE (2) DE60142808D1 (no)
ES (2) ES2350591T3 (no)
NO (2) NO333347B1 (no)
WO (1) WO2001085613A1 (no)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003106338A1 (ja) * 2002-06-18 2003-12-24 株式会社トクヤマ シリコン製造用反応装置
NO20033207D0 (no) * 2002-07-31 2003-07-15 Per Kristian Egeberg Fremgangsmåte og reaktor for fremstilling av höyrent silisium, samt anvendelse av fremgangsmåten og reaktoren ved fremstilling av höyrentsilisium fra uraffinert silisium
JP5291282B2 (ja) * 2003-08-13 2013-09-18 株式会社トクヤマ 管型反応容器および該反応容器を用いたシリコンの製造方法
WO2005019106A1 (ja) 2003-08-22 2005-03-03 Tokuyama Corporation シリコン製造装置
EP1783098B1 (en) * 2004-05-21 2011-09-07 Tokuyama Corporation Cooled lump from molten silicon and process for producing the same
JP4545505B2 (ja) * 2004-07-22 2010-09-15 株式会社トクヤマ シリコンの製造方法
WO2006016626A1 (ja) * 2004-08-11 2006-02-16 Tokuyama Corporation シリコン製造装置
US7727483B2 (en) * 2004-08-19 2010-06-01 Tokuyama Corporation Reactor for chlorosilane compound
EP1798199B1 (en) * 2004-08-19 2013-10-09 Tokuyama Corporation Reactor for chlorosilane compound
US20090139446A1 (en) * 2004-11-30 2009-06-04 Space Energy Corporation Process for producing polycrystalline silicon ingot
JP4276627B2 (ja) 2005-01-12 2009-06-10 ソルボサーマル結晶成長技術研究組合 単結晶育成用圧力容器およびその製造方法
DE102006050901A1 (de) * 2005-11-17 2007-05-31 Solarworld Industries Deutschland Gmbh Verfahren zum Herstellen eines Halbleiterkörpers und zum Herstellen einer Halbleitervorrichtung
US9683286B2 (en) * 2006-04-28 2017-06-20 Gtat Corporation Increased polysilicon deposition in a CVD reactor
KR100768147B1 (ko) * 2006-05-11 2007-10-18 한국화학연구원 혼합된 코어수단을 이용한 다결정 실리콘 봉의 제조방법과그 제조장치
KR100783667B1 (ko) * 2006-08-10 2007-12-07 한국화학연구원 입자형 다결정 실리콘의 제조방법 및 제조장치
JP5205910B2 (ja) * 2006-10-31 2013-06-05 三菱マテリアル株式会社 トリクロロシラン製造装置
JP2010510674A (ja) 2006-11-15 2010-04-02 エナジーツー・インコーポレイテッド 電気２重層キャパシタ装置
WO2008134568A2 (en) * 2007-04-25 2008-11-06 Kagan Ceran Deposition of high-purity silicon via high-surface area gas-solid or gas-liquid interfaces and recovery via liqued phase
DE102007035757A1 (de) * 2007-07-27 2009-01-29 Joint Solar Silicon Gmbh & Co. Kg Verfahren und Reaktor zur Herstellung von Silizium
US20100290960A1 (en) * 2007-12-28 2010-11-18 Hiroo Noumi Apparatus for producing silicon
DE102008000052A1 (de) * 2008-01-14 2009-07-16 Wacker Chemie Ag Verfahren zur Abscheidung von polykristallinem Silicium
CN101565852B (zh) * 2008-04-25 2011-10-12 比亚迪股份有限公司 晶体连续生产设备及使用该设备连续生产多晶硅的方法
US8844513B2 (en) * 2008-07-07 2014-09-30 John Stock LaMunyon, III Apparatus, system and method for heating a ventilation system
DE102008036143A1 (de) 2008-08-01 2010-02-04 Berlinsolar Gmbh Verfahren zum Entfernen von nichtmetallischen Verunreinigungen aus metallurgischem Silicium
JP5334490B2 (ja) * 2008-08-06 2013-11-06 株式会社トクヤマ シリコン製造装置
CN103787336B (zh) 2008-09-16 2016-09-14 储晞 生产高纯颗粒硅的方法
KR101527516B1 (ko) * 2008-12-16 2015-06-09 삼성전자주식회사 실리콘 성장방법 및 이를 이용한 태양전지 제조방법
EP2448748A4 (en) 2009-07-01 2016-04-06 Basf Se ULTRA-PUR SYNTHETIC CARBON MATERIALS
DE102009035041B3 (de) * 2009-07-28 2011-01-05 Sunicon Ag Anlage zur Herstellung von Silizium-Granulat
CN101837977B (zh) * 2010-03-12 2013-02-13 江苏中能硅业科技发展有限公司 硅单质的生产方法及生产设备
CN103261090A (zh) 2010-09-30 2013-08-21 艾纳G2技术公司 储能颗粒的增强式装填
US20120262127A1 (en) 2011-04-15 2012-10-18 Energ2 Technologies, Inc. Flow ultracapacitor
WO2012167117A2 (en) 2011-06-03 2012-12-06 Energ2 Technologies, Inc. Carbon-lead blends for use in hybrid energy storage devices
WO2013120011A1 (en) 2012-02-09 2013-08-15 Energ2 Technologies, Inc. Preparation of polymeric resins and carbon materials
WO2014143213A1 (en) 2013-03-14 2014-09-18 Energ2 Technologies, Inc. Composite carbon materials comprising lithium alloying electrochemical modifiers
US10195583B2 (en) 2013-11-05 2019-02-05 Group 14 Technologies, Inc. Carbon-based compositions with highly efficient volumetric gas sorption
JP6665121B2 (ja) 2014-03-14 2020-03-13 グループ１４・テクノロジーズ・インコーポレイテッドＧｒｏｕｐ１４ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． 無溶媒中におけるゾル−ゲル重合のための新規方法、及びゾル−ゲル重合由来の可変炭素構造の作製
KR101821006B1 (ko) * 2014-05-13 2018-01-22 주식회사 엘지화학 수평형 반응기를 이용한 폴리실리콘 제조 장치 및 제조 방법
US20190097222A1 (en) 2015-08-14 2019-03-28 Energ2 Technologies, Inc. Composites of porous nano-featured silicon materials and carbon materials
DE102015215858B4 (de) * 2015-08-20 2019-01-24 Siltronic Ag Verfahren zur Wärmebehandlung von Granulat aus Silizium, Granulat aus Silizium und Verfahren zur Herstellung eines Einkristalls aus Silizium
KR102637617B1 (ko) 2015-08-28 2024-02-19 그룹14 테크놀로지스, 인코포레이티드 극도로 내구성이 우수한 리튬 인터칼레이션을 나타내는 신규 물질 및 그의 제조 방법
WO2017183487A1 (ja) 2016-04-21 2017-10-26 株式会社トクヤマ 金属粉末の製造方法
US20180208472A1 (en) * 2017-01-26 2018-07-26 Rec Silicon Inc Control of silicon oxide off-gas to prevent fouling of granular silicon annealing system
US10407310B2 (en) 2017-01-26 2019-09-10 Rec Silicon Inc System for reducing agglomeration during annealing of flowable, finely divided solids
KR20230128140A (ko) 2017-03-09 2023-09-01 그룹14 테크놀로지스, 인코포레이티드 다공성 스캐폴드 재료 상의 실리콘 함유 전구체의 분해
CN107881558B (zh) * 2017-11-08 2023-08-22 广东先导微电子科技有限公司 砷化镓多晶合成装置
US11174167B1 (en) 2020-08-18 2021-11-16 Group14 Technologies, Inc. Silicon carbon composites comprising ultra low Z
US11335903B2 (en) 2020-08-18 2022-05-17 Group14 Technologies, Inc. Highly efficient manufacturing of silicon-carbon composites materials comprising ultra low z
US11639292B2 (en) 2020-08-18 2023-05-02 Group14 Technologies, Inc. Particulate composite materials
CN114455591B (zh) * 2022-01-18 2023-08-18 山西宏晟利隆科技有限公司 一种工业制造二氧化硅设备
CN114405394B (zh) * 2022-02-14 2023-04-07 南京博纳能源环保科技有限公司 一种熔融硅出料的造粒装置及其造粒方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7508684A (nl) 1974-07-29 1976-02-02 Motorola Inc Werkwijze en inrichting voor de bereiding van silicium.
JPS52133085A (en) 1976-04-30 1977-11-08 Mitsubishi Metal Corp Production of single silicon crystal of high purity
US4176166A (en) * 1977-05-25 1979-11-27 John S. Pennish Process for producing liquid silicon
JPS6015565B2 (ja) 1978-03-20 1985-04-20 三菱マテリアル株式会社 高純度シリコン多結晶棒の連続製造装置
JPS5663813A (en) 1979-10-22 1981-05-30 Niiru Kaaruman Jiyusuteisu Liquid silicon manufacture and apparatus therefor
JPS57135708A (en) * 1981-02-12 1982-08-21 Shin Etsu Chem Co Ltd Manufacturing of high purity silicon granule
JPS57170510A (en) * 1981-04-15 1982-10-20 Hitachi Ltd Method of ion implantation
JPS59501109A (ja) 1982-06-22 1984-06-28 エシルコ−ポレ−シヨン ソ−ラ−グレ−ドの珪素を製造するための装置と方法
US4737348A (en) 1982-06-22 1988-04-12 Harry Levin Apparatus for making molten silicon
DE3236276A1 (de) * 1982-09-30 1984-04-05 Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen Neuer werkstoff aus silicium und verfahren zu seiner herstellung
US4710260A (en) 1982-12-22 1987-12-01 Texas Instruments Incorporated Deposition of silicon at temperatures above its melting point
US4547258A (en) 1982-12-22 1985-10-15 Texas Instruments Incorporated Deposition of silicon at temperatures above its melting point
JPS59121109A (ja) 1982-12-24 1984-07-13 Denki Kagaku Kogyo Kk 高純度シリコンの製造方法
JPS6077115A (ja) * 1983-09-30 1985-05-01 Sumitomo Metal Ind Ltd 高純度シリコンの製造方法およびその装置
JPS627619A (ja) 1985-07-03 1987-01-14 Mitsubishi Chem Ind Ltd ケイ素の製造方法及び装置
US4994107A (en) 1986-07-09 1991-02-19 California Institute Of Technology Aerosol reactor production of uniform submicron powders
US4829019A (en) * 1987-05-12 1989-05-09 Texas Instruments Incorporated Method for increasing source/drain to channel stop breakdown and decrease P+/N+ encroachment
JPH0230611A (ja) * 1988-07-21 1990-02-01 Nkk Corp 多結晶シリコンの製造方法及び装置
WO1993009953A1 (en) * 1991-11-12 1993-05-27 Canon Kabushiki Kaisha Polycrystalline silicon-based base plate for liquid jet recording head, its manufacturing method, liquid jet recording head using the base plate, and liquid jet recording apparatus
US5478396A (en) * 1992-09-28 1995-12-26 Advanced Silicon Materials, Inc. Production of high-purity polycrystalline silicon rod for semiconductor applications
US5382412A (en) * 1992-10-16 1995-01-17 Korea Research Institute Of Chemical Technology Fluidized bed reactor heated by microwaves
JP3231244B2 (ja) * 1996-07-22 2001-11-19 仗祐 中田 無機材料製の球状体の製造方法及びその製造装置
CN1092602C (zh) * 1996-10-14 2002-10-16 川崎制铁株式会社 多晶硅的制造方法和装置
JPH10273310A (ja) * 1997-03-28 1998-10-13 Mitsubishi Materials Corp 石英ルツボに融着した残留多結晶シリコンの回収方法と装置
JPH11314996A (ja) * 1998-05-08 1999-11-16 Digital Wave:Kk 結晶の製造方法及び製造装置
JP4003197B2 (ja) * 1998-08-04 2007-11-07 シャープ株式会社 多結晶シリコン塊の製造装置および製造方法
US6350312B1 (en) * 1999-03-15 2002-02-26 Memc Electronic Materials, Inc. Strontium doping of molten silicon for use in crystal growing process

Also Published As

Publication number Publication date
CN1224574C (zh) 2005-10-26
AU770276C (en) 2004-09-23
CA2377892A1 (en) 2001-11-15
DE60124246D1 (de) 2006-12-14
NO333347B1 (no) 2013-05-13
KR100692444B1 (ko) 2007-03-09
KR20020026526A (ko) 2002-04-10
ES2274884T3 (es) 2007-06-01
NO20120619L (no) 2002-03-06
CA2377892C (en) 2009-02-03
NO20020117D0 (no) 2002-01-10
DE60142808D1 (de) 2010-09-23
ES2350591T3 (es) 2011-01-25
WO2001085613A1 (fr) 2001-11-15
EP1285880B1 (en) 2006-11-02
EP1285880A4 (en) 2004-05-26
US20020104474A1 (en) 2002-08-08
EP1719736A1 (en) 2006-11-08
CN100406378C (zh) 2008-07-30
AU770276B2 (en) 2004-02-19
DE60124246T2 (de) 2007-05-31
AU5667001A (en) 2001-11-20
US6861144B2 (en) 2005-03-01
CN1699161A (zh) 2005-11-23
EP1719736B1 (en) 2010-08-11
CN1372530A (zh) 2002-10-02
EP1285880A1 (en) 2003-02-26

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