NL194311C - Kleurfilter, alsmede werkwijze voor het vervaardigen daarvan. - Google Patents

Kleurfilter, alsmede werkwijze voor het vervaardigen daarvan. Download PDF

Info

Publication number
NL194311C
NL194311C NL9302118A NL9302118A NL194311C NL 194311 C NL194311 C NL 194311C NL 9302118 A NL9302118 A NL 9302118A NL 9302118 A NL9302118 A NL 9302118A NL 194311 C NL194311 C NL 194311C
Authority
NL
Netherlands
Prior art keywords
pattern
resist layer
guideline
color
key
Prior art date
Application number
NL9302118A
Other languages
English (en)
Dutch (nl)
Other versions
NL194311B (nl
NL9302118A (nl
Inventor
Won-Ho Kim
Dong-Uk Choi
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of NL9302118A publication Critical patent/NL9302118A/nl
Publication of NL194311B publication Critical patent/NL194311B/xx
Application granted granted Critical
Publication of NL194311C publication Critical patent/NL194311C/nl

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
NL9302118A 1992-12-14 1993-12-06 Kleurfilter, alsmede werkwijze voor het vervaardigen daarvan. NL194311C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR920024134 1992-12-14
KR1019920024134A KR960003482B1 (ko) 1992-12-14 1992-12-14 액정 표시 장치의 칼라 필터 제조방법

Publications (3)

Publication Number Publication Date
NL9302118A NL9302118A (nl) 1994-07-01
NL194311B NL194311B (nl) 2001-08-01
NL194311C true NL194311C (nl) 2001-12-04

Family

ID=19345414

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9302118A NL194311C (nl) 1992-12-14 1993-12-06 Kleurfilter, alsmede werkwijze voor het vervaardigen daarvan.

Country Status (6)

Country Link
US (2) US5935741A (ko)
JP (1) JPH06294908A (ko)
KR (1) KR960003482B1 (ko)
CN (1) CN1038709C (ko)
DE (1) DE4342123B4 (ko)
NL (1) NL194311C (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR960003482B1 (ko) * 1992-12-14 1996-03-14 삼성전자주식회사 액정 표시 장치의 칼라 필터 제조방법
US5953204A (en) * 1994-12-27 1999-09-14 Asahi Glass Company Ltd. Electric double layer capacitor
JP3422923B2 (ja) * 1998-01-26 2003-07-07 シャープ株式会社 カラーフィルタの製造方法およびアライメントマーク
JP3538073B2 (ja) * 1999-07-29 2004-06-14 Ｎｅｃ液晶テクノロジー株式会社 Ｔｆｔを搭載する基板側に色層を有するアクティブマトリクス型液晶表示装置及びその製造方法
EP1271243A3 (en) * 2001-06-19 2003-10-15 Fuji Photo Film Co., Ltd. Image forming material, color filter master plate, and color filter
KR100483358B1 (ko) * 2001-09-07 2005-04-14 엘지.필립스 엘시디 주식회사 반사투과형 액정표시장치용 어레이기판과 그 제조방법
KR100796486B1 (ko) * 2001-09-28 2008-01-21 엘지.필립스 엘시디 주식회사 액정표시소자의 제조방법
KR100469561B1 (ko) * 2002-12-24 2005-02-02 엘지.필립스 엘시디 주식회사 액정표시장치용 컬러필터 기판 제조 방법
US20050162400A1 (en) * 2004-01-23 2005-07-28 Au Optronics Corporation Position encoded sensing device and a method thereof
US20070048626A1 (en) * 2005-08-30 2007-03-01 Asml Netherlands B.V. Device manufacturing method, mask and device
KR101385141B1 (ko) * 2008-04-21 2014-04-15 삼성디스플레이 주식회사 표시기판 및 이의 제조방법
CN104777664A (zh) * 2015-04-28 2015-07-15 深圳市华星光电技术有限公司 黑色矩阵的制作方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607764B2 (ja) * 1976-04-28 1985-02-27 キヤノン株式会社 走査型光検出装置
US4343878A (en) * 1981-01-02 1982-08-10 Amdahl Corporation System for providing photomask alignment keys in semiconductor integrated circuit processing
DE3305281A1 (de) * 1983-02-16 1984-08-16 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum projektionskopieren von masken auf ein werkstueck
JPS60201628A (ja) * 1984-03-26 1985-10-12 Sharp Corp 半導体集積回路の製造方法
JPS60206136A (ja) * 1984-03-30 1985-10-17 Fujitsu Ltd マスク位置合わせ方法
JPS60233823A (ja) * 1984-05-07 1985-11-20 Hitachi Ltd フレネルゾ−ンタ−ゲツト
DE3534609A1 (de) * 1985-09-27 1987-04-02 Siemens Ag Verfahren zur automatisierten, unter verwendung von justiermarken erfolgender justierung mehrerer masken bei einem projektions-belichtungsverfahren
JPS6279619A (ja) * 1985-10-02 1987-04-13 Oki Electric Ind Co Ltd ウエハアライメントマ−ク及びその形成方法
JPS62108206A (ja) * 1985-11-06 1987-05-19 Canon Inc カラ−フィルタ−の製造方法
JPS6326634A (ja) * 1986-07-18 1988-02-04 Matsushita Electric Ind Co Ltd 液晶表示装置
US4786148A (en) * 1986-12-10 1988-11-22 Canon Kabushiki Kaisha Color filter having different primary color pigment densities, inter alia
US5262257A (en) * 1989-07-13 1993-11-16 Canon Kabushiki Kaisha Mask for lithography
KR920005444B1 (ko) * 1989-12-02 1992-07-04 삼성전자 주식회사 칼라필터 및 그 제조방법
JPH03248414A (ja) * 1990-02-26 1991-11-06 Mitsubishi Electric Corp 選択的な表面反応を利用した微細パターンの形成方法
US5053299A (en) * 1990-05-25 1991-10-01 Eastman Kodak Company Method of making color filter arrays
KR920004861A (ko) * 1990-08-10 1992-03-28 김광호 컬러필터의 제조방법
US5059500A (en) * 1990-10-10 1991-10-22 Polaroid Corporation Process for forming a color filter
JP2752528B2 (ja) * 1991-04-11 1998-05-18 キヤノン株式会社 カラー液晶パネルの製造装置
JP2949391B2 (ja) * 1992-08-04 1999-09-13 日石三菱株式会社 カラーフィルターの製造法
KR960003482B1 (ko) * 1992-12-14 1996-03-14 삼성전자주식회사 액정 표시 장치의 칼라 필터 제조방법

Also Published As

Publication number Publication date
KR940015536A (ko) 1994-07-21
NL194311B (nl) 2001-08-01
US6080515A (en) 2000-06-27
DE4342123B4 (de) 2007-07-05
US5935741A (en) 1999-08-10
JPH06294908A (ja) 1994-10-21
NL9302118A (nl) 1994-07-01
CN1038709C (zh) 1998-06-10
KR960003482B1 (ko) 1996-03-14
DE4342123A1 (de) 1994-06-16
CN1089360A (zh) 1994-07-13

Similar Documents

Publication Publication Date Title
NL194311C (nl) Kleurfilter, alsmede werkwijze voor het vervaardigen daarvan.
US5995191A (en) Method for manufacturing a liquid crystal display element using light-shielding films to form spacers
US4294913A (en) Information carriers, method of forming and copying said carriers
JPS62189468A (ja) ホトマスク，及びそれを用いた投影露光方法、並びにホトマスクの製造方法
US4419425A (en) Method for manufacturing color filter
US4182647A (en) Process of producing stripe filter
KR100334012B1 (ko) 액정디스플레이용컬러필터의제조방법
JP2000028815A (ja) カラーフィルタの製造方法
JPS63159807A (ja) カラ−フイルタの製造方法
JP3987747B2 (ja) フォトマスク、基準基板および露光機ならびにカラーフィルターの製造方法
JP3383053B2 (ja) カラーフィルタ基板の製造方法
JPH02297502A (ja) 液晶カラーフイルタの製造方法
JPH09171106A (ja) カラーフィルターの作製方法
KR930002920B1 (ko) 액정 표시장치용 컬러필터
KR100202233B1 (ko) 컬러필터어레이의 제조방법
JPH01277202A (ja) 透明電極付カラーフィルターの製造方法
JPS63131167A (ja) ホログラム作製方法
JPH05203807A (ja) カラーフィルターの製造方法
JPH0740082B2 (ja) カラーフィルタの製造方法
JPH09159815A (ja) カラーフィルターの製造方法およびカラーフィルター
JPH0327015A (ja) カラー液晶用基板の製造方法
JPH0713682B2 (ja) カラーフィルタの製造方法
JPH08220339A (ja) カラ−フィルタ−、それを使用したカラ−液晶表示装置およびその製造法
JP2717841B2 (ja) パターンの形成方法
JPH08146211A (ja) カラーフィルターの製造方法

Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
V4 Discontinued because of reaching the maximum lifetime of a patent

Effective date: 20131206