NL188795C - Werkwijze voor het vervaardigen van een kwartsglas. - Google Patents
Werkwijze voor het vervaardigen van een kwartsglas.Info
- Publication number
- NL188795C NL188795C NLAANVRAGE8320410,A NL8320410A NL188795C NL 188795 C NL188795 C NL 188795C NL 8320410 A NL8320410 A NL 8320410A NL 188795 C NL188795 C NL 188795C
- Authority
- NL
- Netherlands
- Prior art keywords
- manufacturing
- quartz glass
- quartz
- glass
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/34—Wet processes, e.g. sol-gel process adding silica powder
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/901—Liquid phase reaction process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22819882A JPS59116135A (ja) | 1982-12-23 | 1982-12-23 | 石英ガラスの製造方法 |
JP22819882 | 1982-12-23 | ||
JP17064383A JPS6065732A (ja) | 1983-09-16 | 1983-09-16 | 石英ガラスの製造方法 |
JP17064383 | 1983-09-16 | ||
JP17064483A JPS6065733A (ja) | 1983-09-16 | 1983-09-16 | 石英ガラスの製造方法 |
JP17064483 | 1983-09-16 | ||
JP23757783A JPS60131833A (ja) | 1983-12-16 | 1983-12-16 | 石英ガラスの製造方法 |
JP23757783 | 1983-12-16 | ||
JP8300450 | 1983-12-22 | ||
PCT/JP1983/000450 WO1984002519A1 (en) | 1982-12-23 | 1983-12-22 | Process for producing quartz glass |
Publications (2)
Publication Number | Publication Date |
---|---|
NL8320410A NL8320410A (nl) | 1984-11-01 |
NL188795C true NL188795C (nl) | 1992-10-01 |
Family
ID=27474331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NLAANVRAGE8320410,A NL188795C (nl) | 1982-12-23 | 1983-12-22 | Werkwijze voor het vervaardigen van een kwartsglas. |
Country Status (8)
Country | Link |
---|---|
US (2) | US4681615A (de) |
EP (1) | EP0131057B1 (de) |
DE (1) | DE3390375T1 (de) |
GB (1) | GB2140408B (de) |
HK (1) | HK69589A (de) |
NL (1) | NL188795C (de) |
SG (1) | SG39588G (de) |
WO (1) | WO1984002519A1 (de) |
Families Citing this family (88)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3390375T1 (de) * | 1982-12-23 | 1985-02-07 | Suwa Seikosha Co. Ltd., Tokio/Tokyo | Verfahren zur Herstellung von Siliciumdioxidglas |
GB2165233B (en) * | 1984-10-04 | 1988-03-09 | Suwa Seikosha Kk | Method of making a tubular silica glass member |
DE3546846C2 (de) * | 1984-10-05 | 1995-01-26 | Suwa Seikosha Kk | Verfahren zur Herstellung von dotiertem Quarzglas |
JPS6191024A (ja) * | 1984-10-05 | 1986-05-09 | Seiko Epson Corp | 円筒状シリカ系ガラスの製造方法 |
DE3535388C2 (de) * | 1984-10-05 | 1995-01-26 | Suwa Seikosha Kk | Verfahren zur Herstellung von dotiertem Quarzglas |
GB2165534B (en) * | 1984-10-05 | 1988-10-19 | Suwa Seikosha Kk | Method of preparing parent material for optical fibres |
NL8403667A (nl) * | 1984-12-03 | 1986-07-01 | Philips Nv | Werkwijze voor de vervaardiging van monolitische glaslichamen. |
US4622056A (en) * | 1985-02-13 | 1986-11-11 | Seiko Epson Corporation | Method of preparing silica glass |
JPH07121813B2 (ja) * | 1985-07-16 | 1995-12-25 | セイコーエプソン株式会社 | 平板状石英ガラスの製造方法 |
DE3537972A1 (de) * | 1985-10-25 | 1987-04-30 | Philips Patentverwaltung | Verfahren zur herstellung von rotationssymmetrischen glaskoerpern |
US4759879A (en) * | 1986-01-28 | 1988-07-26 | The United States Of America As Represented By The United States Department Of Energy | Glass former composition and method for immobilizing nuclear waste using the same |
NZ219745A (en) * | 1986-03-26 | 1990-06-26 | Syntex Inc | Single liquid reagent for analyte binding type assays |
FR2596909B1 (fr) * | 1986-04-08 | 1993-05-07 | Tech Nles Ste Gle | Procede d'immobilisation de dechets nucleaires dans un verre borosilicate |
US4816299A (en) * | 1987-05-20 | 1989-03-28 | Corning Glass Works | Encapsulating compositions containing ultra-pure, fused-silica fillers |
US4961767A (en) * | 1987-05-20 | 1990-10-09 | Corning Incorporated | Method for producing ultra-high purity, optical quality, glass articles |
US4789389A (en) * | 1987-05-20 | 1988-12-06 | Corning Glass Works | Method for producing ultra-high purity, optical quality, glass articles |
DE3869308D1 (de) * | 1987-09-30 | 1992-04-23 | Shinetsu Chemical Co | Verfahren zur herstellung von kieselglas. |
EP0328715B1 (de) * | 1988-02-19 | 1992-08-05 | Tohru Yamamoto | Katalysator für das ein Metallalkoxid verwendendes Sol-Gel-Verfahren und das Oxid verwendende Sol-Gel-Verfahren |
JPH01317155A (ja) * | 1988-03-04 | 1989-12-21 | Mitsubishi Kasei Corp | セラミック成形体の製造法 |
US5215942A (en) * | 1988-08-15 | 1993-06-01 | The Regents Of The University Of California | Diamond-containing ceramic composites and methods of making same |
JPH02124739A (ja) * | 1988-10-31 | 1990-05-14 | Shin Etsu Chem Co Ltd | 合成石英ガラスおよびその製造方法 |
JPH02172830A (ja) * | 1988-12-26 | 1990-07-04 | Hoya Corp | ガラスの製造方法 |
US5207814A (en) * | 1989-02-10 | 1993-05-04 | Enichem S.P.A. | Process for preparing monoliths of aerogels of metal oxides |
IT1230709B (it) * | 1989-02-10 | 1991-10-29 | Enichem Spa | Procedimento per la preparazione di monoliti di aerogel di ossidi di metalli. |
JPH02293333A (ja) * | 1989-04-28 | 1990-12-04 | Hoya Corp | ガラスの製造方法 |
JPH02307830A (ja) * | 1989-05-18 | 1990-12-21 | Chisso Corp | 石英ガラス粉末の製造方法 |
BE1004293A3 (fr) * | 1989-07-20 | 1992-10-27 | Solvay | Procede de fabrication d'un composite d'oxydes metalliques, poudres composites d'oxydes metalliques et materiaux ceramiques. |
JPH0393638A (ja) * | 1989-09-04 | 1991-04-18 | Shin Etsu Chem Co Ltd | 合成石英ガラス粉の製造方法 |
US5011796A (en) * | 1989-10-23 | 1991-04-30 | Martin Marietta Corporation | Sol-gel preparation of polycrystalline strontium barium niobate (SBN) |
US5023208A (en) * | 1989-12-19 | 1991-06-11 | Orion Laboratories, Inc. | Sol-gel process for glass and ceramic articles |
US5063179A (en) * | 1990-03-02 | 1991-11-05 | Cabot Corporation | Process for making non-porous micron-sized high purity silica |
US4999699A (en) * | 1990-03-14 | 1991-03-12 | International Business Machines Corporation | Solder interconnection structure and process for making |
JPH068179B2 (ja) * | 1990-04-12 | 1994-02-02 | 東京工業大学長 | 屈折率分布ガラスの製造方法 |
US5076980A (en) * | 1990-08-01 | 1991-12-31 | Geltech, Inc. | Method of making sol-gel monoliths |
US5221364A (en) * | 1992-02-20 | 1993-06-22 | The United States Of America As Represented By The Secretary Of The Air Force | Lightweight solar cell |
US5250096A (en) * | 1992-04-07 | 1993-10-05 | At&T Bell Laboratories | Sol-gel method of making multicomponent glass |
GB9209967D0 (en) * | 1992-05-08 | 1992-06-24 | S & D Developments Ltd | Ceramic product |
US5260962A (en) * | 1992-05-29 | 1993-11-09 | The United States Of America As Represented By The Secretary Of The Air Force | Compact Lightweight ring laser gyro |
DE19525277A1 (de) * | 1995-07-13 | 1997-01-16 | Forschungszentrum Juelich Gmbh | Si0¶2¶-Körper für das C·4·-Verfahren |
KR100229884B1 (ko) * | 1997-03-10 | 1999-11-15 | 윤종용 | 솔-젤법을 이용한 고순도 실리카 유리의 제조방법 |
KR100229900B1 (ko) * | 1997-03-10 | 1999-11-15 | 윤종용 | 솔-젤법을 이용한 실리카 유리 단일체의 제조방법 |
US5944866A (en) * | 1997-09-26 | 1999-08-31 | Lucent Technologies Inc. | Fabrication including sol-gel processing |
KR100230457B1 (ko) * | 1997-10-02 | 1999-11-15 | 윤종용 | 실리카 글래스 조성물 및 이를 이용한 실리카 글래스 제조방법 |
DE19745045C1 (de) * | 1997-10-11 | 1999-07-15 | Schott Glas | Verfahren zum Herstellen von Sinterglas- oder Sinterglaskeramik-Formkörpern als natursteinähnliche Bau- und Dekorationsmaterialien |
CN1113044C (zh) | 1997-10-29 | 2003-07-02 | 三星电子株式会社 | 石英玻璃组合物 |
IT1306214B1 (it) | 1998-09-09 | 2001-05-30 | Gel Design And Engineering Srl | Processo per la preparazione di film vetrosi spessi di ossido disilicio secondo la tecnica sol-gel e film spessi cosi' ottenuti. |
KR100322132B1 (ko) | 1999-01-29 | 2002-01-29 | 윤종용 | 졸-겔 공정용 실리카 글래스 조성물 |
KR100549423B1 (ko) * | 1999-03-17 | 2006-02-06 | 삼성전자주식회사 | 졸-겔 공정용 실리카 글래스의 제조방법 |
KR100549424B1 (ko) * | 1999-03-17 | 2006-02-06 | 삼성전자주식회사 | 졸-겔 공정용 실리카 글래스 조성물 |
JP3503131B2 (ja) * | 1999-06-03 | 2004-03-02 | サンケン電気株式会社 | 半導体発光装置 |
KR100357638B1 (ko) | 1999-08-31 | 2002-10-25 | 삼성전자 주식회사 | 실리카 솔의 초음파 분산 장치 |
US6383443B1 (en) * | 1999-11-24 | 2002-05-07 | Yazaki Corporation | Sol-gel process for making monolithic alpha-alumina articles having controlled porosity |
US7140201B2 (en) * | 1999-12-28 | 2006-11-28 | M. Watanabe & Co., Ltd. | Method for producing silica particles |
KR100346175B1 (ko) * | 1999-12-30 | 2002-07-26 | 삼성전자 주식회사 | 솔-젤 공법을 이용한 실리카 글래스의 제조 방법 |
KR100330212B1 (ko) * | 2000-01-11 | 2002-03-25 | 윤종용 | 압출에 의한 도핑된 실리카 글래스 제조 방법 |
WO2001053225A1 (en) * | 2000-01-24 | 2001-07-26 | Yazaki Corporation | Sol-gel process for producing synthetic silica glass |
US6620368B1 (en) * | 2000-07-13 | 2003-09-16 | Simax Technologies, Inc. | Sol-gel process for production of oxide-based glass and ceramic articles |
US6679945B2 (en) | 2000-08-21 | 2004-01-20 | Degussa Ag | Pyrogenically prepared silicon dioxide |
US6669892B2 (en) | 2000-12-18 | 2003-12-30 | Rahul Ganguli | Method for preventing warpage of gel plates during sintering |
US20020157418A1 (en) * | 2001-03-19 | 2002-10-31 | Rahul Ganguli | Process for reducing or eliminating bubble defects in sol-gel silica glass |
EP1258456A1 (de) * | 2001-05-18 | 2002-11-20 | Degussa AG | Verfahren zur Herstellung von Quarzglas |
EP1258457A1 (de) * | 2001-05-18 | 2002-11-20 | Degussa AG | Verfahren zur Herstellung von Quarzglas |
US7000885B2 (en) | 2002-02-01 | 2006-02-21 | Simax Technologies, Inc. | Apparatus and method for forming a sol-gel monolith utilizing multiple casting |
US7001568B2 (en) | 2002-02-01 | 2006-02-21 | Simax Technologies, Inc. | Method of removing liquid from pores of a sol-gel monolith |
US20040194511A1 (en) * | 2002-02-01 | 2004-10-07 | Chih-Hsing Cheng | Sol-gel-derived halogen-doped glass |
US6928220B2 (en) | 2002-02-01 | 2005-08-09 | Simax Technologies, Inc. | Sol-gel-derived optical fiber preform and method of manufacture |
US20030147606A1 (en) * | 2002-02-01 | 2003-08-07 | Shiho Wang | Sol-gel-based optical preforms and methods of manufacture |
ITNO20030001A1 (it) * | 2003-01-15 | 2004-07-16 | Novara Technology Srl | Processo sol-gel per la produzione di articoli vetrosi. |
ITNO20030005A1 (it) * | 2003-03-21 | 2004-09-22 | Novara Technology Srl | VETRI DI SiO2 AD ALTA OMOGENEITA'. |
ITNO20030006A1 (it) * | 2003-03-21 | 2004-09-22 | Novara Technology Srl | Articoli a base di ossido di silicio. |
DE10342828A1 (de) * | 2003-09-17 | 2005-04-14 | Degussa Ag | Hochreines, pyrogen hergestelltes Siliciumdioxid |
DE102005032929A1 (de) * | 2004-11-12 | 2006-05-18 | Sms Demag Ag | Herstellung von Rostfreistahl der ferritischen Stahlgruppe AISI 4xx in einem AOD-Konverter |
US20060141486A1 (en) * | 2004-12-29 | 2006-06-29 | Coonan Everett W | Porous substrates and arrays comprising the same |
EP1700824A1 (de) * | 2005-03-09 | 2006-09-13 | Degussa AG | Granulate basierend auf pyrogen hergestelles silicon dioxid, sowie Verfahren zu deren Herstellung und Verwendung dergleichen |
EP1700830A1 (de) | 2005-03-09 | 2006-09-13 | Novara Technology S.R.L. | Prozess für die Herstellung von Monolithen mittels eines Sol-Gel Prozesses |
PT103257B (pt) | 2005-04-05 | 2007-05-31 | Inst Superior Tecnico | Método de produção subcrítica de xerogéis e aerogéis monolíticos híbridos de sílica e látex modificado com grupos alcoxissilano |
US20100003182A1 (en) * | 2006-06-02 | 2010-01-07 | Lorenzo Costa | Pellitized silica |
EP1897860A1 (de) * | 2006-09-07 | 2008-03-12 | Degussa Novara Technology S.p.A. | Sol-Gel Verfahren |
ES2360018T3 (es) * | 2008-08-08 | 2011-05-31 | Orion Tech Anstalt | Procesos de sol-gel para producir artículos monolíticos de sílice vítrea. |
DE102009060768B4 (de) | 2009-12-30 | 2012-02-02 | Thomas Kreuzberger | Verfahren zur Herstellung eines optischen Elements aus einem Gelkörper und Haltevorrichtung für einen Gelkörper |
DE202010018292U1 (de) | 2010-06-02 | 2015-07-14 | Thomas Kreuzberger | Quarzglaskörper und Gelbkörper zur Herstellung eines Quarzglaskörpers |
PT106781A (pt) | 2013-02-15 | 2014-08-18 | Inst Superior Técnico | Aerogéis híbridos flexíveis preparados em condições subcríticas e processo de preparação dos mesmos |
DE102014113482B4 (de) | 2014-09-18 | 2019-01-03 | Bruker Daltonik Gmbh | Ionisierungskammer mit temperierter Gaszufuhr |
PL409679A1 (pl) * | 2014-10-06 | 2016-04-11 | Wrocławskie Centrum Badań Eit + Spółka Z Ograniczoną Odpowiedzialnością | Sposób wytwarzania pianosilikatów z domieszkami o właściwościach magnetycznych oraz pianosilikat wytworzony tym sposobem |
DE102015102858B4 (de) | 2015-02-20 | 2019-04-18 | Iqs Gmbh | Verfahren zur Herstellung eines Licht absorbierenden Quarzglases |
EP3124443A1 (de) | 2015-07-28 | 2017-02-01 | D. Swarovski KG | Kontinuierliches sol-gel verfahren zur herstellung von quarzglas |
EP3281920A1 (de) | 2016-08-12 | 2018-02-14 | D. Swarovski KG | Kontinuierliches sol-gel-verfahren zur herstellung von silicathaltigen gläsern oder glaskeramiken |
EP4103724A1 (de) | 2020-02-14 | 2022-12-21 | Ultragenyx Pharmaceutical Inc. | Gentherapie zur behandlung von cdkl5-mangelerkrankungen |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4159206A (en) * | 1977-03-18 | 1979-06-26 | Rohm And Haas Company | Weatherable, abrasion resistant coating composition, method, and coated articles |
JPS5722130A (en) * | 1980-07-15 | 1982-02-05 | Hitachi Ltd | Production of optical glass |
DE3067197D1 (en) * | 1979-11-21 | 1984-04-26 | Hitachi Ltd | Method for producing optical glass |
JPS5858292B2 (ja) * | 1980-01-21 | 1983-12-24 | 株式会社日立製作所 | シリカガラスの製造方法 |
JPS56125240A (en) * | 1980-03-07 | 1981-10-01 | Natl Inst For Res In Inorg Mater | Preparation of silica glass |
JPS599499B2 (ja) * | 1980-07-15 | 1984-03-02 | 株式会社日立製作所 | 光学ガラスの製造方法 |
GB2075003B (en) * | 1980-04-28 | 1984-01-04 | Hitachi Ltd | Method for producing optical glass |
US4419115A (en) * | 1981-07-31 | 1983-12-06 | Bell Telephone Laboratories, Incorporated | Fabrication of sintered high-silica glasses |
US4426216A (en) * | 1982-01-06 | 1984-01-17 | Hitachi, Ltd. | Process for producing optical glass |
DE3368403D1 (en) * | 1982-10-29 | 1987-01-29 | Dow Corning | Carbon-containing monolithic glasses prepared by a sol-gel process |
US4472510A (en) * | 1982-12-23 | 1984-09-18 | Dow Corning Corporation | Carbon-containing monolithic glasses and ceramics prepared by a sol-gel process |
DE3390375T1 (de) * | 1982-12-23 | 1985-02-07 | Suwa Seikosha Co. Ltd., Tokio/Tokyo | Verfahren zur Herstellung von Siliciumdioxidglas |
-
1983
- 1983-12-22 DE DE19833390375 patent/DE3390375T1/de active Granted
- 1983-12-22 NL NLAANVRAGE8320410,A patent/NL188795C/xx not_active IP Right Cessation
- 1983-12-22 US US06/642,606 patent/US4681615A/en not_active Expired - Lifetime
- 1983-12-22 EP EP84900294A patent/EP0131057B1/de not_active Expired
- 1983-12-22 GB GB08418301A patent/GB2140408B/en not_active Expired
- 1983-12-22 WO PCT/JP1983/000450 patent/WO1984002519A1/ja active IP Right Grant
-
1987
- 1987-01-29 US US07/008,226 patent/US4801318A/en not_active Expired - Lifetime
-
1988
- 1988-06-20 SG SG395/88A patent/SG39588G/en unknown
-
1989
- 1989-08-31 HK HK695/89A patent/HK69589A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE3390375T1 (de) | 1985-02-07 |
EP0131057B1 (de) | 1987-11-04 |
GB2140408B (en) | 1987-03-18 |
DE3390375C2 (de) | 1989-11-30 |
HK69589A (en) | 1989-09-08 |
WO1984002519A1 (en) | 1984-07-05 |
SG39588G (en) | 1989-01-27 |
NL8320410A (nl) | 1984-11-01 |
EP0131057A1 (de) | 1985-01-16 |
GB8418301D0 (en) | 1984-08-22 |
US4801318A (en) | 1989-01-31 |
GB2140408A (en) | 1984-11-28 |
EP0131057A4 (de) | 1985-06-10 |
US4681615A (en) | 1987-07-21 |
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Legal Events
Date | Code | Title | Description |
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V4 | Discontinued because of reaching the maximum lifetime of a patent |
Effective date: 20031222 |