NL1004032A1 - Nieuwe N-vinyllactam derivaten en polymeren daarvan. - Google Patents
Nieuwe N-vinyllactam derivaten en polymeren daarvan.Info
- Publication number
- NL1004032A1 NL1004032A1 NL1004032A NL1004032A NL1004032A1 NL 1004032 A1 NL1004032 A1 NL 1004032A1 NL 1004032 A NL1004032 A NL 1004032A NL 1004032 A NL1004032 A NL 1004032A NL 1004032 A1 NL1004032 A1 NL 1004032A1
- Authority
- NL
- Netherlands
- Prior art keywords
- polymers
- novel
- vinyl lactam
- lactam derivatives
- derivatives
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/18—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
- C07D207/22—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/24—Oxygen or sulfur atoms
- C07D207/26—2-Pyrrolidones
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/18—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
- C07D207/22—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/24—Oxygen or sulfur atoms
- C07D207/26—2-Pyrrolidones
- C07D207/273—2-Pyrrolidones with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to other ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/18—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
- C07D207/22—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/24—Oxygen or sulfur atoms
- C07D207/26—2-Pyrrolidones
- C07D207/273—2-Pyrrolidones with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to other ring carbon atoms
- C07D207/277—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D223/00—Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom
- C07D223/02—Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom not condensed with other rings
- C07D223/06—Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom not condensed with other rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D223/08—Oxygen atoms
- C07D223/10—Oxygen atoms attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
- C08F26/06—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
- C08F26/06—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
- C08F26/10—N-Vinyl-pyrrolidone
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Hydrogenated Pyridines (AREA)
- Pyrrole Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950030063A KR0178475B1 (ko) | 1995-09-14 | 1995-09-14 | 신규한 n-비닐락탐 유도체 및 그의 중합체 |
KR19950030063 | 1995-09-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL1004032A1 true NL1004032A1 (nl) | 1997-03-20 |
NL1004032C2 NL1004032C2 (nl) | 1997-05-21 |
Family
ID=19426831
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1004032A NL1004032C2 (nl) | 1995-09-14 | 1996-09-13 | Nieuwe N-vinyllactam derivaten en polymeren daarvan. |
Country Status (9)
Country | Link |
---|---|
US (2) | US5750680A (nl) |
JP (1) | JP2929526B2 (nl) |
KR (1) | KR0178475B1 (nl) |
CN (1) | CN1152859C (nl) |
DE (1) | DE19637425B4 (nl) |
FR (1) | FR2738820B1 (nl) |
GB (1) | GB2305175B (nl) |
NL (1) | NL1004032C2 (nl) |
TW (1) | TW434460B (nl) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100197673B1 (en) * | 1996-12-20 | 1999-06-15 | Hyundai Electronics Ind | Copolymers containing n-vinyllactam derivatives, preparation methods thereof and photoresists therefrom |
US6124074A (en) * | 1999-03-11 | 2000-09-26 | International Business Machines Corporation | Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives |
US6251560B1 (en) | 2000-05-05 | 2001-06-26 | International Business Machines Corporation | Photoresist compositions with cyclic olefin polymers having lactone moiety |
US6627391B1 (en) | 2000-08-16 | 2003-09-30 | International Business Machines Corporation | Resist compositions containing lactone additives |
US7138218B2 (en) * | 2001-12-18 | 2006-11-21 | Hynix Semiconductor Inc. | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator |
US6756180B2 (en) * | 2002-10-22 | 2004-06-29 | International Business Machines Corporation | Cyclic olefin-based resist compositions having improved image stability |
DE10259815A1 (de) * | 2002-12-19 | 2004-07-01 | Basf Ag | Polymere enthaltend Pyrrolidon-4-carbonsäuregruppen und deren Verwendung |
WO2004099373A2 (en) * | 2003-05-02 | 2004-11-18 | University Of North Carolina At Charlotte | Biocompatible resists |
US7338742B2 (en) * | 2003-10-08 | 2008-03-04 | Hynix Semiconductor Inc. | Photoresist polymer and photoresist composition containing the same |
US7270937B2 (en) * | 2003-10-17 | 2007-09-18 | Hynix Semiconductor Inc. | Over-coating composition for photoresist and process for forming photoresist pattern using the same |
KR100680405B1 (ko) * | 2003-11-19 | 2007-02-08 | 주식회사 하이닉스반도체 | Euv용 포토레지스트 조성물 및 이를 이용한포토레지스트 패턴 형성 방법 |
JP4758679B2 (ja) * | 2005-05-18 | 2011-08-31 | パナソニック株式会社 | レジスト材料及びそれを用いたパターン形成方法 |
US7745339B2 (en) * | 2006-02-24 | 2010-06-29 | Hynix Semiconductor Inc. | Method for forming fine pattern of semiconductor device |
KR100694412B1 (ko) * | 2006-02-24 | 2007-03-12 | 주식회사 하이닉스반도체 | 반도체소자의 미세패턴 형성방법 |
US8313876B2 (en) * | 2006-07-20 | 2012-11-20 | Hynix Semiconductor Inc. | Exposure mask and method for manufacturing semiconductor device using the same |
KR100849800B1 (ko) * | 2006-07-20 | 2008-07-31 | 주식회사 하이닉스반도체 | 노광 마스크 및 이를 이용한 반도체 소자의 제조 방법 |
KR100861173B1 (ko) * | 2006-12-01 | 2008-09-30 | 주식회사 하이닉스반도체 | 액침 노광 공정을 이용한 반도체 소자의 패턴 형성 방법 |
KR20080057562A (ko) * | 2006-12-20 | 2008-06-25 | 주식회사 하이닉스반도체 | 반도체 소자의 미세 패턴 형성 방법 |
US7923200B2 (en) * | 2007-04-09 | 2011-04-12 | Az Electronic Materials Usa Corp. | Composition for coating over a photoresist pattern comprising a lactam |
JP5069494B2 (ja) * | 2007-05-01 | 2012-11-07 | AzエレクトロニックマテリアルズIp株式会社 | 微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法 |
KR100919564B1 (ko) * | 2007-06-29 | 2009-10-01 | 주식회사 하이닉스반도체 | 반도체 소자의 미세 패턴 형성 방법 |
KR100876816B1 (ko) * | 2007-06-29 | 2009-01-07 | 주식회사 하이닉스반도체 | 반도체 소자의 미세 패턴 형성 방법 |
WO2009152276A2 (en) | 2008-06-10 | 2009-12-17 | University Of North Carolina At Charlotte | Photoacid generators and lithographic resists comprising the same |
US7745077B2 (en) * | 2008-06-18 | 2010-06-29 | Az Electronic Materials Usa Corp. | Composition for coating over a photoresist pattern |
KR101037528B1 (ko) | 2008-10-16 | 2011-05-26 | 주식회사 하이닉스반도체 | 반도체 소자의 패턴 형성 방법 |
JP6182864B2 (ja) * | 2012-01-17 | 2017-08-23 | 住友化学株式会社 | レジストパターンの製造方法 |
JP6283477B2 (ja) * | 2012-06-25 | 2018-02-21 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | アミド成分を含むフォトレジスト |
MA50371A (fr) * | 2017-10-10 | 2021-03-31 | Biogen Inc | Procédé de préparation de dérivés spiro |
CN108517219A (zh) * | 2018-06-28 | 2018-09-11 | 深圳市华星光电技术有限公司 | 一种液晶材料、显示面板的制备方法、显示装置 |
CN113835296A (zh) * | 2021-09-28 | 2021-12-24 | 之江实验室 | 一种飞秒激光直写光刻胶组合物 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3666473A (en) * | 1970-10-06 | 1972-05-30 | Ibm | Positive photoresists for projection exposure |
JPS5280022A (en) * | 1975-12-26 | 1977-07-05 | Fuji Photo Film Co Ltd | Light solubilizable composition |
NL8101200A (nl) * | 1981-03-12 | 1982-10-01 | Philips Nv | Werkwijze voor het aanbrengen van een resistmateriaal op een drager en resist-materiaal. |
JPS58174944A (ja) * | 1982-04-07 | 1983-10-14 | Toshiba Corp | パタ−ン形成法 |
US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
JPH04363309A (ja) * | 1991-06-11 | 1992-12-16 | Brother Ind Ltd | 光硬化型組成物 |
DE4124029A1 (de) * | 1991-07-19 | 1993-01-21 | Hoechst Ag | Verfahren zur herstellung von tert.-butyloxycarbonyl-gruppen tragenden organischen verbindungen |
DE4126409A1 (de) * | 1991-08-09 | 1993-02-11 | Hoechst Ag | Strahlungsempfindliches gemisch mit einem polymeren bindemittel mit einheiten aus (alpha)-(beta)-ungesaettigten carbonsaeuren |
JPH06118630A (ja) * | 1992-10-06 | 1994-04-28 | Tokyo Ohka Kogyo Co Ltd | 化学増幅型レジスト用塗布液組成物 |
-
1995
- 1995-09-14 KR KR1019950030063A patent/KR0178475B1/ko active IP Right Grant
-
1996
- 1996-09-12 US US08/713,085 patent/US5750680A/en not_active Expired - Fee Related
- 1996-09-13 GB GB9619234A patent/GB2305175B/en not_active Expired - Fee Related
- 1996-09-13 NL NL1004032A patent/NL1004032C2/nl not_active IP Right Cessation
- 1996-09-13 DE DE19637425A patent/DE19637425B4/de not_active Expired - Fee Related
- 1996-09-14 TW TW085111278A patent/TW434460B/zh not_active IP Right Cessation
- 1996-09-16 CN CNB961199059A patent/CN1152859C/zh not_active Expired - Fee Related
- 1996-09-16 FR FR9611264A patent/FR2738820B1/fr not_active Expired - Fee Related
- 1996-09-17 JP JP8245089A patent/JP2929526B2/ja not_active Expired - Fee Related
-
1998
- 1998-02-19 US US09/026,169 patent/US5955606A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
NL1004032C2 (nl) | 1997-05-21 |
DE19637425A1 (de) | 1997-04-03 |
GB2305175A (en) | 1997-04-02 |
US5955606A (en) | 1999-09-21 |
CN1153775A (zh) | 1997-07-09 |
FR2738820A1 (fr) | 1997-03-21 |
JPH09216867A (ja) | 1997-08-19 |
GB9619234D0 (en) | 1996-10-23 |
JP2929526B2 (ja) | 1999-08-03 |
TW434460B (en) | 2001-05-16 |
FR2738820B1 (fr) | 1998-09-11 |
US5750680A (en) | 1998-05-12 |
DE19637425B4 (de) | 2006-04-13 |
KR0178475B1 (ko) | 1999-03-20 |
GB2305175B (en) | 1999-10-27 |
CN1152859C (zh) | 2004-06-09 |
KR970015572A (ko) | 1997-04-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NL1004032A1 (nl) | Nieuwe N-vinyllactam derivaten en polymeren daarvan. | |
BR9604649B1 (pt) | artigo fotocrÈmico. | |
BR9509569A (pt) | Artigo de segurança óptica | |
FI962997A0 (fi) | Biohajoavia kopolymeerejä ja muovituotteita, jotka käsittävät biohajoavia kopolymeerejä | |
BR9917075B1 (pt) | artigo e artigo fotocrÈmico. | |
BR9917076B1 (pt) | artigo e artigo fotocrÈmico. | |
BR9612278A (pt) | Polímeros de liberação de sujeira com propriedades branqueadoras fluorescentes | |
BR9609812B8 (pt) | Para-herquamidas e marcfortinas antiparasíticas. | |
FR2735357B1 (fr) | Instillateur oculaire double | |
NO973180D0 (no) | Sotmaterialer og polymermaterialer hvor slike inngår | |
DE59609001D1 (de) | Kunststoff-ausgiess-einschweissteil | |
DE69626969D1 (de) | Dezentriertes, nichtkorrigierendes brillenglas | |
DE69720696D1 (de) | Multifokale augenlinse | |
IT1290462B1 (it) | Polimeri idrogenati modificati | |
DE69413790D1 (de) | Antibakterielles polymer, kontaktlinse und kontaktlinsenpflegeprodukt | |
NO20001786L (no) | Firkomponent kopolymerer og den intraokulære linsen fremstilt herav | |
NL1005689A1 (nl) | Copolymeren die N-vinyllactamderivaten bevatten, methoden ter bereiding daarvan en daarvan gemaakte fotoresistmaterialen. | |
DE59800173D1 (de) | Polysiloxan-Polyoxyalkylen-Blockcopolymere | |
DE69736521D1 (de) | Augentropfen | |
ATE190343T1 (de) | Polymermassen | |
DE69624968D1 (de) | Vernetzte Polymere | |
DE59609172D1 (de) | Kippspiegelanordnung | |
DE69631003D1 (de) | Optischer empfänger, tuner und optisches netzwerk | |
DE59602871D1 (de) | Optische sende- und empfangsanordnung | |
GB9622677D0 (en) | Polymer-based integration optical sensors |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1B | A search report has been drawn up | ||
PD2B | A search report has been drawn up | ||
V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20100401 |