MY167435A - Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same - Google Patents

Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same

Info

Publication number
MY167435A
MY167435A MYPI2015000092A MYPI2015000092A MY167435A MY 167435 A MY167435 A MY 167435A MY PI2015000092 A MYPI2015000092 A MY PI2015000092A MY PI2015000092 A MYPI2015000092 A MY PI2015000092A MY 167435 A MY167435 A MY 167435A
Authority
MY
Malaysia
Prior art keywords
same
target material
sputtering target
thin film
recording medium
Prior art date
Application number
MYPI2015000092A
Other languages
English (en)
Inventor
Hiroyuki Hasegawa
Toshiyuki Sawada
Noriaki Matsubara
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of MY167435A publication Critical patent/MY167435A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0433—Nickel- or cobalt-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Thin Magnetic Films (AREA)
MYPI2015000092A 2012-08-14 2013-08-12 Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same MY167435A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012179811A JP6050050B2 (ja) 2012-08-14 2012-08-14 Ｆｅ−Ｃｏ系合金スパッタリングターゲット材およびその製造方法

Publications (1)

Publication Number Publication Date
MY167435A true MY167435A (en) 2018-08-28

Family

ID=50285930

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015000092A MY167435A (en) 2012-08-14 2013-08-12 Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same

Country Status (6)

Country Link
JP (1) JP6050050B2 (ja)
CN (1) CN104508167B (ja)
MY (1) MY167435A (ja)
SG (1) SG11201408794VA (ja)
TW (1) TWI494443B (ja)
WO (1) WO2014027636A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6801168B2 (ja) * 2014-06-27 2020-12-16 三菱マテリアル株式会社 スパッタリングターゲット、光学機能膜、及び、積層配線膜
US10644230B2 (en) 2015-03-04 2020-05-05 Jx Nippon Mining & Metals Corporation Magnetic material sputtering target and method for producing same
WO2016157922A1 (ja) * 2015-03-27 2016-10-06 日立金属株式会社 軟磁性膜および軟磁性膜形成用スパッタリングターゲット
JP6784733B2 (ja) * 2018-08-20 2020-11-11 山陽特殊製鋼株式会社 磁気記録媒体の軟磁性層用Ｃｏ系合金
WO2024128075A1 (ja) * 2022-12-16 2024-06-20 株式会社プロテリアル スパッタリングターゲットおよびその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4331182B2 (ja) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 軟磁性ターゲット材
US20070253103A1 (en) * 2006-04-27 2007-11-01 Heraeus, Inc. Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target
JP4907259B2 (ja) * 2006-08-16 2012-03-28 山陽特殊製鋼株式会社 Ｃｒを添加したＦｅＣｏＢ系ターゲット材
JP2008121071A (ja) * 2006-11-13 2008-05-29 Sanyo Special Steel Co Ltd 軟磁性ＦｅＣｏ系ターゲット材
JP5111835B2 (ja) * 2006-11-17 2013-01-09 山陽特殊製鋼株式会社 （ＣｏＦｅ）ＺｒＮｂ／Ｔａ／Ｈｆ系ターゲット材およびその製造方法
JP5253781B2 (ja) * 2007-09-18 2013-07-31 山陽特殊製鋼株式会社 垂直磁気記録媒体における軟磁性膜層用合金ターゲット材
JP5397755B2 (ja) * 2008-06-17 2014-01-22 日立金属株式会社 軟磁性膜形成用Ｆｅ−Ｃｏ系合金スパッタリングターゲット材
JP5726615B2 (ja) * 2010-11-22 2015-06-03 山陽特殊製鋼株式会社 磁気記録媒体のシード層用合金およびスパッタリングターゲット材
US20150034483A1 (en) * 2012-06-06 2015-02-05 Hitachi Metals, Ltd. Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, AND METHOD OF PRODUCING SAME

Also Published As

Publication number Publication date
WO2014027636A1 (ja) 2014-02-20
JP2014037569A (ja) 2014-02-27
CN104508167B (zh) 2017-08-04
CN104508167A (zh) 2015-04-08
SG11201408794VA (en) 2015-02-27
JP6050050B2 (ja) 2016-12-21
TWI494443B (zh) 2015-08-01
TW201413003A (zh) 2014-04-01

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