KR970029263A - 웨이퍼를 용이하게 구별하기 위한 라벨 - Google Patents

웨이퍼를 용이하게 구별하기 위한 라벨 Download PDF

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Publication number
KR970029263A
KR970029263A KR1019950045823A KR19950045823A KR970029263A KR 970029263 A KR970029263 A KR 970029263A KR 1019950045823 A KR1019950045823 A KR 1019950045823A KR 19950045823 A KR19950045823 A KR 19950045823A KR 970029263 A KR970029263 A KR 970029263A
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South Korea
Prior art keywords
wafer
label
marks
flat zone
semiconductor device
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KR1019950045823A
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English (en)
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KR0147672B1 (ko
Inventor
이재성
이진표
김남철
이승원
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김광호
삼성전자 주식회사
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Priority to KR1019950045823A priority Critical patent/KR0147672B1/ko
Priority to GB9618557A priority patent/GB2307787B/en
Priority to JP8236605A priority patent/JPH09162085A/ja
Priority to TW086212908U priority patent/TW328851U/zh
Priority to DE19636799A priority patent/DE19636799A1/de
Priority to CN96112853A priority patent/CN1098537C/zh
Priority to US08/755,158 priority patent/US5800906A/en
Publication of KR970029263A publication Critical patent/KR970029263A/ko
Application granted granted Critical
Publication of KR0147672B1 publication Critical patent/KR0147672B1/ko

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    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F23/00Advertising on or in specific articles, e.g. ashtrays, letter-boxes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F3/00Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
    • G09F3/02Forms or constructions
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F3/00Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
    • G09F3/02Forms or constructions
    • G09F2003/0214Stock management
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54406Marks applied to semiconductor devices or parts comprising alphanumeric information
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54413Marks applied to semiconductor devices or parts comprising digital information, e.g. bar codes, data matrix
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54493Peripheral marks on wafers, e.g. orientation flats, notches, lot number
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24777Edge feature
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

웨이퍼를 접촉하거나 별도의 확인 과정 없이 특정한 웨이퍼를 용이하게 구별할 수 있는 라벨에 관하여 개시한다. 본 발명은 반도체 장치의 제조 과정 중에 웨이퍼를 구별하기 위한 라벨에 있어서, 상기 웨이퍼의 플랫 존 모서리 부분에서 서로 다른 면적을 가지며, 상기 플랫 존의 다른 위치에 배치된 마크들을 포함한다. 본 발명에 의하여 형성된 라벨을 가지는 웨이퍼에 반도체 장치를 제조하는 경우 상기 웨이퍼에 대하여 불필요한 접촉을 감소시켜서 오염을 방지하고, 손상을 감소시키는 장점이 있다. 따라서, 반도체 장치의 생산성 및 수율을 증가시키는데 기여한다.

Description

웨이퍼를 용이하게 구별하기 위한 라벨
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도 및 제3도는 본 발명에 의해서 형성된 라벨의 위치 및 단면을 보여주고,
제4도는 상기 제2도의 A부분을 확대하여 보여주는 평면도이다.
제5도는 상기 제4도에 표시된 제1마크 및 제2마크를 이용하여 웨이퍼의 번호를 구분하는 방법을 표시한 것이다.
제6도는 상기 제4도에 표시된 제1마크 및 제2마크를 이용하여 웨이퍼의 번호를 구분하는 다른 방법을 표시한 것이다.

Claims (6)

  1. 반도체 장치의 제조 과정 중에 웨이퍼를 구별하기 위한 라벨에 있어서, 상기 웨이퍼의 플랫 존 모서리 부분에서 서로 다른 면적을 가지며, 상기 플랫 존의 다른 위치에 배치된 마크들을 포함하는 것을 특징으로 하는 라벨.
  2. 제1항에 있어서, 상기 마크에 인접하여 상기 웨이퍼 표면에 형성된 롯 번호 또는 웨이퍼 번호를 더 포함하는 것을 특징으로 하는 라벨.
  3. 반도체 장치의 제조 과정 중에 웨이퍼를 구별하기 위한 라벨에 있어서, 상기 웨이퍼의 플랫 존 모서리 부분에서 상기 플랫 존을 동일한 길이로 등분하는 위치에 형성된 제1마크들; 및 상기 제1마크 보다 작은 크기를 가지며 상기 제1마크들 사이의 길이를 등분하는 위치에 형성된 제2마크들을 포함하는 것을 특징으로 하는 라벨.
  4. 제3항에 있어서, 상기 플랫 존에 인접하여 상기 웨이퍼 표면에 형성된 롯 번호 또는 웨이퍼 번호를 더 포함하는 것을 특징으로 하는 라벨.
  5. 제3항에 있어서, 상기 제1마크들은 상기 플랫 존을 5등분하는 위치에 형성된 것을 특징으로 하는 라벨.
  6. 제3항에 있어서, 상기 제2마크들은 상기 제1마크들 사이를 5등분하는 위치에 형성된 것을 특징으로 하는 라벨.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950045823A 1995-11-30 1995-11-30 웨이퍼를 용이하게 구별하기 위한 라벨 KR0147672B1 (ko)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR1019950045823A KR0147672B1 (ko) 1995-11-30 1995-11-30 웨이퍼를 용이하게 구별하기 위한 라벨
GB9618557A GB2307787B (en) 1995-11-30 1996-09-05 A set of labels for a semiconductor wafer
JP8236605A JPH09162085A (ja) 1995-11-30 1996-09-06 半導体ウェーハ用のラベル
TW086212908U TW328851U (en) 1995-11-30 1996-09-09 Label for semiconductor wafer
DE19636799A DE19636799A1 (de) 1995-11-30 1996-09-11 Halbleiter-Wafer mit Markierung
CN96112853A CN1098537C (zh) 1995-11-30 1996-09-19 半导体圆片标记
US08/755,158 US5800906A (en) 1995-11-30 1996-11-22 Label for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950045823A KR0147672B1 (ko) 1995-11-30 1995-11-30 웨이퍼를 용이하게 구별하기 위한 라벨

Publications (2)

Publication Number Publication Date
KR970029263A true KR970029263A (ko) 1997-06-26
KR0147672B1 KR0147672B1 (ko) 1998-08-01

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KR1019950045823A KR0147672B1 (ko) 1995-11-30 1995-11-30 웨이퍼를 용이하게 구별하기 위한 라벨

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US (1) US5800906A (ko)
JP (1) JPH09162085A (ko)
KR (1) KR0147672B1 (ko)
CN (1) CN1098537C (ko)
DE (1) DE19636799A1 (ko)
GB (1) GB2307787B (ko)
TW (1) TW328851U (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10256105A (ja) * 1997-03-11 1998-09-25 Super Silicon Kenkyusho:Kk レーザマークを付けたウェーハ
EP0989596A4 (en) * 1997-06-12 2006-03-08 Nippon Kogaku Kk DEVICE MANUFACTURING SUBSTRATE, METHOD OF MANUFACTURING THE SUBSTRATE, AND METHOD OF EXPOSING THE SAME
US5933521A (en) * 1997-06-23 1999-08-03 Pasic Engineering, Inc. Wafer reader including a mirror assembly for reading wafer scribes without displacing wafers
JP2001101337A (ja) * 1999-07-26 2001-04-13 Komatsu Ltd ドットマークの読取り装置と読取り方法
US6420792B1 (en) * 1999-09-24 2002-07-16 Texas Instruments Incorporated Semiconductor wafer edge marking
US8389099B1 (en) 2007-06-01 2013-03-05 Rubicon Technology, Inc. Asymmetrical wafer configurations and method for creating the same
JP5896810B2 (ja) * 2012-03-30 2016-03-30 オリンパス株式会社 半導体装置
KR102185659B1 (ko) * 2014-02-11 2020-12-03 삼성전자주식회사 웨이퍼의 제조 방법 및 이에 의해 제조된 웨이퍼
US10020264B2 (en) 2015-04-28 2018-07-10 Infineon Technologies Ag Integrated circuit substrate and method for manufacturing the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH604422A5 (ko) * 1973-02-09 1978-09-15 Alsacienne Atom
JPS5572034A (en) * 1978-11-27 1980-05-30 Internatl Rectifier Corp Japan Ltd Preparing semiconductor element
JPS61196512A (ja) * 1985-02-26 1986-08-30 Nec Corp 半導体装置の製造方法
JPH0196920A (ja) * 1987-10-09 1989-04-14 Fujitsu Ltd ウエーハの識別方法
JPH02183509A (ja) * 1989-01-10 1990-07-18 Seiko Epson Corp 半導体基板の識別方法
EP0604061A1 (en) * 1992-12-24 1994-06-29 AT&T Corp. Semiconductor fabrication

Also Published As

Publication number Publication date
GB2307787B (en) 2000-10-11
US5800906A (en) 1998-09-01
TW328851U (en) 1998-03-21
GB2307787A (en) 1997-06-04
JPH09162085A (ja) 1997-06-20
KR0147672B1 (ko) 1998-08-01
CN1098537C (zh) 2003-01-08
DE19636799A1 (de) 1997-06-05
CN1158000A (zh) 1997-08-27
GB9618557D0 (en) 1996-10-16

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