KR960031509A - 열경화성 실리콘 수지 - Google Patents
열경화성 실리콘 수지 Download PDFInfo
- Publication number
- KR960031509A KR960031509A KR1019960002499A KR19960002499A KR960031509A KR 960031509 A KR960031509 A KR 960031509A KR 1019960002499 A KR1019960002499 A KR 1019960002499A KR 19960002499 A KR19960002499 A KR 19960002499A KR 960031509 A KR960031509 A KR 960031509A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- silicone resin
- rti
- sio
- compounds
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
경화 도중에 다량의 휘발 성분을 생성시키지 않고 경도가 우수한 고내열성의 광학적으로 투명한 경화 제품에 대한 전구체인 고도로 스핀 피복 가능한 실리콘 수지가 기재되어 있다.
이러한 실리콘 수지는 다음 일반식(1)의 실리콘 중합체를 포함한다.
(Ph2SiO)a(HSiO3/2)b(R1SiO3/2)c(1)
상기 식에서, R1은 수소원자 또는 헤테로원자를 함유할 수 있는 C1내지 C18탄화수소 그룹이며, Ph는 페닐 그룹이고, a+b+c는 6 내지 1,000이며, a(a+b+c)는 0.4 내지 0.6 미만이고, b/(b+c)는 0.2 내지 1.0이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (4)
- 평균 중합도가 6 내지 1,000인 일반식(1)의 실리콘 중합체를 포함하는 실리콘 수지.(Ph2SiO)a(HSiO3/2)b(R1SiO3/2)c(1)상기 식에서, R1은 각각 서로 독립적으로 산소, 질소, 염소, 불소 및 규소로 이루어진 그룹으로부터 선택된 하나 이상의 원자를 함유할 수 있는 C1내지 C18탄화수소 그룹이고 ; Ph는 페닐 그룹이며 ; O의 또 다른 결합은 규소에 결합하여 실록산 결합을 형성하거나, 수소원자에 결합하여 실란올을 형성할 수 있고 ; 단량체 단위의 평균 비율은 a/(a+b+c)가 0.4 내지 0.6 미만이고 b/(b+c)가 0.2 내지 1.0의 범위로 되도록 하는 비율이다.
- HSiX3또는 HSiX와 R1SiX3와의 혼합물(여기서, X는 각각 독립적으로 염소원자 및 브롬 원자로부터 선택된 가수분해 가능한 그룹이고, R1은 독립적으로 산소, 질소, 염소, 불소 및 규소로 이루어진 그룹으로부터 선택된 하나 이상의 원자를 함유할 수 있는 C1내지 C18탄화수소 그룹이다)에 디페닐 실란디올을 첨가하여 가수분해 혼합물을 수득하는 단계 및 가수분해 혼합물을 100℃를 초과하지 않는 온도에서 가수분해시키는 단계를 포함하는, 제1항에 따르는 실리콘 수지를 제조하는 방법.
- 제2항에 있어서, 반응 전에, 반응물이 유기 용매에 용해되는 방법.
- 제1항에 따르는 실리콘 수지(a)와 염기성 화합물, 2가 및 4가 주석 화합물, 팔라듐 금속, 백금 금속, 팔라듐 화합물 및 백금 화합물로 이루어진 그룹으로부터 선택된 하나 이상의 촉매 성분(b)를 포함하는 열경화성 폴리오가노실록산 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP01618695A JP3542185B2 (ja) | 1995-02-02 | 1995-02-02 | シリコーンレジン、これを含む組成物およびその硬化方法 |
JP95-016186 | 1995-02-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960031509A true KR960031509A (ko) | 1996-09-17 |
KR100359392B1 KR100359392B1 (ko) | 2003-01-24 |
Family
ID=11909492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960002499A KR100359392B1 (ko) | 1995-02-02 | 1996-02-02 | 열경화성실리콘수지 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5614603A (ko) |
EP (1) | EP0725103B1 (ko) |
JP (1) | JP3542185B2 (ko) |
KR (1) | KR100359392B1 (ko) |
DE (1) | DE69629405T2 (ko) |
TW (1) | TW413693B (ko) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3635179B2 (ja) * | 1997-02-24 | 2005-04-06 | ダウ コーニング アジア株式会社 | シリル化ポリメチルシルセスキオキサン、その製造方法、それを用いた組成物 |
US6218497B1 (en) * | 1997-04-21 | 2001-04-17 | Alliedsignal Inc. | Organohydridosiloxane resins with low organic content |
US6015457A (en) | 1997-04-21 | 2000-01-18 | Alliedsignal Inc. | Stable inorganic polymers |
US6143855A (en) * | 1997-04-21 | 2000-11-07 | Alliedsignal Inc. | Organohydridosiloxane resins with high organic content |
US5962067A (en) * | 1997-09-09 | 1999-10-05 | Lucent Technologies Inc. | Method for coating an article with a ladder siloxane polymer and coated article |
US6177199B1 (en) | 1999-01-07 | 2001-01-23 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with low organic content |
US6218020B1 (en) | 1999-01-07 | 2001-04-17 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with high organic content |
EP0992556B1 (en) * | 1998-04-24 | 2012-05-09 | JGC Catalysts and Chemicals Ltd. | Coating liquid for forming silica-based film having low dielectric constant and substrate having film of low dielectric constant coated thereon |
DE19932629A1 (de) * | 1999-07-13 | 2001-01-18 | Fraunhofer Ges Forschung | Organisch modifizierte, lagerstabile, UV-härtbare, NIR-durchlässige und in Schichtdicken von 1 bis 150 mum fotostrukturierbare Kieselsäurepolykondensate, deren Herstellung und deren Verwendung |
US6440550B1 (en) | 1999-10-18 | 2002-08-27 | Honeywell International Inc. | Deposition of fluorosilsesquioxane films |
GB0108274D0 (en) * | 2001-04-03 | 2001-05-23 | Dow Corning | preparation of silicone resins |
US20030096090A1 (en) * | 2001-10-22 | 2003-05-22 | Boisvert Ronald Paul | Etch-stop resins |
KR100968736B1 (ko) * | 2002-05-16 | 2010-07-08 | 다우 코닝 코포레이션 | 난연성 조성물 |
GB0224044D0 (en) * | 2002-10-16 | 2002-11-27 | Dow Corning | Silicone resins |
US6818721B2 (en) * | 2002-12-02 | 2004-11-16 | Rpo Pty Ltd. | Process for producing polysiloxanes and use of the same |
US8101015B2 (en) * | 2003-10-07 | 2012-01-24 | Honeywell International Inc. | Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof |
US8901268B2 (en) * | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
KR101253487B1 (ko) * | 2004-12-17 | 2013-04-11 | 다우 코닝 코포레이션 | 반사방지막의 형성방법 |
EP1883949B1 (en) * | 2005-05-27 | 2015-07-08 | The Governors of the University of Alberta | Method for preparing nanocrystalline silicon in sio2 and freestanding silicon nanoparticles |
US7390599B2 (en) * | 2005-10-11 | 2008-06-24 | Xerox Corporation | Silicon-containing overcoat layers |
JP4783117B2 (ja) * | 2005-10-21 | 2011-09-28 | 東レ・ダウコーニング株式会社 | シリカ系ガラス薄層付き無機質基板、その製造方法、コーテイング剤および半導体装置 |
US8653217B2 (en) | 2007-05-01 | 2014-02-18 | Dow Corning Corporation | Method for forming anti-reflective coating |
JP5320910B2 (ja) * | 2007-09-04 | 2013-10-23 | 豊田合成株式会社 | 発光装置 |
DE102008041601A1 (de) * | 2008-08-27 | 2010-03-04 | Evonik Goldschmidt Gmbh | Verfahren zur Herstellung verzweigter SiH-funtioneller Polysiloxane und deren Verwendung zur Herstellung flüssiger, SiC- oder SiOC-verknüpfter, verzweigter organomodifizierter Polysiloxane |
WO2010068337A1 (en) * | 2008-12-10 | 2010-06-17 | Dow Corning Corporation | Wet-etchable antireflective coatings |
US8809482B2 (en) | 2008-12-10 | 2014-08-19 | Dow Corning Corporation | Silsesquioxane resins |
CN103261281B (zh) * | 2010-11-02 | 2015-09-30 | 汉高股份有限公司 | 含氢硅树脂及其制备方法 |
FI127433B (fi) | 2011-06-14 | 2018-05-31 | Pibond Oy | Menetelmä siloksaanimonomeerien syntetisoimiseksi sekä näiden käyttö |
EP3194502A4 (en) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
WO2017142648A1 (en) * | 2016-02-19 | 2017-08-24 | Dow Corning Corporation | Aged polymeric silsesquioxanes |
CN107501942B (zh) * | 2017-08-29 | 2020-10-02 | 北京康美特科技股份有限公司 | 可模塑成型的有机硅树脂、组合物及其半导体发光元件 |
Family Cites Families (9)
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US3234180A (en) * | 1963-08-01 | 1966-02-08 | Gen Electric | Siloxy polymers |
US3372178A (en) * | 1965-03-04 | 1968-03-05 | Gen Electric | Aryl-vinyl containing linear disiloxanes and tri- and tetracyclosiloxanes |
DE2758415A1 (de) * | 1977-12-28 | 1979-07-12 | Fraunhofer Ges Forschung | Kieselsaeureheteropolykondensate, verfahren zu deren herstellung und deren verwendung als membranen und adsorbentien |
DE2758414A1 (de) * | 1977-12-28 | 1979-07-12 | Fraunhofer Ges Forschung | Kieselsaeureheteropolykondensate, verfahren zu deren herstellung und deren verwendung bei der zuechtung lebender zellen |
DE2925969A1 (de) * | 1979-06-27 | 1981-01-29 | Fraunhofer Ges Forschung | Poroese membranen und adsorbentien, verfahren zu ihrer herstellung und ihre verwendung zur stofftrennung |
GB8615862D0 (en) * | 1986-06-28 | 1986-08-06 | Dow Corning Ltd | Making siloxane resins |
JPH01279912A (ja) * | 1988-05-02 | 1989-11-10 | Shin Etsu Chem Co Ltd | 有機けい素化合物 |
JP3153373B2 (ja) * | 1993-02-09 | 2001-04-09 | ダウ・コ−ニング・コ−ポレ−ション | シリコーンレジンの製造方法 |
US5516867A (en) * | 1995-05-12 | 1996-05-14 | Dow Corning Corporation | Modified hydrogen silsesquioxane resin |
-
1995
- 1995-02-02 JP JP01618695A patent/JP3542185B2/ja not_active Expired - Fee Related
-
1996
- 1996-01-31 DE DE69629405T patent/DE69629405T2/de not_active Expired - Fee Related
- 1996-01-31 EP EP96300675A patent/EP0725103B1/en not_active Expired - Lifetime
- 1996-01-31 US US08/593,318 patent/US5614603A/en not_active Expired - Fee Related
- 1996-02-02 TW TW085101324A patent/TW413693B/zh not_active IP Right Cessation
- 1996-02-02 KR KR1019960002499A patent/KR100359392B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69629405D1 (de) | 2003-09-18 |
KR100359392B1 (ko) | 2003-01-24 |
US5614603A (en) | 1997-03-25 |
EP0725103B1 (en) | 2003-08-13 |
JP3542185B2 (ja) | 2004-07-14 |
EP0725103A3 (en) | 1997-07-16 |
DE69629405T2 (de) | 2004-06-09 |
TW413693B (en) | 2000-12-01 |
JPH08208840A (ja) | 1996-08-13 |
EP0725103A2 (en) | 1996-08-07 |
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LAPS | Lapse due to unpaid annual fee |