KR940008112A - 트랜지스터 및 그 제조 방법 - Google Patents
트랜지스터 및 그 제조 방법 Download PDFInfo
- Publication number
- KR940008112A KR940008112A KR1019930019586A KR930019586A KR940008112A KR 940008112 A KR940008112 A KR 940008112A KR 1019930019586 A KR1019930019586 A KR 1019930019586A KR 930019586 A KR930019586 A KR 930019586A KR 940008112 A KR940008112 A KR 940008112A
- Authority
- KR
- South Korea
- Prior art keywords
- base
- emitter
- low
- collector
- resistance
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
- H01L29/66272—Silicon vertical transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0821—Collector regions of bipolar transistors
- H01L29/0826—Pedestal collectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
- H01L29/7325—Vertical transistors having an emitter-base junction leaving at a main surface and a base-collector junction leaving at a peripheral surface of the body, e.g. mesa planar transistor
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/60—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being bipolar transistors
- H03K17/62—Switching arrangements with several input- output-terminals, e.g. multiplexers, distributors
- H03K17/6221—Switching arrangements with several input- output-terminals, e.g. multiplexers, distributors combined with selecting means
- H03K17/6228—Switching arrangements with several input- output-terminals, e.g. multiplexers, distributors combined with selecting means using current steering means
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/26—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback
- H03K3/28—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback
- H03K3/281—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator
- H03K3/286—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable
- H03K3/288—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable using additional transistors in the input circuit
- H03K3/2885—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar transistors with internal or external positive feedback using means other than a transformer for feedback using at least two transistors so coupled that the input of one is derived from the output of another, e.g. multivibrator bistable using additional transistors in the input circuit the input circuit having a differential configuration
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Transistors (AREA)
Abstract
베이스-에미터 접합이 베이스를 가로질러 있지 않지만 베이스의 상부 표면 내측에서 마무리되는 바이플라트랜지스터가 제공되어 있다. 상기 트랜지스터는 전류를 얻는데 사용될 수 있는 긴 에미터 주변 영역 및 전류를 얻는데 사용될 수 있는 2개의 에미터 변이상(예컨대 3개의 변)을 지니는데, 이는 낮은 베이스 저항, 낮은 에미터저항, 낮은 콜렉터 저항, 낮은 베이스-콜렉터 캐패시턴스, 및 작은 사이즈를 달성할 수 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명에 따른 트랜지스터에 대한 평면도.
제3도 및 제4도는 제2도 트랜지스터의 수직 단면도.
제5도는 제2도 트랜지스터 일부에 대한 수직단면도로서, 제2도 트랜지스터의 한 에미터 측으로 부터 발생된 베이스전류를 예시한 도면.
제6도내지 제8도는 본 발명에 따른 트랜지스터에 대한 평면도.
Claims (1)
- 콜렉터, 상기 콜렉터 상부에 놓여 있으며 상기 콜렉터와 접촉하는 베이스, 및 상기 베이스의 상부 표면 상부에 놓여 있는 1에미터를 포함하며, 상기 제1에미터 및 상기 베이스는 제1상부표면의 경계부분으로 부터 상기상부표면 내측으로 연장되어 있고 상기 상부 표면 내측에는 마무리되는 제1의 인접하는 베이스-에미터 접합을형성하는 것을 특징으로 하는 트랜지스터.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US95152492A | 1992-09-25 | 1992-09-25 | |
US92-07/951,524 | 1992-09-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR940008112A true KR940008112A (ko) | 1994-04-28 |
Family
ID=25491778
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930019586A KR940008112A (ko) | 1992-09-25 | 1993-09-24 | 트랜지스터 및 그 제조 방법 |
Country Status (5)
Country | Link |
---|---|
US (2) | US5387813A (ko) |
EP (1) | EP0596601B1 (ko) |
JP (1) | JP3564152B2 (ko) |
KR (1) | KR940008112A (ko) |
DE (1) | DE69331217T2 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5969749A (en) * | 1994-11-04 | 1999-10-19 | Canon Kabushiki Kaisha | Apparatus and method for suspending a reproduction operation reproducing image information when the arrival of a call from a communication line is detected |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
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US5387813A (en) * | 1992-09-25 | 1995-02-07 | National Semiconductor Corporation | Transistors with emitters having at least three sides |
US5389552A (en) * | 1993-01-29 | 1995-02-14 | National Semiconductor Corporation | Transistors having bases with different shape top surfaces |
JP3612089B2 (ja) * | 1994-03-22 | 2005-01-19 | 株式会社ルネサステクノロジ | バンドギャップ基準電源装置 |
AU3885095A (en) * | 1994-11-03 | 1996-05-31 | Telefonaktiebolaget Lm Ericsson (Publ) | Ballast monitoring for radio frequency power transistors |
JP3253468B2 (ja) * | 1994-12-05 | 2002-02-04 | シャープ株式会社 | 半導体装置 |
JP3269475B2 (ja) * | 1998-02-16 | 2002-03-25 | 日本電気株式会社 | 半導体装置 |
JP3309959B2 (ja) * | 1998-04-16 | 2002-07-29 | 日本電気株式会社 | 半導体装置 |
US6762479B2 (en) | 1998-11-06 | 2004-07-13 | International Business Machines Corporation | Microwave array transistor for low-noise and high-power applications |
US6236072B1 (en) * | 1998-11-12 | 2001-05-22 | Telefonaktiebolaget Lm Ericsson (Publ) | Method and system for emitter partitioning for SiGe RF power transistors |
US6376898B1 (en) * | 1999-08-02 | 2002-04-23 | Matsushita Electric Industrial Co., Ltd. | Bipolar transistor layout with minimized area and improved heat dissipation |
US6303975B1 (en) | 1999-11-09 | 2001-10-16 | International Business Machines Corporation | Low noise, high frequency solid state diode |
US6657280B1 (en) * | 2000-11-13 | 2003-12-02 | International Business Machines Corporation | Redundant interconnect high current bipolar device |
US6750528B2 (en) * | 2001-01-23 | 2004-06-15 | Agere Systems Inc. | Bipolar device |
JP2003045882A (ja) * | 2001-07-27 | 2003-02-14 | Nec Corp | 半導体装置及びその設計方法 |
US6946720B2 (en) * | 2003-02-13 | 2005-09-20 | Intersil Americas Inc. | Bipolar transistor for an integrated circuit having variable value emitter ballast resistors |
CA2608323A1 (en) * | 2005-05-13 | 2006-11-23 | Mosaid Technologies Corporation | Integrated circuit with signal bus formed by cell abutment of logic cells |
CN101189728A (zh) * | 2005-06-01 | 2008-05-28 | Nxp股份有限公司 | 利用改进的npn双极晶体管基极接入电阻的方法和器件 |
JP2007173463A (ja) * | 2005-12-21 | 2007-07-05 | Ricoh Co Ltd | 基準電圧発生回路 |
US9099397B1 (en) * | 2012-03-22 | 2015-08-04 | Hrl Laboratories, Llc | Fabrication of self aligned base contacts for bipolar transistors |
KR101416677B1 (ko) * | 2013-04-09 | 2014-07-09 | 에이피반도체 주식회사 | 에미터 안정 저항의 파워 비제이티 |
CN105261639B (zh) * | 2014-07-18 | 2019-02-26 | 稳懋半导体股份有限公司 | 异质接面双极性电晶体 |
US9728603B2 (en) * | 2015-06-22 | 2017-08-08 | Globalfoundries Inc. | Bipolar junction transistors with double-tapered emitter fingers |
US9812447B2 (en) * | 2016-02-02 | 2017-11-07 | Globalfoundries Inc. | Bipolar junction transistors with extrinsic device regions free of trench isolation |
US10811497B2 (en) | 2018-04-17 | 2020-10-20 | Silanna Asia Pte Ltd | Tiled lateral BJT |
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US5387813A (en) * | 1992-09-25 | 1995-02-07 | National Semiconductor Corporation | Transistors with emitters having at least three sides |
-
1992
- 1992-12-14 US US07/991,075 patent/US5387813A/en not_active Expired - Lifetime
-
1993
- 1993-09-20 EP EP93307431A patent/EP0596601B1/en not_active Expired - Lifetime
- 1993-09-20 DE DE69331217T patent/DE69331217T2/de not_active Expired - Lifetime
- 1993-09-24 KR KR1019930019586A patent/KR940008112A/ko not_active Application Discontinuation
- 1993-09-27 JP JP24008093A patent/JP3564152B2/ja not_active Expired - Fee Related
-
1994
- 1994-09-30 US US08/315,731 patent/US5508552A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5969749A (en) * | 1994-11-04 | 1999-10-19 | Canon Kabushiki Kaisha | Apparatus and method for suspending a reproduction operation reproducing image information when the arrival of a call from a communication line is detected |
Also Published As
Publication number | Publication date |
---|---|
US5387813A (en) | 1995-02-07 |
DE69331217D1 (de) | 2002-01-10 |
EP0596601A3 (en) | 1994-09-07 |
JPH06216138A (ja) | 1994-08-05 |
EP0596601A2 (en) | 1994-05-11 |
DE69331217T2 (de) | 2002-07-25 |
US5508552A (en) | 1996-04-16 |
JP3564152B2 (ja) | 2004-09-08 |
EP0596601B1 (en) | 2001-11-28 |
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Legal Events
Date | Code | Title | Description |
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WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |