KR870000679B1 - 감광성수지조성물 및 감광성수지조성물 적층체 - Google Patents

감광성수지조성물 및 감광성수지조성물 적층체 Download PDF

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Publication number
KR870000679B1
KR870000679B1 KR8204627A KR820004627A KR870000679B1 KR 870000679 B1 KR870000679 B1 KR 870000679B1 KR 8204627 A KR8204627 A KR 8204627A KR 820004627 A KR820004627 A KR 820004627A KR 870000679 B1 KR870000679 B1 KR 870000679B1
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KR
South Korea
Prior art keywords
weight
resin composition
photosensitive resin
addition
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR8204627A
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English (en)
Korean (ko)
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KR840002116A (ko
Inventor
하지메 가꾸마루
노부유끼 하야시
Original Assignee
요꼬야마 료오지
히다찌 가세이고오교 가부시끼 가이샤
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Application filed by 요꼬야마 료오지, 히다찌 가세이고오교 가부시끼 가이샤 filed Critical 요꼬야마 료오지
Publication of KR840002116A publication Critical patent/KR840002116A/ko
Application granted granted Critical
Publication of KR870000679B1 publication Critical patent/KR870000679B1/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/06—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to oxygen-containing macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/022—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations
    • C08F299/024—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Laminated Bodies (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR8204627A 1981-11-20 1982-10-14 감광성수지조성물 및 감광성수지조성물 적층체 Expired KR870000679B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP56187333A JPS5888741A (ja) 1981-11-20 1981-11-20 感光性樹脂組成物及び感光性樹脂組成物積層体
JP187333 1981-11-20
JP81-187333 1981-11-20

Publications (2)

Publication Number Publication Date
KR840002116A KR840002116A (ko) 1984-06-11
KR870000679B1 true KR870000679B1 (ko) 1987-04-06

Family

ID=16204160

Family Applications (1)

Application Number Title Priority Date Filing Date
KR8204627A Expired KR870000679B1 (ko) 1981-11-20 1982-10-14 감광성수지조성물 및 감광성수지조성물 적층체

Country Status (6)

Country Link
US (1) US4562142A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5888741A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR870000679B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3242800A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2112011B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
HK (1) HK61086A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0614185B2 (ja) * 1984-04-02 1994-02-23 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた積層体
JPH0642073B2 (ja) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 光重合性樹脂組成物
JPS60230135A (ja) * 1984-04-27 1985-11-15 Mitsubishi Rayon Co Ltd 光重合性樹脂組成物
JPS61186952A (ja) * 1985-02-15 1986-08-20 Mitsubishi Rayon Co Ltd 光重合性樹脂組成物
JP2585224B2 (ja) * 1986-07-03 1997-02-26 三井東圧化学株式会社 感光性樹脂組成物
JPS6318692A (ja) * 1986-07-11 1988-01-26 日立化成工業株式会社 印刷配線板の製造方法
JPS6398651A (ja) * 1986-10-15 1988-04-30 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性積層体
US4885229A (en) * 1987-12-22 1989-12-05 501 Daicel Chemical Industries Ltd. Photopolymerizable compositions
JPH0235454A (ja) * 1988-07-25 1990-02-06 Sekisui Chem Co Ltd 感光性樹脂組成物
JPH07102646B2 (ja) * 1988-09-30 1995-11-08 株式会社日立製作所 金属とポリイミドの複合成形体
US4985343A (en) * 1989-02-09 1991-01-15 Mitsubishi Rayon Co., Ltd. Crosslinking-curable resin composition
JPH02311847A (ja) * 1989-05-26 1990-12-27 Nippon Paint Co Ltd 水現像性感光性樹脂組成物
JPH101523A (ja) * 1996-06-14 1998-01-06 Japan Synthetic Rubber Co Ltd 放射線硬化性樹脂組成物
EP0831372A1 (de) * 1996-09-23 1998-03-25 Siemens Aktiengesellschaft Photopolymere
MY120763A (en) 1997-09-19 2005-11-30 Hitachi Chemical Co Ltd Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer
CN1968992B (zh) * 2004-07-16 2010-12-22 陶氏康宁公司 辐射敏感的有机硅树脂组合物
US8377630B2 (en) * 2005-07-29 2013-02-19 Anocoil Corporation On-press plate development without contamination of fountain fluid
US8343707B2 (en) 2005-07-29 2013-01-01 Anocoil Corporation Lithographic printing plate for in-solidus development on press
US8137897B2 (en) * 2005-07-29 2012-03-20 Anocoil Corporation Processless development of printing plate
US8133658B2 (en) * 2005-07-29 2012-03-13 Anocoil Corporation Non-chemical development of printing plates
EP1910897A4 (en) * 2005-07-29 2010-12-22 Anocoil Corp PRINTING PLATE THAT CAN BE IMAGED FOR PRESS DEVELOPMENT
JP4586768B2 (ja) * 2006-05-29 2010-11-24 トヨタ自動車株式会社 内燃機関の動弁装置
CN103792788A (zh) * 2008-04-28 2014-05-14 日立化成工业株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法及印刷电路板的制造方法
JP6226174B2 (ja) * 2012-10-26 2017-11-08 株式会社リコー インク、インクカートリッジ、インクジェット記録装置、記録物、重合性化合物及び組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
JPS528303A (en) * 1975-04-11 1977-01-22 Hitachi Chemical Co Ltd Filmmlike laminated body
US4065315A (en) * 1976-04-26 1977-12-27 Dynachem Corporation Phototropic dye system and photosensitive compositions containing the same
US4264708A (en) * 1978-03-31 1981-04-28 E. I. Du Pont De Nemours And Company Radiation sensitive element having a thin photopolymerizable layer
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
US4245031A (en) * 1979-09-18 1981-01-13 E. I. Du Pont De Nemours And Company Photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
US4291115A (en) * 1979-09-18 1981-09-22 E. I. Du Pont De Nemours And Company Elements and method which use photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
JPS581142A (ja) * 1981-06-25 1983-01-06 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体

Also Published As

Publication number Publication date
HK61086A (en) 1986-08-29
JPS5888741A (ja) 1983-05-26
DE3242800C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-06-21
KR840002116A (ko) 1984-06-11
US4562142A (en) 1985-12-31
GB2112011B (en) 1985-12-04
DE3242800A1 (de) 1983-06-01
GB2112011A (en) 1983-07-13

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