HK61086A - Photosensitive composition and photosensitive laminate developable with aqueous alkali - Google Patents

Photosensitive composition and photosensitive laminate developable with aqueous alkali

Info

Publication number
HK61086A
HK61086A HK610/86A HK61086A HK61086A HK 61086 A HK61086 A HK 61086A HK 610/86 A HK610/86 A HK 610/86A HK 61086 A HK61086 A HK 61086A HK 61086 A HK61086 A HK 61086A
Authority
HK
Hong Kong
Prior art keywords
photosensitive
developable
aqueous alkali
laminate
photosensitive composition
Prior art date
Application number
HK610/86A
Other languages
English (en)
Inventor
Hajime Kakumaru
Nobuyuki Hayashi
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of HK61086A publication Critical patent/HK61086A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/06—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to oxygen-containing macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/022—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations
    • C08F299/024—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Laminated Bodies (AREA)
HK610/86A 1981-11-20 1986-08-21 Photosensitive composition and photosensitive laminate developable with aqueous alkali HK61086A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56187333A JPS5888741A (ja) 1981-11-20 1981-11-20 感光性樹脂組成物及び感光性樹脂組成物積層体

Publications (1)

Publication Number Publication Date
HK61086A true HK61086A (en) 1986-08-29

Family

ID=16204160

Family Applications (1)

Application Number Title Priority Date Filing Date
HK610/86A HK61086A (en) 1981-11-20 1986-08-21 Photosensitive composition and photosensitive laminate developable with aqueous alkali

Country Status (6)

Country Link
US (1) US4562142A (xx)
JP (1) JPS5888741A (xx)
KR (1) KR870000679B1 (xx)
DE (1) DE3242800A1 (xx)
GB (1) GB2112011B (xx)
HK (1) HK61086A (xx)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0614185B2 (ja) * 1984-04-02 1994-02-23 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた積層体
JPH0642073B2 (ja) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 光重合性樹脂組成物
JPS60230135A (ja) * 1984-04-27 1985-11-15 Mitsubishi Rayon Co Ltd 光重合性樹脂組成物
JPS61186952A (ja) * 1985-02-15 1986-08-20 Mitsubishi Rayon Co Ltd 光重合性樹脂組成物
JP2585224B2 (ja) * 1986-07-03 1997-02-26 三井東圧化学株式会社 感光性樹脂組成物
JPS6318692A (ja) * 1986-07-11 1988-01-26 日立化成工業株式会社 印刷配線板の製造方法
JPS6398651A (ja) * 1986-10-15 1988-04-30 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性積層体
US4885229A (en) * 1987-12-22 1989-12-05 501 Daicel Chemical Industries Ltd. Photopolymerizable compositions
JPH0235454A (ja) * 1988-07-25 1990-02-06 Sekisui Chem Co Ltd 感光性樹脂組成物
JPH07102646B2 (ja) * 1988-09-30 1995-11-08 株式会社日立製作所 金属とポリイミドの複合成形体
US4985343A (en) * 1989-02-09 1991-01-15 Mitsubishi Rayon Co., Ltd. Crosslinking-curable resin composition
JPH02311847A (ja) * 1989-05-26 1990-12-27 Nippon Paint Co Ltd 水現像性感光性樹脂組成物
JPH101523A (ja) * 1996-06-14 1998-01-06 Japan Synthetic Rubber Co Ltd 放射線硬化性樹脂組成物
EP0831372A1 (de) * 1996-09-23 1998-03-25 Siemens Aktiengesellschaft Photopolymere
MY120763A (en) 1997-09-19 2005-11-30 Hitachi Chemical Co Ltd Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer
KR101275635B1 (ko) * 2004-07-16 2013-06-14 다우 코닝 코포레이션 방사선 민감성 실리콘 수지 조성물
US8133658B2 (en) * 2005-07-29 2012-03-13 Anocoil Corporation Non-chemical development of printing plates
US8343707B2 (en) 2005-07-29 2013-01-01 Anocoil Corporation Lithographic printing plate for in-solidus development on press
US8137897B2 (en) * 2005-07-29 2012-03-20 Anocoil Corporation Processless development of printing plate
US8377630B2 (en) * 2005-07-29 2013-02-19 Anocoil Corporation On-press plate development without contamination of fountain fluid
EP1910897A4 (en) * 2005-07-29 2010-12-22 Anocoil Corp PRINTING PLATE THAT CAN BE IMAGED FOR PRESS DEVELOPMENT
JP4586768B2 (ja) * 2006-05-29 2010-11-24 トヨタ自動車株式会社 内燃機関の動弁装置
US8460852B2 (en) * 2008-04-28 2013-06-11 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board
JP6226174B2 (ja) * 2012-10-26 2017-11-08 株式会社リコー インク、インクカートリッジ、インクジェット記録装置、記録物、重合性化合物及び組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
JPS528303A (en) * 1975-04-11 1977-01-22 Hitachi Chemical Co Ltd Filmmlike laminated body
US4065315A (en) * 1976-04-26 1977-12-27 Dynachem Corporation Phototropic dye system and photosensitive compositions containing the same
US4264708A (en) * 1978-03-31 1981-04-28 E. I. Du Pont De Nemours And Company Radiation sensitive element having a thin photopolymerizable layer
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
US4245031A (en) * 1979-09-18 1981-01-13 E. I. Du Pont De Nemours And Company Photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
US4291115A (en) * 1979-09-18 1981-09-22 E. I. Du Pont De Nemours And Company Elements and method which use photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
JPS581142A (ja) * 1981-06-25 1983-01-06 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体

Also Published As

Publication number Publication date
KR840002116A (ko) 1984-06-11
DE3242800C2 (xx) 1990-06-21
GB2112011A (en) 1983-07-13
GB2112011B (en) 1985-12-04
DE3242800A1 (de) 1983-06-01
US4562142A (en) 1985-12-31
KR870000679B1 (ko) 1987-04-06
JPS5888741A (ja) 1983-05-26

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Legal Events

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