KR850000734A - 구리도체 조성물 - Google Patents

구리도체 조성물 Download PDF

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Publication number
KR850000734A
KR850000734A KR1019840003434A KR840003434A KR850000734A KR 850000734 A KR850000734 A KR 850000734A KR 1019840003434 A KR1019840003434 A KR 1019840003434A KR 840003434 A KR840003434 A KR 840003434A KR 850000734 A KR850000734 A KR 850000734A
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KR
South Korea
Prior art keywords
composition
copper
copper oxide
particles
weight
Prior art date
Application number
KR1019840003434A
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English (en)
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KR910005524B1 (ko
Inventor
폴 시어타(외 1) 빈센트
Original Assignee
도늘드 에이 호오스
이 아이 듀우판 디 네모아 앤드 캄파니
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Application filed by 도늘드 에이 호오스, 이 아이 듀우판 디 네모아 앤드 캄파니 filed Critical 도늘드 에이 호오스
Publication of KR850000734A publication Critical patent/KR850000734A/ko
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Publication of KR910005524B1 publication Critical patent/KR910005524B1/ko

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/12Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/14Conductive material dispersed in non-conductive inorganic material
    • H01B1/16Conductive material dispersed in non-conductive inorganic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/28Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals
    • H01C17/281Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals by thick film techniques
    • H01C17/283Precursor compositions therefor, e.g. pastes, inks, glass frits

Abstract

내용 없음.

Description

구리도체 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (12)

  1. (a) 산화구리피막으로서 산소를 적어도 0.2중량% 함유하는 산화물피막을 가지고 있으며 입자크기가 0.5-10μm이며, 평균 입자크기가 1-5μm이며 중량에 대한 표면적의 비가 1m2/g이하인 금속구리와, (b) 입자자크기가 0.1-10μm이며, 평균 입자크기가 0.5-5μm이며 산화물이 피복된 구리금속 입자에 대한 산화구리입자의 중량비가 0-0.15인 산화구리와, (c) 연화점이 300-700℃이며, 크기가 1-15μm이며 평균 입자크기가 1-5μm이며 구리금속입자상에 있는 산화구리에 대한 결합제내에 있는 산화구리의 중량비가 0-0.5인 무기결합제, 이들 모두가 (d) 전체조성물을 기준으로 0.1중량% 이하의 수지를 함유하는 유기매제중에 분산되어 있으며, 상기 (a),(b) 및 (c)로 부터 나온 산화구리 총량이 구리금속과(a) 중에 있는 산화구리 총량의 15%를 초과하지 않는 그런 미세하게 분할된 입자의 혼합물을 구성된 프린트할 수 있는 후막도체 조성물.
  2. 제1항에 있어서, (a),(b) 및 (c)로 부터 나온 산화구리총량이 4-10중량%인 조성물.
  3. 제1항에 있어서 산화구리가 모두 구리입자의 산화물피막으로 부터 나온 것인 조성물.
  4. 제1항에 있어서 구리 금속입자상에 있는 산화구리에 대한 산화구리로서 첨가된 산소의 중량비가 0.2-0.5인 조성물.
  5. 제1항에 있어서 구리 금속입자상에 있는 산화구리에 대한 무기결합제중에 있는 산화구리의 중량비가 0.2-0.5인 조성물.
  6. 제1항에 있어서, 분산된 고체가 70-90%이며, 유기매제가 전체조성물의 30-10중량%인 조성물.
  7. 제1항에 있어서 무기 결합제가 붕규 산납유리인 조성물.
  8. 제1항에 있어서 유리가 B2O3를 20중량% 이하 함유하는 조성물.
  9. 제1항에 있어서 은금속을 미세하게 분할된 구리입자를 기준으로 1-50중량% 함유하는 조성물.
  10. 제1항에 있어서 구리와 은 입자를 공융하는 비율로 함유하는 조성물.
  11. 유기매제의 휘발, 산화구리의 분해 및 무기결합제와 구리의 소결이 일어나도록 연소시킨 제1항의 조성물로 된 패턴필름을 가진 세라믹기질로 구성된 도체부품.
  12. (1) 세라믹기질에 무기매제중에 분산된 무기결합제와 미세하게 분할된 저항물질입자의 혼합물로 구성된 후막저항기 페이스트층을 적용하고, (2) 저항기 페이스트층을 산화분위기 하에서 연소시켜 유기매제를 휘발시키고 무기결합제를 소결시킨 다음, (3) 연소된 저항기층에 제1항의 도체조성물로된 패턴층을 적용하고, (4) 패턴도체층을 비산화분위기 하에서 연소시켜 유기매제의 휘발, 산화구리의 분해 및 무기결합제와 구리의 소결이 일어나게 하는 것으로 구성된 종단저항기의 제조방법.
    ※참고사항:최초출원 내용에 의하여 공개하는 것임.
KR1019840003434A 1983-06-20 1984-06-19 구리도체 조성물 KR910005524B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US505,730 1983-06-20
US06/505,730 US4521329A (en) 1983-06-20 1983-06-20 Copper conductor compositions
US505703 1983-06-20

Publications (2)

Publication Number Publication Date
KR850000734A true KR850000734A (ko) 1985-03-09
KR910005524B1 KR910005524B1 (ko) 1991-07-31

Family

ID=24011585

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840003434A KR910005524B1 (ko) 1983-06-20 1984-06-19 구리도체 조성물

Country Status (9)

Country Link
US (1) US4521329A (ko)
EP (1) EP0131778B2 (ko)
JP (2) JPS6035405A (ko)
KR (1) KR910005524B1 (ko)
CA (1) CA1211930A (ko)
DE (1) DE3472327D1 (ko)
DK (1) DK159698C (ko)
GR (1) GR82171B (ko)
IE (1) IE55567B1 (ko)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4714570A (en) * 1984-07-17 1987-12-22 Matsushita Electric Industrial Co., Ltd. Conductor paste and method of manufacturing a multilayered ceramic body using the paste
JPS6167702A (ja) * 1984-09-07 1986-04-07 Mitsui Mining & Smelting Co Ltd 導電性粉末及びこれを用いた導電性組成物
US4594181A (en) * 1984-09-17 1986-06-10 E. I. Du Pont De Nemours And Company Metal oxide-coated copper powder
US4600604A (en) * 1984-09-17 1986-07-15 E. I. Du Pont De Nemours And Company Metal oxide-coated copper powder
JPS61194794A (ja) * 1985-02-22 1986-08-29 三菱電機株式会社 混成集積回路基板の製造方法
US4659406A (en) * 1985-04-22 1987-04-21 International Business Machines Corporation Method of bonding to ceramic and glass
KR900008781B1 (ko) * 1985-06-17 1990-11-29 마쯔시다덴기산교 가부시기가이샤 후막도체조성물
US4623482A (en) * 1985-10-25 1986-11-18 Cts Corporation Copper conductive paint for porcelainized metal substrates
US4687597A (en) * 1986-01-29 1987-08-18 E. I. Du Pont De Nemours And Company Copper conductor compositions
JPS6355807A (ja) * 1986-08-27 1988-03-10 古河電気工業株式会社 導電性ペ−スト
US4808770A (en) * 1986-10-02 1989-02-28 General Electric Company Thick-film copper conductor inks
US4733018A (en) * 1986-10-02 1988-03-22 Rca Corporation Thick film copper conductor inks
US4808673A (en) * 1986-10-02 1989-02-28 General Electric Company Dielectric inks for multilayer copper circuits
US4810420A (en) * 1986-10-02 1989-03-07 General Electric Company Thick film copper via-fill inks
JP2518839B2 (ja) * 1987-03-20 1996-07-31 富士通株式会社 導体ペ−スト組成物
JPS6413790A (en) * 1987-07-08 1989-01-18 Koa Corp Copper electrode paste
US5062891A (en) * 1987-08-13 1991-11-05 Ceramics Process Systems Corporation Metallic inks for co-sintering process
US4816615A (en) * 1987-08-20 1989-03-28 General Electric Company Thick film copper conductor inks
US4880567A (en) * 1987-08-20 1989-11-14 General Electric Company Thick film copper conductor inks
US4788163A (en) * 1987-08-20 1988-11-29 General Electric Company Devitrifying glass frits
JPH01192781A (ja) * 1988-01-26 1989-08-02 Dai Ichi Kogyo Seiyaku Co Ltd 銅厚膜導体組成物
US4859364A (en) * 1988-05-25 1989-08-22 E. I. Du Pont De Nemours And Company Conductive paste composition
US4906404A (en) * 1988-11-07 1990-03-06 Dai-Ichi Kogyo Seiyaku Co., Ltd. Copper conductor composition
US4937016A (en) * 1989-02-01 1990-06-26 Dai-Ichi Kogyo Seiyaku Co., Ltd. Copper conductor composition
JP2788510B2 (ja) * 1989-10-27 1998-08-20 第一工業製薬株式会社 銅ペースト組成物
US6207288B1 (en) 1991-02-05 2001-03-27 Cts Corporation Copper ink for aluminum nitride
JPH07161223A (ja) * 1993-12-10 1995-06-23 Murata Mfg Co Ltd 導電性ペーストおよび積層セラミックコンデンサ
US5407473A (en) * 1993-12-29 1995-04-18 Matsushita Electric Industrial Co., Ltd. Conductive ink
JPH0817241A (ja) * 1994-06-30 1996-01-19 Mitsuboshi Belting Ltd 銅導体ペーストおよび銅導体膜の製造方法
US5976628A (en) * 1995-12-08 1999-11-02 Mitsuboshi Belting Ltd. Copper conductor paste and production method of copper conductor film
US5928568A (en) * 1996-06-24 1999-07-27 Delco Electonics Corporation Thick film circuit having conductor composition with coated metallic particles
US5716552A (en) * 1996-06-24 1998-02-10 Delco Electronics Corp. Thick-film conductor compostions comprising silver or palladium particles coated with alumina or zirconia
US6146743A (en) 1997-02-21 2000-11-14 Medtronic, Inc. Barrier metallization in ceramic substrate for implantable medical devices
US5855995A (en) * 1997-02-21 1999-01-05 Medtronic, Inc. Ceramic substrate for implantable medical devices
JP2001243836A (ja) * 1999-12-21 2001-09-07 Murata Mfg Co Ltd 導電性ペースト及びそれを用いた印刷配線板
JP5044857B2 (ja) * 2001-05-30 2012-10-10 Dowaエレクトロニクス株式会社 酸化膜付き銅粉の製造方法
JP3840921B2 (ja) * 2001-06-13 2006-11-01 株式会社デンソー プリント基板のおよびその製造方法
JP4059148B2 (ja) * 2003-06-02 2008-03-12 株式会社村田製作所 導電性ペーストおよびセラミック多層基板
JP2011094236A (ja) * 2010-12-07 2011-05-12 Dowa Holdings Co Ltd 低温焼成用銅粉または導電ペースト用銅粉
US9676969B2 (en) 2011-08-03 2017-06-13 Hitachi Chemical Company, Ltd. Composition set, conductive substrate and method of producing the same, and conductive adhesive composition
KR101353149B1 (ko) * 2011-12-27 2014-01-27 삼성전기주식회사 구리분말 제조방법
JP2014199720A (ja) * 2013-03-29 2014-10-23 富士フイルム株式会社 導電膜形成用組成物およびこれを用いる導電膜の製造方法
US9351398B2 (en) 2013-04-04 2016-05-24 GM Global Technology Operations LLC Thick film conductive inks for electronic devices
EP2804183B1 (en) * 2013-05-14 2019-04-17 Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung e.V. Brown-red cu-comprising composition and a composite comprising the brown-red cu-comprising composition
US9681559B2 (en) 2013-12-19 2017-06-13 GM Global Technology Operations LLC Thick film circuits with conductive components formed using different conductive elements and related methods
US10774196B2 (en) 2016-09-22 2020-09-15 Toyota Motor Engineering & Manufacturing North America, Inc. Light weight composite of steel and polymer
JP6914999B2 (ja) * 2019-07-16 2021-08-04 Jx金属株式会社 表面処理銅粉
JP2021014634A (ja) * 2019-07-16 2021-02-12 Jx金属株式会社 表面処理銅粉

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2993815A (en) * 1959-05-25 1961-07-25 Bell Telephone Labor Inc Metallizing refractory substrates
US3647532A (en) * 1969-02-17 1972-03-07 Gen Electric Application of conductive inks
US3988647A (en) * 1974-09-27 1976-10-26 General Electric Company Method for making a circuit board and article made thereby
US4072771A (en) * 1975-11-28 1978-02-07 Bala Electronics Corporation Copper thick film conductor
DE2606963C3 (de) * 1976-02-20 1981-07-23 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung einer hartlötbaren Dickschichtschaltung auf ein vorzugsweise aus einer Oxidkeramik bestehendes Trägerplättchen
GB1559523A (en) * 1976-07-16 1980-01-23 Trw Inc Resistor material and resistor made thereform
US4070518A (en) * 1976-10-15 1978-01-24 E. I. Du Pont De Nemours And Company Copper metallizations
US4172919A (en) * 1977-04-22 1979-10-30 E. I. Du Pont De Nemours And Company Copper conductor compositions containing copper oxide and Bi2 O3
US4323483A (en) * 1979-11-08 1982-04-06 E. I. Du Pont De Nemours And Company Mixed oxide bonded copper conductor compositions
US4322316A (en) * 1980-08-22 1982-03-30 Ferro Corporation Thick film conductor employing copper oxide
IE53277B1 (en) * 1981-06-03 1988-09-28 Du Pont Conductive composition comprising copper,and flash bar produced therewith
JPS5868802A (ja) * 1981-10-21 1983-04-23 ティーディーケイ株式会社 導電性ペ−スト組成物

Also Published As

Publication number Publication date
KR910005524B1 (ko) 1991-07-31
DK298784A (da) 1984-12-21
CA1211930A (en) 1986-09-30
JPS62110202A (ja) 1987-05-21
DK298784D0 (da) 1984-06-19
DK159698C (da) 1991-04-15
JPS6035405A (ja) 1985-02-23
JPH0350365B2 (ko) 1991-08-01
JPH0334162B2 (ko) 1991-05-21
EP0131778A1 (en) 1985-01-23
US4521329A (en) 1985-06-04
EP0131778B1 (en) 1988-06-22
EP0131778B2 (en) 1991-12-11
IE841525L (en) 1984-12-20
GR82171B (ko) 1984-12-13
DK159698B (da) 1990-11-19
IE55567B1 (en) 1990-11-07
DE3472327D1 (en) 1988-07-28

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