KR840007481A - 얼룩지지 않는 산화루디늄 기제 저항기 조성물 - Google Patents

얼룩지지 않는 산화루디늄 기제 저항기 조성물 Download PDF

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KR840007481A
KR840007481A KR1019840000251A KR840000251A KR840007481A KR 840007481 A KR840007481 A KR 840007481A KR 1019840000251 A KR1019840000251 A KR 1019840000251A KR 840000251 A KR840000251 A KR 840000251A KR 840007481 A KR840007481 A KR 840007481A
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composition
weight
mixtures
group
oxygen
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KR1019840000251A
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KR910000922B1 (ko
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호마댈리 제이컵
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도늘드 에이 호우즈
이 아이 듀우판 디 네모아 엔드 캄파니
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
    • H01C17/06533—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
    • H01C17/0654—Oxides of the platinum group
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07—Glass compositions containing silica with less than 40% silica by weight containing lead
    • C03C3/072—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron
    • C03C3/074—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/108—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/10—Frit compositions, i.e. in a powdered or comminuted form containing lead
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/22—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions containing two or more distinct frits having different compositions

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Adjustable Resistors (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Conductive Materials (AREA)
  • Glass Compositions (AREA)

Abstract

내용 없음.

Description

얼룩지지 않는 산화루디늄 기제 저항기 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. (a) 5-75중량%의 신하루디늄기제 화합물: (b) 150℃이하에서는 열에 대해 안정한 반면 150-1200℃에서 조성물을 공기연소하면 분해되어 산소를 방출하는 산소-함유 비알칼리 금속 5-50중량%. (b)에 대한 (a)의 몰비는 적어도 0.1이상임. (c) 5-20중량%의 무기 결합제가 (d) 5-45중량%의 유기매제에 분산되어 있는 미세하게 분할된 입자의 혼합물로 본질적으로 구성된 프린트 될수 있는 두꺼운 피막 저항기 조성물.
  2. 제1항에 있어서, (a)가 조성물의 10-60중량%인 조성물.
  3. 제1항에 있어서, (b)가 조성물의 10-40중량%인 조성물.
  4. 제1항에 있어서, (b)가 조성물의 15-30중량%인 조성물.
  5. 제1항에 있어서, (a)가 RuO2, 루디늄함유피로클로르, RuO2의 전구물질 및 그의 혼합물로 구성된 군으로부터 선택되는 조성물.
  6. 제1항에 있어서 (a)가 비알칼리금속의 산화물, 크롬산염, 질산염 및 과망간산염과 그의 혼합물로 구성된 군으로부터 선택되는 조성물.
  7. 제6항에 있어서 (a)가 Ag2O인 조성물.
  8. 제6항에 있어서 (a)가 CoCrO4조성물.
  9. 제1항에 있어서 (c)가 납함유 유리, 납을 함유치 않은 망간함유유리 및 그 혼합물로 구성된 군으로부터 선택된 조성물.
  10. 제1항 내지 9항중 어느 하나의 조성물이나 그의 혼합물의 분산액을 건조하고 산화대기하에서 연소시켜 산소함유비 알칼리금속 화합물의 열분해, 유기매제의 휘발 및 무기 결합제의 액상소결이 일어나도록 한 분산액의 일정 패턴의 박층으로 구성된 저항기.
    ※ 참고사항:최초출원 내용에 의하여 공개하는 것임.
KR1019840000251A 1983-01-21 1984-01-20 내오염성 산화루디늄 기제 저항기 조성물 KR910000922B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/460,059 US4476039A (en) 1983-01-21 1983-01-21 Stain-resistant ruthenium oxide-based resistors
US460059 1983-01-21

Publications (2)

Publication Number Publication Date
KR840007481A true KR840007481A (ko) 1984-12-07
KR910000922B1 KR910000922B1 (ko) 1991-02-18

Family

ID=23827258

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840000251A KR910000922B1 (ko) 1983-01-21 1984-01-20 내오염성 산화루디늄 기제 저항기 조성물

Country Status (9)

Country Link
US (1) US4476039A (ko)
EP (1) EP0115798B1 (ko)
JP (2) JPH0612722B2 (ko)
KR (1) KR910000922B1 (ko)
CA (1) CA1211625A (ko)
DE (1) DE3470813D1 (ko)
DK (1) DK159347C (ko)
GR (1) GR79788B (ko)
IE (1) IE55141B1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100243809B1 (ko) * 1995-01-13 2000-02-01 요시무라 세이다로 유리섬유 프리폼의 제조방법

Families Citing this family (26)

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JPS581522B2 (ja) * 1978-03-01 1983-01-11 株式会社日立製作所 サ−ミスタ組成物
US4548741A (en) * 1982-06-01 1985-10-22 E. I. Du Pont De Nemours And Company Method for doping tin oxide
US4707346A (en) * 1982-06-01 1987-11-17 E. I. Du Pont De Nemours And Company Method for doping tin oxide
US4613539A (en) * 1982-06-01 1986-09-23 E. I. Du Pont De Nemours And Company Method for doping tin oxide
US4548742A (en) * 1983-12-19 1985-10-22 E. I. Du Pont De Nemours And Company Resistor compositions
JPS60145949A (ja) * 1984-01-06 1985-08-01 昭栄化学工業株式会社 抵抗組成物
US4539223A (en) * 1984-12-19 1985-09-03 E. I. Du Pont De Nemours And Company Thick film resistor compositions
JPH0812802B2 (ja) * 1986-11-14 1996-02-07 株式会社日立製作所 サ−マルヘツド用厚膜抵抗体材料，サ−マルヘツド用厚膜抵抗体，並びにサ−マルヘツド
US4780248A (en) * 1987-02-06 1988-10-25 E. I. Du Pont De Nemours And Company Thick film electronic materials
US5298330A (en) * 1987-08-31 1994-03-29 Ferro Corporation Thick film paste compositions for use with an aluminum nitride substrate
US5089172A (en) * 1987-08-31 1992-02-18 Ferro Corporation Thick film conductor compositions for use with an aluminum nitride substrate
JPH07105282B2 (ja) * 1988-05-13 1995-11-13 富士ゼロックス株式会社 抵抗体及び抵抗体の製造方法
US4906406A (en) * 1988-07-21 1990-03-06 E. I. Du Pont De Nemours And Company Thermistor composition
US4961999A (en) * 1988-07-21 1990-10-09 E. I. Du Pont De Nemours And Company Thermistor composition
US5096619A (en) * 1989-03-23 1992-03-17 E. I. Du Pont De Nemours And Company Thick film low-end resistor composition
US5165986A (en) * 1991-06-05 1992-11-24 Ferro Corporation Copper conductive composition for use on aluminum nitride substrate
JP2970713B2 (ja) * 1991-12-25 1999-11-02 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 厚膜抵抗体組成物
US5474711A (en) * 1993-05-07 1995-12-12 E. I. Du Pont De Nemours And Company Thick film resistor compositions
JP3397125B2 (ja) * 1998-03-12 2003-04-14 株式会社村田製作所 電子部品
DE19937442A1 (de) 1999-08-07 2001-02-08 Pfeiffer Erich Gmbh & Co Kg Spender für strömungsfähige Medien, insbesondere zurZerstäubung von Flüssigkeiten
KR100369565B1 (ko) * 1999-12-17 2003-01-29 대주정밀화학 주식회사 전기발열체용 저항 페이스트 조성물
US7384577B2 (en) * 2005-03-09 2008-06-10 E.I. Du Pont De Nemours And Company Black conductive thick film compositions, black electrodes, and methods of forming thereof
US7608206B1 (en) * 2008-04-18 2009-10-27 E.I. Dupont De Nemours & Company Non-lead resistor composition
TW201227761A (en) * 2010-12-28 2012-07-01 Du Pont Improved thick film resistive heater compositions comprising ag & ruo2, and methods of making same
US8808581B2 (en) * 2011-08-15 2014-08-19 E I Du Pont De Nemours And Company Conductive compositions containing Li2RuO3 and ion-exchanged Li2RuO3 and their use in the manufacture of semiconductor devices
JP6965543B2 (ja) * 2017-03-28 2021-11-10 住友金属鉱山株式会社 厚膜抵抗体用組成物、厚膜抵抗体用ペースト、及び厚膜抵抗体

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GB1210493A (en) * 1966-10-20 1970-10-28 Johnson Matthey Co Ltd Improvements in or relating to resistor composition
JPS5225952A (en) * 1975-08-25 1977-02-26 Daihatsu Diesel Kk Sealing cycle hot gas engine
US4051074A (en) * 1975-10-29 1977-09-27 Shoei Kagaku Kogyo Kabushiki Kaisha Resistor composition and method for its manufacture
US4101708A (en) * 1977-03-25 1978-07-18 E. I. Du Pont De Nemours And Company Resistor compositions
JPS5440756A (en) * 1977-09-05 1979-03-30 Matsushita Electric Works Ltd Electric hair shaver
FR2437427A1 (fr) * 1978-09-08 1980-04-25 Labo Electronique Physique Encre serigraphiable, a cuire sous atmosphere non oxydante
US4362656A (en) * 1981-07-24 1982-12-07 E. I. Du Pont De Nemours And Company Thick film resistor compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100243809B1 (ko) * 1995-01-13 2000-02-01 요시무라 세이다로 유리섬유 프리폼의 제조방법

Also Published As

Publication number Publication date
EP0115798B1 (en) 1988-04-27
EP0115798A1 (en) 1984-08-15
DK27384D0 (da) 1984-01-20
US4476039A (en) 1984-10-09
JPS59138305A (ja) 1984-08-08
CA1211625A (en) 1986-09-23
DK159347C (da) 1991-03-04
JPS6290902A (ja) 1987-04-25
DE3470813D1 (en) 1988-06-01
DK27384A (da) 1984-07-22
GR79788B (ko) 1984-10-31
KR910000922B1 (ko) 1991-02-18
IE55141B1 (en) 1990-06-06
DK159347B (da) 1990-10-01
JPH0612722B2 (ja) 1994-02-16

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