KR850004865A - 두꺼운 피막 저항기 조성물 - Google Patents
두꺼운 피막 저항기 조성물 Download PDFInfo
- Publication number
- KR850004865A KR850004865A KR1019840008045A KR840008045A KR850004865A KR 850004865 A KR850004865 A KR 850004865A KR 1019840008045 A KR1019840008045 A KR 1019840008045A KR 840008045 A KR840008045 A KR 840008045A KR 850004865 A KR850004865 A KR 850004865A
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- composition
- component
- thick film
- conductive phase
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims 10
- 239000010410 layer Substances 0.000 claims 3
- 229910006404 SnO 2 Inorganic materials 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 1
- 238000010304 firing Methods 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000012044 organic layer Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 239000002243 precursor Substances 0.000 claims 1
- 238000005245 sintering Methods 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
- H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
- H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
- H01C17/06533—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/06—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material including means to minimise changes in resistance with changes in temperature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49082—Resistor making
- Y10T29/49099—Coating resistive material on a base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31627—Next to aldehyde or ketone condensation product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Physics & Mathematics (AREA)
- Non-Adjustable Resistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Glass Compositions (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (6)
- (a) 근복적으로 하기의 일반식을 갖는 피로클로로(pyrodhlore):혹은 그의 선구 혼합물 1-95중량%와 99-1중량%의 SnO2로 이루어지는 전도성 상(conductive phase)40-85중량%; (b)무기 결합체 60-15중량%, 및 (c) CoCrO4,NiCrO4혹은 그의 혼합물 0.05-10중량%;의 미분말 입자가 (d) 유기매체내에 분산된 혼합물로 이루어지는 두꺼운 피막저항기 조성물.
- 제1항에 있어서, (a) 성분이 60-80중량%, (b) 성분이 40-20중량%, 그리고 (c) 성분이 0.05-2.5중량% 함유되어 있는 조성물.
- 제1항에 있어서, 상기 전도성상이 피로클로르 2-50중량%와 SnO290-50중량%를 함유하는 조성물.
- 제1항에 있어서, Y2=O인 조성물.
- 제1항에 있어서, 상기 크롬산염이 상기 고체의 0.05-2.5중량%를 포함하는 조성물.
- (a) 기질상에 제1항의 조성물의 박층을 형성시키고 (b)(a) 단계의 박층을 건조시켜 (c)(b) 단계의 건조층을 비산화성 대기하에서 연소(firing)시킴으로써, 상기 유기매체를 휘발시키고, 금속크롬산염을 분해시키며 상기 무기결합체와 상기 전도성 상을 소결시켜 제조하는 저항기 기소.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US562.964 | 1983-12-19 | ||
US06/562,964 US4548742A (en) | 1983-12-19 | 1983-12-19 | Resistor compositions |
US562,964 | 1983-12-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR850004865A true KR850004865A (ko) | 1985-07-27 |
KR890004940B1 KR890004940B1 (ko) | 1989-11-30 |
Family
ID=24248523
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019840008045A KR890004940B1 (ko) | 1983-12-19 | 1984-12-18 | 두꺼운 피막 저항기 조성물 |
Country Status (8)
Country | Link |
---|---|
US (1) | US4548742A (ko) |
EP (1) | EP0146120B1 (ko) |
JP (1) | JPS60157201A (ko) |
KR (1) | KR890004940B1 (ko) |
CA (1) | CA1228474A (ko) |
DE (1) | DE3469633D1 (ko) |
DK (1) | DK157957C (ko) |
GR (1) | GR82483B (ko) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4652397A (en) * | 1984-12-17 | 1987-03-24 | E. I. Du Pont De Nemours And Company | Resistor compositions |
US4657699A (en) * | 1984-12-17 | 1987-04-14 | E. I. Du Pont De Nemours And Company | Resistor compositions |
US4645621A (en) * | 1984-12-17 | 1987-02-24 | E. I. Du Pont De Nemours And Company | Resistor compositions |
US4720418A (en) * | 1985-07-01 | 1988-01-19 | Cts Corporation | Pre-reacted resistor paint, and resistors made therefrom |
US4654166A (en) * | 1986-06-13 | 1987-03-31 | E. I. Du Pont De Nemours And Company | Resistor compositions |
DE3627682A1 (de) * | 1986-08-14 | 1988-02-25 | Bbc Brown Boveri & Cie | Praezisionswiderstandsnetzwerk, insbesondere fuer dickschicht-hybrid-schaltungen |
JP2699381B2 (ja) * | 1987-04-28 | 1998-01-19 | 富士ゼロックス株式会社 | 抵抗体の製造方法 |
US4906406A (en) * | 1988-07-21 | 1990-03-06 | E. I. Du Pont De Nemours And Company | Thermistor composition |
US4961999A (en) * | 1988-07-21 | 1990-10-09 | E. I. Du Pont De Nemours And Company | Thermistor composition |
JP2802770B2 (ja) * | 1989-03-31 | 1998-09-24 | 昭栄化学工業株式会社 | 抵抗組成物 |
US5242623A (en) * | 1991-08-13 | 1993-09-07 | E. I. Du Pont De Nemours And Company | Screen-printable thick film paste composition |
DE4207220A1 (de) * | 1992-03-07 | 1993-09-09 | Philips Patentverwaltung | Festkoerperelement fuer eine thermionische kathode |
JPH08111047A (ja) * | 1994-10-12 | 1996-04-30 | Hitachi Ltd | 磁気記録再生装置 |
US6787068B1 (en) | 1999-10-08 | 2004-09-07 | E. I. Du Pont De Nemours And Company | Conductor composition |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4065743A (en) * | 1975-03-21 | 1977-12-27 | Trw, Inc. | Resistor material, resistor made therefrom and method of making the same |
US4129525A (en) * | 1977-12-02 | 1978-12-12 | Exxon Research & Engineering Co. | Method of making lead-rich and bismuth-rich pyrochlore compounds using an alkaline medium |
US4176094A (en) * | 1977-12-02 | 1979-11-27 | Exxon Research & Engineering Co. | Method of making stoichiometric lead and bismuth pyrochlore compounds using an alkaline medium |
US4163706A (en) * | 1977-12-02 | 1979-08-07 | Exxon Research & Engineering Co. | Bi2 [M2-x Bix ]O7-y compounds wherein M is Ru, Ir or mixtures thereof, and electrochemical devices containing same (Bat-24) |
FR2437427A1 (fr) * | 1978-09-08 | 1980-04-25 | Labo Electronique Physique | Encre serigraphiable, a cuire sous atmosphere non oxydante |
DE3220250A1 (de) * | 1982-05-28 | 1983-12-01 | Siemens AG, 1000 Berlin und 8000 München | Halbleiterbauelement mit planarstruktur |
US4548741A (en) * | 1982-06-01 | 1985-10-22 | E. I. Du Pont De Nemours And Company | Method for doping tin oxide |
US4476039A (en) * | 1983-01-21 | 1984-10-09 | E. I. Du Pont De Nemours And Company | Stain-resistant ruthenium oxide-based resistors |
-
1983
- 1983-12-19 US US06/562,964 patent/US4548742A/en not_active Expired - Lifetime
-
1984
- 1984-12-13 DE DE8484115336T patent/DE3469633D1/de not_active Expired
- 1984-12-13 EP EP19840115336 patent/EP0146120B1/en not_active Expired
- 1984-12-17 GR GR82483A patent/GR82483B/el unknown
- 1984-12-18 DK DK608584A patent/DK157957C/da not_active IP Right Cessation
- 1984-12-18 CA CA000470418A patent/CA1228474A/en not_active Expired
- 1984-12-18 KR KR1019840008045A patent/KR890004940B1/ko not_active IP Right Cessation
- 1984-12-19 JP JP59266533A patent/JPS60157201A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
DK157957B (da) | 1990-03-05 |
EP0146120A3 (en) | 1985-08-14 |
JPS60157201A (ja) | 1985-08-17 |
DK157957C (da) | 1990-08-13 |
DK608584A (da) | 1985-06-20 |
DK608584D0 (da) | 1984-12-18 |
EP0146120B1 (en) | 1988-03-02 |
DE3469633D1 (en) | 1988-04-07 |
GR82483B (en) | 1985-04-18 |
CA1228474A (en) | 1987-10-27 |
US4548742A (en) | 1985-10-22 |
KR890004940B1 (ko) | 1989-11-30 |
JPH0216001B2 (ko) | 1990-04-13 |
EP0146120A2 (en) | 1985-06-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR850004865A (ko) | 두꺼운 피막 저항기 조성물 | |
KR850000734A (ko) | 구리도체 조성물 | |
EP0116258A3 (de) | Polymerisierbare Zusammensetzung, damit beschichtetes Material und dessen Verwendung | |
KR840008517A (ko) | 자기 기록매체 | |
JPS5588065A (en) | Electrophotographic receptor | |
JPS54119925A (en) | Photosensitive material for electrophotography | |
KR950009357A (ko) | 박막 패턴 형성 방법 | |
KR930012181A (ko) | 후막 구리 페이스트 조성물 | |
KR860000903A (ko) | 모형재 조성물 | |
KR830004453A (ko) | 백금족 금속 촉매와 반도전형 중합체로 코우팅된 전극 | |
DK161791C (da) | Modstands- og/eller lederkomposition i hovedsagen bestaaende af et indhold af uorganiske pulverformede faste stoffer dispergeret i en organisk baerer | |
KR830005913A (ko) | 폐기물 캡슐화 개량방법 | |
KR850005663A (ko) | 탄화철을 함유하는 자기피복 조성물과 자기 기록매체 | |
KR930702773A (ko) | 개선된 저소성 콘덴서 유전체 | |
KR850003559A (ko) | 전착조성물 | |
JPS56130759A (en) | Electrophotographic photoreceptor | |
KR880010448A (ko) | 후막 전자 물질 | |
KR850006202A (ko) | 자기 피복 조성물 및 자기 기록 대체(磁氣被覆組成勿 및 磁氣記錄媒體) | |
KR850007366A (ko) | 서방성(徐放性) 입상 농약 | |
KR850005124A (ko) | 소결방지제-함유탄화철 침상입자물질 | |
KR880014587A (ko) | 도전성 페이스트 조성물 | |
KR920019961A (ko) | 고영율재료 및 이것을 이용한 표면피복공구 부재 | |
KR890017087A (ko) | 자성체를 함유한 전사재의 제조방법 | |
KR870002620A (ko) | 유기용제를 사용한 세라믹박판의 제조방법 | |
JPS5480750A (en) | Electronic photographic photosensitive material of laminated type |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 19981001 Year of fee payment: 10 |
|
LAPS | Lapse due to unpaid annual fee |