KR850004865A - 두꺼운 피막 저항기 조성물 - Google Patents

두꺼운 피막 저항기 조성물 Download PDF

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Publication number
KR850004865A
KR850004865A KR1019840008045A KR840008045A KR850004865A KR 850004865 A KR850004865 A KR 850004865A KR 1019840008045 A KR1019840008045 A KR 1019840008045A KR 840008045 A KR840008045 A KR 840008045A KR 850004865 A KR850004865 A KR 850004865A
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KR
South Korea
Prior art keywords
weight
composition
component
thick film
conductive phase
Prior art date
Application number
KR1019840008045A
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English (en)
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KR890004940B1 (ko
Inventor
호오머데일리 제이곱
Original Assignee
도늘드 에이 호우즈
이 아이 듀우판 디 네모아 앤드캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 도늘드 에이 호우즈, 이 아이 듀우판 디 네모아 앤드캄파니 filed Critical 도늘드 에이 호우즈
Publication of KR850004865A publication Critical patent/KR850004865A/ko
Application granted granted Critical
Publication of KR890004940B1 publication Critical patent/KR890004940B1/ko

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06513Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
    • H01C17/06533Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/06Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material including means to minimise changes in resistance with changes in temperature
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49082Resistor making
    • Y10T29/49099Coating resistive material on a base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31551Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31627Next to aldehyde or ketone condensation product

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Physics & Mathematics (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Glass Compositions (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

내용 없음

Description

두꺼운 피막 저항기 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (6)

  1. (a) 근복적으로 하기의 일반식을 갖는 피로클로로(pyrodhlore):
    혹은 그의 선구 혼합물 1-95중량%와 99-1중량%의 SnO2로 이루어지는 전도성 상(conductive phase)40-85중량%; (b)무기 결합체 60-15중량%, 및 (c) CoCrO4,NiCrO4혹은 그의 혼합물 0.05-10중량%;의 미분말 입자가 (d) 유기매체내에 분산된 혼합물로 이루어지는 두꺼운 피막저항기 조성물.
  2. 제1항에 있어서, (a) 성분이 60-80중량%, (b) 성분이 40-20중량%, 그리고 (c) 성분이 0.05-2.5중량% 함유되어 있는 조성물.
  3. 제1항에 있어서, 상기 전도성상이 피로클로르 2-50중량%와 SnO290-50중량%를 함유하는 조성물.
  4. 제1항에 있어서, Y2=O인 조성물.
  5. 제1항에 있어서, 상기 크롬산염이 상기 고체의 0.05-2.5중량%를 포함하는 조성물.
  6. (a) 기질상에 제1항의 조성물의 박층을 형성시키고 (b)(a) 단계의 박층을 건조시켜 (c)(b) 단계의 건조층을 비산화성 대기하에서 연소(firing)시킴으로써, 상기 유기매체를 휘발시키고, 금속크롬산염을 분해시키며 상기 무기결합체와 상기 전도성 상을 소결시켜 제조하는 저항기 기소.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019840008045A 1983-12-19 1984-12-18 두꺼운 피막 저항기 조성물 KR890004940B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US562.964 1983-12-19
US06/562,964 US4548742A (en) 1983-12-19 1983-12-19 Resistor compositions
US562,964 1983-12-19

Publications (2)

Publication Number Publication Date
KR850004865A true KR850004865A (ko) 1985-07-27
KR890004940B1 KR890004940B1 (ko) 1989-11-30

Family

ID=24248523

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840008045A KR890004940B1 (ko) 1983-12-19 1984-12-18 두꺼운 피막 저항기 조성물

Country Status (8)

Country Link
US (1) US4548742A (ko)
EP (1) EP0146120B1 (ko)
JP (1) JPS60157201A (ko)
KR (1) KR890004940B1 (ko)
CA (1) CA1228474A (ko)
DE (1) DE3469633D1 (ko)
DK (1) DK157957C (ko)
GR (1) GR82483B (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4652397A (en) * 1984-12-17 1987-03-24 E. I. Du Pont De Nemours And Company Resistor compositions
US4657699A (en) * 1984-12-17 1987-04-14 E. I. Du Pont De Nemours And Company Resistor compositions
US4645621A (en) * 1984-12-17 1987-02-24 E. I. Du Pont De Nemours And Company Resistor compositions
US4720418A (en) * 1985-07-01 1988-01-19 Cts Corporation Pre-reacted resistor paint, and resistors made therefrom
US4654166A (en) * 1986-06-13 1987-03-31 E. I. Du Pont De Nemours And Company Resistor compositions
DE3627682A1 (de) * 1986-08-14 1988-02-25 Bbc Brown Boveri & Cie Praezisionswiderstandsnetzwerk, insbesondere fuer dickschicht-hybrid-schaltungen
JP2699381B2 (ja) * 1987-04-28 1998-01-19 富士ゼロックス株式会社 抵抗体の製造方法
US4906406A (en) * 1988-07-21 1990-03-06 E. I. Du Pont De Nemours And Company Thermistor composition
US4961999A (en) * 1988-07-21 1990-10-09 E. I. Du Pont De Nemours And Company Thermistor composition
JP2802770B2 (ja) * 1989-03-31 1998-09-24 昭栄化学工業株式会社 抵抗組成物
US5242623A (en) * 1991-08-13 1993-09-07 E. I. Du Pont De Nemours And Company Screen-printable thick film paste composition
DE4207220A1 (de) * 1992-03-07 1993-09-09 Philips Patentverwaltung Festkoerperelement fuer eine thermionische kathode
JPH08111047A (ja) * 1994-10-12 1996-04-30 Hitachi Ltd 磁気記録再生装置
US6787068B1 (en) 1999-10-08 2004-09-07 E. I. Du Pont De Nemours And Company Conductor composition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4065743A (en) * 1975-03-21 1977-12-27 Trw, Inc. Resistor material, resistor made therefrom and method of making the same
US4129525A (en) * 1977-12-02 1978-12-12 Exxon Research & Engineering Co. Method of making lead-rich and bismuth-rich pyrochlore compounds using an alkaline medium
US4176094A (en) * 1977-12-02 1979-11-27 Exxon Research & Engineering Co. Method of making stoichiometric lead and bismuth pyrochlore compounds using an alkaline medium
US4163706A (en) * 1977-12-02 1979-08-07 Exxon Research & Engineering Co. Bi2 [M2-x Bix ]O7-y compounds wherein M is Ru, Ir or mixtures thereof, and electrochemical devices containing same (Bat-24)
FR2437427A1 (fr) * 1978-09-08 1980-04-25 Labo Electronique Physique Encre serigraphiable, a cuire sous atmosphere non oxydante
DE3220250A1 (de) * 1982-05-28 1983-12-01 Siemens AG, 1000 Berlin und 8000 München Halbleiterbauelement mit planarstruktur
US4548741A (en) * 1982-06-01 1985-10-22 E. I. Du Pont De Nemours And Company Method for doping tin oxide
US4476039A (en) * 1983-01-21 1984-10-09 E. I. Du Pont De Nemours And Company Stain-resistant ruthenium oxide-based resistors

Also Published As

Publication number Publication date
DK157957B (da) 1990-03-05
EP0146120A3 (en) 1985-08-14
JPS60157201A (ja) 1985-08-17
DK157957C (da) 1990-08-13
DK608584A (da) 1985-06-20
DK608584D0 (da) 1984-12-18
EP0146120B1 (en) 1988-03-02
DE3469633D1 (en) 1988-04-07
GR82483B (en) 1985-04-18
CA1228474A (en) 1987-10-27
US4548742A (en) 1985-10-22
KR890004940B1 (ko) 1989-11-30
JPH0216001B2 (ko) 1990-04-13
EP0146120A2 (en) 1985-06-26

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