KR830009646A - 반도체 소자 - Google Patents
반도체 소자 Download PDFInfo
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- KR830009646A KR830009646A KR1019820001382A KR820001382A KR830009646A KR 830009646 A KR830009646 A KR 830009646A KR 1019820001382 A KR1019820001382 A KR 1019820001382A KR 820001382 A KR820001382 A KR 820001382A KR 830009646 A KR830009646 A KR 830009646A
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- South Korea
- Prior art keywords
- semiconductor film
- hydrogen
- polycrystalline
- lithium
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- 239000004065 semiconductor Substances 0.000 title claims description 26
- 239000010408 film Substances 0.000 claims 17
- 229910052739 hydrogen Inorganic materials 0.000 claims 12
- 239000001257 hydrogen Substances 0.000 claims 12
- 239000010409 thin film Substances 0.000 claims 10
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims 9
- 229910052744 lithium Inorganic materials 0.000 claims 9
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 8
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 8
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 8
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 8
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 8
- 229910052794 bromium Inorganic materials 0.000 claims 8
- 229910052792 caesium Inorganic materials 0.000 claims 8
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims 8
- 229910052801 chlorine Inorganic materials 0.000 claims 8
- 239000000460 chlorine Substances 0.000 claims 8
- 229910052731 fluorine Inorganic materials 0.000 claims 8
- 239000011737 fluorine Substances 0.000 claims 8
- 150000002431 hydrogen Chemical class 0.000 claims 8
- 229910052700 potassium Inorganic materials 0.000 claims 8
- 239000011591 potassium Substances 0.000 claims 8
- 229910052708 sodium Inorganic materials 0.000 claims 8
- 239000011734 sodium Substances 0.000 claims 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 7
- 229910052736 halogen Inorganic materials 0.000 claims 7
- 150000002367 halogens Chemical class 0.000 claims 7
- 229910052701 rubidium Inorganic materials 0.000 claims 7
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims 7
- 229910052710 silicon Inorganic materials 0.000 claims 7
- 239000010703 silicon Substances 0.000 claims 7
- 239000013078 crystal Substances 0.000 claims 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 4
- 230000005669 field effect Effects 0.000 claims 4
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 4
- 229910052740 iodine Inorganic materials 0.000 claims 4
- 239000011630 iodine Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 2
- 239000000969 carrier Substances 0.000 claims 1
- 239000012535 impurity Substances 0.000 claims 1
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Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제4도에서 7도는 본 발명의 반도체 소자에서 중요한 부분의 단면도이다.
Claims (16)
- 다결정 반도체막이 수소, 불소, 염소, 브롬, 요오드, 리튬, 나트륨, 칼륨, 루비듐, 세슘 등의 원소중 최소한 하나의 원소를 포함하여 원소의 총 함유량이 반도체막 평균의 원자비로 100ppm에서 40%까지 대체로 한정지어지는 결정면의 결정 경계를 갖도록 하여서 몸체의 기판상에 형성된 반도체소자.
- 제1항에 있어서 반도체 소자의 다결정 반도체막이 주로 실리콘으로 만들어진 반도체 소자.
- 제1항 및 2항에 있어서 다결정 반도체막이 불소, 염소, 브롬, 요오드로 구성되는 할로겐원소중 하나의 원소와 수소, 리튬, 나트륨, 칼륨, 리튬, 세슘으로 구성되는 원소중 최소한 하나의 원소를 포함하는 반도체 소자.
- 제3항에 있어서 할로겐 원소의 함유량과 수소나 1가 금속원소의 함유량이 각각100ppm에서 10%까지의 원자비로 하는 반도체 소자.
- 최소한 반도체막과 게이트 전극 사이에 있는 처음과 두번째의 불순물 지역에서는, 다결정 반도체막이 수소, 불소, 염소, 브롬, 요오드, 리튬, 나트륨, 칼륨, 루비듐, 세슘등으로 구성되는 원소중에서 선택된 최소한 하나의 원소를 포함하여 그 포함된 원소의 총함유량이 반도체막의 평균적인 원자비가 100pm에서 40%까지 대체로 한정되는 결정면 경계를 갖도록하여서 기판상에 형성된 전계효과 트랜지스터.
- 제5항에 있어서 다결정 반도체막이 주로 실리콘으로 만들어진 전계효과 트랜지스터.
- 제5항 및 제6항에 있어서 다결정 반도체막이 불소, 염소, 브롬, 요오드로 구성되는 할로겐 원소중 선택된 최소한 하나의 원소와 수소, 리튬, 나트륨, 칼륨, 루비듐, 세슘으로 구성된 원소중에서 선택된 최소한 하나의 원소를 포함하여서 된 전계효과 트랜지스터.
- 제7항에 있어서 할로겐 원소의 함유량과 수소와 1가 금속원소의 함유량이 각각 원자비로 100ppm에서 10%로 하는 전계효과 트랜지스터.
- 기판과, 주로 실리콘으로 구성된 다결정 실리콘 박막과, 실리콘 박막의 양 반대면에 처음의 투명전극과 두번째의 전극을 갖고 있으며 그리고 빛을 쪼일때 나오는 양과 음의 캐리어를 구별하는데 사용되는 실리콘 박막의 접합부분을 갖고 있되, 그곳에 상기 다결정 실리콘 박막이 수소, 불소, 염소, 브롬, 요오드, 리튬, 나트륨, 칼륨, 루비듐, 세슘으로 구성된 원소중에서 선택된 최소한 하나의 원소를 포함하여 포함된 원소의 총 함유량이 반도체막의 평균적인 원자비로 100ppm에서 40%까지 대체로 한정된 결정면 경계를 갖도록 하여서 된 박막태양전지.
- 제9항에 있어서, 다결정 박막이 주로 실리콘으로 만들어진 박막태양전지.
- 제9항 및 제10항에 있어서 상기 다결정 박막이 불소, 염소, 브롬, 요오드로 구성된 할로겐 원소중에서 선택된 최소한 하나의 원소와, 수소, 리튬, 나트륨, 칼륨, 루비듐, 세슘등의 원소중에서 선택된 최소한 하나의 원소를 포함하여서 된 박막태양전지.
- 제11항에 있어서 상기 할로겐 원소의 함유량과 수소나 1가 속원소의 함유량이 각각 100ppm에서 10%의 원자비로 하는 박막태양전지.
- 기판상에 형성된 다결정 반도체막과, pn접합의 반대측에 처음과 두번째 전극이 있어 반도체막에 형성된 상기 pn접합을 갖고 있되 그곳의 다결정 반도체막이 수소,불소, 염소, 브롬, 요오드, 리튬, 나트륨, 칼륨, 루비듐, 세슘으로 구성되는 원소중에서 선택된 최소한 하나의 원소를 포함하여 그 포함된 원소의 총함유량이 반도체막의 평균적인 원자비로 100ppm에서 40%까지 대체로 한정된 결정 경계면을 갖도록 하여서된 다이오드.
- 제13항에 있어서, 다결정 반도체막이 주로 실리콘으로 구성되 있는 다이오드.
- 제13항 및 14항에 있어서 다결정 반도체막이 불소, 염소, 브롬, 요오드로 구성되는 원소중에서 선택된 최소한 하나의 할로겐원소와, 수소, 리튬, 나트륨, 칼륨, 루비듐, 세슘으로 구성되는 원소중 최소한 하나의 원소를 포함하고 있는 반도체소자.
- 제14항에 있어서 할로겐 원소의 함유량과 수소나 1가 금속원소의 함유량은 각각 100ppm에서의 10%의 원자비로 되어있는 반도체소자.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56045553A JPS57160123A (en) | 1981-03-30 | 1981-03-30 | Semiconductor device |
JP81-45553 | 1981-03-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR830009646A true KR830009646A (ko) | 1983-12-22 |
KR860001161B1 KR860001161B1 (ko) | 1986-08-18 |
Family
ID=12722546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR8201382A KR860001161B1 (ko) | 1981-03-30 | 1982-03-30 | 반도체 장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US4613382A (ko) |
EP (1) | EP0061923B1 (ko) |
JP (1) | JPS57160123A (ko) |
KR (1) | KR860001161B1 (ko) |
CA (1) | CA1189940A (ko) |
DE (1) | DE3278527D1 (ko) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3241959A1 (de) * | 1981-11-13 | 1983-05-26 | Canon K.K., Tokyo | Halbleiterbauelement |
DE3300400A1 (de) * | 1982-01-06 | 1983-07-14 | Canon K.K., Tokyo | Halbleiterbauelement |
EP0129037B1 (en) * | 1983-06-17 | 1987-09-02 | Texas Instruments Incorporated | Polysilicon fets |
US5111260A (en) * | 1983-06-17 | 1992-05-05 | Texax Instruments Incorporated | Polysilicon FETs |
US4670763A (en) * | 1984-05-14 | 1987-06-02 | Energy Conversion Devices, Inc. | Thin film field effect transistor |
US4727044A (en) | 1984-05-18 | 1988-02-23 | Semiconductor Energy Laboratory Co., Ltd. | Method of making a thin film transistor with laser recrystallized source and drain |
US4717681A (en) * | 1986-05-19 | 1988-01-05 | Texas Instruments Incorporated | Method of making a heterojunction bipolar transistor with SIPOS |
US4821091A (en) * | 1986-07-22 | 1989-04-11 | The United States Of America As Represented By The United States Department Of Energy | Polysilicon photoconductor for integrated circuits |
US4945065A (en) * | 1988-06-02 | 1990-07-31 | Mobil Solar Energy Corporation | Method of passivating crystalline substrates |
JPH0323639A (ja) * | 1989-06-21 | 1991-01-31 | Sony Corp | 薄膜トランジスタ |
JPH0388321A (ja) * | 1989-08-31 | 1991-04-12 | Tonen Corp | 多結晶シリコン薄膜 |
US5051786A (en) * | 1989-10-24 | 1991-09-24 | Mcnc | Passivated polycrystalline semiconductors quantum well/superlattice structures fabricated thereof |
JPH0828379B2 (ja) * | 1990-05-28 | 1996-03-21 | 株式会社東芝 | 半導体装置の製造方法 |
DE69125886T2 (de) * | 1990-05-29 | 1997-11-20 | Semiconductor Energy Lab | Dünnfilmtransistoren |
JPH0611705A (ja) * | 1992-01-31 | 1994-01-21 | Sony Corp | 能動素子基板 |
JPH06151801A (ja) * | 1992-11-13 | 1994-05-31 | Canon Inc | 光電変換装置及び光電変換装置の製造方法 |
US5897346A (en) * | 1994-02-28 | 1999-04-27 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing a thin film transistor |
US5620906A (en) * | 1994-02-28 | 1997-04-15 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing semiconductor device by introducing hydrogen ions |
JP4003888B2 (ja) * | 1995-06-06 | 2007-11-07 | 旭化成エレクトロニクス株式会社 | 半導体装置およびその製造方法 |
JPH09148581A (ja) * | 1995-11-17 | 1997-06-06 | Sharp Corp | 薄膜半導体装置の製造方法 |
US5665611A (en) * | 1996-01-31 | 1997-09-09 | Micron Technology, Inc. | Method of forming a thin film transistor using fluorine passivation |
TW322591B (ko) * | 1996-02-09 | 1997-12-11 | Handotai Energy Kenkyusho Kk | |
US6936485B2 (en) * | 2000-03-27 | 2005-08-30 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a light emitting device |
DE102005013537A1 (de) * | 2004-03-24 | 2005-10-20 | Sharp Kk | Fotoelektrischer Wandler und Herstellverfahren für einen solchen |
MX2010007723A (es) * | 2008-01-15 | 2010-08-09 | First Solar Inc | Dispositivos fotovoltaicos tratados con plasma. |
US9299863B2 (en) * | 2008-05-07 | 2016-03-29 | The Hong Kong University Of Science And Technology | Ultrathin film multi-crystalline photovoltaic device |
US20120006395A1 (en) * | 2010-07-08 | 2012-01-12 | E. I. Du Pont De Nemours And Company | Coated stainless steel substrate |
JP2012019146A (ja) * | 2010-07-09 | 2012-01-26 | Sony Corp | 撮像装置、表示撮像装置および電子機器 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4196438A (en) * | 1976-09-29 | 1980-04-01 | Rca Corporation | Article and device having an amorphous silicon containing a halogen and method of fabrication |
US4342044A (en) * | 1978-03-08 | 1982-07-27 | Energy Conversion Devices, Inc. | Method for optimizing photoresponsive amorphous alloys and devices |
US4217374A (en) * | 1978-03-08 | 1980-08-12 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors |
US4178415A (en) * | 1978-03-22 | 1979-12-11 | Energy Conversion Devices, Inc. | Modified amorphous semiconductors and method of making the same |
US4239554A (en) * | 1978-07-17 | 1980-12-16 | Shunpei Yamazaki | Semiconductor photoelectric conversion device |
JPS55151374A (en) * | 1979-05-14 | 1980-11-25 | Shunpei Yamazaki | Semiconductor device |
JPS55151329A (en) * | 1979-05-14 | 1980-11-25 | Shunpei Yamazaki | Fabricating method of semiconductor device |
-
1981
- 1981-03-30 JP JP56045553A patent/JPS57160123A/ja active Granted
-
1982
- 1982-03-29 DE DE8282301643T patent/DE3278527D1/de not_active Expired
- 1982-03-29 EP EP82301643A patent/EP0061923B1/en not_active Expired
- 1982-03-29 CA CA000399652A patent/CA1189940A/en not_active Expired
- 1982-03-30 KR KR8201382A patent/KR860001161B1/ko active
-
1985
- 1985-03-14 US US06/710,953 patent/US4613382A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE3278527D1 (en) | 1988-06-23 |
CA1189940A (en) | 1985-07-02 |
JPS57160123A (en) | 1982-10-02 |
KR860001161B1 (ko) | 1986-08-18 |
JPH0363208B2 (ko) | 1991-09-30 |
EP0061923A1 (en) | 1982-10-06 |
US4613382A (en) | 1986-09-23 |
EP0061923B1 (en) | 1988-05-18 |
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