KR20250061862A - 가스 분석 장치 - Google Patents

가스 분석 장치 Download PDF

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Publication number
KR20250061862A
KR20250061862A KR1020257013273A KR20257013273A KR20250061862A KR 20250061862 A KR20250061862 A KR 20250061862A KR 1020257013273 A KR1020257013273 A KR 1020257013273A KR 20257013273 A KR20257013273 A KR 20257013273A KR 20250061862 A KR20250061862 A KR 20250061862A
Authority
KR
South Korea
Prior art keywords
gas
plasma
analysis device
sample
gas analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257013273A
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English (en)
Korean (ko)
Inventor
나오키 타카하시
프라카시 스리다르 무르티
Original Assignee
아토나프 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아토나프 가부시키가이샤 filed Critical 아토나프 가부시키가이샤
Publication of KR20250061862A publication Critical patent/KR20250061862A/ko
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/626—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using heat to ionise a gas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32963—End-point detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32981—Gas analysis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0422—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for gaseous samples
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/34—Dynamic spectrometers
    • H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electrochemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
KR1020257013273A 2019-03-25 2020-03-24 가스 분석 장치 Pending KR20250061862A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2019-057148 2019-03-25
JP2019057148 2019-03-25
KR1020247005439A KR20240026251A (ko) 2019-03-25 2020-03-24 가스 분석 장치
PCT/JP2020/012839 WO2020196452A1 (ja) 2019-03-25 2020-03-24 ガス分析装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020247005439A Division KR20240026251A (ko) 2019-03-25 2020-03-24 가스 분석 장치

Publications (1)

Publication Number Publication Date
KR20250061862A true KR20250061862A (ko) 2025-05-08

Family

ID=72610978

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020257013273A Pending KR20250061862A (ko) 2019-03-25 2020-03-24 가스 분석 장치
KR1020217023565A Active KR102401449B1 (ko) 2019-03-25 2020-03-24 가스 분석 장치
KR1020247005439A Ceased KR20240026251A (ko) 2019-03-25 2020-03-24 가스 분석 장치
KR1020227016666A Active KR102639194B1 (ko) 2019-03-25 2020-03-24 가스 분석 장치

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020217023565A Active KR102401449B1 (ko) 2019-03-25 2020-03-24 가스 분석 장치
KR1020247005439A Ceased KR20240026251A (ko) 2019-03-25 2020-03-24 가스 분석 장치
KR1020227016666A Active KR102639194B1 (ko) 2019-03-25 2020-03-24 가스 분석 장치

Country Status (6)

Country Link
US (3) US11557469B2 (https=)
JP (4) JP6783496B1 (https=)
KR (4) KR20250061862A (https=)
CN (3) CN116148335A (https=)
TW (3) TWI888050B (https=)
WO (1) WO2020196452A1 (https=)

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TWI888050B (zh) * 2019-03-25 2025-06-21 日商亞多納富有限公司 製程系統
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CN117256038A (zh) * 2021-03-31 2023-12-19 英福康有限公司 用于在大的压力范围内产生等离子体的设备和方法以及用于借助于这样的设备进行光学气体分析/检测的系统和方法
US12469751B2 (en) 2021-06-03 2025-11-11 Applied Materials, Inc. Apparatus to detect and quantify radical concentration in semiconductor processing systems
JP7725306B2 (ja) * 2021-09-14 2025-08-19 東京エレクトロン株式会社 基板処理システム及びガス計測方法
KR20240088888A (ko) * 2021-10-29 2024-06-20 아토나프 가부시키가이샤 가스 분석 장치 및 제어 방법
WO2024019479A1 (ko) * 2022-07-18 2024-01-25 차동호 가스분석장치 및 이를 포함하는 기판처리시스템
KR102734665B1 (ko) * 2022-07-18 2024-11-27 차동호 가스분석장치 및 이를 포함하는 기판처리시스템
KR102667398B1 (ko) * 2022-07-18 2024-05-20 차동호 가스분석장치 및 이를 포함하는 기판처리시스템
KR102734657B1 (ko) * 2022-07-18 2024-11-27 차동호 가스분석장치 및 이를 포함하는 기판처리시스템
TW202501613A (zh) * 2023-04-25 2025-01-01 日商亞多納富有限公司 氣體分析器設備
US20250138429A1 (en) * 2023-10-31 2025-05-01 Tokyo Electron Limited Endpoint detection in dry development of photoresist
US20250308867A1 (en) * 2024-03-29 2025-10-02 Tokyo Electron Limited High-performance adaptable sampling system

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Publication number Publication date
JP2021007108A (ja) 2021-01-21
JP2025060825A (ja) 2025-04-10
CN113678228A (zh) 2021-11-19
US20220044919A1 (en) 2022-02-10
WO2020196452A1 (ja) 2020-10-01
JP2024050730A (ja) 2024-04-10
KR20240026251A (ko) 2024-02-27
US12368032B2 (en) 2025-07-22
KR20220070339A (ko) 2022-05-30
KR102401449B1 (ko) 2022-05-23
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