TWI888050B - 製程系統 - Google Patents

製程系統 Download PDF

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Publication number
TWI888050B
TWI888050B TW113109314A TW113109314A TWI888050B TW I888050 B TWI888050 B TW I888050B TW 113109314 A TW113109314 A TW 113109314A TW 113109314 A TW113109314 A TW 113109314A TW I888050 B TWI888050 B TW I888050B
Authority
TW
Taiwan
Prior art keywords
gas
plasma
sample
unit
analysis device
Prior art date
Application number
TW113109314A
Other languages
English (en)
Chinese (zh)
Other versions
TW202429066A (zh
Inventor
高橋直樹
普拉卡什史帝德哈爾 穆爾帝
Original Assignee
日商亞多納富有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商亞多納富有限公司 filed Critical 日商亞多納富有限公司
Publication of TW202429066A publication Critical patent/TW202429066A/zh
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Publication of TWI888050B publication Critical patent/TWI888050B/zh

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/626—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using heat to ionise a gas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32963—End-point detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32981—Gas analysis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0422—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for gaseous samples
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/34—Dynamic spectrometers
    • H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electrochemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
TW113109314A 2019-03-25 2020-03-23 製程系統 TWI888050B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-057148 2019-03-25
JP2019057148 2019-03-25

Publications (2)

Publication Number Publication Date
TW202429066A TW202429066A (zh) 2024-07-16
TWI888050B true TWI888050B (zh) 2025-06-21

Family

ID=72610978

Family Applications (3)

Application Number Title Priority Date Filing Date
TW113109314A TWI888050B (zh) 2019-03-25 2020-03-23 製程系統
TW109109668A TWI838493B (zh) 2019-03-25 2020-03-23 氣體分析裝置
TW114118446A TW202534314A (zh) 2019-03-25 2020-03-23 製程系統及其控制方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW109109668A TWI838493B (zh) 2019-03-25 2020-03-23 氣體分析裝置
TW114118446A TW202534314A (zh) 2019-03-25 2020-03-23 製程系統及其控制方法

Country Status (6)

Country Link
US (3) US11557469B2 (https=)
JP (4) JP6783496B1 (https=)
KR (4) KR20250061862A (https=)
CN (3) CN116148335A (https=)
TW (3) TWI888050B (https=)
WO (1) WO2020196452A1 (https=)

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CN117256038A (zh) * 2021-03-31 2023-12-19 英福康有限公司 用于在大的压力范围内产生等离子体的设备和方法以及用于借助于这样的设备进行光学气体分析/检测的系统和方法
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WO2024019479A1 (ko) * 2022-07-18 2024-01-25 차동호 가스분석장치 및 이를 포함하는 기판처리시스템
KR102734665B1 (ko) * 2022-07-18 2024-11-27 차동호 가스분석장치 및 이를 포함하는 기판처리시스템
KR102667398B1 (ko) * 2022-07-18 2024-05-20 차동호 가스분석장치 및 이를 포함하는 기판처리시스템
KR102734657B1 (ko) * 2022-07-18 2024-11-27 차동호 가스분석장치 및 이를 포함하는 기판처리시스템
TW202501613A (zh) * 2023-04-25 2025-01-01 日商亞多納富有限公司 氣體分析器設備
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Also Published As

Publication number Publication date
JP2021007108A (ja) 2021-01-21
JP2025060825A (ja) 2025-04-10
CN113678228A (zh) 2021-11-19
US20220044919A1 (en) 2022-02-10
WO2020196452A1 (ja) 2020-10-01
JP2024050730A (ja) 2024-04-10
KR20240026251A (ko) 2024-02-27
US12368032B2 (en) 2025-07-22
KR20220070339A (ko) 2022-05-30
KR102401449B1 (ko) 2022-05-23
JP7618309B2 (ja) 2025-01-21
TW202429066A (zh) 2024-07-16
JPWO2020196452A1 (ja) 2021-04-08
US20240266155A1 (en) 2024-08-08
KR20250061862A (ko) 2025-05-08
KR102639194B1 (ko) 2024-02-20
TW202534314A (zh) 2025-09-01
US11557469B2 (en) 2023-01-17
CN118116790A (zh) 2024-05-31
TW202037902A (zh) 2020-10-16
JP6783496B1 (ja) 2020-11-11
TWI838493B (zh) 2024-04-11
US20230187190A1 (en) 2023-06-15
KR20210096310A (ko) 2021-08-04
US11942312B2 (en) 2024-03-26
CN116148335A (zh) 2023-05-23
JP7433652B2 (ja) 2024-02-20

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