KR20230165904A - 절연막 형성용 감방사선성 조성물, 패턴을 갖는 수지막 및 반도체 회로 기판 - Google Patents

절연막 형성용 감방사선성 조성물, 패턴을 갖는 수지막 및 반도체 회로 기판 Download PDF

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KR20230165904A
KR20230165904A KR1020237031975A KR20237031975A KR20230165904A KR 20230165904 A KR20230165904 A KR 20230165904A KR 1020237031975 A KR1020237031975 A KR 1020237031975A KR 20237031975 A KR20237031975 A KR 20237031975A KR 20230165904 A KR20230165904 A KR 20230165904A
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group
polymer
compound
radiation
insulating film
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료지 다타라
히로카즈 이토
다쿠 오가와
신야 나카후지
쇼마 아나부키
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제이에스알 가부시끼가이샤
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  • Compositions Of Macromolecular Compounds (AREA)
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  • Materials For Photolithography (AREA)
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