KR20230121047A - 은용 에칭액, 및 그것을 이용한 프린트 배선판의 제조 방법 - Google Patents

은용 에칭액, 및 그것을 이용한 프린트 배선판의 제조 방법 Download PDF

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Publication number
KR20230121047A
KR20230121047A KR1020237019066A KR20237019066A KR20230121047A KR 20230121047 A KR20230121047 A KR 20230121047A KR 1020237019066 A KR1020237019066 A KR 1020237019066A KR 20237019066 A KR20237019066 A KR 20237019066A KR 20230121047 A KR20230121047 A KR 20230121047A
Authority
KR
South Korea
Prior art keywords
silver
layer
mass
etching
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020237019066A
Other languages
English (en)
Korean (ko)
Inventor
쇼타 니이바야시
노리마사 후카자와
아키라 무라카와
와타루 후지카와
Original Assignee
디아이씨 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 디아이씨 가부시끼가이샤 filed Critical 디아이씨 가부시끼가이샤
Publication of KR20230121047A publication Critical patent/KR20230121047A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/30—Acidic compositions for etching other metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
KR1020237019066A 2020-12-15 2021-12-02 은용 에칭액, 및 그것을 이용한 프린트 배선판의 제조 방법 Pending KR20230121047A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020207422 2020-12-15
JPJP-P-2020-207422 2020-12-15
PCT/JP2021/044185 WO2022130991A1 (ja) 2020-12-15 2021-12-02 銀用エッチング液、及びそれを用いたプリント配線板の製造方法

Publications (1)

Publication Number Publication Date
KR20230121047A true KR20230121047A (ko) 2023-08-17

Family

ID=82057567

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237019066A Pending KR20230121047A (ko) 2020-12-15 2021-12-02 은용 에칭액, 및 그것을 이용한 프린트 배선판의 제조 방법

Country Status (5)

Country Link
JP (1) JP7211571B2 (https=)
KR (1) KR20230121047A (https=)
CN (1) CN116601332A (https=)
TW (1) TW202231926A (https=)
WO (1) WO2022130991A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117904634A (zh) * 2023-12-05 2024-04-19 浙江奥首材料科技有限公司 一种耐高温半导体铂蚀刻液、其制备方法及应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009162727A (ja) 2008-01-10 2009-07-23 Yazaki Corp 銀めっき層の有害金属分析方法
JP2012194024A (ja) 2011-03-16 2012-10-11 Sumiko Techno-Research Co Ltd 銀メッキ層溶解液及び銀メッキ層溶解方法、並びに銀メッキ層含有元素の定量方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100440343B1 (ko) * 2002-04-03 2004-07-15 동우 화인켐 주식회사 고 선택성 은 식각용액-1
KR101518055B1 (ko) * 2008-10-30 2015-05-06 동우 화인켐 주식회사 금속막 에칭액 조성물
JP6207248B2 (ja) * 2013-06-17 2017-10-04 株式会社Adeka エッチング液組成物及びエッチング方法
EP2916627B1 (en) * 2013-08-29 2019-04-03 Hitachi Metals, Ltd. Method for manufacturing ceramic circuit board
JP7377212B2 (ja) * 2018-10-17 2023-11-09 株式会社Adeka エッチング液組成物及びエッチング方法
KR102925602B1 (ko) * 2019-02-19 2026-02-10 디아이씨 가부시끼가이샤 은용 에칭액, 및 그것을 이용한 프린트 배선판의 제조 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009162727A (ja) 2008-01-10 2009-07-23 Yazaki Corp 銀めっき層の有害金属分析方法
JP2012194024A (ja) 2011-03-16 2012-10-11 Sumiko Techno-Research Co Ltd 銀メッキ層溶解液及び銀メッキ層溶解方法、並びに銀メッキ層含有元素の定量方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Bioinorganic Chemistry and Applications 2008, Article ID 436458.
무라카와 아키라, 후카자와 노리마사, 후지카와 와타루, 시라카미 준; 마이크로일렉트로닉스 심포지엄 논문집 2018, "은나노 입자를 하지로 하는 구리 패턴 형성의 검토".

Also Published As

Publication number Publication date
CN116601332A (zh) 2023-08-15
WO2022130991A1 (ja) 2022-06-23
TW202231926A (zh) 2022-08-16
JP7211571B2 (ja) 2023-01-24
JPWO2022130991A1 (https=) 2022-06-23

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