KR20220076324A - 반송 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법 - Google Patents
반송 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법 Download PDFInfo
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- KR20220076324A KR20220076324A KR1020210159405A KR20210159405A KR20220076324A KR 20220076324 A KR20220076324 A KR 20220076324A KR 1020210159405 A KR1020210159405 A KR 1020210159405A KR 20210159405 A KR20210159405 A KR 20210159405A KR 20220076324 A KR20220076324 A KR 20220076324A
- Authority
- KR
- South Korea
- Prior art keywords
- conveying
- substrate
- roller
- conveying roller
- cover
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- H01L51/001—
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- H01L51/56—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Rollers For Roller Conveyors For Transfer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020198684A JP7191922B2 (ja) | 2020-11-30 | 2020-11-30 | 搬送装置、成膜装置、成膜方法および電子デバイスの製造方法 |
JPJP-P-2020-198684 | 2020-11-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20220076324A true KR20220076324A (ko) | 2022-06-08 |
Family
ID=81769803
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020210159405A KR20220076324A (ko) | 2020-11-30 | 2021-11-18 | 반송 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7191922B2 (ja) |
KR (1) | KR20220076324A (ja) |
CN (1) | CN114574813B (ja) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010147256A (ja) | 2008-12-18 | 2010-07-01 | Ulvac Japan Ltd | 基板搬送装置及びこれを用いた成膜装置 |
JP2014173170A (ja) | 2013-03-12 | 2014-09-22 | Sumitomo Heavy Ind Ltd | 成膜装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63171425A (ja) * | 1987-01-08 | 1988-07-15 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造装置 |
JPH11158630A (ja) * | 1997-11-26 | 1999-06-15 | Shin Meiwa Ind Co Ltd | 真空搬送装置 |
JP4381160B2 (ja) * | 2003-07-16 | 2009-12-09 | 積水化学工業株式会社 | 表面処理装置 |
EP1698715A1 (de) * | 2005-03-03 | 2006-09-06 | Applied Films GmbH & Co. KG | Anlage zum Beschichten eines Substrats und Einschubelement |
JP5055776B2 (ja) * | 2006-02-03 | 2012-10-24 | 大日本印刷株式会社 | 成膜装置 |
US20090218214A1 (en) * | 2008-02-28 | 2009-09-03 | Applied Materials, Inc. | Backside coating prevention device, coating chamber comprising a backside coating prevention device, and method of coating |
TW201346050A (zh) * | 2012-02-06 | 2013-11-16 | Tokyo Electron Ltd | 成膜裝置及成膜方法 |
TWI575330B (zh) * | 2012-03-27 | 2017-03-21 | 尼康股份有限公司 | 光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法 |
JP2018172212A (ja) * | 2017-03-31 | 2018-11-08 | 平田機工株式会社 | ローラ組立体、ローラユニット及びコンベア装置 |
JP2020152954A (ja) * | 2019-03-19 | 2020-09-24 | 東レエンジニアリング株式会社 | 成膜装置 |
JP7324028B2 (ja) * | 2019-03-28 | 2023-08-09 | 日東電工株式会社 | ガラス基材の搬送装置、積層ガラスの製造装置、および、積層ガラスの製造方法 |
-
2020
- 2020-11-30 JP JP2020198684A patent/JP7191922B2/ja active Active
-
2021
- 2021-11-18 KR KR1020210159405A patent/KR20220076324A/ko not_active Application Discontinuation
- 2021-11-19 CN CN202111373493.XA patent/CN114574813B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010147256A (ja) | 2008-12-18 | 2010-07-01 | Ulvac Japan Ltd | 基板搬送装置及びこれを用いた成膜装置 |
JP2014173170A (ja) | 2013-03-12 | 2014-09-22 | Sumitomo Heavy Ind Ltd | 成膜装置 |
Also Published As
Publication number | Publication date |
---|---|
CN114574813B (zh) | 2023-07-25 |
JP7191922B2 (ja) | 2022-12-19 |
JP2022086586A (ja) | 2022-06-09 |
CN114574813A (zh) | 2022-06-03 |
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