KR20220040366A - 묘화 장치 - Google Patents

묘화 장치 Download PDF

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Publication number
KR20220040366A
KR20220040366A KR1020210090862A KR20210090862A KR20220040366A KR 20220040366 A KR20220040366 A KR 20220040366A KR 1020210090862 A KR1020210090862 A KR 1020210090862A KR 20210090862 A KR20210090862 A KR 20210090862A KR 20220040366 A KR20220040366 A KR 20220040366A
Authority
KR
South Korea
Prior art keywords
substrate
stage
movement
weight
moving
Prior art date
Application number
KR1020210090862A
Other languages
English (en)
Korean (ko)
Inventor
가츠야 후지타
노조무 하라
히로시 후쿠다
나오토 하야카와
Original Assignee
가부시키가이샤 스크린 홀딩스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 스크린 홀딩스 filed Critical 가부시키가이샤 스크린 홀딩스
Publication of KR20220040366A publication Critical patent/KR20220040366A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Confectionery (AREA)
  • Formation And Processing Of Food Products (AREA)
  • Control And Other Processes For Unpacking Of Materials (AREA)
KR1020210090862A 2020-09-23 2021-07-12 묘화 장치 KR20220040366A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020158317A JP7433181B2 (ja) 2020-09-23 2020-09-23 描画装置
JPJP-P-2020-158317 2020-09-23

Publications (1)

Publication Number Publication Date
KR20220040366A true KR20220040366A (ko) 2022-03-30

Family

ID=80791367

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020210090862A KR20220040366A (ko) 2020-09-23 2021-07-12 묘화 장치

Country Status (4)

Country Link
JP (1) JP7433181B2 (zh)
KR (1) KR20220040366A (zh)
CN (1) CN114253085B (zh)
TW (1) TWI811714B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023249799A1 (en) * 2022-06-20 2023-12-28 Mrsi Systems Llc Tunable, dynamic counterbalance

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69717975T2 (de) * 1996-12-24 2003-05-28 Asml Netherlands Bv In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
JP2001308141A (ja) * 2000-02-18 2001-11-02 Sony Corp 電子回路装置の製造方法
JPWO2003015139A1 (ja) 2001-08-08 2004-12-02 株式会社ニコン ステージシステム及び露光装置、並びにデバイス製造方法
JP3920605B2 (ja) * 2001-09-06 2007-05-30 株式会社日立ハイテクノロジーズ 露光装置
JP3906753B2 (ja) * 2002-07-01 2007-04-18 株式会社日立プラントテクノロジー 基板組立て装置
WO2005098911A1 (ja) 2004-04-09 2005-10-20 Nikon Corporation 移動体の駆動方法、ステージ装置及び露光装置
JP2006100689A (ja) 2004-09-30 2006-04-13 Canon Inc ステージ装置、露光装置及びデバイス製造方法
US7750818B2 (en) * 2006-11-29 2010-07-06 Adp Engineering Co., Ltd. System and method for introducing a substrate into a process chamber
US8144310B2 (en) 2008-04-14 2012-03-27 Asml Netherlands B.V. Positioning system, lithographic apparatus and device manufacturing method
JP5024301B2 (ja) * 2009-01-20 2012-09-12 パナソニック株式会社 圧着装置及び圧着方法
JP5415842B2 (ja) * 2009-06-26 2014-02-12 大日本スクリーン製造株式会社 描画システムおよびパターン形成システム
WO2011074474A1 (ja) * 2009-12-16 2011-06-23 株式会社ニコン 基板支持部材、基板搬送装置、基板搬送方法、露光装置及びデバイス製造方法
US20120064461A1 (en) * 2010-09-13 2012-03-15 Nikon Corporation Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
JP2014532298A (ja) 2011-09-06 2014-12-04 ケーエルエー−テンカー コーポレイション 反射電子ビームリソグラフィ用リニアステージ
JP2013089278A (ja) * 2011-10-24 2013-05-13 Sanyo Electric Co Ltd 光ピックアップ装置
CN102393611B (zh) * 2011-11-12 2013-10-16 哈尔滨工业大学 光刻机工件台磁预紧平衡定位系统
JP5875904B2 (ja) * 2012-03-13 2016-03-02 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
JP5701465B2 (ja) * 2012-12-21 2015-04-15 株式会社新川 フリップチップボンダ及びボンディングステージの平坦度並びに変形量補正方法
JP2014146011A (ja) * 2013-01-30 2014-08-14 Hitachi High-Technologies Corp パターン形成装置及びパターン形成方法
US10031427B2 (en) 2015-09-30 2018-07-24 Applied Materials, Inc. Methods and apparatus for vibration damping stage
CN105676597B (zh) * 2016-04-14 2017-11-14 清华大学 一种掩模台平衡块合质心防飘移运动控制方法
CN106092444A (zh) * 2016-08-02 2016-11-09 北方民族大学 一种双电机驱动的重力平衡装置及调节方法
JP6917848B2 (ja) * 2017-09-26 2021-08-11 株式会社Ｓｃｒｅｅｎホールディングス ステージ駆動装置および描画装置
CN110658688B (zh) * 2018-06-29 2020-12-15 上海微电子装备（集团）股份有限公司 一种工件台系统及光刻设备

Also Published As

Publication number Publication date
JP7433181B2 (ja) 2024-02-19
JP2022052125A (ja) 2022-04-04
CN114253085A (zh) 2022-03-29
CN114253085B (zh) 2024-05-24
TW202213452A (zh) 2022-04-01
TWI811714B (zh) 2023-08-11

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