WO2011074474A1 - 基板支持部材、基板搬送装置、基板搬送方法、露光装置及びデバイス製造方法 - Google Patents
基板支持部材、基板搬送装置、基板搬送方法、露光装置及びデバイス製造方法 Download PDFInfo
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- WO2011074474A1 WO2011074474A1 PCT/JP2010/072135 JP2010072135W WO2011074474A1 WO 2011074474 A1 WO2011074474 A1 WO 2011074474A1 JP 2010072135 W JP2010072135 W JP 2010072135W WO 2011074474 A1 WO2011074474 A1 WO 2011074474A1
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- WIPO (PCT)
- Prior art keywords
- substrate
- support member
- support
- supported
- tray
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/067—Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
Definitions
- the present invention relates to a substrate support member, a substrate transport apparatus, a substrate transport method, an exposure apparatus, and a device manufacturing method.
- the present application claims priority based on Japanese Patent Application Nos. 2009-285412 and 2009-285413 filed in Japan on December 16, 2009, the contents of which are incorporated herein by reference.
- processing apparatuses for large substrates such as exposure apparatuses and inspection apparatuses are used.
- a transport apparatus as disclosed in the following patent document that transports a large substrate (for example, a glass substrate) to the processing apparatus is used.
- the substrate support member is held by, for example, a transfer arm and transferred. To do. Therefore, depending on the method of supporting the substrate support member, the substrate support member may be bent downward by its own weight during transportation. Further, when the substrate is supported by the substrate support member, the substrate and the substrate support member may be in close contact with each other, and slippage may not easily occur between them. In this case, when the substrate support member bends downward, stress may be generated in the substrate, and the substrate may be distorted.
- An object of an aspect of the present invention is to provide a substrate support member, a substrate transport apparatus, a substrate transport method, an exposure apparatus, and a device manufacturing method that can suppress distortion of the substrate that occurs during substrate transfer.
- a substrate support member for supporting a substrate, the placement portion on which the substrate is placed, and the placement portion, which is placed on the placement portion.
- a support member is provided.
- a substrate transfer apparatus for transferring a substrate, comprising: the substrate support member that supports the substrate; and a transfer unit that holds and moves the substrate support member.
- a substrate transfer apparatus is provided.
- the substrate support member is supported, the substrate is placed on the placement portion of the substrate support member, and the substrate is moved from the placement portion to the substrate.
- a substrate transport method including delivering to a holder.
- an exposure apparatus that exposes the substrate by irradiating exposure light onto a substrate held by the substrate holder, wherein the substrate transport apparatus transports the substrate to the substrate holder.
- An exposure apparatus is provided.
- a device manufacturing method comprising: exposing the substrate using the exposure apparatus described above; and processing the exposed substrate based on an exposure result. Is done.
- a substrate transport method for transporting a substrate placed on a substrate support member together with the substrate support member, wherein a predetermined supported portion of the substrate support member is supported. Placing the substrate on the substrate support member on which the supported portion is supported, and holding the supported portion of the substrate support member on which the substrate is placed or the vicinity of the supported portion. And moving the substrate support member.
- a substrate transport apparatus for transporting a substrate placed on a substrate support member together with the substrate support member, wherein the support mechanism supports a predetermined supported portion of the substrate support member.
- a placement mechanism for placing the substrate on the substrate support member on which the supported portion is supported, and the supported portion of the substrate support member on which the substrate is placed or in the vicinity of the supported portion And a substrate transfer device provided with a transfer mechanism for moving the substrate support member.
- an exposure apparatus for exposing the substrate by irradiating exposure light onto a substrate held by the substrate holder, wherein the substrate transport apparatus transports the substrate to the substrate holder.
- An exposure apparatus is provided.
- a device manufacturing method comprising: exposing the substrate using the exposure apparatus described above; and processing the exposed substrate based on an exposure result. Is done.
- a device manufacturing method is provided.
- a first embodiment of the present invention will be described with reference to the drawings. Note that the present invention is not limited to this.
- an exposure apparatus that includes the substrate transport apparatus according to the present invention and performs an exposure process for exposing a pattern for a liquid crystal display device to a substrate coated with a photosensitive agent, and a substrate support member according to the present invention, An embodiment of a device manufacturing method and a substrate transfer method will also be described.
- FIG. 1 is a cross-sectional plan view showing a schematic configuration of the exposure apparatus of the present embodiment.
- the exposure apparatus 1 includes an exposure apparatus main body 3 that exposes a pattern for a liquid crystal display device on a substrate, a transport robot (transport section, transport mechanism) 4, a carry-in / out section (transport section) 5, and a tray (substrate support member) T.
- a substrate transfer device 7 is provided, which is housed in a chamber 2 that is highly cleaned and adjusted to a predetermined temperature.
- the substrate is a large glass plate, and the size of one side thereof is, for example, 500 mm or more.
- FIG. 2 is an external perspective view of the exposure apparatus main body 3 and the transfer robot 4 that transfers the substrate P to the exposure apparatus main body 3.
- the exposure apparatus main body 3 is disposed below the mask stage, an illumination system (not shown) that illuminates the mask M with the exposure light IL, a mask stage (not shown) that holds the mask M on which the liquid crystal display device pattern is formed.
- the two-dimensional movement of the substrate holder 9 with respect to the base 8 is performed in a horizontal plane, and the X axis and the Y axis are set in directions orthogonal to each other in the horizontal plane.
- the holding surface of the substrate holder 9 with respect to the substrate P is parallel to the horizontal plane in a reference state (for example, a state when the substrate P is transferred).
- the Z axis is set in a direction orthogonal to the X axis and the Y axis, and the optical axis of the projection optical system PL is parallel to the Z axis.
- the directions around the X, Y, and Z axes are referred to as the ⁇ X direction, the ⁇ Y direction, and the ⁇ Z direction, respectively.
- the moving mechanism 33 includes a moving mechanism main body 35 and a plate table 34 that is disposed on the moving mechanism main body 35 and holds the substrate holder 9.
- the moving mechanism body 35 is supported by the gas bearing in a non-contact manner on the guide surface 8a (the upper surface of the base 8), and can move on the guide surface 8a in the XY directions.
- the exposure apparatus main body 3 can move within a predetermined region of the guide surface 8a on the light emission side (image surface side of the projection optical system PL) while holding the substrate P.
- the moving mechanism main body 35 can move in the XY plane on the guide surface 8a by the operation of a coarse movement system (moving mechanism) including an actuator such as a linear motor.
- the plate table 34 is movable in the Z-axis, ⁇ X, and ⁇ Y directions with respect to the moving mechanism body 35 by the operation of a fine movement system including an actuator such as a voice coil motor.
- the plate table 34 is moved in six directions including the X axis, the Y axis, the Z axis, the ⁇ X, the ⁇ Y, and the ⁇ Z directions while holding the substrate P by the operation of the substrate stage driving system including the coarse movement system and the fine movement system. It is movable.
- the transfer robot 4 is for transferring the substrate P to the exposure apparatus main body 3 and the loading / unloading unit 5.
- the transport robot 4 holds the tray T, transports the substrate P by moving the substrate P placed on the tray T together with the tray T, and delivers the substrate P to the exposure apparatus main body 3 and the loading / unloading unit 5. .
- the exposure apparatus 1 performs step-and-scan exposure in a state where the rectangular substrate P is placed on the substrate holder 9, and a plurality of patterns formed on the mask P are formed on the substrate P, for example,
- the images are sequentially transferred to four exposure areas (pattern transfer areas). That is, in the exposure apparatus 1, the slit M on the mask M is illuminated by the exposure light IL from the illumination system, and the mask M is moved by a controller (not shown) via a drive system (not shown).
- the pattern of the mask M in one exposure region on the substrate P is obtained by moving the holding mask stage and the substrate holder 9 holding the substrate P in synchronization in a predetermined scanning direction (here, the Y-axis direction). Is transferred, that is, scanning exposure is performed.
- the exposure apparatus 1 is a so-called multi-lens scan in which the projection optical system PL includes a plurality of projection optical modules, and the illumination system includes a plurality of illumination modules corresponding to the plurality of projection optical modules. It constitutes an exposure apparatus.
- a stepping operation is performed in which the substrate holder 9 is moved in the X direction by a predetermined amount to the scanning start position of the next exposure area.
- the pattern of the mask M is sequentially transferred to the four exposure regions by repeatedly performing such scanning exposure and stepping operation.
- the transfer robot 4 has, for example, a horizontal joint type structure, and is connected to the arm portion 10 composed of a plurality of portions connected via a vertical joint axis, and the tip of the arm portion 10.
- a transport hand (holding arm) 12 and a drive device 13 are provided.
- the arm unit 10 can be moved, for example, in the vertical direction (Z-axis direction) by the driving device 13.
- the driving of the driving device 13 is controlled by a control device (not shown).
- the transport hand 12 is provided in a substantially U shape (opened in FIG. 2, a substantially U shape opened in the + X direction when viewed from the Z-axis direction), and the longitudinal direction of the tray T (substrate).
- a substantially U shape opened in FIG. 2, a substantially U shape opened in the + X direction when viewed from the Z-axis direction
- the tray T substrate
- FIG. 3 is a perspective view for explaining the operation of the transfer robot 4.
- the transfer robot 4 changes the direction of the transfer hand 12 so that the longitudinal direction of the transfer hand 12 (long side direction of the substrate P) faces the substrate holder 9 side of the exposure apparatus main body 3. Be able to.
- the transfer robot 4 delivers the substrate P to the substrate holder 9.
- the transfer robot 4 is provided below the transfer hand 12, has the same mechanism as the transfer hand 12, and can be independently driven. It has a double arm structure with Further, the transfer robot 4 is not limited to a horizontal joint type robot, and can be realized by appropriately adopting or combining known robots (generally, a transfer mechanism).
- FIG. 4A is a side view showing a schematic configuration of the carry-in / out section 5.
- the carry-in / out section 5 is configured to receive the substrate P which has been coated with a photosensitive agent and conveyed by a coater / developer (not shown) disposed adjacent to the exposure apparatus 1.
- the carry-in / out unit 5 includes a substrate support unit 51 that supports the substrate P and a tray support unit 52 that supports the tray T.
- the substrate support portion 51 includes a flat plate-like first support portion 51a and a plurality of substrate support pins (support pins) 51b that are provided on the first support portion 51a and support different portions of the lower surface of the substrate P. It has.
- the present embodiment for example, 30 substrate support pins 51b are provided to support the substrate P in a state substantially along a horizontal plane.
- the state substantially along the horizontal plane means that, for example, the substrate P is bent when supported by the substrate support pins 51b, the positioning error of the substrate support pins 51b, the allowable tolerance of the substrate P, etc. are ignored. This means that the substrate surface is parallel to the horizontal plane.
- Each of the substrate support pins 51b has a lower end portion fixed to the first support portion 51a and an upper end portion (upper end surface) provided so as to support the substrate P.
- a suction hole connected to a vacuum pump (not shown) is provided on the upper end surface of the substrate support pin 51b so that the substrate P can be sucked and held.
- a substrate detection unit (not shown) that detects whether or not the substrate P is placed on the substrate support pin 51b is provided at the upper end of the substrate support pin 51b.
- the substrate support unit 51 is connected to the drive unit 54 via a connecting member 53.
- the drive unit 54 is movable in the XY plane and the ⁇ Z direction on the base unit 55 by operation of a drive system including a coarse motion system and a fine motion system, for example.
- a drive system including a coarse motion system and a fine motion system, for example.
- the carry-in / out unit 5 can correct the position of the substrate P supported by the substrate support pins 51b or rotate the substrate P by 90 degrees.
- the tray support portion 52 is a frame-shaped second support portion 52a and a plurality of tray support pins (second support pins) that are provided on the second support portion 52a and support different portions of the lower surface of the tray T. 52b.
- Each tray support pin 52b has a lower end fixed to the second support 52a and an upper end provided to support the tray T.
- the tray support pins 52b are disposed outside the first support portion 51a of the substrate support portion 51.
- a tray detection unit (not shown) that detects whether or not the tray T is placed on the tray support pin 52b is provided at the upper end of the tray support pin 52b.
- the tray support portion 52 is provided so as to be movable in the Z-axis direction along the guide portion 56 by the operation of a drive unit (not shown).
- the guide unit 56 is provided outside the drive unit 54 and the base unit 55 of the substrate support unit 51. Further, the first support part 51a, the connecting member 53, and the drive part 54 of the substrate support part 51 are disposed inside the frame-shaped second support part 52a.
- a support mechanism that supports the tray T and moves the tray T relative to the substrate P is configured by the tray support portion 52, the guide portion 56, and a drive unit (not shown).
- the tray support part 52 can move in the Z-axis direction without interfering with the first support part 51 a, the connecting member 53, and the drive part 54 of the substrate support part 51. Further, the tray support portion 52 moves up in the positive direction of the Z axis to raise the tray T supported by the tray support pins 52b in the positive direction of the Z axis and is supported on the substrate support pins 51b of the substrate support portion 51. The substrate P is placed on the tray T. Further, the tray support unit 52 is configured to deliver the tray T supported by the tray support pins 52 b to the transport hand 12 of the transport robot 4.
- FIG. 4B is a perspective view showing the relationship between the transfer robot 4, the loading / unloading unit 5 and the tray T.
- the transport hand 12 of the transport robot 4 has a plurality of cutout portions 12b through which a plurality of tray support pins 52b are inserted into a tray holding portion 12a that holds the tray T.
- the notch 12b is formed in a rectangular shape in which the edge side of the tray holding part 12a is opened.
- FIG. 5A is a plan view showing a planar structure of the tray T.
- the tray T includes a mounting portion 20 formed in a lattice shape by a plurality of linear members 19 stretched at predetermined intervals in the vertical and horizontal directions. That is, the portion of the placement unit 20 where the linear member 19 is not disposed is a rectangular opening 21.
- the tray T is a supported portion in which both side portions 18 and 18 of the placement portion 20 are supported by the transport hand 12.
- both side portions 18, 18 which are held portions of the tray T are disposed at end portions in the short direction of the tray T, and are provided by linear members 19 extending in the longitudinal direction of the tray T.
- the tray T transports the substrate P
- the substrate P is placed at a predetermined position of the placement unit 20 with the both side portions 18 and 18 or the vicinity thereof being supported, and the substrate P is supported from below. It has become.
- the shape of the tray T is not limited to the shape shown in FIG. 5A.
- the tray T is a frame-like single frame in which only one opening 21 is formed and supports only the peripheral edge of the substrate P. Also good.
- FIG. 5B is an enlarged cross-sectional view of the vicinity of the placement surface 20a on which the substrate P of the placement portion 20 of the tray T is placed.
- the mounting unit 20 is provided with a plurality of support units 20 b that support a part of the substrate P mounted on the mounting unit 20.
- the support portion 20b is provided so as to protrude from the placement surface 20a of the placement portion 20, and the height H with respect to the placement portion 20 is different between, for example, the central portion and the peripheral portion of the placement portion 20.
- the height H of each of the plurality of support portions 20b is set corresponding to the amount of deflection of the placement portion 20 in a state where the side portions 18 and 18 of the tray T are supported and the substrate P is placed on the placement portion 20. Has been.
- the height H of the support portion 20b is set high in the portion where the deflection amount of the placement portion 20 is large, and the height H of the support portion 20b is set low in the portion where the deflection amount of the placement portion 20 is small.
- the amount of deflection of the placing portion 20 when the both side portions 18 and 18 of the tray T are supported is relatively small in the vicinity of the both side portions 18 and 18, and in the vicinity of the intermediate portion between the both side portions 18 and 18. Tend to be the largest. Therefore, in general, the height H of the support portion 20b disposed in the vicinity of the side portions 18 and 18 (peripheral portions of the placement portion 20) of the tray T is equal to the height H of the support portion 20b disposed in other portions.
- the height H of the support portion 20b Compared with the height H, it becomes lower. In other words, a portion having a larger amount of deflection than the height H of the support portion 20b disposed in the vicinity of the both side portions 18 and 18 having a relatively small amount of deflection, for example, the vicinity of an intermediate portion between the side portions 18 and 18 of the tray T.
- the amount of deflection of each part of the placement unit 20 on which the side portions 18 and 18 are held in advance and the substrate P is placed is measured, and the amount of deflection of each part of the placement unit 20 is measured.
- positioned at each part is set according to magnitude. That is, the height H and arrangement of each of the plurality of support portions 20b are determined in consideration of the material and shape of the placement portion 20 and the position of the supported portion.
- the plurality of support portions 20b support the side portions 18 and 18 that are the supported portions of the tray T, and the amount of bending of the substrate P is placed in a state where the substrate P is placed on the placement portion 20.
- the substrate P is supported so as to be smaller than the bending amount of the portion 20.
- a material for forming the tray T it is preferable to use a material capable of suppressing the bending due to the weight of the substrate P when the tray T supports the substrate P.
- various synthetic resins or metals can be used. . Specific examples include nylon, polypropylene, AS resin, ABS resin, polycarbonate, fiber reinforced plastic, and stainless steel. Examples of the fiber reinforced plastic include GFRP (Glass Fiber Reinforced Plastic) and CFRP (Carbon Fiber Reinforced Plastic).
- the linear member 19 stretched around in a lattice shape may be formed using a member having excellent flexibility such as a wire.
- the height H of the support portion 20b with respect to the placement portion 20 of the tray T is not only the amount of bending of the placement portion 20, but also the shape such as the unevenness of the placement surface 20a of the placement portion 20. It is adjusted to compensate for tolerances.
- the height H of each of the plurality of support portions 20b supports both side portions 18 and 18 of the tray T, and the support portion 20b that contacts the substrate P when the substrate P is placed on the placement portion 20.
- the upper ends are adjusted so as to be arranged on the same virtual plane parallel to the horizontal plane.
- the surface of the support portion 20b that contacts the substrate P is preferably a convex curved surface that protrudes toward the substrate P in order to prevent an adsorption state due to the close contact between the substrate P and the support portion 20b.
- the plurality of support portions 20b are formed on both side portions 18 in a direction (vertical direction in FIGS. 5A and 5B) perpendicular to the extending direction of the side portions 18 and 18 of the tray T (vertical direction in FIG. 5A), for example.
- 18 are arranged symmetrically with respect to the middle part. This arrangement corresponds to, for example, when the both side portions 18 and 18 of the tray T are supported, the tray T bends symmetrically with respect to the intermediate portion between the both side portions 18 and 18.
- the plurality of support portions 20b support the substrate P substantially flatly along the horizontal plane in a state where the both side portions 18 and 18 of the tray T are supported and the substrate P is placed on the placement portion 20. It is supposed to be.
- substantially flat means that the substrate P becomes a flat plate with no undulations along the horizontal plane when neglecting minute bending due to the substrate P being supported by the plurality of support portions 20b and the mounting surface 20a. That means.
- the substrate P is arranged so that its long side is parallel to both side portions 18 and 18 of the tray T.
- the tray T is transported by placing the substrate P on the placement unit 20 in a state where both side portions 18 and 18 are supported from below by the transport hand 12 of the transport robot 4 (see FIG. 2 and FIG. 2). (See FIG. 3).
- the transport hand 12 of the transport robot 4 in this embodiment functions as a support mechanism that supports the side portions 18 and 18 that are supported portions of the tray T. Further, the transfer robot 4 holds and moves the both side portions 18 and 18 of the tray T by the transfer hand 12, thereby placing the substrate P on the tray T on which the both side portions 18 and 18 of the tray T are supported. It also functions as a placement mechanism. The transport robot 4 also functions as a transport mechanism that moves the tray T while holding the side portions 18 and 18 of the tray T on which the substrate P is placed or the vicinity thereof.
- the tray T is configured such that the lower surface of the mounting portion 20 is supported by a plurality of tray support pins 52b of the tray support portion 52 of the carry-in / out portion 5 shown in FIG. 4A. Further, the tray T has a plurality of substrate support pins 51b of the substrate support portion 51 with a plurality of openings shown in FIG. 5A in a state where the lower surface of the placement portion 20 is supported by the tray support pins 52b as shown in FIG. 4A. It is made to pass through the portion 21.
- the transfer robot 4 places the transfer hand 12 on the lower side of the tray T along the side portions 18 and 18 of the tray T, and then moves the transfer hand 12 to hold the tray.
- the portion 12a is arranged below the side portions 18 and 18 of the tray T.
- a groove 30 for holding the tray T is formed on the upper surface of the substrate holder 9.
- the groove portions 30 are provided in a lattice shape corresponding to the frame structure of the tray T.
- a plurality of holding portions (holder portions) 31 for the substrate P are provided in an island shape by forming the groove portion 30 on the upper surface of the substrate holder 9. That is, the groove portion 30 is provided in a groove shape with respect to the holding portion 31 of the substrate holder 9, and the holding portion 31 has a size corresponding to the opening portion 21 of the tray T.
- the upper surface of the holding part 31 is finished so that the substantial holding surface of the substrate holder 9 with respect to the substrate P has good flatness.
- a plurality of suction holes K are provided on the upper surface of the holding portion 31 for bringing the substrate P into close contact with the surface (see FIG. 2).
- Each suction hole K is connected to a vacuum pump (not shown).
- FIG. 6 is a partial side sectional view showing a state where the tray T is accommodated in the groove 30 of the substrate holder 9. As shown in FIG. 6, the thickness of the tray T is smaller than the depth of the groove 30. As a result, the tray T is inserted into the groove 30 and sinks, so that the holding portion 31 is protruded from the opening 21, and only the substrate P placed on the tray T is received by the holding portion 31. It is supposed to be passed.
- Conical concave portions 41 are formed at the four corners on the lower surface side of the placement portion 20 of the tray T, and spherical convex portions 42 that engage with the concave portions 41 are provided at positions corresponding to the concave portions 41 in the groove portion 30. It has been.
- the tray T is displaced when the mounting portion 20 is inserted into the groove portion 30 and the convex portion 42 of the substrate holder 9 is engaged with the concave portion 41 of the mounting portion 20 so that the tray T is accommodated in the groove portion 30. Is to be prevented.
- a similar convex portion 12c that engages with the concave portion 41 of the mounting portion 20 is also formed on the tray holding portion 12a of the transport hand 12 (see FIGS. 7A to 7C).
- the operation of the exposure apparatus 1 will be described. Specifically, a substrate transfer method for loading and unloading the substrate P by transferring the substrate P placed on the tray T together with the tray T by the transfer robot 4 will be described. Here, a procedure for placing the substrate P on the tray T and carrying the substrate P placed on the tray T into and out of the exposure apparatus main body 3 will be described.
- the substrate P coated with the photosensitive agent is conveyed from the coater / developer to the carry-in / out section 5 shown in FIG. 1, and is positioned and placed at a predetermined position on the substrate support pins 51b of the substrate support section 51 shown in FIG. 4A. Then, it is sucked and held on the upper surface of the substrate support pin 51b. Thereby, the board
- substrate P is supported in the state substantially parallel to the horizontal surface.
- the substrate support portion 51 operates the driving unit 54 in a state where the substrate P is sucked and held on the upper surface of the substrate support pin 51b, and the tray T The substrate P is aligned. As a result, the tray T is supported below the substrate P in a state of facing the substrate P and substantially parallel to the horizontal plane.
- FIGS. 8A to 8B are process diagrams showing a process of placing the substrate P on the tray T.
- FIG. 7A When the alignment of the substrate P and the tray T is completed, the substrate transfer device 7 drives the transfer robot 4 and moves the transfer hand 12 to the lower side of the side of the tray T as shown in FIG. 18 along. Then, as shown in FIG. 7A, the convex portion 12c provided in the tray holding portion 12a of the transport hand 12 and the concave portion 41 provided in the placement portion 20 of the tray T are aligned.
- the substrate transfer device 7 drives the transfer robot 4 to move the transfer hand 12 upward along the vertical direction, as shown in FIG. 7B, so that the convex portion 12c of the transfer hand 12 and the concave portion 41 of the tray T are obtained. And engage. Thereafter, the transport hand 12 is further moved upward along the vertical direction, and the tray T is lifted by supporting the both side portions 18 and 18 which are supported portions of the tray T by the transport hand 12 as shown in FIG. 7C. To go.
- the tray T is in a state where both side portions 18 and 18 of the mounting portion 20 and the vicinity thereof are lifted upward, and an intermediate portion between the side portions 18 and 18 is relatively bent downward. 18 away from the tray support pin 52b.
- the transport hand 12 is further moved upward along the vertical direction, the intermediate portions of the side portions 18 and 18 of the tray T are eventually separated from the tray support pins 52b.
- the tray T and the plurality of tray support pins 52 b are completely separated from each other, and the tray T is in a state where both side portions 18 and 18 are supported by the transport hand 12.
- the amount of downward deflection of the mounting portion 20 from the state in which the tray T is supported substantially along the horizontal plane is relatively small in the vicinity of the side portions 18, 18. It is almost the maximum in the vicinity of the middle part of 18.
- the plurality of support portions 20b of the tray T come into contact with the lower surface of the substrate P as shown in FIG. 8A.
- the height H of each of the plurality of support portions 20b is the amount of deformation (deflection) of the tray T when the side portions 18 and 18 of the tray T are supported at the respective positions where the plurality of support portions 20b are arranged.
- the height is set according to the size. Specifically, when the both sides 18 and 18 of the tray T are supported and the substrate P is placed on the placement portion 20, the upper end of the support portion 20b that contacts the substrate P is the same virtual parallel to the horizontal plane. It is adjusted so that each may be arranged on a plane.
- the tray T is slightly warped upward (the support portion 20b positioned at the intermediate portion between the side portions 18 and 18 of the tray T is otherwise In a state of protruding slightly upward from the support portion 20b disposed in the portion.
- the intermediate portion of the tray T on that curve Has an arch (arc shape) curved upward (a shape having a convex upward).
- the support portion 20b disposed in the middle portion of the side portions 18 and 18 of the tray T or in the vicinity thereof is a part of the lower surface of the substrate P. Abut. Next, the support portions 20b disposed on the both side portions 18 and 18 side of the support portion 20b sequentially contact a part of the lower surface of the substrate P. And the board
- the intermediate portion of the side portions 18 and 18 is further bent downward by a slight amount due to the weight of the substrate P.
- the upper ends of the plurality of support portions 20b that are in contact with a part of the lower surface of the substrate P are respectively arranged on the same virtual plane parallel to the horizontal plane.
- substrate P mounted in the mounting part 20 of the tray T is supported substantially flat by the some support part 20b substantially parallel to a horizontal surface.
- the surface of the support portion 20b that contacts the substrate P is formed in a convex curved shape, the support portion 20b and the substrate P are prevented from being attracted, and the tray T is bent to the substrate P. It is possible to more reliably prevent the occurrence of stress due to.
- the side portions 18 and 18 that are the supported portions at the time of transporting the tray T on which the substrate P is placed are supported,
- the shape of the tray T is set to be equivalent to the shape of the tray T when the substrate P is transported with the substrate P placed thereon. Then, after the tray T is bent into the shape, the substrate P is placed on the tray T.
- the transfer robot 4 directs the longitudinal direction of the transfer hand 12 (long side direction of the substrate P) toward the substrate holder 9 side of the exposure apparatus main body 3 from the state shown in FIG. 2.
- the direction of the transport hand 12 is changed.
- the transport hand 12 is moved, and the tray T on which the substrate P is placed is transported upward of the substrate holder 9.
- the transport hand 12 transports the substrate P so that the surface of the substrate P and the holding portion 31 of the substrate holder 9 are substantially parallel.
- substantially parallel means that the substrate P is in a parallel or nearly parallel state when the deflection of the substrate P due to its own weight is excluded.
- the transport hand 12 transports the substrate P so that the held portion of the substrate P by the tray T and the substrate placement surface of the holding unit 31 are substantially parallel.
- 9A to 9D are process diagrams for explaining a process of transferring the substrate P from the tray T to the substrate holder 9 of the exposure apparatus 1.
- the transfer robot 4 transfers the substrate P to the upper side of the substrate holder 9 by the transfer hand 12, aligns the tray T with the groove 30, and then moves the drive device 13 shown in FIG. Driven, the transport hand 12 is lowered.
- 9B and 9C the tray T is accommodated in the groove 30 of the substrate holder 9, and the substrate P is placed on the holding portion 31 of the substrate holder 9.
- the both sides 18 and 18 of the placement portion 20 of the tray T are supported, and the middle portion of the both sides 18 and 18 is bent downward.
- the substrate P is horizontal by the support portion 20b. And is held on the holding portion 31 in a state of being supported substantially parallel and flat.
- the substrate transfer device 7 drives the transfer robot 4 to retract the transfer hand 12 from the substrate holder 9.
- the mask M shown in FIG. 2 is illuminated with the exposure light IL by the illumination system.
- the pattern of the mask M illuminated with the exposure light IL is projected and exposed to the substrate P placed on the substrate holder 9 via the projection optical system PL.
- the substrate P is hardly bent when the substrate P is delivered as described above, and the substrate P is satisfactorily (that is, in a state in which the occurrence of distortion is suppressed) on the substrate holder 9. Can be placed. Therefore, predetermined exposure can be performed at an appropriate position on the substrate P with high accuracy, and highly reliable exposure processing can be realized.
- the exposure apparatus 1 can smoothly transfer the substrate P to the tray T and the substrate holder 9 as described above, the exposure processing for the substrate P can be performed without delay.
- FIGS. 10A to FIG. 10C are process diagrams showing a process of holding both sides of the tray on which the substrate is placed by the transport hand.
- FIGS. 11A to 11C are process diagrams showing a process of transferring the substrate and the tray to the substrate holder.
- the tray is supported by a plurality of support pins from below with the substrate placed on the tray.
- the transport hand is moved up and the both sides of the tray are held by the transport hand.
- the transport hand is further moved upward, the tray is separated from the plurality of support pins, and then the transport hand is moved toward the substrate holder to transport the substrate.
- the substrate and the tray may come into close contact with each other and may not slide easily.
- the deflection of the tray gradually increases, while the substrate moves in the direction of the arrow with respect to the tray.
- the substrate is compressed toward the middle portion on both sides.
- FIG.10 (c) it will distort so that the intermediate part of the both sides of a board
- substrate may swell.
- FIG. 11 (b) when the tray was lowered and the substrate was transferred to the holding portion of the substrate holder, there was not enough slip between the holding portion of the substrate holder and the substrate. In some cases, the substrate cannot move in the direction of the arrow with respect to the holding portion of the substrate holder. Then, as shown in FIG.
- the distance between the end portions of the substrates transferred to the holding portion of the substrate holder is between the end portions of the substrates in the bent state as shown in FIG.
- the distance is almost equal to the distance, and the substrate is compressed and contracted toward the middle portion on both sides.
- the exposure process may be adversely affected.
- the tray T on which the substrate P is placed is held by the transport hand 12 as shown in FIGS. 8A to 8B.
- the substrate P is supported by the plurality of support portions 20b and is not distorted as in the conventional case.
- the substrate P that is substantially parallel to the horizontal plane and flat can be transferred to the holding portion 31 of the substrate holder 9. Therefore, the conventional problem caused by the distortion of the substrate P shown in FIGS. 10A to 10C, the problem caused by the compression of the substrate P shown in FIGS. 11A to 11C, or a combination thereof. Can solve all the problems.
- the transport hand 12 is described as carrying the substrate P out, but another transport hand in the double hand structure may be carried out.
- the transport robot 4 drives the transport hand 12 and inserts the transport hand 12 from the ⁇ Y direction side on both sides in the X-axis direction of the substrate holder 9 below the tray T placed on the substrate holder 9. To do. Along with this, suction by the vacuum pump is released by a control device (not shown), and adsorption of the substrate P by the substrate holder 9 is released.
- the convex portions 12 c of the tray holding portion 12 a of the transport hand 12 are concave portions on the lower surfaces of the side portions 18, 18 of the placing portion 20 of the tray T. 41 is engaged.
- the transport hand 12 is further driven upward, the substrate P placed on the holding unit 31 of the substrate holder 9 is transferred to the tray T. It should be noted that the suction by the vacuum pump (adsorption of the substrate P by the substrate holder 9) may be canceled before the convex portion 12c is engaged with the concave portion 41.
- a part of the substrate P is supported by the plurality of support portions 20b provided in the placement portion 20, and thus the substrate P is placed on the placement portion 20 of the tray T. It can be placed in a flatter state than before.
- the tray T supporting the substrate P is lifted above the substrate holder 9, and the placement unit 20 is separated from the substrate holder 9.
- the tray T holding the substrate P is retracted from the substrate holder 9 by the transport hand 12. In this way, the carry-out operation of the substrate P with respect to the exposure apparatus main body 3 is completed.
- the plurality of tray support pins (second support pins) 52b that support the tray T in the carry-in / out section 5A support only the side portions 18 and 18 of the tray T or the vicinity thereof. It differs from the substrate transfer apparatus 7 of the first embodiment described above in that it is provided. Since the other points are the same as those of the substrate transfer apparatus 7 of the first embodiment, the same portions are denoted by the same reference numerals and description thereof is omitted.
- FIGS. 13A to 13B are process diagrams showing a process of placing the substrate P on the tray T.
- FIG. below operation
- a substrate transfer method for loading and unloading the substrate P by transferring the substrate P placed on the tray T together with the tray T by the transfer robot 4 will be described.
- a procedure for placing the substrate P on the tray T and carrying the substrate P placed on the tray T into and out of the exposure apparatus main body 3 will be described.
- the substrate P coated with the photosensitive agent is transported from the coater / developer to the carry-in / out unit 5A similar to the carry-in / out unit 5 shown in FIG. 1, and the substrate support of the substrate support unit 51 shown in FIG. It is positioned and placed at a predetermined position on the pin 51b, and is sucked and held on the upper surface of the substrate support pin 51b.
- the substrate support portion 51 operates the driving unit 54 in a state where the substrate P is sucked and held on the upper surface of the substrate support pin 51b, and the tray T The substrate P is aligned.
- a plurality of tray support pins 52 b that support the tray T are arranged along both side portions 18 and 18 of the tray T.
- Each tray support pin 52b supports only both side portions 18, 18 of the tray T or the vicinity thereof.
- the tray T is bent by its own weight to the same shape as that of the tray T when the substrate P is placed on the placement portion 20 and the both side portions 18 and 18 are supported by the transport hand 12. In this state, the substrate P is supported below the substrate P so as to face the substrate P.
- the substrate transport apparatus 7A moves the tray support portion (support mechanism) 52 shown in FIG. 4A upward along the guide portion 56 by a drive portion (not shown).
- the tray T supported by the tray support pins 52b moves upward so as to approach the substrate P.
- a plurality of support portions 20 b provided on the placement portion 20 of the tray T abut on the lower surface of the substrate P.
- the carry-in / out section 5A functions as a support mechanism that supports the side portions 18 and 18 that are predetermined holding portions of the tray T, and the tray T on which the side portions 18 and 18 are supported. It functions as a mounting mechanism for mounting the substrate P on the substrate.
- the tray T matches the substrate P.
- the upper ends of the plurality of supporting portions 20b in contact with each other are adjusted so as to be arranged on the same virtual plane parallel to the horizontal plane.
- the substrate P placed on the placement unit 20 of the tray T is supported substantially parallel to the horizontal plane and substantially flat by the plurality of support units 20b.
- both sides that are supported portions when the tray T on which the substrate P is placed are transported, as in the first embodiment.
- the portions 18 and 18 are supported so that the shape of the tray T before the substrate P is placed is equivalent to the shape of the tray T when the substrate P is transported in a state where the substrate P is placed. Yes.
- the substrate P is placed on the tray T.
- the substrate transfer device 7A drives the transfer robot 4 and arranges the transfer hand 12 along the side portions 18 and 18 on the lower side of the side of the tray T as shown in FIG. 12C. Then, as shown in FIG. 13A, the transport hand 12 is moved, and the convex portion 12 c provided on the tray holding portion 12 a of the transport hand 12 and the concave portion 41 provided on the placement portion 20 of the tray T are aligned. .
- the substrate transfer device 7A drives the transfer robot 4 to move the transfer hand 12 up and engage the convex portion 12c of the transfer hand 12 and the concave portion 41 of the tray T as shown in FIG. 13B. . Thereafter, the transport hand 12 is further moved upward along the vertical direction, and the transport hand 12 supports the side portions 18 and 18 which are supported portions of the tray T and lifts the tray T.
- the transfer robot 4 directs the longitudinal direction of the transfer hand 12 from the state shown in FIG. 2 to the substrate holder 9 side of the exposure apparatus main body 3 as shown in FIG.
- the direction of the transport hand 12 is changed.
- the transport hand 12 is moved, and the tray T on which the substrate P is placed is transported upward of the substrate holder 9.
- the substrate P is transferred from the tray T to the substrate holder 9 of the exposure apparatus 1.
- the substrate P is placed as shown in FIGS. 12A to 12C and FIGS. 13A to 13B.
- the substrate P is not distorted as in the prior art.
- FIGS. 9A to 9D the substrate P that is substantially parallel to the horizontal plane and flat can be transferred to the holding portion 31 of the substrate holder 9. Therefore, the conventional problem caused by the distortion of the substrate P shown in FIGS. 10A to 10C, the problem caused by the compression of the substrate P shown in FIGS. 11A to 11C, or a combination thereof. Can solve all the problems.
- the configuration in which the tray held portions are provided on both sides has been described.
- the supported portions may be provided on portions other than both sides, such as an intermediate portion on both sides. Good.
- the substrate disposed below the substrate is moved upward with respect to the substrate.
- the substrate disposed above the tray is placed on the tray. On the other hand, it may be moved downward and placed on the tray.
- the substrate P in the above-described embodiment not only a glass substrate for a display device but also a semiconductor wafer for manufacturing a semiconductor device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus ( Synthetic quartz, silicon wafer) or the like is applied.
- a step-and-scan type scanning exposure apparatus that moves the mask M and the substrate P synchronously to scan and expose the substrate P with the exposure light IL through the pattern of the mask M.
- the present invention may be applied to a step-and-repeat projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the mask M and the substrate P are stationary, and the substrate P is sequentially moved stepwise. it can.
- the present invention also relates to a twin-stage type exposure having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. It can also be applied to devices.
- the present invention relates to a substrate stage for holding a substrate as disclosed in US Pat. No. 6,897,963, European Patent Application No. 1713113, etc., and a reference mark without holding the substrate.
- the present invention can also be applied to an exposure apparatus that includes a formed reference member and / or a measurement stage on which various photoelectric sensors are mounted.
- An exposure apparatus including a plurality of substrate stages and measurement stages can be employed.
- a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used.
- a variable shaped mask also called an electronic mask, an active mask, or an image generator
- a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.
- the exposure apparatus of the above-described embodiment is manufactured by assembling various subsystems including the constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy.
- various optical systems are adjusted to achieve optical accuracy
- various mechanical systems are adjusted to achieve mechanical accuracy
- various electrical systems are Adjustments are made to achieve electrical accuracy.
- the assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection, and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus.
- comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus.
- the exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.
- a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device.
- Manufacturing step 203 including substrate processing (exposure processing) including exposing the substrate with exposure light using a mask pattern and developing the exposed substrate (photosensitive agent) according to the above-described embodiment
- the substrate is manufactured through a substrate processing step 204, a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.
- the photosensitive agent is developed to form an exposure pattern layer (developed photosensitive agent layer) corresponding to the mask pattern, and the substrate is processed through the exposure pattern layer. It is.
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Abstract
Description
本願は、2009年12月16日に、日本に出願された特願2009-285412号及び特願2009-285413号に基づき優先権を主張し、その内容をここに援用する。
本発明の態様は、基板の受け渡し時に生じる基板の歪みを抑制できる基板支持部材、基板搬送装置、基板搬送方法、露光装置及びデバイス製造方法を提供することを目的としている。
基板搬送装置7は、基板PとトレイTとの位置合わせが終了すると、搬送ロボット4を駆動させ、図4Bに示すように、搬送ハンド12をトレイTの側方の下側に両側部18,18に沿って配置する。そして、図7Aに示すように、搬送ハンド12のトレイ保持部12aに設けられた凸部12cとトレイTの載置部20に設けられた凹部41とを位置合わせする。
搬送ロボット4は、図9Aに示すように、搬送ハンド12により基板Pを基板ホルダ9の上方へ搬送し、トレイTと溝部30との位置合わせを行った後、図2に示す駆動装置13を駆動させ、搬送ハンド12を下降させる。すると、図9B及び図9Cに示すように、トレイTは基板ホルダ9の溝部30に収容され、基板Pは基板ホルダ9の保持部31上に載置される。このとき、トレイTの載置部20は、両側部18,18が支持され、両側部18,18の中間部が下方へ撓んだ状態となっているが、基板Pは支持部20bによって水平面とほぼ平行にかつ平坦に支持された状態で保持部31上に受け渡される。
各種サブシステムから露光装置への組み立て工程は、各種サブシステム相互の、機械的接続、電気回路の配線接続、気圧回路の配管接続等が含まれる。この各種サブシステムから露光装置への組み立て工程の前に、各サブシステム個々の組み立て工程があることはいうまでもない。各種サブシステムの露光装置への組み立て工程が終了したら、総合調整が行われ、露光装置全体としての各種精度が確保される。なお、露光装置の製造は温度およびクリーン度等が管理されたクリーンルームで行うことが望ましい。
Claims (49)
- 基板を支持する基板支持部材であって、
前記基板が載置される載置部と、
前記載置部に設けられ、前記載置部に載置された前記基板を支持する複数の支持部と、を備え、
前記複数の支持部のうち第1部分の支持部と第2部分の支持部とは、前記載置部に対する高さが相互に異なる基板支持部材。 - 前記複数の支持部は、前記基板が前記載置部に載置された状態において、前記基板の撓み量が前記載置部の撓み量よりも小さくなるように前記基板を支持する請求項1に記載の基板支持部材。
- 前記複数の支持部は、前記基板が前記載置部に載置された状態において、前記基板をほぼ平坦に支持する請求項2に記載の基板支持部材。
- 前記第1部分の支持部と前記第2部分の支持部とは、前記基板が載置された状態における前記載置部の撓み量に対応して、前記載置部に対する高さが相互に異なる請求項1から請求項3のいずれか一項に記載の基板支持部材。
- 前記第1部分の支持部は、前記第2部分の支持部に比して、前記載置部の撓み量が大きい位置に設けられ、
前記第1部分の支持部の前記高さは、前記第2部分の支持部の前記高さに比して高い請求項1から請求項4のいずれか一項に記載の基板支持部材。 - 前記載置部の被支持部の近傍に配置された前記支持部の前記高さは、その他の位置に配置された前記支持部の前記高さよりも低い請求項1から請求項5のいずれか一項に記載の基板支持部材。
- 前記複数の支持部は、前記載置部の両側部の中間部に対して対称的に配置される請求項1から請求項6のいずれか一項に記載の基板支持部材。
- 前記載置部に対する前記複数の支持部の配置及び前記高さは、前記載置部の材質、形状及び被支持部の位置に基づいて決定される請求項1から請求項7のいずれか一項に記載の基板支持部材。
- 前記支持部の前記基板と当接する面が凸曲面である請求項1から請求項8のいずれか一項に記載の基板支持部材。
- 基板を搬送する基板搬送装置であって、
前記基板を支持する請求項1から請求項9のいずれか一項に記載の基板支持部材と、
前記基板支持部材を保持して移動する搬送部と、
を備える基板搬送装置。 - 前記搬送部は、前記載置部の両側部を保持する請求項10に記載の基板搬送装置。
- 前記搬送部は、前記基板を保持する基板ホルダに向けて前記基板支持部材を移動させて、該基板支持部材が支持する前記基板を前記基板ホルダに受け渡す請求項9又は請求項11に記載の基板搬送装置。
- 前記搬送部は、前記基板支持部材を前記基板ホルダに受け渡す請求項12に記載の基板搬送装置。
- 前記搬送部は、前記基板ホルダのうち前記基板が載置されるホルダ部に前記基板を受け渡し、前記基板ホルダのうち前記ホルダ部と異なる部分に前記基板支持部材を受け渡す請求項13に記載の基板搬送装置。
- 前記搬送部は、前記基板ホルダのうち前記ホルダ部に対して溝状に設けられた溝部に前記基板支持部材を受け渡す請求項14に記載の基板搬送装置。
- 前記基板を支持する複数の支持ピンを備え、
前記基板支持部材は、前記複数の支持ピンが挿通される複数の挿通孔を有し、
前記搬送部は、前記複数の支持ピンのうち少なくとも一部の支持ピンが前記複数の挿通孔に挿通された前記基板支持部材を上昇移動させ、前記複数の支持ピンに支持された前記基板を前記基板支持部材に支持させる請求項10から請求項15のいずれか一項に記載の基板搬送装置。 - 前記複数の支持ピンは、前記基板をほぼ水平面に沿った状態で支持し、
前記搬送部は、前記基板支持部材の前記支持部に前記基板をほぼ水平面に沿った状態で支持させる請求項16に記載の基板搬送装置。 - 請求項1から請求項9のいずれか一項に記載の基板支持部材を支持することと、
前記基板支持部材の前記載置部に前記基板を載置させることと、
前記基板を前記載置部から基板ホルダに受け渡すことと、
を含む基板搬送方法。 - 前記基板支持部材を支持した後、前記載置部に前記基板を載置させ、前記基板の撓み量が、前記載置部の撓み量よりも小さくなるように前記支持部により前記基板の一部を支持する請求項18に記載の基板搬送方法。
- 前記基板支持部材の両側部を支持した後、前記載置部に前記基板を載置させ、前記支持部により前記基板をほぼ水平面に沿った状態で支持する請求項19に記載の基板搬送方法。
- 基板ホルダが保持する基板に露光光を照射して前記基板を露光する露光装置であって、
前記基板ホルダに前記基板を搬送する請求項10から請求項17のいずれか一項に記載の基板搬送装置を備える露光装置。 - 請求項21に記載の露光装置を用いて、前記基板を露光することと、
露光された前記基板を露光結果に基づいて処理することと、を含むデバイス製造方法。 - 基板支持部材に載置された基板を前記基板支持部材とともに搬送する基板搬送方法であって、
前記基板支持部材の所定の被支持部を支持することと、
前記被支持部が支持された前記基板支持部材に前記基板を載置することと、
前記基板が載置されている前記基板支持部材の前記被支持部又は該被支持部の近傍を保持して該基板支持部材を移動させることと、を含む基板搬送方法。 - 基板支持部材に載置された基板を前記基板支持部材とともに搬送する基板搬送方法であって、
前記基板支持部材の形状が、前記基板を支持した状態で搬送される際の該基板支持部材の形状と同等の形状となるように、前記基板支持部材を支持した後に、該基板支持部材に前記基板を載置して前記基板を搬送する基板搬送方法。 - 前記基板と前記基板支持部材とを対向させた状態で前記基板支持部材を支持し、該基板支持部材を前記基板に対して相対的に移動させて該基板支持部材に前記基板を載置する請求項23又は請求項24に記載の基板搬送方法。
- ほぼ水平面に沿った状態で支持した前記基板の下方に前記基板支持部材を支持し、前記基板支持部材を前記基板に対して相対的にほぼ鉛直方向に沿う方向に移動させ、前記基板支持部材に前記基板を載置する請求項25に記載の基板搬送方法。
- 前記基板支持部材に前記基板を載置する際に、前記基板支持部材に設けられた支持部により前記基板の一部を支持する請求項23から請求項26のいずれか一項に基板搬送方法。
- 前記基板支持部材に前記基板を載置する際に、前記支持部により前記基板をほぼ水平面に沿った状態で支持する請求項27に記載の基板搬送方法。
- 前記被支持部は、少なくとも前記基板支持部材の両側部に設けられている請求項23に記載の基板搬送方法。
- 前記基板を支持した状態の前記基板支持部材を、前記基板を保持する基板ホルダに向けて搬送し、前記基板支持部材が支持する前記基板を前記基板ホルダに受け渡す請求項23から請求項29のいずれか一項に記載の基板搬送方法。
- 前記基板支持部材を前記基板ホルダに受け渡す請求項30に記載の基板搬送方法。
- 前記基板ホルダのうち前記基板が載置されるホルダ部に前記基板を受け渡し、前記基板ホルダのうち前記ホルダ部と異なる部分に前記基板支持部材を受け渡す請求項31に記載の基板搬送方法。
- 前記基板ホルダのうち前記ホルダ部に対して溝状に設けられた溝部に前記基板支持部材を受け渡す請求項32に記載の基板搬送方法。
- 基板支持部材に載置された基板を前記基板支持部材とともに搬送する基板搬送装置であって、
前記基板支持部材の所定の被支持部を支持する支持機構と、
前記被支持部が支持された前記基板支持部材に前記基板を載置する載置機構と、
前記基板が載置されている前記基板支持部材の前記被支持部又は該被支持部の近傍を保持して該基板支持部材を移動させる搬送機構と、を備える基板搬送装置。 - 前記支持機構は、前記基板支持部材の撓み形状が、前記搬送機構によって保持される際の該基板支持部材の撓み形状と同等の形状となるように、前記基板支持部材の前記被支持部を支持する請求項34に記載の基板搬送装置。
- 前記被支持部は、少なくとも前記基板支持部材の両側部に設けられている請求項34又は請求項35に記載の基板搬送装置。
- 前記搬送機構は、前記基板を保持する基板ホルダに向けて前記基板支持部材を移動させて、該基板支持部材が支持する前記基板を前記基板ホルダに受け渡す請求項34から請求項36のいずれか一項に記載の基板搬送装置。
- 前記搬送機構は、前記基板支持部材を前記基板ホルダに受け渡す請求項37に記載の基板搬送装置。
- 前記搬送機構は、前記基板ホルダのうち前記基板が載置されるホルダ部に前記基板を受け渡し、前記基板ホルダのうち前記ホルダ部と異なる部分に前記基板支持部材を受け渡す請求項38に記載の基板搬送装置。
- 前記搬送機構は、前記基板ホルダのうち前記ホルダ部に対して溝状に設けられた溝部に前記基板支持部材を受け渡す請求項39に記載の基板搬送装置。
- 前記基板を支持する複数の支持ピンを備え、
前記基板支持部材は、前記複数の支持ピンが挿通される複数の挿通孔を有し、
前記載置機構は、前記複数の支持ピンのうち少なくとも一部の支持ピンが前記複数の挿通孔に挿通された状態で前記支持機構が支持する前記基板支持部材を上昇移動させ、前記複数の支持ピンに支持された前記基板を前記基板支持部材に載置させる請求項34から請求項40のいずれか一項に記載の基板搬送装置。 - 前記複数の支持ピンは、前記基板をほぼ水平面に沿った状態で支持し、
前記載置機構は、前記基板支持部材に前記基板を支持させる際に、前記基板支持部材に設けられ、前記基板の一部を支持する支持部に、前記基板をほぼ水平面に沿った状態で支持させる請求項41に記載の基板搬送装置。 - 前記支持機構は、前記基板支持部材の前記被支持部を支持する保持アームを備え、
前記載置機構は、前記複数の支持ピンが支持する前記基板と前記保持アームとを相対移動させて前記基板を前記基板支持部材に載置させ、
前記搬送機構は、前記基板支持部材を保持する前記保持アームを移動させる請求項34から請求項42のいずれか一項に記載の基板搬送装置。 - 前記支持機構は、前記基板支持部材の前記被支持部を支持する複数の第2支持ピンを備え、
前記載置機構は、前記複数の支持ピンが支持する前記基板と前記複数の第2支持ピンとを相対移動させて前記基板を前記基板支持部材に載置させ、
前記搬送機構は、前記複数の第2支持ピンが支持する前記基板支持部材の前記被支持部又は該被支持部の近傍を保持して移動する搬送アームを備える請求項34から請求項42のいずれか一項に記載の基板搬送装置。 - 前記複数の第2支持ピンは、前記基板支持部材を上昇移動させ、前記基板を前記基板支持部材に載置する請求項44に記載の基板搬送装置。
- 前記搬送アームは、前記複数の第2支持ピンが挿通される切欠き部を有し、前記基板が前記基板支持部材に載置された後、前記被支持部を保持して上昇移動する請求項44に記載の基板搬送装置。
- 基板ホルダが保持する基板に露光光を照射して前記基板を露光する露光装置であって、
前記基板ホルダに前記基板を搬送する請求項34から請求項46のいずれか一項に記載の基板搬送装置を備える露光装置。 - 請求項47に記載の露光装置を用いて、前記基板を露光することと、
露光された前記基板を露光結果に基づいて処理することと、を含むデバイス製造方法。 - 請求項23から請求項33のいずれか一項に記載の基板搬送方法を用いて、前記基板を搬送することと、
前記基板を露光することと、
露光された前記基板を露光結果に基づいて処理することと、を含むデバイス製造方法。
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JP6685213B2 (ja) * | 2016-09-29 | 2020-04-22 | 株式会社Screenホールディングス | 基板整列装置、基板処理装置、基板配列装置、基板整列方法、基板処理方法および基板配列方法 |
CN107010417B (zh) * | 2017-03-20 | 2020-03-06 | 京东方科技集团股份有限公司 | 用于显示屏基板的存放装置及取放显示屏基板的控制方法 |
JP6468540B2 (ja) * | 2017-05-22 | 2019-02-13 | キヤノントッキ株式会社 | 基板搬送機構、基板載置機構、成膜装置及びそれらの方法 |
JP7033303B2 (ja) * | 2018-01-31 | 2022-03-10 | 三星ダイヤモンド工業株式会社 | 基板搬送装置 |
CN109433999A (zh) * | 2018-12-03 | 2019-03-08 | 广东盛茂达自动控制科技有限公司 | 伸缩架自动铆压系统 |
CN110730611B (zh) * | 2019-09-30 | 2020-12-08 | 云谷(固安)科技有限公司 | 曲面显示屏绑定装置及曲面显示屏绑定方法 |
JP7433181B2 (ja) * | 2020-09-23 | 2024-02-19 | 株式会社Screenホールディングス | 描画装置 |
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