JP7433181B2 - 描画装置 - Google Patents

描画装置 Download PDF

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Publication number
JP7433181B2
JP7433181B2 JP2020158317A JP2020158317A JP7433181B2 JP 7433181 B2 JP7433181 B2 JP 7433181B2 JP 2020158317 A JP2020158317 A JP 2020158317A JP 2020158317 A JP2020158317 A JP 2020158317A JP 7433181 B2 JP7433181 B2 JP 7433181B2
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JP
Japan
Prior art keywords
substrate
moving mechanism
stage
counterweight
moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020158317A
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English (en)
Japanese (ja)
Other versions
JP2022052125A (ja
Inventor
雄也 藤田
望 原
浩士 福田
直人 早川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2020158317A priority Critical patent/JP7433181B2/ja
Priority to TW110123244A priority patent/TWI811714B/zh
Priority to KR1020210090862A priority patent/KR20220040366A/ko
Priority to CN202110987294.1A priority patent/CN114253085B/zh
Publication of JP2022052125A publication Critical patent/JP2022052125A/ja
Application granted granted Critical
Publication of JP7433181B2 publication Critical patent/JP7433181B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Confectionery (AREA)
  • Formation And Processing Of Food Products (AREA)
  • Control And Other Processes For Unpacking Of Materials (AREA)
JP2020158317A 2020-09-23 2020-09-23 描画装置 Active JP7433181B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2020158317A JP7433181B2 (ja) 2020-09-23 2020-09-23 描画装置
TW110123244A TWI811714B (zh) 2020-09-23 2021-06-25 描繪裝置
KR1020210090862A KR20220040366A (ko) 2020-09-23 2021-07-12 묘화 장치
CN202110987294.1A CN114253085B (zh) 2020-09-23 2021-08-26 描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020158317A JP7433181B2 (ja) 2020-09-23 2020-09-23 描画装置

Publications (2)

Publication Number Publication Date
JP2022052125A JP2022052125A (ja) 2022-04-04
JP7433181B2 true JP7433181B2 (ja) 2024-02-19

Family

ID=80791367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020158317A Active JP7433181B2 (ja) 2020-09-23 2020-09-23 描画装置

Country Status (4)

Country Link
JP (1) JP7433181B2 (zh)
KR (1) KR20220040366A (zh)
CN (1) CN114253085B (zh)
TW (1) TWI811714B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023249799A1 (en) * 2022-06-20 2023-12-28 Mrsi Systems Llc Tunable, dynamic counterbalance

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003015139A1 (fr) 2001-08-08 2003-02-20 Nikon Corporation Systeme a etage, dispositif d'exposition, et procede de fabrication du dispositif
WO2005098911A1 (ja) 2004-04-09 2005-10-20 Nikon Corporation 移動体の駆動方法、ステージ装置及び露光装置
JP2006100689A (ja) 2004-09-30 2006-04-13 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP2009260339A (ja) 2008-04-14 2009-11-05 Asml Netherlands Bv 位置決めシステム、リソグラフィ装置、およびデバイス製造方法
JP2014532298A (ja) 2011-09-06 2014-12-04 ケーエルエー−テンカー コーポレイション 反射電子ビームリソグラフィ用リニアステージ
US20170090303A1 (en) 2015-09-30 2017-03-30 Applied Materials, Inc. Methods and apparatus for vibration damping stage

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Publication number Priority date Publication date Assignee Title
DE69717975T2 (de) * 1996-12-24 2003-05-28 Asml Netherlands Bv In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
JP2001308141A (ja) * 2000-02-18 2001-11-02 Sony Corp 電子回路装置の製造方法
JP3920605B2 (ja) * 2001-09-06 2007-05-30 株式会社日立ハイテクノロジーズ 露光装置
JP3906753B2 (ja) * 2002-07-01 2007-04-18 株式会社日立プラントテクノロジー 基板組立て装置
US7750818B2 (en) * 2006-11-29 2010-07-06 Adp Engineering Co., Ltd. System and method for introducing a substrate into a process chamber
JP5024301B2 (ja) * 2009-01-20 2012-09-12 パナソニック株式会社 圧着装置及び圧着方法
JP5415842B2 (ja) * 2009-06-26 2014-02-12 大日本スクリーン製造株式会社 描画システムおよびパターン形成システム
CN102741993B (zh) * 2009-12-16 2016-06-22 株式会社尼康 基板支承构件、基板搬送装置、基板搬送方法、曝光装置及元件制造方法
US20120064461A1 (en) * 2010-09-13 2012-03-15 Nikon Corporation Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
JP2013089278A (ja) * 2011-10-24 2013-05-13 Sanyo Electric Co Ltd 光ピックアップ装置
CN102393611B (zh) * 2011-11-12 2013-10-16 哈尔滨工业大学 光刻机工件台磁预紧平衡定位系统
JP5875904B2 (ja) * 2012-03-13 2016-03-02 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
KR101603536B1 (ko) * 2012-12-21 2016-03-15 가부시키가이샤 신가와 플립 칩 본더 및 본딩 스테이지의 평탄도 및 변형량 보정 방법
JP2014146011A (ja) * 2013-01-30 2014-08-14 Hitachi High-Technologies Corp パターン形成装置及びパターン形成方法
CN105676597B (zh) * 2016-04-14 2017-11-14 清华大学 一种掩模台平衡块合质心防飘移运动控制方法
CN106092444A (zh) * 2016-08-02 2016-11-09 北方民族大学 一种双电机驱动的重力平衡装置及调节方法
JP6917848B2 (ja) * 2017-09-26 2021-08-11 株式会社Ｓｃｒｅｅｎホールディングス ステージ駆動装置および描画装置
CN110658688B (zh) * 2018-06-29 2020-12-15 上海微电子装备（集团）股份有限公司 一种工件台系统及光刻设备

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003015139A1 (fr) 2001-08-08 2003-02-20 Nikon Corporation Systeme a etage, dispositif d'exposition, et procede de fabrication du dispositif
WO2005098911A1 (ja) 2004-04-09 2005-10-20 Nikon Corporation 移動体の駆動方法、ステージ装置及び露光装置
JP2006100689A (ja) 2004-09-30 2006-04-13 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP2009260339A (ja) 2008-04-14 2009-11-05 Asml Netherlands Bv 位置決めシステム、リソグラフィ装置、およびデバイス製造方法
JP2014532298A (ja) 2011-09-06 2014-12-04 ケーエルエー−テンカー コーポレイション 反射電子ビームリソグラフィ用リニアステージ
US20170090303A1 (en) 2015-09-30 2017-03-30 Applied Materials, Inc. Methods and apparatus for vibration damping stage

Also Published As

Publication number Publication date
CN114253085B (zh) 2024-05-24
TW202213452A (zh) 2022-04-01
CN114253085A (zh) 2022-03-29
JP2022052125A (ja) 2022-04-04
KR20220040366A (ko) 2022-03-30
TWI811714B (zh) 2023-08-11

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