KR20120024756A - 표면 개질된 육방정 질화붕소 입자 - Google Patents

표면 개질된 육방정 질화붕소 입자 Download PDF

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KR20120024756A
KR20120024756A KR1020117029685A KR20117029685A KR20120024756A KR 20120024756 A KR20120024756 A KR 20120024756A KR 1020117029685 A KR1020117029685 A KR 1020117029685A KR 20117029685 A KR20117029685 A KR 20117029685A KR 20120024756 A KR20120024756 A KR 20120024756A
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polymer
alkyl
smhbn
film
substituted phenyl
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Korean (ko)
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고빈다사미 파라마시반 라젠드란
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이 아이 듀폰 디 네모아 앤드 캄파니
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C07C211/44—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
    • C07C211/45—Monoamines
    • C07C211/46—Aniline
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/38—Boron-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/77—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by unit-cell parameters, atom positions or structure diagrams
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/88—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by thermal analysis data, e.g. TGA, DTA, DSC
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/40—Electric properties
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B2200/00—Indexing scheme relating to specific properties of organic compounds
    • C07B2200/11—Compounds covalently bound to a solid support
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/08—Treatment with low-molecular-weight non-polymer organic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020117029685A 2009-05-13 2010-05-12 표면 개질된 육방정 질화붕소 입자 Withdrawn KR20120024756A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/465,042 2009-05-13
US12/465,042 US8258346B2 (en) 2009-05-13 2009-05-13 Surface modified hexagonal boron nitride particles

Publications (1)

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KR20120024756A true KR20120024756A (ko) 2012-03-14

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Country Status (6)

Country Link
US (1) US8258346B2 (https=)
EP (1) EP2429943A4 (https=)
JP (1) JP5619149B2 (https=)
KR (1) KR20120024756A (https=)
CN (1) CN102421701B (https=)
WO (1) WO2010132512A2 (https=)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10133176B2 (en) 2015-03-24 2018-11-20 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern using the same
US10153163B2 (en) 2014-07-25 2018-12-11 Samsung Electronics Co., Ltd. Hardmask composition and method of forming patterning by using the hardmask composition
US10170325B2 (en) 2014-05-30 2019-01-01 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern by using the hardmask composition
US10331033B2 (en) 2014-07-04 2019-06-25 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern using the hardmask composition
US10495972B2 (en) 2015-04-03 2019-12-03 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern using the hardmask composition
KR102122019B1 (ko) * 2019-04-26 2020-06-11 서울대학교산학협력단 질화붕소를 포함하는 폴리올레핀 나노복합재료 및 그 제조방법
US10685844B2 (en) 2017-07-27 2020-06-16 Samsung Electronics Co., Ltd. Hardmask composition, method of forming pattern by using the hardmask composition, and hardmask formed using the hardmask composition
US10808142B2 (en) 2017-07-28 2020-10-20 Samsung Electronics Co., Ltd. Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition
US11034847B2 (en) 2017-07-14 2021-06-15 Samsung Electronics Co., Ltd. Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition
KR102291752B1 (ko) * 2020-12-18 2021-08-24 한국기초과학지원연구원 산기 치환 표면 개질 질화붕소, 이의 제조방법 및 이를 함유한 방열성 조성물

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US8288466B2 (en) * 2009-05-13 2012-10-16 E I Du Pont De Nemours And Company Composite of a polymer and surface modified hexagonal boron nitride particles
US8258346B2 (en) 2009-05-13 2012-09-04 E I Du Pont De Nemours And Company Surface modified hexagonal boron nitride particles
US8440292B2 (en) * 2009-05-13 2013-05-14 E I Du Pont De Nemours And Company Multi-layer article for flexible printed circuits
US8784980B2 (en) * 2009-05-13 2014-07-22 E I Du Pont De Nemours And Company Film prepared from a casting composition comprising a polymer and surface modified hexagonal boron nitride particles
CN104011124A (zh) 2011-12-16 2014-08-27 提克纳有限责任公司 用于聚芳硫醚组合物的成核体系
CN103998506B (zh) 2011-12-16 2016-08-24 提克纳有限责任公司 用于聚苯硫醚的含硼成核剂
US8852487B2 (en) 2011-12-16 2014-10-07 Ticona Llc Injection molding of polyarylene sulfide compositions
US8796392B2 (en) 2011-12-16 2014-08-05 Ticona Llc Low temperature injection molding of polyarylene sulfide compositions
BR112016000401A2 (pt) * 2013-07-10 2018-03-20 Boron Nitride Power Llc materiais de nitreto de boro funcionalizado como espécies eletroativas em dispositivos de armazenagem de energia eletroquímica
US9745499B2 (en) * 2013-09-06 2017-08-29 Korea Advanced Institute Of Science And Technology Hexagonal boron nitride nanosheet/ceramic nanocomposite powder and producing method of the same, and hexagonal boron nitride nanosheet/ceramic nanocomposite materials and producing method of the same
KR102235501B1 (ko) * 2014-09-12 2021-04-05 엘지이노텍 주식회사 무기충전재 및 이를 포함하는 에폭시 수지 조성물
TWI708805B (zh) * 2015-12-30 2020-11-01 美商聖高拜陶器塑膠公司 改質氮化物顆粒、寡聚物官能化氮化物顆粒、基於聚合物之複合材料及其形成方法
JP6632636B2 (ja) * 2016-01-26 2020-01-22 富士フイルム株式会社 表面修飾無機物およびその製造方法、樹脂組成物、熱伝導材料、ならびにデバイス
WO2017158919A1 (ja) * 2016-03-14 2017-09-21 ナミックス株式会社 窒化ホウ素フィラ―、樹脂組成物、フィルム、窒化ホウ素フィラ―の製造方法
CN109134271A (zh) * 2017-06-15 2019-01-04 中国科学院化学研究所 一种对六方氮化硼进行表面改性的方法
KR102293461B1 (ko) * 2017-07-14 2021-08-25 후지필름 가부시키가이샤 표면 수식 무기 질화물, 조성물, 열전도 재료, 열전도층 부착 디바이스
CN109401360B (zh) * 2017-08-18 2020-08-21 中国科学院化学研究所 一种对高温结构陶瓷材料进行表面改性的方法
CN107827770A (zh) * 2017-11-14 2018-03-23 西北工业大学 一种脂肪链接枝的六方氮化硼纳米复合材料及其制备方法
EP3916773A4 (en) 2019-01-23 2022-03-23 FUJIFILM Corporation COMPOSITION, THERMAL FILM AND THERMAL COATING DEVICE
JP7191988B2 (ja) 2019-02-01 2022-12-19 富士フイルム株式会社 熱伝導材料形成用組成物、熱伝導材料
CN116694106A (zh) * 2023-06-07 2023-09-05 安徽建筑大学 一种功能化氮化硼及基于其的阻燃导热硅橡胶

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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10170325B2 (en) 2014-05-30 2019-01-01 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern by using the hardmask composition
US10331033B2 (en) 2014-07-04 2019-06-25 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern using the hardmask composition
US10153163B2 (en) 2014-07-25 2018-12-11 Samsung Electronics Co., Ltd. Hardmask composition and method of forming patterning by using the hardmask composition
US10133176B2 (en) 2015-03-24 2018-11-20 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern using the same
US10495972B2 (en) 2015-04-03 2019-12-03 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern using the hardmask composition
US11086223B2 (en) 2015-04-03 2021-08-10 Samsung Electronics Co., Ltd. Hardmask composition and method of forming pattern using the hardmask composition
US11034847B2 (en) 2017-07-14 2021-06-15 Samsung Electronics Co., Ltd. Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition
US10685844B2 (en) 2017-07-27 2020-06-16 Samsung Electronics Co., Ltd. Hardmask composition, method of forming pattern by using the hardmask composition, and hardmask formed using the hardmask composition
US10808142B2 (en) 2017-07-28 2020-10-20 Samsung Electronics Co., Ltd. Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition
KR102122019B1 (ko) * 2019-04-26 2020-06-11 서울대학교산학협력단 질화붕소를 포함하는 폴리올레핀 나노복합재료 및 그 제조방법
KR102291752B1 (ko) * 2020-12-18 2021-08-24 한국기초과학지원연구원 산기 치환 표면 개질 질화붕소, 이의 제조방법 및 이를 함유한 방열성 조성물

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US8258346B2 (en) 2012-09-04
HK1169366A1 (en) 2013-01-25
WO2010132512A3 (en) 2011-03-03
EP2429943A4 (en) 2015-03-11
EP2429943A2 (en) 2012-03-21
US20100292508A1 (en) 2010-11-18
JP5619149B2 (ja) 2014-11-05
WO2010132512A2 (en) 2010-11-18
CN102421701B (zh) 2014-07-16
JP2012526830A (ja) 2012-11-01
CN102421701A (zh) 2012-04-18

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