KR20100124802A - 구리 인듐 설파이드 나노입자 및 이의 제조 방법 - Google Patents
구리 인듐 설파이드 나노입자 및 이의 제조 방법 Download PDFInfo
- Publication number
- KR20100124802A KR20100124802A KR1020107022221A KR20107022221A KR20100124802A KR 20100124802 A KR20100124802 A KR 20100124802A KR 1020107022221 A KR1020107022221 A KR 1020107022221A KR 20107022221 A KR20107022221 A KR 20107022221A KR 20100124802 A KR20100124802 A KR 20100124802A
- Authority
- KR
- South Korea
- Prior art keywords
- copper
- indium
- indium sulfide
- copper indium
- semiconductor nanoparticles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000002105 nanoparticle Substances 0.000 title claims abstract description 59
- LCUOIYYHNRBAFS-UHFFFAOYSA-N copper;sulfanylideneindium Chemical compound [Cu].[In]=S LCUOIYYHNRBAFS-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000004065 semiconductor Substances 0.000 claims abstract description 49
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000002245 particle Substances 0.000 claims abstract description 15
- 150000001879 copper Chemical class 0.000 claims abstract description 12
- 150000002471 indium Chemical class 0.000 claims abstract description 12
- 238000003756 stirring Methods 0.000 claims abstract description 11
- 239000000843 powder Substances 0.000 claims abstract description 8
- 238000004062 sedimentation Methods 0.000 claims abstract description 7
- 239000003960 organic solvent Substances 0.000 claims abstract description 6
- 238000000295 emission spectrum Methods 0.000 claims abstract description 5
- 239000011261 inert gas Substances 0.000 claims abstract description 5
- 239000002798 polar solvent Substances 0.000 claims abstract description 5
- 238000001816 cooling Methods 0.000 claims abstract 2
- 238000004519 manufacturing process Methods 0.000 claims description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 15
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical group [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 14
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- VBXWCGWXDOBUQZ-UHFFFAOYSA-K diacetyloxyindiganyl acetate Chemical group [In+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VBXWCGWXDOBUQZ-UHFFFAOYSA-K 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 6
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadecene Natural products CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 claims description 6
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 claims description 4
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims description 4
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 claims description 4
- RZJRJXONCZWCBN-UHFFFAOYSA-N octadecane Chemical compound CCCCCCCCCCCCCCCCCC RZJRJXONCZWCBN-UHFFFAOYSA-N 0.000 claims description 4
- 239000011877 solvent mixture Substances 0.000 claims description 4
- 238000001556 precipitation Methods 0.000 claims description 3
- NKJOXAZJBOMXID-UHFFFAOYSA-N 1,1'-Oxybisoctane Chemical compound CCCCCCCCOCCCCCCCC NKJOXAZJBOMXID-UHFFFAOYSA-N 0.000 claims description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 2
- XURCIPRUUASYLR-UHFFFAOYSA-N Omeprazole sulfide Chemical compound N=1C2=CC(OC)=CC=C2NC=1SCC1=NC=C(C)C(OC)=C1C XURCIPRUUASYLR-UHFFFAOYSA-N 0.000 claims description 2
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims description 2
- 229910000337 indium(III) sulfate Inorganic materials 0.000 claims description 2
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 claims description 2
- XGCKLPDYTQRDTR-UHFFFAOYSA-H indium(iii) sulfate Chemical compound [In+3].[In+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O XGCKLPDYTQRDTR-UHFFFAOYSA-H 0.000 claims description 2
- 229940038384 octadecane Drugs 0.000 claims description 2
- 239000012188 paraffin wax Substances 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 230000035484 reaction time Effects 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- ZJCZFAAXZODMQT-UHFFFAOYSA-N 2-methylpentadecane-2-thiol Chemical compound CCCCCCCCCCCCCC(C)(C)S ZJCZFAAXZODMQT-UHFFFAOYSA-N 0.000 description 5
- 238000000862 absorption spectrum Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 5
- 238000002189 fluorescence spectrum Methods 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- 238000009835 boiling Methods 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000002086 nanomaterial Substances 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 2
- 238000003917 TEM image Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000012454 non-polar solvent Substances 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000003440 toxic substance Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- LSESCEUNBVHCTC-UHFFFAOYSA-N 6-methylheptane-1-thiol Chemical compound CC(C)CCCCCS LSESCEUNBVHCTC-UHFFFAOYSA-N 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000090 biomarker Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical group [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- ORTRWBYBJVGVQC-UHFFFAOYSA-N hexadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCS ORTRWBYBJVGVQC-UHFFFAOYSA-N 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- QJAOYSPHSNGHNC-UHFFFAOYSA-N octadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCCCS QJAOYSPHSNGHNC-UHFFFAOYSA-N 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
- C01G15/006—Compounds containing gallium, indium or thallium, with or without oxygen or hydrogen, and containing two or more other elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Composite Materials (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Luminescent Compositions (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA200810101428XA CN101234779A (zh) | 2008-03-06 | 2008-03-06 | 铜铟硫半导体纳米粒子的制备方法 |
| CN200810101428.X | 2008-03-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20100124802A true KR20100124802A (ko) | 2010-11-29 |
Family
ID=39918722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020107022221A Withdrawn KR20100124802A (ko) | 2008-03-06 | 2009-03-06 | 구리 인듐 설파이드 나노입자 및 이의 제조 방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20110039104A1 (enExample) |
| EP (1) | EP2263977A4 (enExample) |
| JP (1) | JP2011513181A (enExample) |
| KR (1) | KR20100124802A (enExample) |
| CN (2) | CN101234779A (enExample) |
| IL (1) | IL207814A0 (enExample) |
| WO (1) | WO2009109110A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108910939A (zh) * | 2018-08-06 | 2018-11-30 | 桂林电子科技大学 | 一种超薄CuInS2纳米片及其制备方法和应用 |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101234779A (zh) * | 2008-03-06 | 2008-08-06 | 中国科学院化学研究所 | 铜铟硫半导体纳米粒子的制备方法 |
| CN101870458B (zh) * | 2009-04-22 | 2012-05-09 | 钟润文 | 多元金属硫族元素化合物和靶材及涂层材料的制备方法 |
| CN102126708B (zh) * | 2010-01-20 | 2013-03-27 | 电子科技大学 | 一种铜铟镓硒硫纳米粉末材料的制备方法 |
| CN101804971A (zh) * | 2010-04-19 | 2010-08-18 | 西安交通大学 | 一种铜铟硒纳米晶材料的制备方法 |
| FR2964044B1 (fr) * | 2010-08-26 | 2012-09-14 | Commissariat Energie Atomique | Emulsion de metal liquide |
| CN102041555A (zh) * | 2011-01-14 | 2011-05-04 | 南开大学 | 一种CuInS2纳米晶材料的制备方法 |
| WO2012163976A1 (en) | 2011-06-03 | 2012-12-06 | Bayer Intellectual Property Gmbh | Continuous process for the synthesis of ternary or quaternary semiconducting nanoparticles based on ib, iiia, via elements of the periodic classification |
| WO2012168192A2 (en) | 2011-06-07 | 2012-12-13 | Bayer Intellectual Property Gmbh | Synthesis of highly fluorescing semiconducting core-shell nanoparticles based on ib, iib, iiia, via elements of the periodic classification. |
| CN102502788B (zh) * | 2011-10-13 | 2014-12-24 | 中国科学院过程工程研究所 | 一种铜铟硫三元半导体纳米颗粒的简单可控的制备方法 |
| CN102517003B (zh) * | 2011-11-03 | 2013-12-11 | 吉林大学 | 一种新型近红外水溶性铜铟硫三元量子点的水热制备方法 |
| CN102583263A (zh) * | 2012-02-14 | 2012-07-18 | 北京理工大学 | 一种水相合成禁带可调的Cu-In-X三元纳米颗粒的方法 |
| US8231848B1 (en) | 2012-04-10 | 2012-07-31 | Sun Harmonics Ltd | One-pot synthesis of chalcopyrite-based semi-conductor nanoparticles |
| CN102709381B (zh) * | 2012-05-03 | 2014-11-26 | 北京工业大学 | 一种制备cis薄膜的方法 |
| CN103112885A (zh) * | 2012-12-12 | 2013-05-22 | 南京工业大学 | 铜基纳米太阳能电池材料的制备方法 |
| CN103137340B (zh) * | 2013-01-23 | 2016-05-11 | 中国科学院过程工程研究所 | 高效低成本染料敏化太阳能电池对电极材料一维铜铟硫-硫化锌异质结纳米晶的制备方法 |
| CN105190836B (zh) | 2013-03-04 | 2021-01-22 | 纳米技术有限公司 | 用于薄膜太阳能电池的铜-铟-镓-硫属化物纳米粒子前体 |
| CN103310992A (zh) * | 2013-05-21 | 2013-09-18 | 东莞上海大学纳米技术研究院 | 一种染料敏化太阳能电池的光阳极及其制备方法 |
| JP6281835B2 (ja) * | 2013-09-06 | 2018-02-21 | 国立大学法人 宮崎大学 | 太陽電池用化合物半導体ナノ粒子の作製方法 |
| CN104016590B (zh) * | 2014-04-29 | 2016-06-15 | 北京理工大学 | 一种纳米晶掺杂光学玻璃的制备方法 |
| CN104891555B (zh) * | 2015-05-22 | 2016-06-15 | 温州大学 | 一种三维中空CuInS2微球的制备方法 |
| CN105369358A (zh) * | 2015-11-04 | 2016-03-02 | 北京理工大学 | 一种对半导体纳米晶材料表面进行配体交换的方法 |
| CN106830055B (zh) * | 2017-02-24 | 2018-08-07 | 武汉理工大学 | 一种含纤锌矿孪晶结构的铜铟硫纳米晶及其制备方法 |
| KR102799365B1 (ko) | 2019-12-02 | 2025-04-22 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 양자 도트, 파장 변환 재료, 백라이트 유닛, 화상 표시 장치 및 양자 도트의 제조 방법 |
| CN112062149A (zh) * | 2020-09-16 | 2020-12-11 | 泉州师范学院 | 一种纳米硫化铜的制备方法 |
| CN115197695B (zh) * | 2021-04-14 | 2024-01-19 | 中国科学院理化技术研究所 | 一种CuInS2量子点超晶格结构的制备方法 |
| CN114538498B (zh) * | 2022-02-23 | 2022-11-29 | 西安交通大学 | 一种硫化铜纳米线的制备方法及应用 |
| CN114933327B (zh) * | 2022-06-13 | 2023-12-01 | 佛山(华南)新材料研究院 | 一种制氢材料及其制备方法、应用 |
| CN115340866A (zh) * | 2022-08-30 | 2022-11-15 | 北华大学 | 一种CuAlInS量子点及其制备方法 |
| CN116603542A (zh) * | 2023-06-30 | 2023-08-18 | 合肥工业大学 | 一种CuInS2-In2S3纳米异质结催化剂及其制备方法和应用 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6191005A (ja) * | 1984-10-08 | 1986-05-09 | Ryuichi Yamamoto | 金属硫化物溶液とその製造方法 |
| KR100621309B1 (ko) * | 2004-04-20 | 2006-09-14 | 삼성전자주식회사 | 황 전구체로서 싸이올 화합물을 이용한 황화 금속나노결정의 제조방법 |
| JP4714859B2 (ja) * | 2005-03-01 | 2011-06-29 | 国立大学法人 名古屋工業大学 | 硫化銅ナノ粒子の合成方法 |
| JP2007169605A (ja) * | 2005-11-24 | 2007-07-05 | National Institute Of Advanced Industrial & Technology | 蛍光体、及びその製造方法 |
| US20080038558A1 (en) * | 2006-04-05 | 2008-02-14 | Evident Technologies, Inc. | I-iii-vi semiconductor nanocrystals, i-iii-vi water stable semiconductor nanocrystals, and methods of making same |
| JP4829046B2 (ja) * | 2006-08-30 | 2011-11-30 | 国立大学法人 名古屋工業大学 | 硫化金属ナノ粒子の製造方法及び光電変換素子 |
| JP5188070B2 (ja) * | 2007-02-07 | 2013-04-24 | Jx日鉱日石エネルギー株式会社 | カルコパイライトナノ粒子の製造方法及び光電変換素子 |
| CN100494068C (zh) * | 2007-05-17 | 2009-06-03 | 上海交通大学 | 单分散三元硫化物CuInS2的制备方法 |
| CN101234779A (zh) * | 2008-03-06 | 2008-08-06 | 中国科学院化学研究所 | 铜铟硫半导体纳米粒子的制备方法 |
-
2008
- 2008-03-06 CN CNA200810101428XA patent/CN101234779A/zh active Pending
-
2009
- 2009-03-06 EP EP09718518.5A patent/EP2263977A4/en not_active Withdrawn
- 2009-03-06 CN CN200980107584XA patent/CN102105400A/zh active Pending
- 2009-03-06 US US12/920,665 patent/US20110039104A1/en not_active Abandoned
- 2009-03-06 JP JP2010549003A patent/JP2011513181A/ja active Pending
- 2009-03-06 WO PCT/CN2009/000237 patent/WO2009109110A1/zh not_active Ceased
- 2009-03-06 KR KR1020107022221A patent/KR20100124802A/ko not_active Withdrawn
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2010
- 2010-08-26 IL IL207814A patent/IL207814A0/en unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108910939A (zh) * | 2018-08-06 | 2018-11-30 | 桂林电子科技大学 | 一种超薄CuInS2纳米片及其制备方法和应用 |
| CN108910939B (zh) * | 2018-08-06 | 2020-11-10 | 桂林电子科技大学 | 一种超薄CuInS2纳米片及其制备方法和应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| IL207814A0 (en) | 2010-12-30 |
| EP2263977A4 (en) | 2014-01-29 |
| EP2263977A1 (en) | 2010-12-22 |
| WO2009109110A1 (zh) | 2009-09-11 |
| CN102105400A (zh) | 2011-06-22 |
| US20110039104A1 (en) | 2011-02-17 |
| CN101234779A (zh) | 2008-08-06 |
| JP2011513181A (ja) | 2011-04-28 |
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