KR20090107494A - 표면을 패턴화하는 방법 - Google Patents
표면을 패턴화하는 방법 Download PDFInfo
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- KR20090107494A KR20090107494A KR1020097013916A KR20097013916A KR20090107494A KR 20090107494 A KR20090107494 A KR 20090107494A KR 1020097013916 A KR1020097013916 A KR 1020097013916A KR 20097013916 A KR20097013916 A KR 20097013916A KR 20090107494 A KR20090107494 A KR 20090107494A
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- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
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- 229920005989 resin Polymers 0.000 description 1
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- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 1
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- 239000010980 sapphire Substances 0.000 description 1
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- 238000001350 scanning transmission electron microscopy Methods 0.000 description 1
- 239000002094 self assembled monolayer Substances 0.000 description 1
- 239000013545 self-assembled monolayer Substances 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 238000002174 soft lithography Methods 0.000 description 1
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- 238000004381 surface treatment Methods 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
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- 238000004876 x-ray fluorescence Methods 0.000 description 1
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F7/00—Signs, name or number plates, letters, numerals, or symbols; Panels or boards
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87280206P | 2006-12-05 | 2006-12-05 | |
| US60/872,802 | 2006-12-05 | ||
| PCT/US2007/024854 WO2008070087A2 (en) | 2006-12-05 | 2007-12-05 | Method for patterning a surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20090107494A true KR20090107494A (ko) | 2009-10-13 |
Family
ID=39081811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020097013916A Ceased KR20090107494A (ko) | 2006-12-05 | 2007-12-05 | 표면을 패턴화하는 방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20080152835A1 (enExample) |
| EP (1) | EP2095187A2 (enExample) |
| JP (1) | JP2010512028A (enExample) |
| KR (1) | KR20090107494A (enExample) |
| CN (1) | CN101755237B (enExample) |
| TW (2) | TW200839432A (enExample) |
| WO (1) | WO2008070087A2 (enExample) |
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| TW200939509A (en) * | 2007-11-19 | 2009-09-16 | Applied Materials Inc | Crystalline solar cell metallization methods |
| KR20100124268A (ko) * | 2008-02-06 | 2010-11-26 | 나노 테라 인코포레이티드 | 표면에 미크론 크기의 특징형상을 형성하기 위한 제거가능 뒷댐재를 가지는 스텐실 및 그의 제조 및 사용 방법 |
| US20110017703A1 (en) * | 2008-03-14 | 2011-01-27 | Research Triangle Institute | Selective planarization method and devices fabricated on planarized structures |
| JP5149083B2 (ja) * | 2008-06-16 | 2013-02-20 | 富士フイルム株式会社 | パターン形成方法、並びに基板加工方法、モールド構造体の複製方法、及びモールド構造体 |
| WO2009158039A1 (en) * | 2008-06-27 | 2009-12-30 | Nano Terra Inc. | Patterning processes comprising amplified patterns |
| US8183081B2 (en) * | 2008-07-16 | 2012-05-22 | Applied Materials, Inc. | Hybrid heterojunction solar cell fabrication using a metal layer mask |
| US8685272B2 (en) * | 2008-08-08 | 2014-04-01 | Samsung Electronics Co., Ltd. | Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device |
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| TW201128301A (en) * | 2009-08-21 | 2011-08-16 | Nano Terra Inc | Methods for patterning substrates using heterogeneous stamps and stencils and methods of making the stamps and stencils |
| TW201220974A (en) * | 2010-05-21 | 2012-05-16 | Nano Terra Inc | Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same |
| US20120070570A1 (en) * | 2010-09-16 | 2012-03-22 | Xerox Corporation | Conductive thick metal electrode forming method |
| CN104011882A (zh) | 2012-01-12 | 2014-08-27 | 应用材料公司 | 制造太阳能电池装置的方法 |
| US9550940B2 (en) | 2012-10-16 | 2017-01-24 | Hitachi Chemical Company, Ltd. | Etching material |
| JP6136186B2 (ja) * | 2012-10-16 | 2017-05-31 | 日立化成株式会社 | 液状組成物 |
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| US20160090488A1 (en) * | 2013-09-09 | 2016-03-31 | FunNano USA, Inc. | Mesh-like micro- and nanostructure for optically transparent conductive coatings and method for producing same |
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| US9750141B2 (en) * | 2014-03-19 | 2017-08-29 | Utilight Ltd | Printing high aspect ratio patterns |
| US9868902B2 (en) | 2014-07-17 | 2018-01-16 | Soulbrain Co., Ltd. | Composition for etching |
| JP2016086187A (ja) * | 2016-02-01 | 2016-05-19 | 日立化成株式会社 | SiN膜の除去方法 |
| WO2018026378A1 (en) * | 2016-08-05 | 2018-02-08 | Applied Materials, Inc. | Method of imprint lithography of conductive materials; stamp for imprint lithography, and apparatus for imprint lithograph |
| CN109470675B (zh) * | 2017-09-08 | 2024-04-02 | 清华大学 | 分子载体的制备方法 |
| KR102081490B1 (ko) * | 2017-12-07 | 2020-02-25 | 인하대학교 산학협력단 | 비닐계 호모폴리머 이온성 젤의 녹는점을 이용한 스탬핑 전사방법 및 이에 의하여 전사된 비닐계 호모폴리머 이온성 젤 |
| CN110039890B (zh) * | 2019-04-18 | 2020-09-18 | 云南开放大学 | 印刷色泽更亮丽的印刷装置 |
| JP7205413B2 (ja) * | 2019-08-07 | 2023-01-17 | 株式会社Sumco | レーザマーク付きシリコンウェーハの製造方法 |
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| ES2315797T3 (es) | 2005-06-10 | 2009-04-01 | Obducat Ab | Metodo de replicacion de modelo. |
| DE602005012068D1 (de) * | 2005-06-10 | 2009-02-12 | Obducat Ab | Kopieren eines Musters mit Hilfe eines Zwischenstempels |
| TW200705541A (en) * | 2005-07-25 | 2007-02-01 | Li Bing Huan | Manufacturing method of nano-sticker |
| CN1800984A (zh) * | 2005-12-27 | 2006-07-12 | 国家纳米技术产业化基地 | 一种负型纳米压印方法 |
| US8608972B2 (en) * | 2006-12-05 | 2013-12-17 | Nano Terra Inc. | Method for patterning a surface |
-
2007
- 2007-12-05 WO PCT/US2007/024854 patent/WO2008070087A2/en not_active Ceased
- 2007-12-05 CN CN200780050792.1A patent/CN101755237B/zh not_active Expired - Fee Related
- 2007-12-05 EP EP07853240A patent/EP2095187A2/en not_active Withdrawn
- 2007-12-05 US US11/950,703 patent/US20080152835A1/en not_active Abandoned
- 2007-12-05 TW TW096146280A patent/TW200839432A/zh unknown
- 2007-12-05 KR KR1020097013916A patent/KR20090107494A/ko not_active Ceased
- 2007-12-05 JP JP2009540265A patent/JP2010512028A/ja active Pending
- 2007-12-05 TW TW102136512A patent/TW201418875A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20080152835A1 (en) | 2008-06-26 |
| WO2008070087A2 (en) | 2008-06-12 |
| EP2095187A2 (en) | 2009-09-02 |
| JP2010512028A (ja) | 2010-04-15 |
| WO2008070087A3 (en) | 2009-04-30 |
| CN101755237A (zh) | 2010-06-23 |
| TW201418875A (zh) | 2014-05-16 |
| CN101755237B (zh) | 2014-04-09 |
| TW200839432A (en) | 2008-10-01 |
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