CN100526053C - 纳米贴纸的制造方法 - Google Patents
纳米贴纸的制造方法 Download PDFInfo
- Publication number
- CN100526053C CN100526053C CNB2005100849334A CN200510084933A CN100526053C CN 100526053 C CN100526053 C CN 100526053C CN B2005100849334 A CNB2005100849334 A CN B2005100849334A CN 200510084933 A CN200510084933 A CN 200510084933A CN 100526053 C CN100526053 C CN 100526053C
- Authority
- CN
- China
- Prior art keywords
- mould
- substrate
- embossed layer
- nanometer
- sticking paper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Paper (AREA)
- Laminated Bodies (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
Description
Claims (7)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2005100849334A CN100526053C (zh) | 2005-03-29 | 2005-07-25 | 纳米贴纸的制造方法 |
EP05019006A EP1708022A1 (en) | 2005-03-29 | 2005-09-01 | Nanoimprint lithograph for fabricating nanopattern in a resist layer |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200510062488 | 2005-03-29 | ||
CN200510062488.1 | 2005-03-29 | ||
CNB2005100849334A CN100526053C (zh) | 2005-03-29 | 2005-07-25 | 纳米贴纸的制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1840318A CN1840318A (zh) | 2006-10-04 |
CN100526053C true CN100526053C (zh) | 2009-08-12 |
Family
ID=35478759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100849334A Expired - Fee Related CN100526053C (zh) | 2005-03-29 | 2005-07-25 | 纳米贴纸的制造方法 |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP1708022A1 (zh) |
CN (1) | CN100526053C (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101755237B (zh) * | 2006-12-05 | 2014-04-09 | 纳诺泰拉公司 | 使表面形成图案的方法 |
US8608972B2 (en) | 2006-12-05 | 2013-12-17 | Nano Terra Inc. | Method for patterning a surface |
KR101457185B1 (ko) * | 2008-10-09 | 2014-10-31 | 서울대학교산학협력단 | 진공효과를 이용한 고분자 전구체의 나노기공 내 삽입방법 및 이를 이용한 나노패턴의 정밀 복제방법 |
US20120088159A1 (en) * | 2009-06-26 | 2012-04-12 | Jayan Thomas | Nano-architectured carbon structures and methods for fabricating same |
US9321214B2 (en) | 2011-07-13 | 2016-04-26 | University Of Utah Research Foundation | Maskless nanoimprint lithography |
DE102019101485A1 (de) * | 2019-01-22 | 2020-07-23 | Lufthansa Technik Aktiengesellschaft | Riblet-Folie und Verfahren zu deren Herstellung |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6517995B1 (en) * | 1999-09-14 | 2003-02-11 | Massachusetts Institute Of Technology | Fabrication of finely featured devices by liquid embossing |
US20030017424A1 (en) * | 2001-07-18 | 2003-01-23 | Miri Park | Method and apparatus for fabricating complex grating structures |
US7750059B2 (en) * | 2002-12-04 | 2010-07-06 | Hewlett-Packard Development Company, L.P. | Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure |
-
2005
- 2005-07-25 CN CNB2005100849334A patent/CN100526053C/zh not_active Expired - Fee Related
- 2005-09-01 EP EP05019006A patent/EP1708022A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP1708022A1 (en) | 2006-10-04 |
CN1840318A (zh) | 2006-10-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI280159B (en) | Method for fabricating nano-adhesive | |
CN100526053C (zh) | 纳米贴纸的制造方法 | |
KR100663858B1 (ko) | 나노 스티커의 제조방법 | |
CN101377618B (zh) | 双面压印光刻系统 | |
CN102910579B (zh) | 一种可提高图形深宽比的纳米压印方法及其产品 | |
TW200848956A (en) | Devices and methods for pattern generation by ink lithography | |
Probst et al. | Athermal Azobenzene‐Based Nanoimprint Lithography | |
CN106663600A (zh) | 分步重复用压印用模具及其制造方法 | |
US8795775B2 (en) | Nanoimprint method | |
TW202113923A (zh) | 微小構造轉印裝置及微小構造轉印方法 | |
TWI693141B (zh) | 奈米壓印用複製模、其製造方法及奈米壓印用複製模製造裝置 | |
KR20090020922A (ko) | 대면적 나노 임프린트 리소그래피 장치 | |
CN110333643B (zh) | 一种纳米压印模板、其制备方法及纳米压印方法 | |
EP1748316A2 (en) | Nanoimprint lithograph for fabricating nanoadhesive | |
TW201109176A (en) | Device and method for preparing a stamp for imprint or roll-print lithography | |
Chen et al. | IR laser-assisted micro/nano-imprinting | |
US8647552B2 (en) | Method for enhancing hardness of nanoimprint mold | |
Singh et al. | Organic Light Emitting Diode (OLED) Toward Smart Lighting and Displays Technologies: Material Design Strategies, Challenges and Future Perspectives | |
KR100869311B1 (ko) | 나노 임프린트 리소그래피 | |
TW201217151A (en) | Nano-imprinting mold and producing method thereof and method for nano-imprinting using the mold and method | |
Gentili et al. | Subtracting technologies: Unconventional Nanolithography | |
KR20080109364A (ko) | 마이크로-나노 금속 구조물의 제조 방법 | |
US20200201170A1 (en) | Semiconductor device and method for forming the same | |
CN115167072A (zh) | 一种快速制备光刻胶掩膜的压印方法 | |
KR20220128399A (ko) | 레이어 증착 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: DONGJIE TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: LI BINGHUAN Effective date: 20071012 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20071012 Address after: Xinshi County, Tainan, Taiwan Applicant after: Contrel Semiconductor Technology Co., Ltd. Address before: Kaohsiung County of Taiwan Province Applicant before: Li Binghuan |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090812 Termination date: 20100725 |