AU2003291443A1 - Compositions and processes for nanoimprinting - Google Patents

Compositions and processes for nanoimprinting

Info

Publication number
AU2003291443A1
AU2003291443A1 AU2003291443A AU2003291443A AU2003291443A1 AU 2003291443 A1 AU2003291443 A1 AU 2003291443A1 AU 2003291443 A AU2003291443 A AU 2003291443A AU 2003291443 A AU2003291443 A AU 2003291443A AU 2003291443 A1 AU2003291443 A1 AU 2003291443A1
Authority
AU
Australia
Prior art keywords
nanoimprinting
compositions
processes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003291443A
Other versions
AU2003291443A8 (en
Inventor
Lei Chen
Stephen Chou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Princeton University
Original Assignee
Princeton University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Princeton University filed Critical Princeton University
Publication of AU2003291443A8 publication Critical patent/AU2003291443A8/en
Publication of AU2003291443A1 publication Critical patent/AU2003291443A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
AU2003291443A 2002-11-12 2003-11-12 Compositions and processes for nanoimprinting Abandoned AU2003291443A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US42558702P 2002-11-12 2002-11-12
US60/425,587 2002-11-12
PCT/US2003/035796 WO2004044654A2 (en) 2002-11-12 2003-11-12 Compositions and processes for nanoimprinting

Publications (2)

Publication Number Publication Date
AU2003291443A8 AU2003291443A8 (en) 2004-06-03
AU2003291443A1 true AU2003291443A1 (en) 2004-06-03

Family

ID=32313021

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003291443A Abandoned AU2003291443A1 (en) 2002-11-12 2003-11-12 Compositions and processes for nanoimprinting

Country Status (3)

Country Link
CN (1) CN1726433B (en)
AU (1) AU2003291443A1 (en)
WO (1) WO2004044654A2 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7641468B2 (en) 2004-09-01 2010-01-05 Hewlett-Packard Development Company, L.P. Imprint lithography apparatus and method employing an effective pressure
DE102004044111B4 (en) * 2004-09-08 2015-05-07 Seereal Technologies Gmbh Method and device for coding and reconstructing computer-generated video holograms
KR101169426B1 (en) 2005-10-20 2012-07-27 에이전시 포 사이언스, 테크놀로지 앤드 리서치 Hierarchical Nanopatterns by Nanoimprint Lithography
CN1323025C (en) * 2005-11-22 2007-06-27 华中科技大学 Super hydrophobic surface possessing dual microtexture and preparation method
KR100848559B1 (en) * 2006-06-29 2008-07-25 엘지디스플레이 주식회사 FABRICATING METHOD OF SOFT MOLD AND pattern forming METHOD USING THEREOF
JP5002207B2 (en) 2006-07-26 2012-08-15 キヤノン株式会社 Method for manufacturing structure having pattern
WO2008070087A2 (en) * 2006-12-05 2008-06-12 Nano Terra Inc. Method for patterning a surface
JP4445538B2 (en) * 2007-09-26 2010-04-07 株式会社東芝 Pattern formation method
US9337100B2 (en) * 2009-06-03 2016-05-10 Qualcomm Incorporated Apparatus and method to fabricate an electronic device
CN101923282B (en) * 2009-06-09 2012-01-25 清华大学 Nano-imprint resist and nano-imprint method adopting same
CN101923279B (en) * 2009-06-09 2012-03-28 清华大学 Nano-imprint template and preparation method thereof
CN101923283B (en) * 2009-06-09 2012-01-25 清华大学 Nano-imprint resist and nano-imprint method adopting same
WO2012002413A1 (en) * 2010-07-02 2012-01-05 株式会社トクヤマ Composition for photocurable imprint, and method for formation of pattern using the composition
US9731456B2 (en) 2013-03-14 2017-08-15 Sabic Global Technologies B.V. Method of manufacturing a functionally graded article
JP6029506B2 (en) 2013-03-26 2016-11-24 富士フイルム株式会社 Composition for forming underlayer film for imprint and pattern forming method
SG11201510349TA (en) * 2013-06-19 2016-01-28 Ev Group E Thallner Gmbh Embossing Material For Embossing Lithography
CN104681641A (en) * 2013-11-29 2015-06-03 比亚迪股份有限公司 Etching resisting agent and preparation method thereof as well as SE (selective emitter) crystalline silicon solar cell and preparation method thereof
CN110983404A (en) * 2019-12-30 2020-04-10 江苏乐彩印刷材料有限公司 Environment-friendly energy-saving CTP (computer to plate) lithographic printing material

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762920B2 (en) * 1986-03-17 1995-07-05 東レ株式会社 Optical recording medium
US5202366A (en) * 1988-07-20 1993-04-13 Union Carbide Chemicals & Plastics Technology Corporation Crosslinkable polyester compositions with improved properties
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
WO2002003142A2 (en) * 2000-06-30 2002-01-10 President And Fellows Of Harvard College Electric microcontact printing method and apparatus

Also Published As

Publication number Publication date
CN1726433B (en) 2010-12-15
AU2003291443A8 (en) 2004-06-03
WO2004044654A2 (en) 2004-05-27
CN1726433A (en) 2006-01-25
WO2004044654A3 (en) 2005-06-23

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase