TW200839432A - Method for patterning a surface - Google Patents
Method for patterning a surface Download PDFInfo
- Publication number
- TW200839432A TW200839432A TW096146280A TW96146280A TW200839432A TW 200839432 A TW200839432 A TW 200839432A TW 096146280 A TW096146280 A TW 096146280A TW 96146280 A TW96146280 A TW 96146280A TW 200839432 A TW200839432 A TW 200839432A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- paste
- stamp
- feature
- elastomeric
- Prior art date
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- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 238000000813 microcontact printing Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920000747 poly(lactic acid) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 239000004626 polylactic acid Substances 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000000190 proton-induced X-ray emission spectroscopy Methods 0.000 description 1
- 230000005588 protonation Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- DTPQZKZONQKKSU-UHFFFAOYSA-N silver azanide silver Chemical compound [NH2-].[Ag].[Ag].[Ag+] DTPQZKZONQKKSU-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 238000002174 soft lithography Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
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- 238000011410 subtraction method Methods 0.000 description 1
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- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 238000004670 tapping atomic force microscopy Methods 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F7/00—Signs, name or number plates, letters, numerals, or symbols; Panels or boards
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87280206P | 2006-12-05 | 2006-12-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200839432A true TW200839432A (en) | 2008-10-01 |
Family
ID=39081811
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096146280A TW200839432A (en) | 2006-12-05 | 2007-12-05 | Method for patterning a surface |
| TW102136512A TW201418875A (zh) | 2006-12-05 | 2007-12-05 | 用於圖案化表面的方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102136512A TW201418875A (zh) | 2006-12-05 | 2007-12-05 | 用於圖案化表面的方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20080152835A1 (enExample) |
| EP (1) | EP2095187A2 (enExample) |
| JP (1) | JP2010512028A (enExample) |
| KR (1) | KR20090107494A (enExample) |
| CN (1) | CN101755237B (enExample) |
| TW (2) | TW200839432A (enExample) |
| WO (1) | WO2008070087A2 (enExample) |
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| WO2009067483A1 (en) * | 2007-11-19 | 2009-05-28 | Applied Materials, Inc. | Solar cell contact formation process using a patterned etchant material |
| TW200939509A (en) * | 2007-11-19 | 2009-09-16 | Applied Materials Inc | Crystalline solar cell metallization methods |
| KR20100124268A (ko) * | 2008-02-06 | 2010-11-26 | 나노 테라 인코포레이티드 | 표면에 미크론 크기의 특징형상을 형성하기 위한 제거가능 뒷댐재를 가지는 스텐실 및 그의 제조 및 사용 방법 |
| US20110017703A1 (en) * | 2008-03-14 | 2011-01-27 | Research Triangle Institute | Selective planarization method and devices fabricated on planarized structures |
| JP5149083B2 (ja) * | 2008-06-16 | 2013-02-20 | 富士フイルム株式会社 | パターン形成方法、並びに基板加工方法、モールド構造体の複製方法、及びモールド構造体 |
| WO2009158039A1 (en) * | 2008-06-27 | 2009-12-30 | Nano Terra Inc. | Patterning processes comprising amplified patterns |
| US8183081B2 (en) * | 2008-07-16 | 2012-05-22 | Applied Materials, Inc. | Hybrid heterojunction solar cell fabrication using a metal layer mask |
| US8685272B2 (en) * | 2008-08-08 | 2014-04-01 | Samsung Electronics Co., Ltd. | Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device |
| US7951637B2 (en) * | 2008-08-27 | 2011-05-31 | Applied Materials, Inc. | Back contact solar cells using printed dielectric barrier |
| JP5363856B2 (ja) * | 2009-03-30 | 2013-12-11 | 富士フイルム株式会社 | パターン形成方法 |
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| TW201128301A (en) * | 2009-08-21 | 2011-08-16 | Nano Terra Inc | Methods for patterning substrates using heterogeneous stamps and stencils and methods of making the stamps and stencils |
| TW201220974A (en) * | 2010-05-21 | 2012-05-16 | Nano Terra Inc | Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same |
| US20120070570A1 (en) * | 2010-09-16 | 2012-03-22 | Xerox Corporation | Conductive thick metal electrode forming method |
| CN104011882A (zh) | 2012-01-12 | 2014-08-27 | 应用材料公司 | 制造太阳能电池装置的方法 |
| US9550940B2 (en) | 2012-10-16 | 2017-01-24 | Hitachi Chemical Company, Ltd. | Etching material |
| JP6136186B2 (ja) * | 2012-10-16 | 2017-05-31 | 日立化成株式会社 | 液状組成物 |
| JP2014082330A (ja) * | 2012-10-16 | 2014-05-08 | Hitachi Chemical Co Ltd | ＳｉＮ膜の除去方法 |
| JP6011234B2 (ja) * | 2012-10-16 | 2016-10-19 | 日立化成株式会社 | 組成物 |
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| US9750141B2 (en) * | 2014-03-19 | 2017-08-29 | Utilight Ltd | Printing high aspect ratio patterns |
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| JP2016086187A (ja) * | 2016-02-01 | 2016-05-19 | 日立化成株式会社 | ＳｉＮ膜の除去方法 |
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| KR102081490B1 (ko) * | 2017-12-07 | 2020-02-25 | 인하대학교 산학협력단 | 비닐계 호모폴리머 이온성 젤의 녹는점을 이용한 스탬핑 전사방법 및 이에 의하여 전사된 비닐계 호모폴리머 이온성 젤 |
| CN110039890B (zh) * | 2019-04-18 | 2020-09-18 | 云南开放大学 | 印刷色泽更亮丽的印刷装置 |
| JP7205413B2 (ja) * | 2019-08-07 | 2023-01-17 | 株式会社Sumco | レーザマーク付きシリコンウェーハの製造方法 |
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| US20230271445A1 (en) * | 2022-02-25 | 2023-08-31 | Intel Corporation | Reusable composite stencil for spray processes |
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-
2007
- 2007-12-05 WO PCT/US2007/024854 patent/WO2008070087A2/en not_active Ceased
- 2007-12-05 CN CN200780050792.1A patent/CN101755237B/zh not_active Expired - Fee Related
- 2007-12-05 EP EP07853240A patent/EP2095187A2/en not_active Withdrawn
- 2007-12-05 US US11/950,703 patent/US20080152835A1/en not_active Abandoned
- 2007-12-05 TW TW096146280A patent/TW200839432A/zh unknown
- 2007-12-05 KR KR1020097013916A patent/KR20090107494A/ko not_active Ceased
- 2007-12-05 JP JP2009540265A patent/JP2010512028A/ja active Pending
- 2007-12-05 TW TW102136512A patent/TW201418875A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20080152835A1 (en) | 2008-06-26 |
| WO2008070087A2 (en) | 2008-06-12 |
| EP2095187A2 (en) | 2009-09-02 |
| JP2010512028A (ja) | 2010-04-15 |
| WO2008070087A3 (en) | 2009-04-30 |
| CN101755237A (zh) | 2010-06-23 |
| TW201418875A (zh) | 2014-05-16 |
| CN101755237B (zh) | 2014-04-09 |
| KR20090107494A (ko) | 2009-10-13 |
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