KR20060091911A - 플루오로알킬술폰늄염의 광산발생기가 치환된 화합물과 이를 중합한 공중합체 - Google Patents
플루오로알킬술폰늄염의 광산발생기가 치환된 화합물과 이를 중합한 공중합체 Download PDFInfo
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- KR20060091911A KR20060091911A KR1020050012680A KR20050012680A KR20060091911A KR 20060091911 A KR20060091911 A KR 20060091911A KR 1020050012680 A KR1020050012680 A KR 1020050012680A KR 20050012680 A KR20050012680 A KR 20050012680A KR 20060091911 A KR20060091911 A KR 20060091911A
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- photoacid generator
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/06—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/38—Esters containing sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
Claims (2)
- 플루오로알킬술폰늄염이 치환된 광산발생기가 측쇄기에 도입되어 있는 것임을 특징으로 하는 다음 화학식 2로 표시되는 공중합체:[화학식 2]상기 화학식 2에서,R1과 R2는 각각 C1 ∼ C6의 알킬카르보닐기, 알데하이드기, 시아노기, 니트로기, 페닐기 중에서 선택된 전자공여기 및 전자흡인성기가 치환된 페닐기이고;R4는 C1 ∼ C20의 직쇄상, 측쇄상 또는 고리형의 알킬기이고;R5와 R6은 각각 수소원자, C1 ∼ C6 의 직쇄상, 측쇄상 또는 고리형의 알킬기이며;n은 0 ∼ 20의 정수이고, x + y = 1이고, 0 ≤ x ≤ 0.99이고, 0.01 ≤ y ≤ 1을 나타낸다.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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KR1020050012680A KR100637450B1 (ko) | 2005-02-16 | 2005-02-16 | 플루오로알킬술폰늄염의 광산발생기가 치환된 화합물과 이를 중합한 공중합체 |
JP2007545390A JP4642860B2 (ja) | 2005-02-16 | 2006-02-16 | フルオロアルキルスルホンの光酸発生部が置換された新規の単量体およびその重合体 |
PCT/KR2006/000535 WO2006088317A1 (en) | 2005-02-16 | 2006-02-16 | Novel monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof |
US11/632,358 US7534844B2 (en) | 2005-02-16 | 2006-02-16 | Monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof |
EP06715986.3A EP1848690B1 (en) | 2005-02-16 | 2006-02-16 | Method for preparing a photoacid generator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050012680A KR100637450B1 (ko) | 2005-02-16 | 2005-02-16 | 플루오로알킬술폰늄염의 광산발생기가 치환된 화합물과 이를 중합한 공중합체 |
Publications (2)
Publication Number | Publication Date |
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KR20060091911A true KR20060091911A (ko) | 2006-08-22 |
KR100637450B1 KR100637450B1 (ko) | 2006-10-23 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050012680A KR100637450B1 (ko) | 2005-02-16 | 2005-02-16 | 플루오로알킬술폰늄염의 광산발생기가 치환된 화합물과 이를 중합한 공중합체 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7534844B2 (ko) |
EP (1) | EP1848690B1 (ko) |
JP (1) | JP4642860B2 (ko) |
KR (1) | KR100637450B1 (ko) |
WO (1) | WO2006088317A1 (ko) |
Cited By (1)
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KR101498903B1 (ko) * | 2012-08-31 | 2015-03-05 | 다우 글로벌 테크놀로지스 엘엘씨 | 포토애시드 발생제를 함유하는 말단 그룹을 포함하는 폴리머, 그 폴리머를 포함하는 포토레지스트, 및 장치의 제조방법 |
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2005
- 2005-02-16 KR KR1020050012680A patent/KR100637450B1/ko active IP Right Grant
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2006
- 2006-02-16 JP JP2007545390A patent/JP4642860B2/ja not_active Expired - Fee Related
- 2006-02-16 US US11/632,358 patent/US7534844B2/en not_active Expired - Fee Related
- 2006-02-16 EP EP06715986.3A patent/EP1848690B1/en not_active Expired - Fee Related
- 2006-02-16 WO PCT/KR2006/000535 patent/WO2006088317A1/en active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101498903B1 (ko) * | 2012-08-31 | 2015-03-05 | 다우 글로벌 테크놀로지스 엘엘씨 | 포토애시드 발생제를 함유하는 말단 그룹을 포함하는 폴리머, 그 폴리머를 포함하는 포토레지스트, 및 장치의 제조방법 |
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EP1848690B1 (en) | 2017-09-13 |
JP4642860B2 (ja) | 2011-03-02 |
KR100637450B1 (ko) | 2006-10-23 |
JP2008523053A (ja) | 2008-07-03 |
US7534844B2 (en) | 2009-05-19 |
EP1848690A4 (en) | 2010-06-30 |
WO2006088317A1 (en) | 2006-08-24 |
US20070203312A1 (en) | 2007-08-30 |
EP1848690A1 (en) | 2007-10-31 |
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