JP2008523053A - フルオロアルキルスルホンの光酸発生部が置換された新規の単量体およびその重合体 - Google Patents
フルオロアルキルスルホンの光酸発生部が置換された新規の単量体およびその重合体 Download PDFInfo
- Publication number
- JP2008523053A JP2008523053A JP2007545390A JP2007545390A JP2008523053A JP 2008523053 A JP2008523053 A JP 2008523053A JP 2007545390 A JP2007545390 A JP 2007545390A JP 2007545390 A JP2007545390 A JP 2007545390A JP 2008523053 A JP2008523053 A JP 2008523053A
- Authority
- JP
- Japan
- Prior art keywords
- chemical formula
- substituted
- fluoroalkylsulfonium
- side chain
- novel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 0 C[S+](*)c1ccc(C*C(C(*)=C)=O)cc1 Chemical compound C[S+](*)c1ccc(C*C(C(*)=C)=O)cc1 0.000 description 5
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/06—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/38—Esters containing sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
Abstract
Description
Jpn. J. Appl. Phys., 37, 7148, 1998, Kim J. C. J. Kor. Phys. Soc., 35, 1013, 1999, Kim J. C. Adv. Mater., 12, 6, 424, 2000, Rivka M. Vac. Sci. Technol., 1223, 1996, Sugimura A. J. Vac. Sci. Technol., 2912, 1997, Birkelund K. J. Appl. Phys. Lett., 285, 1997, Avouris P. Journal of Photopolymer Science and Technology, Vol. 13, No. 2(2000), pp223〜230
R3は水素原子または直鎖状、側鎖状または環状のC1〜C6アルキル基であり、
nは0から20の整数である。
R4は直鎖状、側鎖状または環状のC1〜C20アルキル基であり、
R5およびR6は独立に、水素原子または直鎖状、側鎖状または環状のC1〜C6アルキル基であり、
nは0〜20の整数であり、x+y=1、0≦x≦0.99、および0.01≦y≦1である。
(a)ジフェニルスルホキシドからアルキルスルホニウムトリフルオレート(alkylsulfonium trifluorate)の合成。
(b)ハロゲン置換されたアルキルスルホニウムトリフルオレートの合成。
(c)アルキルアクリロイルオキシアルキルスルホニウムトリフルオレート(alkylacryloyloxy alkylsulfonium trifluorate)の合成。
以下の化学式(3)は新規の光酸発生基が置換された4−メタクリロイルオキシフェニルジフェニルスルホニウムトリフルオレート(4−methacryloyloxyphenyl diphenylsulfonium trifluorate)の合成を図解するが、本発明はこの実施例に限定されない。
ジフェニルスルホキシド10g(49.4mmol)とトルエン5.1g(49.4mmol)がジクロロメタン500mLに溶解された。アセトン−ドライアイス槽を用いて溶液を含む反応器の温度が約−78℃に調節され、三フッ化無水物(trifluoric anhydride)14.8g(49.4mmol)をゆっくりと滴加させた。その後、溶液は同一温度で1時間攪拌され、室温までゆっくりと温められた。30分間攪拌した後、反応溶液は重炭酸ナトリウム飽和溶液、およびその後蒸留水で洗浄された。溶液は無水硫酸マグネシウムで乾燥された後、溶媒は回転蒸発器を用いることにより除去され、残渣は高温の酢酸エチル中で再結晶され、4−メチルフェニルジフェニルスルホニウムトリフルオレート(収率=50%)を得た。
(1)で合成されたスルホニウム化合物5g(11.7mmol)はN−ブロモスクシンイミド(N-bromosuccinimide)5.5g(30.9mmol)と混合され、混合溶媒(二硫化炭素30mL、四塩化炭素30mL、ジクロロメタン40mL)に溶解される。混合物に過酸化ベンゾイル0.3g(1.2mmol)が加えられた後、混合物は加熱還流下で10日間攪拌された。溶媒は反応溶液から減圧下で除去され、残渣がジクロロメタン100mLに溶解され、蒸留水で2度洗浄され、そして無水硫酸マグネシウムで乾燥された。その後、溶媒は回転蒸発器で除去され、精製がコラムクロマトグラフィー法により遂行され、4−ブロモメチルフェニルジフェニルスルホニウムトリフルオレート(収率=60%)を得た。
(2)で合成された化合物22g(3.9mmol)、メタクリル酸ナトリウム0.47g(4.3mmol)、ヨウ化ナトリウム60mg(0.4mmol)、臭化テトラエチルアンモニウム(tetraethylammonium bromide)84mg(0.4mmol)と微量のジヒドロキシキノンがアセトニトリル20mLに溶解され、そして混合物が加熱還流下で1.5時間攪拌された。溶媒が反応溶液から減圧下で除去され、そして残渣が蒸留水30mLに溶解された。生成物がジクロロメタンで抽出され、溶液が無水硫酸マグネシウムで乾燥された。その後、溶媒が回転蒸発器で除去され、精製がコラムクロマトグラフィー法により遂行され、4−メタアクリロイルオキシフェニルジフェニルスルホニウムトリフルオレート(収率=93%)を得た。
以下の化学式(4)は、光酸発生基が側鎖で置換された共重合体の例として、ポリ(メタクリル酸メチル・4−ジフェニルトリフルオレートメタクリル酸ベンジル共重合体(methylmethacrylate-co-4-diphenylsulfoniumtrifluoratebenzylmethacrylate))の合成を図解する。本発明はこの実施例に限定されない。
化学式(2)により表される共重合体は、実施例2と同様な方法で合成された。ただしtert−メタクリル酸ブチル(tert-butylmetacrylate)と実施例1で合成された化合物が1:1のモル比(収率=50%)で用いられたことを除く。
化学式(2)により表された共重合体は、実施例2と同様な方法で合成された。ただしテトラヒドロピラニルメタクリル酸と実施例1で合成された化合物が1:1のモル比(収率=45%)で用いられたことを除く。
Claims (2)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050012680A KR100637450B1 (ko) | 2005-02-16 | 2005-02-16 | 플루오로알킬술폰늄염의 광산발생기가 치환된 화합물과 이를 중합한 공중합체 |
PCT/KR2006/000535 WO2006088317A1 (en) | 2005-02-16 | 2006-02-16 | Novel monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008523053A true JP2008523053A (ja) | 2008-07-03 |
JP4642860B2 JP4642860B2 (ja) | 2011-03-02 |
Family
ID=36916688
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007545390A Expired - Fee Related JP4642860B2 (ja) | 2005-02-16 | 2006-02-16 | フルオロアルキルスルホンの光酸発生部が置換された新規の単量体およびその重合体 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7534844B2 (ja) |
EP (1) | EP1848690B1 (ja) |
JP (1) | JP4642860B2 (ja) |
KR (1) | KR100637450B1 (ja) |
WO (1) | WO2006088317A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010538155A (ja) * | 2008-08-18 | 2010-12-09 | アイユーシーエフ−エイチワイユー(インダストリー−ユニバーシティ コーオペレーション ファウンデーション ハンヤン ユニバーシティ) | 光酸発生剤を含むレジスト用共重合体及びその製造方法 |
WO2012050065A1 (ja) * | 2010-10-14 | 2012-04-19 | 日産化学工業株式会社 | 単分子層又は多分子層形成用組成物 |
JP2016081053A (ja) * | 2014-10-10 | 2016-05-16 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | フォトレジスト組成物及び電子デバイスを形成する関連方法 |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7534548B2 (en) * | 2005-06-02 | 2009-05-19 | Hynix Semiconductor Inc. | Polymer for immersion lithography and photoresist composition |
KR100823471B1 (ko) * | 2006-11-01 | 2008-04-21 | 한양대학교 산학협력단 | 플루오로알킬술폰늄염의 광산발생기가 측쇄에 도입된 호모폴리머 제조용 화합물의 제조방법 |
JP4966886B2 (ja) * | 2008-02-12 | 2012-07-04 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物 |
KR101529940B1 (ko) * | 2008-02-12 | 2015-06-19 | 한양대학교 산학협력단 | 플루오로알킬술폰늄염의 광산발생기가 측쇄에 도입된단량체 제조방법 |
JP2011525918A (ja) * | 2008-06-27 | 2011-09-29 | ユニバーサル ディスプレイ コーポレイション | 架橋可能なイオンドーパント |
KR101229960B1 (ko) | 2011-01-28 | 2013-02-06 | 한양대학교 산학협력단 | 광산발생제를 포함하는 테트라 폴리머 레지스트 및 이의 제조 방법 |
KR101385508B1 (ko) * | 2011-06-21 | 2014-04-16 | 한양대학교 산학협력단 | 광산발생제를 포함하는 포지티브형 폴리머 레지스트 및 그 제조 방법 |
US9588095B2 (en) | 2012-07-24 | 2017-03-07 | Massachusetts Institute Of Technology | Reagents for oxidizer-based chemical detection |
JP6031420B2 (ja) * | 2012-08-31 | 2016-11-24 | ダウ グローバル テクノロジーズ エルエルシー | 光酸発生剤を含む末端基を含むポリマー、前記ポリマーを含むフォトレジストおよびデバイスの製造方法 |
WO2014126830A2 (en) | 2013-02-12 | 2014-08-21 | Eipi Systems, Inc. | Method and apparatus for three-dimensional fabrication |
EP3203318A1 (en) | 2013-02-12 | 2017-08-09 | CARBON3D, Inc. | Continuous liquid interphase printing |
US10816530B2 (en) | 2013-07-23 | 2020-10-27 | Massachusetts Institute Of Technology | Substrate containing latent vaporization reagents |
US9365659B2 (en) * | 2014-01-29 | 2016-06-14 | Excelsior Nanotech Corporation | System and method for optimizing the efficiency of photo-polymerization |
WO2015142546A1 (en) | 2014-03-21 | 2015-09-24 | Carbon3D, Inc. | Method and apparatus for three-dimensional fabrication with gas injection through carrier |
WO2015154087A1 (en) | 2014-04-04 | 2015-10-08 | Massachusetts Institute Of Technology | Reagents for enhanced detection of low volatility analytes |
US10259171B2 (en) | 2014-04-25 | 2019-04-16 | Carbon, Inc. | Continuous three dimensional fabrication from immiscible liquids |
WO2015195924A1 (en) | 2014-06-20 | 2015-12-23 | Carbon3D, Inc. | Three-dimensional printing with reciprocal feeding of polymerizable liquid |
US10661501B2 (en) | 2014-06-20 | 2020-05-26 | Carbon, Inc. | Three-dimensional printing method using increased light intensity and apparatus therefor |
US10569465B2 (en) | 2014-06-20 | 2020-02-25 | Carbon, Inc. | Three-dimensional printing using tiled light engines |
JP6720092B2 (ja) | 2014-06-23 | 2020-07-08 | カーボン,インコーポレイテッド | 多様な硬化機構を有する材料からのポリウレタン三次元物体製造方法 |
US11390062B2 (en) | 2014-08-12 | 2022-07-19 | Carbon, Inc. | Three-dimensional printing with supported build plates |
EP3240671B1 (en) | 2014-12-31 | 2020-12-16 | Carbon, Inc. | Three-dimensional printing of objects with breathing orifices |
US20160193786A1 (en) | 2015-01-06 | 2016-07-07 | Carbon3D, Inc. | Three-dimensional printing with build plates having a rough or patterned surface and related methods |
WO2016112090A1 (en) | 2015-01-07 | 2016-07-14 | Carbon3D, Inc. | Microfluidic devices and methods of making the same |
EP3245044B1 (en) | 2015-01-13 | 2021-05-05 | Carbon, Inc. | Three-dimensional printing with build plates having surface topologies for increasing permeability and related methods |
EP3250368A1 (en) | 2015-01-30 | 2017-12-06 | Carbon, Inc. | Build plates for continuous liquid interface printing having permeable sheets and related methods, systems and devices |
WO2016123499A1 (en) | 2015-01-30 | 2016-08-04 | Carbon3D, Inc. | Build plates for continuous liquid interface printing having permeable base and adhesive for increasing permeability and related methods, systems and devices |
WO2016126779A1 (en) | 2015-02-05 | 2016-08-11 | Carbon3D, Inc. | Method of additive manufacturing by fabrication through multiple zones |
US11000992B2 (en) | 2015-02-20 | 2021-05-11 | Carbon, Inc. | Methods and apparatus for continuous liquid interface printing with electrochemically supported dead zone |
US10391711B2 (en) | 2015-03-05 | 2019-08-27 | Carbon, Inc. | Fabrication of three dimensional objects with multiple operating modes |
US20180029292A1 (en) | 2015-03-05 | 2018-02-01 | Carbon, Inc. | Continuous liquid interface production with sequential patterned exposure |
US20180015662A1 (en) | 2015-03-05 | 2018-01-18 | Carbon, Inc. | Fabrication of three dimensional objects with variable slice thickness |
WO2016145050A1 (en) | 2015-03-10 | 2016-09-15 | Carbon3D, Inc. | Microfluidic devices having flexible features and methods of making the same |
WO2016145182A1 (en) | 2015-03-12 | 2016-09-15 | Carbon3D, Inc. | Additive manufacturing using polymerization initiators or inhibitors having controlled migration |
US10792856B2 (en) | 2015-03-13 | 2020-10-06 | Carbon, Inc. | Three-dimensional printing with flexible build plates |
WO2016149097A1 (en) | 2015-03-13 | 2016-09-22 | Carbon3D, Inc. | Three-dimensional printing with reduced pressure build plate unit |
WO2016149151A1 (en) | 2015-03-13 | 2016-09-22 | Carbon3D, Inc. | Three-dimensional printing with concurrent delivery of different polymerizable liquids |
WO2017048710A1 (en) | 2015-09-14 | 2017-03-23 | Carbon, Inc. | Light-curable article of manufacture with portions of differing solubility |
EP3352972B1 (en) | 2015-09-25 | 2021-10-27 | Carbon, Inc. | Build plate assemblies for continuous liquid interphase printing having lighting panels and related methods and devices |
WO2017059082A1 (en) | 2015-09-30 | 2017-04-06 | Carbon, Inc. | Method and apparatus for producing three-dimensional objects |
US10647873B2 (en) | 2015-10-30 | 2020-05-12 | Carbon, Inc. | Dual cure article of manufacture with portions of differing solubility |
CN108475008B (zh) | 2015-12-22 | 2020-11-06 | 卡本有限公司 | 一种形成三维物体的方法 |
WO2017112483A2 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Accelerants for additive manufacturing with dual cure resins |
WO2017112521A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Production of flexible products by additive manufacturing with dual cure resins |
WO2017112653A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Dual precursor resin systems for additive manufacturing with dual cure resins |
US10538031B2 (en) | 2015-12-22 | 2020-01-21 | Carbon, Inc. | Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products |
US11465339B2 (en) | 2016-05-31 | 2022-10-11 | Northwestern University | Method for the fabrication of three-dimensional objects and apparatus for same |
JP7026058B2 (ja) | 2016-07-01 | 2022-02-25 | カーボン,インコーポレイテッド | ビルドプレート経由での脱ガスによって気泡を低減する三次元印刷法および装置 |
WO2018094131A1 (en) | 2016-11-21 | 2018-05-24 | Carbon, Inc. | Method of making three-dimensional object by delivering reactive component for subsequent cure |
US10239255B2 (en) | 2017-04-11 | 2019-03-26 | Molecule Corp | Fabrication of solid materials or films from a polymerizable liquid |
US11616302B2 (en) | 2018-01-15 | 2023-03-28 | Rogers Corporation | Dielectric resonator antenna having first and second dielectric portions |
US11552390B2 (en) | 2018-09-11 | 2023-01-10 | Rogers Corporation | Dielectric resonator antenna system |
TWI820237B (zh) | 2018-10-18 | 2023-11-01 | 美商羅傑斯公司 | 聚合物結構、其立體光刻製造方法以及包含該聚合物結構之電子裝置 |
WO2020117489A1 (en) | 2018-12-04 | 2020-06-11 | Rogers Corporation | Dielectric electromagnetic structure and method of making the same |
NL2022372B1 (en) | 2018-12-17 | 2020-07-03 | What The Future Venture Capital Wtfvc B V | Process for producing a cured 3d product |
CA3131996A1 (en) | 2019-04-09 | 2020-10-15 | David Alan WALKER | Methodologies to rapidly cure and coat parts produced by additive manufacturing |
TW202043298A (zh) | 2019-05-30 | 2020-12-01 | 美商羅傑斯公司 | 用於立體微影的光可固化組合物、形成該組合物的方法、使用該組合物的立體微影方法、藉由該立體微影方法形成的聚合物組件、及包含該聚合物組件的裝置 |
US11482790B2 (en) | 2020-04-08 | 2022-10-25 | Rogers Corporation | Dielectric lens and electromagnetic device with same |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04230645A (ja) * | 1990-08-27 | 1992-08-19 | Ciba Geigy Ag | オレフィン的に不飽和のオニウム塩 |
JPH05178819A (ja) * | 1991-04-13 | 1993-07-20 | Ciba Geigy Ag | 新規なスルホキソニウム塩 |
JPH10111563A (ja) * | 1996-10-07 | 1998-04-28 | Hitachi Ltd | パタン形成方法及びそれを用いた半導体装置の製造方法並びに感放射線組成物 |
JPH10182999A (ja) * | 1996-12-26 | 1998-07-07 | Sumitomo Chem Co Ltd | モノアゾ化合物及びそれを用いる繊維材料の染色又は捺染方法 |
JPH10221852A (ja) * | 1997-02-06 | 1998-08-21 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
JPH11338146A (ja) * | 1998-05-28 | 1999-12-10 | Fuji Photo Film Co Ltd | ポジ型画像形成材料 |
JP2002207293A (ja) * | 2001-01-12 | 2002-07-26 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP2002528766A (ja) * | 1998-10-27 | 2002-09-03 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フォトレジストおよびミクロリソグラフィのための方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4250053A (en) * | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
DE3902114A1 (de) * | 1989-01-25 | 1990-08-02 | Basf Ag | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung |
TW237466B (ja) | 1992-07-21 | 1995-01-01 | Giba Gerigy Ag | |
KR100279497B1 (ko) | 1998-07-16 | 2001-02-01 | 박찬구 | 술포늄 염의 제조방법 |
US7008749B2 (en) * | 2001-03-12 | 2006-03-07 | The University Of North Carolina At Charlotte | High resolution resists for next generation lithographies |
US20050018595A1 (en) * | 2001-06-06 | 2005-01-27 | Spectra Systems Corporation | System for applying markings to optical media |
-
2005
- 2005-02-16 KR KR1020050012680A patent/KR100637450B1/ko active IP Right Grant
-
2006
- 2006-02-16 EP EP06715986.3A patent/EP1848690B1/en not_active Expired - Fee Related
- 2006-02-16 WO PCT/KR2006/000535 patent/WO2006088317A1/en active Application Filing
- 2006-02-16 JP JP2007545390A patent/JP4642860B2/ja not_active Expired - Fee Related
- 2006-02-16 US US11/632,358 patent/US7534844B2/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04230645A (ja) * | 1990-08-27 | 1992-08-19 | Ciba Geigy Ag | オレフィン的に不飽和のオニウム塩 |
JPH05178819A (ja) * | 1991-04-13 | 1993-07-20 | Ciba Geigy Ag | 新規なスルホキソニウム塩 |
JPH10111563A (ja) * | 1996-10-07 | 1998-04-28 | Hitachi Ltd | パタン形成方法及びそれを用いた半導体装置の製造方法並びに感放射線組成物 |
JPH10182999A (ja) * | 1996-12-26 | 1998-07-07 | Sumitomo Chem Co Ltd | モノアゾ化合物及びそれを用いる繊維材料の染色又は捺染方法 |
JPH10221852A (ja) * | 1997-02-06 | 1998-08-21 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
JPH11338146A (ja) * | 1998-05-28 | 1999-12-10 | Fuji Photo Film Co Ltd | ポジ型画像形成材料 |
JP2002528766A (ja) * | 1998-10-27 | 2002-09-03 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フォトレジストおよびミクロリソグラフィのための方法 |
JP2002207293A (ja) * | 2001-01-12 | 2002-07-26 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010538155A (ja) * | 2008-08-18 | 2010-12-09 | アイユーシーエフ−エイチワイユー(インダストリー−ユニバーシティ コーオペレーション ファウンデーション ハンヤン ユニバーシティ) | 光酸発生剤を含むレジスト用共重合体及びその製造方法 |
WO2012050065A1 (ja) * | 2010-10-14 | 2012-04-19 | 日産化学工業株式会社 | 単分子層又は多分子層形成用組成物 |
US9023583B2 (en) | 2010-10-14 | 2015-05-05 | Nissan Chemical Industries, Ltd. | Monolayer or multilayer forming composition |
JP2016081053A (ja) * | 2014-10-10 | 2016-05-16 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | フォトレジスト組成物及び電子デバイスを形成する関連方法 |
Also Published As
Publication number | Publication date |
---|---|
JP4642860B2 (ja) | 2011-03-02 |
KR20060091911A (ko) | 2006-08-22 |
EP1848690A4 (en) | 2010-06-30 |
EP1848690A1 (en) | 2007-10-31 |
US20070203312A1 (en) | 2007-08-30 |
KR100637450B1 (ko) | 2006-10-23 |
WO2006088317A1 (en) | 2006-08-24 |
EP1848690B1 (en) | 2017-09-13 |
US7534844B2 (en) | 2009-05-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4642860B2 (ja) | フルオロアルキルスルホンの光酸発生部が置換された新規の単量体およびその重合体 | |
TWI525066B (zh) | 鹽、光阻組成物及製備光阻圖案之方法 | |
JP5138627B2 (ja) | 光酸発生剤、共重合体、化学増幅型レジスト組成物、および化学増幅型レジスト組成物を用いたパターン形成方法 | |
CN109843853A (zh) | 组合物和使用该组合物的设备的制造方法 | |
JP2009280562A (ja) | 化学増幅型レジスト組成物用の酸発生剤 | |
JP2011252147A (ja) | 光酸発生剤、この製造方法、及びこれを含むレジスト組成物 | |
WO2006121150A1 (ja) | (メタ)アクリルアミド誘導体、重合体、化学増幅型感光性樹脂組成物及びパターン形成方法 | |
JP7079647B2 (ja) | 組成物及びそれを用いたデバイスの製造方法 | |
JPH09221519A (ja) | 酸誘導体化合物、高分子化合物、それを用いた感光性樹脂組成物およびパターン形成方法 | |
KR20140033027A (ko) | 안정화된 산 증폭제 | |
JP2009527019A (ja) | 200nm未満リソグラフィー用アダマンタン系分子性ガラスフォトレジスト | |
JP2009221194A (ja) | 光酸発生基結合型多価フェノール誘導体、該誘導体の製造方法及び該誘導体を含む電子線用又はeuv用化学増幅型レジスト組成物 | |
JP4683887B2 (ja) | ラクトン化合物、ラクトン含有単量体、高分子化合物、それを用いたレジスト材料及びパターン形成方法 | |
US8481663B2 (en) | Resist copolymers containing photoacid generators for lithographic applications and its method of preparation | |
KR20140042753A (ko) | 안정화된 산 증폭제 | |
CN112142769B (zh) | 含硅多苯基单分子树脂及其光刻胶组合物 | |
TWI457319B (zh) | 化合物及其製造方法以及含該化合物之阻劑組成物 | |
US4965316A (en) | Radiation sensitive polymers and use thereof | |
JP2020176096A (ja) | オニウム塩、組成物及びそれを用いたデバイスの製造方法 | |
KR100823471B1 (ko) | 플루오로알킬술폰늄염의 광산발생기가 측쇄에 도입된 호모폴리머 제조용 화합물의 제조방법 | |
JP5948862B2 (ja) | 新規化合物及びその製造方法 | |
JP6304644B2 (ja) | ハイパーブランチポリマー | |
KR101529940B1 (ko) | 플루오로알킬술폰늄염의 광산발생기가 측쇄에 도입된단량체 제조방법 | |
JP5812914B2 (ja) | レジスト組成物 | |
JP7341074B2 (ja) | 交互共重合体、交互共重合体の製造方法、高分子化合物の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100518 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100818 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100825 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100921 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101102 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101201 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4642860 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131210 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |