KR20030019577A - 마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법 - Google Patents

마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법 Download PDF

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Publication number
KR20030019577A
KR20030019577A KR10-2003-7000622A KR20037000622A KR20030019577A KR 20030019577 A KR20030019577 A KR 20030019577A KR 20037000622 A KR20037000622 A KR 20037000622A KR 20030019577 A KR20030019577 A KR 20030019577A
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KR
South Korea
Prior art keywords
force
optical
optical element
optical system
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR10-2003-7000622A
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English (en)
Korean (ko)
Inventor
마르틴 브루노테
쥐르겐 하르트마이어
후베르트 홀더러
윈프리드 카이저
알렉산더 콜
젠스 쿠글레르
만프레드 마울
크리스챤 바그너
Original Assignee
칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트
짜이스, 칼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트, 짜이스, 칼 filed Critical 칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트
Publication of KR20030019577A publication Critical patent/KR20030019577A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
KR10-2003-7000622A 2001-05-15 2002-05-04 마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법 Withdrawn KR20030019577A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10123725A DE10123725A1 (de) 2001-05-15 2001-05-15 Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
DE10123725.1 2001-05-15
PCT/EP2002/004900 WO2002093257A2 (de) 2001-05-15 2002-05-04 Projektionsbelichtungsanlage der mikrolithographie,

Publications (1)

Publication Number Publication Date
KR20030019577A true KR20030019577A (ko) 2003-03-06

Family

ID=7684936

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-7000622A Withdrawn KR20030019577A (ko) 2001-05-15 2002-05-04 마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법

Country Status (7)

Country Link
US (3) US6879379B2 (https=)
EP (1) EP1390813A2 (https=)
JP (1) JP2004525527A (https=)
KR (1) KR20030019577A (https=)
DE (1) DE10123725A1 (https=)
TW (1) TWI266149B (https=)
WO (1) WO2002093257A2 (https=)

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US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
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DE102006021334B3 (de) * 2006-05-05 2007-08-30 Carl Zeiss Smt Ag Polarisationsbeeinflussendes optisches Element sowie Verfahren zu dessen Herstellung sowie optisches System und mikrolithographische Projektionsbelichtungsanlage mit einem solchen Element
JP5174810B2 (ja) * 2006-06-16 2013-04-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の投影対物器械
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WO2002093257A2 (de) 2002-11-21
US20050134967A1 (en) 2005-06-23
WO2002093257A3 (de) 2003-09-25
JP2004525527A (ja) 2004-08-19
US20050264786A1 (en) 2005-12-01
DE10123725A1 (de) 2002-11-21
US7170585B2 (en) 2007-01-30
WO2002093257A8 (de) 2003-12-31
TWI266149B (en) 2006-11-11
US6879379B2 (en) 2005-04-12

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