KR102523731B1 - 완전히 자기 정렬된 비아를 형성하기 위한 선택적 퇴적 방법 - Google Patents

완전히 자기 정렬된 비아를 형성하기 위한 선택적 퇴적 방법 Download PDF

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KR102523731B1
KR102523731B1 KR1020180143516A KR20180143516A KR102523731B1 KR 102523731 B1 KR102523731 B1 KR 102523731B1 KR 1020180143516 A KR1020180143516 A KR 1020180143516A KR 20180143516 A KR20180143516 A KR 20180143516A KR 102523731 B1 KR102523731 B1 KR 102523731B1
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substrate
gas
metal layer
silanol
exposing
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KR20190058342A (ko
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칸다바라 엔. 타필리
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도쿄엘렉트론가부시키가이샤
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US10586734B2 (en) 2020-03-10
JP2019096877A (ja) 2019-06-20
US10847363B2 (en) 2020-11-24
KR20220132493A (ko) 2022-09-30
KR102549289B1 (ko) 2023-06-29

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