KR102454532B9 - 전기적 아크 및 발광을 방지하고 프로세스 균일도를 개선하기 위한 피처들을 갖는 정전 척 - Google Patents

전기적 아크 및 발광을 방지하고 프로세스 균일도를 개선하기 위한 피처들을 갖는 정전 척

Info

Publication number
KR102454532B9
KR102454532B9 KR1020170083390A KR20170083390A KR102454532B9 KR 102454532 B9 KR102454532 B9 KR 102454532B9 KR 1020170083390 A KR1020170083390 A KR 1020170083390A KR 20170083390 A KR20170083390 A KR 20170083390A KR 102454532 B9 KR102454532 B9 KR 102454532B9
Authority
KR
South Korea
Prior art keywords
features
light
electrostatic chuck
improving process
process uniformity
Prior art date
Application number
KR1020170083390A
Other languages
English (en)
Other versions
KR20180006307A (ko
KR102454532B1 (ko
Inventor
알렉산더 마튜슈킨
존 패트릭 홀란드
하르미트 싱
알렉세이 마라크타노브
키이스 개프
지강 첸
펠릭스 코자케비치
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20180006307A publication Critical patent/KR20180006307A/ko
Application granted granted Critical
Publication of KR102454532B1 publication Critical patent/KR102454532B1/ko
Publication of KR102454532B9 publication Critical patent/KR102454532B9/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
KR1020170083390A 2016-07-07 2017-06-30 전기적 아크 및 발광을 방지하고 프로세스 균일도를 개선하기 위한 피처들을 갖는 정전 척 KR102454532B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201662359405P 2016-07-07 2016-07-07
US62/359,405 2016-07-07
US15/634,365 2017-06-27
US15/634,365 US11069553B2 (en) 2016-07-07 2017-06-27 Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity

Publications (3)

Publication Number Publication Date
KR20180006307A KR20180006307A (ko) 2018-01-17
KR102454532B1 KR102454532B1 (ko) 2022-10-13
KR102454532B9 true KR102454532B9 (ko) 2023-03-13

Family

ID=60911098

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170083390A KR102454532B1 (ko) 2016-07-07 2017-06-30 전기적 아크 및 발광을 방지하고 프로세스 균일도를 개선하기 위한 피처들을 갖는 정전 척

Country Status (5)

Country Link
US (1) US11069553B2 (ko)
JP (1) JP7062383B2 (ko)
KR (1) KR102454532B1 (ko)
CN (1) CN107591355B (ko)
TW (1) TWI752051B (ko)

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JP6801773B2 (ja) * 2019-02-27 2020-12-16 Toto株式会社 半導体製造装置用部材および半導体製造装置用部材を備えた半導体製造装置並びにディスプレイ製造装置
CN111627790B (zh) * 2019-02-27 2024-05-03 Toto株式会社 半导体制造装置构件、半导体制造装置、显示器制造装置
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CN115151105A (zh) * 2022-07-13 2022-10-04 业成科技（成都）有限公司 贴合治具

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US11069553B2 (en) 2021-07-20
KR20180006307A (ko) 2018-01-17
TW201812982A (zh) 2018-04-01
US20180012785A1 (en) 2018-01-11
KR102454532B1 (ko) 2022-10-13
JP2018014492A (ja) 2018-01-25
JP7062383B2 (ja) 2022-05-06
CN107591355B (zh) 2023-09-08
TWI752051B (zh) 2022-01-11
CN107591355A (zh) 2018-01-16

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