KR102350218B1 - 2 트랜지스터 finfet 기반 분리형 게이트 비휘발성 플로팅 게이트 플래시 메모리 및 제조 방법 - Google Patents

2 트랜지스터 finfet 기반 분리형 게이트 비휘발성 플로팅 게이트 플래시 메모리 및 제조 방법 Download PDF

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KR102350218B1
KR102350218B1 KR1020207024873A KR20207024873A KR102350218B1 KR 102350218 B1 KR102350218 B1 KR 102350218B1 KR 1020207024873 A KR1020207024873 A KR 1020207024873A KR 20207024873 A KR20207024873 A KR 20207024873A KR 102350218 B1 KR102350218 B1 KR 102350218B1
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floating gate
gate
fin
memory cell
side surfaces
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KR20200111789A (ko
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세르게이 주르바
캐서린 데코베르트
조 펭
짐호 킴
시안 리우
난 도
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실리콘 스토리지 테크놀로지 인크
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    • H01L27/11524—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
    • H10B41/35—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region with a cell select transistor, e.g. NAND
    • H01L27/0886—
    • H01L29/40114—
    • H01L29/42328—
    • H01L29/66825—
    • H01L29/7883—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/40—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the peripheral circuit region
    • H10B41/42—Simultaneous manufacture of periphery and memory cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0411—Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having floating gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/62—Fin field-effect transistors [FinFET]
    • H10D30/6211—Fin field-effect transistors [FinFET] having fin-shaped semiconductor bodies integral with the bulk semiconductor substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/637—Lateral IGFETs having no inversion channels, e.g. buried channel lateral IGFETs, normally-on lateral IGFETs or depletion-mode lateral IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/68—Floating-gate IGFETs
    • H10D30/681—Floating-gate IGFETs having only two programming levels
    • H10D30/683—Floating-gate IGFETs having only two programming levels programmed by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/68—Floating-gate IGFETs
    • H10D30/6891—Floating-gate IGFETs characterised by the shapes, relative sizes or dispositions of the floating gate electrode
    • H10D30/6892—Floating-gate IGFETs characterised by the shapes, relative sizes or dispositions of the floating gate electrode having at least one additional gate other than the floating gate and the control gate, e.g. program gate, erase gate or select gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/031—Manufacture or treatment of data-storage electrodes
    • H10D64/035—Manufacture or treatment of data-storage electrodes comprising conductor-insulator-conductor-insulator-semiconductor structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/834—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET] comprising FinFETs

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
KR1020207024873A 2018-03-22 2019-01-23 2 트랜지스터 finfet 기반 분리형 게이트 비휘발성 플로팅 게이트 플래시 메모리 및 제조 방법 Active KR102350218B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/933,124 2018-03-22
US15/933,124 US10312247B1 (en) 2018-03-22 2018-03-22 Two transistor FinFET-based split gate non-volatile floating gate flash memory and method of fabrication
PCT/US2019/014816 WO2019182681A2 (en) 2018-03-22 2019-01-23 Two transistor finfet-based split gate non-volatile floating gate flash memory and method of fabrication

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KR20200111789A KR20200111789A (ko) 2020-09-29
KR102350218B1 true KR102350218B1 (ko) 2022-01-11

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US (1) US10312247B1 (https=)
EP (1) EP3769338B1 (https=)
JP (1) JP7372932B2 (https=)
KR (1) KR102350218B1 (https=)
CN (1) CN111868928B (https=)
TW (1) TWI693698B (https=)
WO (1) WO2019182681A2 (https=)

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US11114451B1 (en) 2020-02-27 2021-09-07 Silicon Storage Technology, Inc. Method of forming a device with FinFET split gate non-volatile memory cells and FinFET logic devices
US11362100B2 (en) * 2020-03-24 2022-06-14 Silicon Storage Technology, Inc. FinFET split gate non-volatile memory cells with enhanced floating gate to floating gate capacitive coupling
CN111415937B (zh) * 2020-05-13 2023-04-25 上海华虹宏力半导体制造有限公司 存储器及其形成方法
CN114256251B (zh) 2020-09-21 2025-05-13 硅存储技术股份有限公司 形成具有存储器单元、高压器件和逻辑器件的设备的方法
CN114446972B (zh) * 2020-10-30 2025-09-05 硅存储技术股份有限公司 具有鳍式场效应晶体管结构的分裂栅非易失性存储器单元、hv和逻辑器件及其制造方法
TWI766609B (zh) 2021-03-10 2022-06-01 華邦電子股份有限公司 半導體記憶體結構
US12453136B2 (en) * 2022-03-08 2025-10-21 Silicon Storage Technology, Inc. Method of forming a device with planar split gate non-volatile memory cells, planar HV devices, and FinFET logic devices on a substrate
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JP7372932B2 (ja) 2023-11-01
TW202006927A (zh) 2020-02-01
WO2019182681A8 (en) 2020-10-01
WO2019182681A3 (en) 2020-04-30
TWI693698B (zh) 2020-05-11
US10312247B1 (en) 2019-06-04
KR20200111789A (ko) 2020-09-29
EP3769338A4 (en) 2021-12-22
EP3769338A2 (en) 2021-01-27
WO2019182681A2 (en) 2019-09-26
EP3769338B1 (en) 2023-03-29
JP2021518670A (ja) 2021-08-02
CN111868928A (zh) 2020-10-30
CN111868928B (zh) 2024-09-06

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