KR102266585B1 - 벌크 탄화규소를 제조하기 위한 방법 - Google Patents

벌크 탄화규소를 제조하기 위한 방법 Download PDF

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KR102266585B1
KR102266585B1 KR1020167008933A KR20167008933A KR102266585B1 KR 102266585 B1 KR102266585 B1 KR 102266585B1 KR 1020167008933 A KR1020167008933 A KR 1020167008933A KR 20167008933 A KR20167008933 A KR 20167008933A KR 102266585 B1 KR102266585 B1 KR 102266585B1
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silicon carbide
seed
crucible
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KR20160050086A (ko
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로먼 브이. 드라체브
빠르티싸르티 산타나라가반
안드리히 엠. 안드루크히브
데이비드 에스. 리틀
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지티에이티 코포레이션
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02Epitaxial-layer growth
    • C30B23/06Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066Heating of the material to be evaporated
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02Epitaxial-layer growth
    • C30B23/025Epitaxial-layer growth characterised by the substrate
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/36Carbides

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
KR1020167008933A 2013-09-06 2014-09-05 벌크 탄화규소를 제조하기 위한 방법 Active KR102266585B1 (ko)

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US201361874597P 2013-09-06 2013-09-06
US61/874,597 2013-09-06
PCT/US2014/054255 WO2015035140A1 (en) 2013-09-06 2014-09-05 Method for producing bulk silicon carbide

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KR20160050086A KR20160050086A (ko) 2016-05-10
KR102266585B1 true KR102266585B1 (ko) 2021-06-18

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US (2) US10801126B2 (enExample)
JP (1) JP6487446B2 (enExample)
KR (1) KR102266585B1 (enExample)
CN (2) CN110670124B (enExample)
DE (1) DE112014004096T5 (enExample)
TW (2) TWI690627B (enExample)
WO (1) WO2015035140A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112014004056T5 (de) * 2013-09-06 2016-06-02 Gtat Corporation Verfahren und Apparatur zur Herstellung von Massen-Siliciumcarbid aus einem Siliciumcarbid-Vorläufer
CN112639174B (zh) * 2018-08-30 2022-09-20 赛尼克公司 生长半绝缘碳化硅单晶锭的方法和用于生长碳化硅单晶锭的装置
CN109402731B (zh) * 2018-10-17 2021-01-15 福建北电新材料科技有限公司 一种高纯半绝缘碳化硅晶体生长装置及其方法
JP2020189756A (ja) * 2019-05-17 2020-11-26 信越半導体株式会社 結晶成長装置及び結晶成長方法
EP3760766B1 (en) * 2019-07-03 2022-03-09 SiCrystal GmbH System for efficient manufacturing of a plurality of high-quality semiconductor single crystals, and method of manufacturing same
EP3760765B1 (en) * 2019-07-03 2022-03-16 SiCrystal GmbH System for horizontal growth of high-quality semiconductor single crystals, and method of manufacturing same
JP7434802B2 (ja) * 2019-10-30 2024-02-21 株式会社レゾナック 結晶成長装置及び結晶成長方法
CN112160025B (zh) * 2020-08-27 2021-07-16 露笑新能源技术有限公司 一种基于晶体炉的加热组件结构
US20220251725A1 (en) * 2021-02-09 2022-08-11 National Chung Shan Institute Of Science And Technology Method of growing on-axis silicon carbide single crystal by regulating silicon carbide source material in size
CN113652750B (zh) * 2021-08-18 2022-07-12 山东天岳先进科技股份有限公司 具有环形形貌的碳化硅晶体及其制备方法和制得的衬底
CN116716655B (zh) * 2023-06-14 2024-04-02 通威微电子有限公司 生长高质量碳化硅晶体的装置、方法及碳化硅晶体

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030094132A1 (en) 2001-02-14 2003-05-22 Vodakov Yury Alexandrovich Apparatus for growing low defect density silicon carbide
US20070283880A1 (en) 2005-03-24 2007-12-13 Tsvetkov Valeri F Apparatus and method for the production of bulk silicon carbide single crystals
WO2015035152A1 (en) 2013-09-06 2015-03-12 Gtat Corporation Method and apparatus for producing bulk silicon carbide using a silicon carbide seed

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732385A (en) 1980-08-01 1982-02-22 Sumitomo Heavy Ind Ltd Immersion type continuous pickling device
JPS6124472A (ja) 1984-07-13 1986-02-03 Olympus Optical Co Ltd 感熱転写方式の階調記録方法
JPS6124472U (ja) * 1984-07-19 1986-02-13 三洋電機株式会社 昇華式結晶成長装置
JPH0631699A (ja) 1992-07-14 1994-02-08 Nec Corp シャント切断ブレイク装置
JPH06316499A (ja) * 1993-04-30 1994-11-15 Sharp Corp 炭化珪素単結晶の製造方法
JPH09268096A (ja) * 1996-03-29 1997-10-14 Toyota Central Res & Dev Lab Inc 単結晶の製造方法及び種結晶
US5944890A (en) * 1996-03-29 1999-08-31 Denso Corporation Method of producing single crystals and a seed crystal used in the method
JPH08325099A (ja) * 1996-06-24 1996-12-10 Sanyo Electric Co Ltd SiC単結晶の成長方法
JP3898278B2 (ja) * 1997-04-21 2007-03-28 昭和電工株式会社 炭化ケイ素単結晶の製造方法及びその製造装置
US6451112B1 (en) * 1999-10-15 2002-09-17 Denso Corporation Method and apparatus for fabricating high quality single crystal
JP4880164B2 (ja) * 2000-02-15 2012-02-22 ザ フォックス グループ,インコーポレイティド 低欠陥密度炭化ケイ素材料
JP2001294413A (ja) * 2000-04-11 2001-10-23 Toyota Motor Corp カーボンナノチューブの製造方法および多孔質SiC材料の製造方法および多孔質SiC材料
JP4275308B2 (ja) * 2000-12-28 2009-06-10 株式会社デンソー 炭化珪素単結晶の製造方法およびその製造装置
ATE335872T1 (de) 2003-04-24 2006-09-15 Norstel Ab Vorrichtung und verfahren zur herstellung von einkristallen durch dampfphasenabscheidung
DE10335538A1 (de) * 2003-07-31 2005-02-24 Sicrystal Ag Verfahren und Vorrichtung zur AIN-Einkristall-Herstellung mit gasdurchlässiger Tiegelwand
US7314520B2 (en) * 2004-10-04 2008-01-01 Cree, Inc. Low 1c screw dislocation 3 inch silicon carbide wafer
US7300519B2 (en) 2004-11-17 2007-11-27 Cree, Inc. Reduction of subsurface damage in the production of bulk SiC crystals
WO2008014449A2 (en) * 2006-07-28 2008-01-31 Caracal, Inc. Seed holder for crystal growth reactors
CN101580964B (zh) * 2008-05-12 2012-02-01 中国科学院物理研究所 一种用于生长高质量碳化硅晶体的籽晶托
JP5012655B2 (ja) * 2008-05-16 2012-08-29 三菱電機株式会社 単結晶成長装置
JP5102697B2 (ja) * 2008-05-21 2012-12-19 株式会社ブリヂストン 炭化珪素単結晶の製造方法
JP2010095397A (ja) * 2008-10-15 2010-04-30 Nippon Steel Corp 炭化珪素単結晶及び炭化珪素単結晶ウェハ
WO2010111473A1 (en) * 2009-03-26 2010-09-30 Ii-Vi Incorporated Sic single crystal sublimation growth method and apparatus
JP5146418B2 (ja) * 2009-07-13 2013-02-20 新日鐵住金株式会社 炭化珪素単結晶製造用坩堝及び炭化珪素単結晶の製造方法
JP2013504513A (ja) * 2009-09-15 2013-02-07 トゥー‐シックス・インコーポレイテッド SiC単結晶の昇華成長方法
CN101985773B (zh) * 2009-11-05 2013-12-18 新疆天科合达蓝光半导体有限公司 一种籽晶处理方法和生长碳化硅单晶的方法
WO2011065060A1 (ja) * 2009-11-30 2011-06-03 住友電気工業株式会社 単結晶の製造方法
JP4992965B2 (ja) * 2009-12-25 2012-08-08 株式会社デンソー 炭化珪素単結晶の製造装置
JP5346821B2 (ja) * 2010-01-15 2013-11-20 株式会社ブリヂストン 炭化ケイ素単結晶の製造装置
JP5143159B2 (ja) * 2010-02-18 2013-02-13 三菱電機株式会社 単結晶の製造装置
JP2011184208A (ja) * 2010-03-04 2011-09-22 Bridgestone Corp 炭化ケイ素単結晶の製造装置及び炭化ケイ素単結晶の製造方法
EP2402999A1 (en) 2010-06-29 2012-01-04 IHP GmbH-Innovations for High Performance Microelectronics / Leibniz-Institut für innovative Mikroelektronik Semiconductor component, method of producing a semiconductor component, semiconductor device
CN102534763A (zh) * 2012-01-17 2012-07-04 山东天岳先进材料科技有限公司 一种物理气相沉积法生长大尺寸碳化硅单晶的石墨坩埚及其应用
CN202440568U (zh) * 2012-01-17 2012-09-19 山东天岳先进材料科技有限公司 一种用于生长碳化硅晶棒的石墨坩埚
US9738991B2 (en) * 2013-02-05 2017-08-22 Dow Corning Corporation Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030094132A1 (en) 2001-02-14 2003-05-22 Vodakov Yury Alexandrovich Apparatus for growing low defect density silicon carbide
US20070283880A1 (en) 2005-03-24 2007-12-13 Tsvetkov Valeri F Apparatus and method for the production of bulk silicon carbide single crystals
WO2015035152A1 (en) 2013-09-06 2015-03-12 Gtat Corporation Method and apparatus for producing bulk silicon carbide using a silicon carbide seed

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CN105518187B (zh) 2019-11-08
TWI654346B (zh) 2019-03-21
US20210032770A1 (en) 2021-02-04
WO2015035140A1 (en) 2015-03-12
CN105518187A (zh) 2016-04-20
US20150068445A1 (en) 2015-03-12
US10801126B2 (en) 2020-10-13
JP2016531836A (ja) 2016-10-13
US11505876B2 (en) 2022-11-22
DE112014004096T5 (de) 2016-06-23
TW201920784A (zh) 2019-06-01
TW201522726A (zh) 2015-06-16
CN110670124A (zh) 2020-01-10
JP6487446B2 (ja) 2019-03-20
KR20160050086A (ko) 2016-05-10
CN110670124B (zh) 2021-07-30
TWI690627B (zh) 2020-04-11

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