KR102213034B1 - 임베디드 다이 기판 및 임베디드 다이 기판을 제조하는 방법 - Google Patents

임베디드 다이 기판 및 임베디드 다이 기판을 제조하는 방법 Download PDF

Info

Publication number
KR102213034B1
KR102213034B1 KR1020187029732A KR20187029732A KR102213034B1 KR 102213034 B1 KR102213034 B1 KR 102213034B1 KR 1020187029732 A KR1020187029732 A KR 1020187029732A KR 20187029732 A KR20187029732 A KR 20187029732A KR 102213034 B1 KR102213034 B1 KR 102213034B1
Authority
KR
South Korea
Prior art keywords
die
layer
substrate
conductive
dielectric layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020187029732A
Other languages
English (en)
Korean (ko)
Other versions
KR20180124932A (ko
Inventor
대익 김
지에 푸
창한 윤
진관 김
마누엘 올드릿
쳉지에 주오
마리오 벨레즈
종해 김
Original Assignee
퀄컴 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 퀄컴 인코포레이티드 filed Critical 퀄컴 인코포레이티드
Publication of KR20180124932A publication Critical patent/KR20180124932A/ko
Application granted granted Critical
Publication of KR102213034B1 publication Critical patent/KR102213034B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/611Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together
    • H10W70/614Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together the multiple chips being integrally enclosed
    • H01L23/5383
    • H01L21/4853
    • H01L21/4857
    • H01L21/486
    • H01L23/481
    • H01L23/49822
    • H01L23/49827
    • H01L23/5384
    • H01L23/5389
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • H10W20/021Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • H10W20/021Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • H10W20/0234Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias comprising etching via holes that stop on pads or on electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • H10W20/021Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • H10W20/0242Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias comprising etching via holes from the back sides of the chips, wafers or substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/20Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/08Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers by depositing layers on the chip or wafer, e.g. "chip-first" RDLs
    • H10W70/09Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers by depositing layers on the chip or wafer, e.g. "chip-first" RDLs extending onto an encapsulation that laterally surrounds the chip or wafer, e.g. fan-out wafer level package [FOWLP] RDLs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/095Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers of vias therein
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/611Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63Vias, e.g. via plugs
    • H10W70/635Through-vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68Shapes or dispositions thereof
    • H10W70/685Shapes or dispositions thereof comprising multiple insulating layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/093Connecting or disconnecting other interconnections thereto or therefrom, e.g. connecting bond wires or bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/099Connecting interconnections to insulating or insulated package substrates, interposers or redistribution layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68Shapes or dispositions thereof
    • H10W70/682Shapes or dispositions thereof comprising holes having chips therein
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/0198Manufacture or treatment batch processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/351Materials of die-attach connectors
    • H10W72/352Materials of die-attach connectors comprising metals or metalloids, e.g. solders
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/351Materials of die-attach connectors
    • H10W72/353Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
    • H10W72/354Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/9413Dispositions of bond pads on encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/944Dispositions of multiple bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/734Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Structure Of Printed Boards (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
KR1020187029732A 2016-03-18 2017-03-16 임베디드 다이 기판 및 임베디드 다이 기판을 제조하는 방법 Active KR102213034B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/074,750 2016-03-18
US15/074,750 US10325855B2 (en) 2016-03-18 2016-03-18 Backside drill embedded die substrate
PCT/US2017/022829 WO2017161199A1 (en) 2016-03-18 2017-03-16 Backside drill embedded die substrate

Publications (2)

Publication Number Publication Date
KR20180124932A KR20180124932A (ko) 2018-11-21
KR102213034B1 true KR102213034B1 (ko) 2021-02-04

Family

ID=58455674

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187029732A Active KR102213034B1 (ko) 2016-03-18 2017-03-16 임베디드 다이 기판 및 임베디드 다이 기판을 제조하는 방법

Country Status (9)

Country Link
US (1) US10325855B2 (https=)
EP (1) EP3430644B1 (https=)
JP (1) JP6679748B2 (https=)
KR (1) KR102213034B1 (https=)
CN (1) CN109075154B (https=)
BR (1) BR112018068970B1 (https=)
ES (1) ES2821728T3 (https=)
TW (1) TWI692048B (https=)
WO (1) WO2017161199A1 (https=)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10373893B2 (en) * 2017-06-30 2019-08-06 Intel Corporation Embedded bridge with through-silicon vias
US10504865B2 (en) * 2017-09-28 2019-12-10 Taiwan Semiconductor Manufacturing Co., Ltd. Package structure and method of manufacturing the same
WO2019066943A1 (en) * 2017-09-29 2019-04-04 Intel Corporation SEMICONDUCTOR HOUSINGS WITH INTEGRATED INTERCONNECTIONS
WO2019132955A1 (en) 2017-12-29 2019-07-04 Intel Corporation Microelectronic assemblies
TWI733056B (zh) * 2018-09-19 2021-07-11 矽品精密工業股份有限公司 電子封裝件及其製法
US11342243B2 (en) * 2018-09-25 2022-05-24 Intel Corporation Thermal management solutions for embedded integrated circuit devices
US11322428B2 (en) * 2019-12-02 2022-05-03 Advanced Semiconductor Engineering, Inc. Semiconductor device package and method of manufacturing the same
KR102762887B1 (ko) * 2019-12-10 2025-02-07 삼성전기주식회사 전자부품 내장기판
US11289404B2 (en) 2020-01-17 2022-03-29 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and method
US11715699B2 (en) 2020-03-17 2023-08-01 Amkor Technology Singapore Holding Pte. Ltd. Semiconductor devices and methods of manufacturing semiconductor devices
TWI891722B (zh) * 2020-03-17 2025-08-01 新加坡商安靠科技新加坡控股私人有限公司 半導體裝置和製造半導體裝置的方法
US11302643B2 (en) * 2020-03-25 2022-04-12 Intel Corporation Microelectronic component having molded regions with through-mold vias
US11824031B2 (en) * 2020-06-10 2023-11-21 Advanced Semiconductor Engineering, Inc. Semiconductor package structure with dielectric structure covering upper surface of chip
TWI731745B (zh) * 2020-07-15 2021-06-21 欣興電子股份有限公司 內埋式元件結構及其製造方法
KR102854180B1 (ko) * 2020-07-27 2025-09-03 삼성전기주식회사 전자부품 내장기판
US11367673B2 (en) * 2020-09-02 2022-06-21 Intel Corporation Semiconductor package with hybrid through-silicon-vias
KR102902639B1 (ko) * 2020-12-29 2025-12-22 삼성전자주식회사 반도체 패키지 및 그 제조 방법
US12230615B2 (en) * 2020-12-30 2025-02-18 UTAC Headquarters Pte. Ltd. Semiconductor packages with vertical passive components
TWI759095B (zh) * 2021-02-04 2022-03-21 欣興電子股份有限公司 封裝結構及其製作方法
US20240145445A1 (en) * 2021-03-09 2024-05-02 Sony Semiconductor Solutions Corporation Semiconductor device, method for manufacturing semiconductor device, and electronic device
CN118251764A (zh) * 2021-11-11 2024-06-25 应用材料公司 半导体元件封装
US12230552B2 (en) * 2021-11-18 2025-02-18 Qualcomm Incorporated Recess structure for padless stack via
US20250140748A1 (en) * 2023-10-31 2025-05-01 Intel Corporation Double-sided conductive via
TWI879344B (zh) * 2023-12-25 2025-04-01 友達光電股份有限公司 半導體結構及其製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020020898A1 (en) 2000-08-16 2002-02-21 Vu Quat T. Microelectronic substrates with integrated devices
US20080048310A1 (en) 2006-08-25 2008-02-28 Phoenix Precision Technology Corporation Carrier Board Structure Embedded with Semiconductor Component and Method for Fabricating the Carrier Board Structure
US20110204505A1 (en) 2010-02-23 2011-08-25 Stats Chippac, Ltd. Semiconductor Device and Method of Forming TMV and TSV in WLCSP Using Same Carrier
US20150318246A1 (en) 2014-04-30 2015-11-05 Taiwan Semiconductor Manufacturing Company, Ltd. Chip-on-wafer package and method of forming same

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6744135B2 (en) * 2001-05-22 2004-06-01 Hitachi, Ltd. Electronic apparatus
JP2004186422A (ja) 2002-12-03 2004-07-02 Shinko Electric Ind Co Ltd 電子部品実装構造及びその製造方法
KR100716815B1 (ko) * 2005-02-28 2007-05-09 삼성전기주식회사 칩 내장형 인쇄회로기판 및 그 제조방법
US8110899B2 (en) * 2006-12-20 2012-02-07 Intel Corporation Method for incorporating existing silicon die into 3D integrated stack
KR101486420B1 (ko) 2008-07-25 2015-01-26 삼성전자주식회사 칩 패키지, 이를 이용한 적층형 패키지 및 그 제조 방법
KR101484786B1 (ko) * 2008-12-08 2015-01-21 삼성전자주식회사 집적회로 패키지 내장 인쇄회로기판 및 그 제조방법
US9406658B2 (en) 2010-12-17 2016-08-02 Advanced Semiconductor Engineering, Inc. Embedded component device and manufacturing methods thereof
EP2610269A1 (en) * 2011-12-28 2013-07-03 Saudi Basic Industries Corporation Catalyst composition and method for preparing the same
JP5955023B2 (ja) * 2012-02-23 2016-07-20 京セラ株式会社 部品内蔵印刷配線板及びその製造方法
US10049964B2 (en) * 2012-03-23 2018-08-14 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming a fan-out PoP device with PWB vertical interconnect units
US8786060B2 (en) 2012-05-04 2014-07-22 Advanced Semiconductor Engineering, Inc. Semiconductor package integrated with conformal shield and antenna
US20130337648A1 (en) 2012-06-14 2013-12-19 Bridge Semiconductor Corporation Method of making cavity substrate with built-in stiffener and cavity
US9147663B2 (en) * 2013-05-28 2015-09-29 Intel Corporation Bridge interconnection with layered interconnect structures
CN104851847B (zh) * 2014-02-14 2017-09-08 恒劲科技股份有限公司 封装装置及其制作方法
US9202803B2 (en) * 2014-03-28 2015-12-01 Intel Corporation Laser cavity formation for embedded dies or components in substrate build-up layers
DE102014112407B4 (de) 2014-04-30 2016-12-29 Taiwan Semiconductor Manufacturing Company, Ltd. 3D-Gehäuse mit gestapelten Chips und Verfahren zu dessen Herstellung
US9252127B1 (en) * 2014-07-10 2016-02-02 Invensas Corporation Microelectronic assemblies with integrated circuits and interposers with cavities, and methods of manufacture
US9653438B2 (en) * 2014-08-21 2017-05-16 General Electric Company Electrical interconnect structure for an embedded semiconductor device package and method of manufacturing thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020020898A1 (en) 2000-08-16 2002-02-21 Vu Quat T. Microelectronic substrates with integrated devices
US20080048310A1 (en) 2006-08-25 2008-02-28 Phoenix Precision Technology Corporation Carrier Board Structure Embedded with Semiconductor Component and Method for Fabricating the Carrier Board Structure
US20110204505A1 (en) 2010-02-23 2011-08-25 Stats Chippac, Ltd. Semiconductor Device and Method of Forming TMV and TSV in WLCSP Using Same Carrier
US20150318246A1 (en) 2014-04-30 2015-11-05 Taiwan Semiconductor Manufacturing Company, Ltd. Chip-on-wafer package and method of forming same

Also Published As

Publication number Publication date
US10325855B2 (en) 2019-06-18
TW201737394A (zh) 2017-10-16
JP6679748B2 (ja) 2020-04-15
US20170271266A1 (en) 2017-09-21
ES2821728T3 (es) 2021-04-27
JP2019511120A (ja) 2019-04-18
BR112018068970A2 (pt) 2019-03-06
BR112018068970B1 (pt) 2023-01-31
CN109075154B (zh) 2022-06-03
EP3430644A1 (en) 2019-01-23
KR20180124932A (ko) 2018-11-21
CN109075154A (zh) 2018-12-21
WO2017161199A1 (en) 2017-09-21
EP3430644B1 (en) 2020-07-01
TWI692048B (zh) 2020-04-21

Similar Documents

Publication Publication Date Title
KR102213034B1 (ko) 임베디드 다이 기판 및 임베디드 다이 기판을 제조하는 방법
JP6609633B2 (ja) 半導体装置
US20180130761A1 (en) Semiconductor package, manufacturing method thereof, and electronic element module using the same
JP6377178B2 (ja) 埋込型パッケージ基板コンデンサ
CN111933590B (zh) 封装结构和封装结构制作方法
KR20130038404A (ko) 스택 다이 bga 또는 lga 컴포넌트 어셈블리
JP4395166B2 (ja) コンデンサを内蔵した半導体装置及びその製造方法
US9425116B2 (en) Integrated circuit package and a method for manufacturing an integrated circuit package
US9105562B2 (en) Integrated circuit package and packaging methods
KR20170138644A (ko) Pop 구조의 반도체 어셈블리 및 이를 포함하는 전자 장치
TW201731070A (zh) 混合式微電子基材及其製造方法
CN103219317B (zh) 集成电路封装以及用于制造集成电路封装的方法
CN108604585B (zh) 包括集成电路(ic)封装之间的柔性连接器的集成器件
US20140116762A1 (en) Wiring board and mounting structure using the same
JP2016219535A (ja) 電子回路装置
US20240363503A1 (en) Semiconductor devices with double-sided fanout chip packages
JP4099072B2 (ja) 部品内蔵モジュール
HK1252273A1 (zh) 半导体器件
HK1260183B (zh) 包括集成电路(ic)封装之间的柔性连接器的集成器件
HK1260183A1 (en) Integrated device comprising flexible connector between integrated circuit (ic) packages

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
A302 Request for accelerated examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D17-exm-PA0302

St.27 status event code: A-1-2-D10-D16-exm-PA0302

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E90F Notification of reason for final refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000